| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/02/2000 | CN1261829A Method and apparatus for gas phase coating complex internal surfaces of hollow articles |
| 08/01/2000 | US6097079 Boron implanted dielectric structure |
| 08/01/2000 | US6096913 Suppressing formation of a second metal-ligand complex of the metal with a higher valence by adding the elemental form of the metal to the synthesis of the first metal-ligand complex. |
| 08/01/2000 | US6096661 Method for depositing silicon dioxide using low temperatures |
| 08/01/2000 | US6096436 A coating on at least a portion of a substrate comprising a base layer, a boron and carbon containing intermediated layer and a carbon, boron and nitrogen containing layer adjacent to the intermediate layer |
| 08/01/2000 | US6096390 Method of forming a hard carbon film over the inner surface of a guide bush |
| 08/01/2000 | US6096389 Method and apparatus for forming a deposited film using a microwave CVD process |
| 08/01/2000 | US6096377 Subjecting the substrate to a selective tungsten carbide etching step, and selective cobalt etching step |
| 08/01/2000 | US6096371 Methods and apparatus for reducing reflection from optical substrates |
| 08/01/2000 | US6096149 Method for fabricating adhesion-resistant micromachined devices |
| 08/01/2000 | US6096135 Method and apparatus for reducing contamination of a substrate in a substrate processing system |
| 08/01/2000 | US6096134 Liquid delivery system |
| 08/01/2000 | US6096133 Chemical vapor deposition apparatus |
| 08/01/2000 | US6095806 Semiconductor wafer boat and vertical heat treating system |
| 08/01/2000 | US6095158 Anhydrous HF in-situ cleaning process of semiconductor processing chambers |
| 08/01/2000 | US6095085 Photo-assisted remote plasma apparatus and method |
| 08/01/2000 | US6095084 High density plasma process chamber |
| 07/27/2000 | WO2000044047A1 Microelectronic structure |
| 07/27/2000 | WO2000044033A1 Method and apparatus for film deposition |
| 07/27/2000 | WO2000043577A1 Cdv method of and reactor for silicon carbide monocrystal growth |
| 07/27/2000 | WO2000043568A1 Microwave plasma cvd apparatus |
| 07/27/2000 | WO2000043567A1 Film forming device |
| 07/27/2000 | WO2000043566A1 Plasma processing system and method |
| 07/27/2000 | WO2000043564A1 Method of, and apparatus for, depositing materials |
| 07/27/2000 | WO2000000992A9 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber |
| 07/27/2000 | DE19959845A1 Plasma generator, for plasma-assisted coating of a tubular component, comprises an induction coil around a protective tube with end closure flanges enclosing the component |
| 07/27/2000 | DE19902000A1 Production of metal-coated hard materials used in cutting, boring, sawing and grinding tools comprises producing the metal layer by decomposing metal carbonyls in the presence of the hard material |
| 07/26/2000 | EP1022559A1 System and method for identifying gaseous effluents, and equipment provided with such a system |
| 07/26/2000 | EP1022354A2 Process for coating plastic substrates |
| 07/26/2000 | EP1022353A1 Process for manufacturing metal coated hard materials |
| 07/26/2000 | EP1021592A1 Jet plasma process and apparatus for deposition of coatings and coatings thus obtained |
| 07/26/2000 | EP1021591A1 Combustion chemical vapor deposition of phosphate films and coatings |
| 07/26/2000 | EP1021589A1 Method of chemical vapor deposition of metal films |
| 07/26/2000 | EP1021588A1 Fluid delivery apparatus and method |
| 07/26/2000 | EP1021587A1 Automatic positive pressure seal access door |
| 07/26/2000 | EP1021586A1 A rapid thermal processing barrel reactor for processing substrates |
| 07/26/2000 | EP0583374B1 Method and apparatus for plasma deposition |
| 07/25/2000 | US6093660 Inductively coupled plasma chemical vapor deposition technology |
| 07/25/2000 | US6093645 Elimination of titanium nitride film deposition in tungsten plug technology using PE-CVD-TI and in-situ plasma nitridation |
| 07/25/2000 | US6093638 Method of forming an electrical contact in a substrate |
| 07/25/2000 | US6093479 Coated hard alloy blade member |
| 07/25/2000 | US6093297 Method for depositing solid electrolyte layer |
| 07/25/2000 | US6093281 Baffle plate design for decreasing conductance lost during precipitation of polymer precursors in plasma etching chambers |
| 07/25/2000 | US6093260 Surface alloyed high temperature alloys |
| 07/25/2000 | US6093253 Method and a device for epitaxial growth of objects by chemical vapor deposition |
| 07/25/2000 | US6093252 Process chamber with inner support |
| 07/25/2000 | US6093228 Method and device for collecting by-products individually |
| 07/25/2000 | US6092486 Plasma processing apparatus and plasma processing method |
| 07/25/2000 | CA2035991C Method of coating steel substrate using low temperature plasma processes and priming |
| 07/20/2000 | WO2000042652A1 Semiconductor device and its production method |
| 07/20/2000 | WO2000042236A2 Processing system and method for chemical vapor deposition |
| 07/20/2000 | WO2000042235A1 Film forming device |
| 07/20/2000 | WO2000042234A1 Material fabrication |
| 07/20/2000 | WO2000042232A1 Tungsten layer forming method and laminate structure of tungsten layer |
| 07/20/2000 | WO2000041983A1 Densification of porous bodies |
| 07/20/2000 | WO2000003421A9 Improved endpoint detection for substrate fabrication processes |
| 07/20/2000 | WO2000000767A9 System for supply of multiple chemicals to a process tool |
| 07/20/2000 | DE19901834A1 Verfahren zum Beschichten von Substraten aus Kunststoff A process for coating substrates of plastic |
| 07/20/2000 | CA2359822A1 Material fabrication |
| 07/19/2000 | EP1020236A2 Cleaning gas and cleaning method |
| 07/19/2000 | EP1019956A1 Control of semiconductor device isolation properties through incorporation of fluorine in peteos films |
| 07/19/2000 | EP1019945A1 Method and device for surface-treating substrates |
| 07/19/2000 | EP1019944A1 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process |
| 07/19/2000 | EP1019943A1 Device and method for treating the inside surface of a plastic container with a narrow opening in a plasma enhanced process |
| 07/19/2000 | EP1019563A1 Dual frequency excitation of plasma for film deposition |
| 07/19/2000 | EP1019562A1 Plasma enhanced chemical deposition with low vapor pressure compounds |
| 07/19/2000 | EP1019553A1 Method for dissociating metals or dissociating metal compounds |
| 07/19/2000 | EP1019180A1 Ampule with integral filter |
| 07/19/2000 | EP1017641A4 Method for lubricating glass molds, plungers and the like |
| 07/19/2000 | EP0820424B1 Method for the chemical vapour infiltration of a material consisting of carbon and silicon and/or boron |
| 07/19/2000 | EP0800490B1 Process for producing preforms for optical fibres |
| 07/19/2000 | EP0419507B1 Dry exhaust gas conditioning |
| 07/19/2000 | CN1260843A Method of coating edges with diamond-like carbon |
| 07/19/2000 | CN1260767A Photocatalytic-activated self-cleaning article and method of making same |
| 07/19/2000 | CN1260407A Liquid conveying system |
| 07/19/2000 | CN1054656C Method of cleaning vacuum processing apparatus |
| 07/19/2000 | CN1054652C Apparatus for rapid plasma treatments and method |
| 07/18/2000 | US6091122 Fabrication of mid-cap metal gates compatible with ultra-thin dielectrics |
| 07/18/2000 | US6091045 Plasma processing apparatus utilizing a microwave window having a thinner inner area |
| 07/18/2000 | US6090964 Organocuprous precursors for chemical vapor deposition of a copper film |
| 07/18/2000 | US6090963 Cuprous hexafluoroacetonate complex with olefin ligand, chemical vapor deposition precursor |
| 07/18/2000 | US6090960 Cuprous (hexafluoroacetylacetonate) complex with a methoxysilylolefin |
| 07/18/2000 | US6090725 Method for preventing bubble defects in BPSG film |
| 07/18/2000 | US6090709 Nitriding from titanium tetrahalide; hydrogen halide or ammonium halide by-product formation |
| 07/18/2000 | US6090706 Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein |
| 07/18/2000 | US6090705 Method of eliminating edge effect in chemical vapor deposition of a metal |
| 07/18/2000 | US6090702 Embedded electroconductive layer and method for formation thereof |
| 07/18/2000 | US6090675 Formation of dielectric layer employing high ozone:tetraethyl-ortho-silicate ratios during chemical vapor deposition |
| 07/18/2000 | US6090530 Heating substrate using thermal energy in pressurized procesing chamber; applying electromagnetic energy to electrode to strike a plasma to plasma-polymerize precursor gas methylsilane to deposit polymer film on substrate |
| 07/18/2000 | US6090490 Substrate having thereon leveling plastic coating, decorative zirconium compound layer, protective silicone coating |
| 07/18/2000 | US6090476 Multilayer coated cutting tool comprising a cemented carbide body with at least one sintered-on inlay containing polycrystalline cubic boron nitride forming at least one cutting edge |
| 07/18/2000 | US6090458 Method and apparatus for film formation by chemical vapor deposition |
| 07/18/2000 | US6090455 Strontium, bismuth, tantalum thin film |
| 07/18/2000 | US6090442 Method of growing films on substrates at room temperatures using catalyzed binary reaction sequence chemistry |
| 07/18/2000 | US6090358 Crystalline Six Cy Nz and method for synthesis |
| 07/18/2000 | US6090212 Substrate platform for a semiconductor substrate during rapid high temperature processing and method of supporting a substrate |
| 07/18/2000 | US6090211 Apparatus and method for forming semiconductor thin layer |
| 07/18/2000 | US6090210 Multi-zone gas flow control in a process chamber |
| 07/18/2000 | US6090208 Prevention of clogging in CVD apparatus |
| 07/18/2000 | US6090206 Throttle valve providing enhanced cleaning |