| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/05/2000 | US6113751 Electromagnetic beam assisted deposition method for depositing a material on an irradiated substrate |
| 09/05/2000 | US6113732 Deposited film forming apparatus |
| 09/05/2000 | US6113705 High-speed rotational vapor deposition apparatus and high-speed rotational vapor deposition thin film method |
| 09/05/2000 | US6113704 Substrate-supporting device for semiconductor processing |
| 09/05/2000 | US6113703 Method and apparatus for processing the upper and lower faces of a wafer |
| 09/05/2000 | US6113702 Wafer support system |
| 09/05/2000 | US6113701 Semiconductor device, manufacturing method, and system |
| 09/05/2000 | US6113700 Gas diffuser having varying thickness and nozzle density for semiconductor device fabrication and reaction furnace with gas diffuser |
| 09/05/2000 | US6113699 Purging gas control structure for CVD chamber |
| 09/05/2000 | US6113698 Degassing method and apparatus |
| 09/05/2000 | US6112697 RF powered plasma enhanced chemical vapor deposition reactor and methods |
| 09/05/2000 | US6112696 Downstream plasma using oxygen gas mixture |
| 09/05/2000 | US6112695 Apparatus for plasma deposition of a thin film onto the interior surface of a container |
| 09/05/2000 | US6112554 Device for forming a pyrolytic coating |
| 09/05/2000 | CA2073236C Process and apparatus for the ignition of cvd plasmas |
| 08/31/2000 | WO2000051174A1 A method of processing a polymer layer |
| 08/31/2000 | WO2000050246A1 Electronic device, method of manufacturing power supply board and imaging device, and method of manufacturing electronic device and electron source board |
| 08/31/2000 | DE19907601A1 Verfahren sowie Anordnung zum kontinuierlichen Behandeln von Gegenständen Method and arrangement for the continuous treatment of objects |
| 08/30/2000 | EP1032052A1 Method of manufacturing silicon based thin film photoelectric conversion device |
| 08/30/2000 | EP1032032A2 Tailoring of a wetting/barrier layer to reduce electromigration in an aluminium interconnect |
| 08/30/2000 | EP1032023A2 Method and arrangement for continuously treating objects |
| 08/30/2000 | EP1031641A2 Method and apparatus for depositing an insulating film |
| 08/30/2000 | EP1031640A1 Trap apparatus |
| 08/30/2000 | EP1030855A1 Bismuth amide compounds and compositions, and method of forming bismuth-containing films therewith |
| 08/30/2000 | EP1030788A1 Plasma processing methods and apparatus |
| 08/30/2000 | EP1030745A1 All-surface biasable and/or temperature-controlled electrostatically-shielded rf plasma source |
| 08/30/2000 | EP0928498B1 Method for producing a titanium monophosphide layer and its use |
| 08/30/2000 | EP0907764B1 Cutting tool and manufacturing method therefor |
| 08/30/2000 | EP0833960B1 Use of plasma polymer layer sequences as functional layers in material transport or heat exchanger systems |
| 08/30/2000 | EP0586579B1 Microwave plasma processing device |
| 08/30/2000 | CN1265163A Single body injector and deposition chamber |
| 08/29/2000 | US6111284 Ferroelectric thin-film device |
| 08/29/2000 | US6111124 Such as tris-(2,2,6,6-tetramethyl-3,5-heptanedionato) bismuth n,n,n'n'-tetramethylethylenediamine adduct; use as precursors for chemical vapor deposition of bismuth for ferroelectric thin film devices, chalcogenides, and thermoelectric films |
| 08/29/2000 | US6111122 Group II MOCVD source reagents, and method of forming Group II metal-containing films utilizing same |
| 08/29/2000 | US6110855 Process for strengthening aluminum based ceramics and material |
| 08/29/2000 | US6110844 Reduction of particle deposition on substrates using temperature gradient control |
| 08/29/2000 | US6110814 Forming on substrate an insulating film containing phosphorus oxide by using film forming gas in which oxidizing gas is added to mixture including silicon compound and phosphorus compound, heating, fluidizing, planarizing |
| 08/29/2000 | US6110594 Diamond film and solid fiber composite compositions |
| 08/29/2000 | US6110556 Lid assembly for a process chamber employing asymmetric flow geometries |
| 08/29/2000 | US6110544 Surface such as glass, metal or plastic to be coated is positioned in the path of the active species generated by the plasma as they pass into and through the deposition or coating chamber of the apparatus; protective coatings |
| 08/29/2000 | US6110543 Process for making compound films |
| 08/29/2000 | US6110542 Method for forming a film |
| 08/29/2000 | US6110541 Chemical vapor deposition method and apparatus for highly textured diamond film formation |
| 08/29/2000 | US6110540 Plasma apparatus and method |
| 08/29/2000 | US6110531 Gasifying a generated mist to form a gasified precursor comprising a bismuth-containing organic compound, a metal polyalkoxide compound, a lead-containing organic compound, oxidizing with oxygen gas to form a superlattice thin film |
| 08/29/2000 | US6110530 CVD method of depositing copper films by using improved organocopper precursor blend |
| 08/29/2000 | US6110529 Using a metalorganic reagent solution consisting a metalorganic complex dissolved in a solvent or suspending agent to deposit a metal, a metal oxide or a metal sulfide |
| 08/29/2000 | US6110322 Prevention of ground fault interrupts in a semiconductor processing system |
| 08/29/2000 | US6110290 Method for epitaxial growth and apparatus for epitaxial growth |
| 08/29/2000 | US6110289 Rapid thermal processing barrel reactor for processing substrates |
| 08/29/2000 | US6110287 Plasma processing method and plasma processing apparatus |
| 08/29/2000 | US6110286 Vertical processing unit |
| 08/29/2000 | US6110285 Vertical wafer boat |
| 08/29/2000 | US6110284 Apparatus and a method for shielding light emanating from a light source heating a semicondutor processing chamber |
| 08/29/2000 | US6110283 Chemical vapor deposition apparatus |
| 08/29/2000 | US6110240 Superhard article with diamond coat and method of manufacturing same |
| 08/29/2000 | US6109915 Drafting apparatus |
| 08/29/2000 | US6109209 Apparatus for use with CVI/CVD processes |
| 08/29/2000 | US6109208 Plasma generating apparatus with multiple microwave introducing means |
| 08/29/2000 | US6109206 Remote plasma source for chamber cleaning |
| 08/29/2000 | US6108937 Method of cooling wafers |
| 08/29/2000 | CA2195049C Blood collection tube assembly |
| 08/24/2000 | WO2000049646A1 Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material |
| 08/24/2000 | WO2000049199A1 Method and apparatus for chemical vapor deposition of polysilicon |
| 08/24/2000 | WO2000049198A1 Method and apparatus for controlling polymerized teos build-up in vacuum pump lines |
| 08/24/2000 | WO2000049197A1 Wafer processing reactor having a gas flow control system and method |
| 08/24/2000 | DE19907220A1 Diamond coated tool, especially a machining tool or dental tool, has adjustable surface topography obtained by sintering particles to tool body prior to diamond layer deposition |
| 08/24/2000 | DE19906676A1 Bedampfungsvorrichtung A steamer |
| 08/24/2000 | CA2362694A1 Wafer processing reactor having a gas flow control system and method |
| 08/23/2000 | EP1030352A2 Method and apparatus for forming materials layers from atomic gases |
| 08/23/2000 | EP1030089A2 Method and apparatus for removing processing liquid from a processing liquid path |
| 08/23/2000 | EP1029943A1 Process for producing barrier film |
| 08/23/2000 | EP1029371A1 CONSTRUCTION WITH HIGH T c? SUPERCONDUCTOR MATERIAL AND METHOD FOR PRODUCING SAID CONSTRUCTION |
| 08/23/2000 | EP1029349A1 Titanium nitride contact plug formation |
| 08/23/2000 | EP1029343A1 ELIMINATION OF THE TITANIUM NITRIDE FILM DEPOSITION IN TUNGSTEN PLUG TECHNOLOGY USING PE-CVD-Ti AND IN-SITU PLASMA NITRIDATION |
| 08/23/2000 | EP1029109A1 Long life high temperature process chamber |
| 08/23/2000 | EP1029108A1 Cemented carbide body with high wear resistance and extra tough behaviour |
| 08/23/2000 | EP1029107A1 Method for applying a diamond layer on substrates made of sintered metallic carbide |
| 08/23/2000 | EP1029106A1 Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor |
| 08/23/2000 | EP1029103A1 Coating method and device |
| 08/23/2000 | EP1028798A1 Gas purification system with safety device and method for purifying gases |
| 08/23/2000 | EP1028797A1 Semiconductor manufacturing system with getter safety device |
| 08/23/2000 | CN1264432A Method and device for vacuum-coating substrate |
| 08/23/2000 | CN1264353A Method for depositing coating layer on optical fibre while it is being drawn and device for its implementation |
| 08/23/2000 | CN1264159A Foreign-body elminating method, film forming method, semiconductor device and film forming device |
| 08/23/2000 | CN1263953A Industrial pulse or DC plasma and chemical gas-phase deposition equipment for strenthening surface of tool or mould |
| 08/22/2000 | US6108490 Multizone illuminator for rapid thermal processing with improved spatial resolution |
| 08/22/2000 | US6108189 Electrostatic chuck having improved gas conduits |
| 08/22/2000 | US6107214 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers |
| 08/22/2000 | US6107212 Method of and apparatus for manufacturing semiconductor devices |
| 08/22/2000 | US6107200 Forming a second tungsten film on a first tungsten film which is formed by using a reduction gas not containing diborane, by using a gas containing the diborane, or forming the second tungsten film on the first tungsten film |
| 08/22/2000 | US6107199 Method for improving the morphology of refractory metal thin films |
| 08/22/2000 | US6107198 Ammonium chloride vaporizer cold trap |
| 08/22/2000 | US6107192 Reactive preclean prior to metallization for sub-quarter micron application |
| 08/22/2000 | US6107152 Method of forming tungsten nitride comprising layers using NF3 as a nitrogen source gas |
| 08/22/2000 | US6106898 Vapor deposition nitride film with tert-butyl hydrazine |
| 08/22/2000 | US6106892 Deposition of silicon oxide coating on glass |
| 08/22/2000 | US6106737 Plasma treatment method utilizing an amplitude-modulated high frequency power |
| 08/22/2000 | US6106734 Micromachine manufacture using gas beam crystallization |
| 08/22/2000 | US6106682 Thin-film processing electromagnet for low-skew magnetic orientation |