Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2000
10/10/2000US6130159 Apparatus and methods for minimizing as-deposited stress in tungsten silicide films
10/10/2000US6130146 In-situ nitride and oxynitride deposition process in the same chamber
10/10/2000US6130118 Plasma reaction apparatus and plasma reaction
10/10/2000US6130105 Deposition rate control on wafers with varying characteristics
10/10/2000US6129991 Aluminide/MCrAlY coating system for superalloys
10/10/2000US6129950 Chemical vapor deposition of a doped polysilicon layer; purging reactant gas with inert gas; adding oxidizing gas to form a thin oxide layer on silicon; purging oxidizing gas with inert gas; repeating until desired thickness reached
10/10/2000US6129856 Process for surface-finishing inner surfaces of hollow bodies and apparatus for carrying out the process
10/10/2000US6129819 Method for depositing high density plasma chemical vapor deposition oxide in high aspect ratio gaps
10/10/2000US6129808 Low contamination high density plasma etch chambers and methods for making the same
10/10/2000US6129108 Fluid delivering system
10/10/2000US6129048 Susceptor for barrel reactor
10/10/2000US6129047 Susceptor for vapor-phase growth apparatus
10/10/2000US6129046 Substrate processing apparatus
10/10/2000US6129045 Apparatus and method for exchanging an atmosphere of spherical object
10/10/2000US6129044 Apparatus for substrate processing with improved throughput and yield
10/10/2000US6129043 Gas tube with heating apparatus
10/05/2000WO2000059045A2 Multilayer semiconductor structure with phosphide-passivated germanium substrate
10/05/2000WO2000059018A1 Plasma processing system
10/05/2000WO2000059005A1 Method and apparatus for insulating a high power rf electrode through which plasma discharge gases are injected into a processing chamber
10/05/2000WO2000058995A2 Apparatus for improving plasma distribution and performance in an inductively coupled plasma
10/05/2000WO2000058994A1 Method and apparatus for compensating non-uniform wafer processing in plasma processing
10/05/2000WO2000058631A1 Conveyor for treating hollow bodies comprising an advanced pressure distribution circuit
10/05/2000WO2000058533A1 Reaction chamber for an epitaxial reactor
10/05/2000WO2000058245A1 Organometallic compounds for vapor-phase epitaxy of organometal
10/05/2000DE19957671A1 Werkzeug mit einer Molybdänsulfid enthaltenden Beschichtung und Verfahren zu dessen Herstellung Tool with a molybdenum sulphide-containing coating and process for its preparation
10/05/2000DE10005121A1 Lamp reflector for vehicles has a plasma deposited layer that acts as a barrier layer
10/05/2000CA2367000A1 Conveyor for treating hollow bodies comprising an advanced pressure distribution circuit
10/04/2000EP1041171A1 CVD processing chamber
10/04/2000EP1040500A1 A plasma generating apparatus having an electrostatic shield
10/04/2000EP1040292A1 Gas panel
10/04/2000EP1040210A1 Plasma polymerization on surface of material
10/04/2000EP1040175A1 Anti-coking coatings
10/04/2000EP1039990A1 Fluorine-doped diamond-like coatings
10/04/2000EP0711455B1 Shadow clamp
10/04/2000CN1268982A Jet plasma process and apparatus for deposition of coatings thus obtd.
10/03/2000USH1868 Method of and apparatus for controlling plasma potential and eliminating unipolar arcs in plasma chambers
10/03/2000US6127287 Silicon nitride deposition method for use in forming a memory cell dielectric
10/03/2000US6127286 Apparatus and process for deposition of thin film on semiconductor substrate while inhibiting particle formation and deposition
10/03/2000US6127271 Process for dry etching and vacuum treatment reactor
10/03/2000US6127269 Method for enhancing sheet resistance uniformity of chemical vapor deposited (CVD) tungsten silicide layers
10/03/2000US6127262 Vapor deposition of protective nitride or oxynitride antireflectivity/antirefractive coating onto first layer coated onto substrate, then coating with photosensitive layer, patterning and etching uppermost layer
10/03/2000US6126996 Metal complex source reagents for chemical vapor deposition
10/03/2000US6126994 Liquid material supply apparatus and method
10/03/2000US6126807 Dechlorination from sodium gold chloride, sulfiting; sodium gold sulfite solution can be solidified by a freeze-drying process; use in gold electroplating baths
10/03/2000US6126793 Electrodepositing a multilayer in one vacuum vessel
10/03/2000US6126792 Vapor depositing in a vacuum chamber by supplying the excitation gas through a tube directed to the plastic eyeglass substrate
10/03/2000US6126753 Single-substrate-processing CVD apparatus and method
10/03/2000US6126744 Method and system for adjusting semiconductor processing equipment
10/03/2000US6125859 Method for improved cleaning of substrate processing systems
10/03/2000US6125789 Increasing the sensitivity of an in-situ particle monitor
10/03/2000US6125788 Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter
10/03/2000CA2177645C Apparatus and method for depositing a substance with temperature control
09/2000
09/28/2000WO2000057463A1 Heat treating method for thin film and forming method for thin film
09/28/2000WO2000057462A1 Semiconductor device and its production method
09/28/2000WO2000029637A9 Diffusion barrier materials with improved step coverage
09/28/2000DE19914112A1 Verfahren zum Aufbringen einer lichtblockierenden Schicht zwischen photoleitender Schicht und Spiegel bei der Herstellung eines optisch adressierbaren, ortsauflösenden Lichtmodulators OASLM A method of applying a light-blocking layer between a photoconductive layer and a mirror during the manufacture of an optically addressable spatially resolving light modulator OASLM
09/27/2000EP1039559A1 Method for manufacturing piezoelectric material
09/27/2000EP1039524A2 Silicon nitride composite HDP/CVD process
09/27/2000EP1039523A2 Method and apparatus for forming an interlayer insulating film, and semiconductor device
09/27/2000EP1039522A1 Process for producing insulating film
09/27/2000EP1039514A1 Apparatus for manufacturing semiconductor device and its manufacturing method
09/27/2000EP1039512A2 Method for growing semiconductor film by pulsed chemical vapour deposition
09/27/2000EP1039502A2 Heat protection of sealing o-rings in a microwave plasma generating apparatus
09/27/2000EP1039501A2 Apparatus and method for production of electronic devices
09/27/2000EP1039334A2 Method of applying a light blocking layer between photoconductive layer and mirror during manufacture of an optically adressable spatial light modulator (OASLM)
09/27/2000EP1038988A2 Vaporizing device for CVD apparatus
09/27/2000EP1038307A1 Surface modification of semiconductors using electromagnetic radiation
09/27/2000EP1038306A1 Method and device for improving surfaces
09/27/2000EP1038048A2 Gas feeding system for chemical vapor deposition reactor and method of controlling the same
09/27/2000EP1038047A1 Chemical deposition method using catalyst on surface
09/27/2000EP1038046A1 Plasma reactor with a deposition shield
09/27/2000CN1268099A Method for fabricating silicon oxynitride
09/27/2000CN1267571A Aluminium hydrophilic processing technology, used primary agent and hydrophilic coating
09/26/2000US6124793 Temperature monitoring and calibration system for control of a heated CVD chuck
09/26/2000US6124217 Forming a silicon oxynitride layer upon a semiconductor topography, perfomring a bake of silicon oxynitride layer, and forming an oxide layer directly over said silicon oxynitride layer thereby forming the interlevel dielectric
09/26/2000US6124211 Cleaning method
09/26/2000US6124210 Oxidizing the particles present on the substrate by contacting a pre-process gas containing ozone to the surface of the substrate, and removing the particles by heating to exceed a decoposition point of oxide of the particles
09/26/2000US6124209 Method for treating a surface of a silicon single crystal and a method for manufacturing a silicon single crystal thin film
09/26/2000US6124186 Flowing silicohydride gas on a filament to decompose the gas into silicon and hydrogen atoms, allowing product of gas reaction between both atomic species and silicon hydride to migrated and deposit on the substrate
09/26/2000US6124039 Coating substrate
09/26/2000US6124003 Film depositing method and film depositing apparatus
09/26/2000US6123993 Providing liquid-phase precursor comprising parylene source reagent as neat liquid or in solvent solution, flash vaporizing liquid-phase precursor in flash vaporizer pyrolytic cracking unit to produce flash vaporized precursor, cracking
09/26/2000US6123992 Method of forming aluminum interconnection layer
09/26/2000US6123991 Method of coating elastomeric components
09/26/2000US6123791 Dielectric windows supported on walls, ceramics, pedestals. power sources and gas introducing assembly
09/26/2000US6123776 Gas delivering apparatus for chemical vapor deposition
09/26/2000US6123775 Reaction chamber component having improved temperature uniformity
09/26/2000US6123773 Gas manifold
09/26/2000US6123767 Method and apparatus for feeding a gas for epitaxial growth
09/26/2000US6123766 Method and apparatus for achieving temperature uniformity of a substrate
09/26/2000CA2182247C Apparatus and method for treatment of substrate surface using plasma focused below orifice leading from chamber into substrate containing area
09/26/2000CA2182245C Process for depositing adherent diamond thin films
09/23/2000CA2301457A1 Process for the application of a light-blocking layer between photoconducting layer and mirror in the manufacture of an optically addressable spatial light modulator oaslm
09/21/2000WO2000056127A1 Optically transparent, scratch-resistant, diamond-like carbon coatings
09/21/2000WO2000055894A1 Plasma processing apparatus and method of maintaining the same
09/21/2000WO2000055654A1 Ultraviolet filters with enhanced weatherability and method of making
09/21/2000WO2000055389A1 Method of making a multilayer article by arc plasma deposition
09/21/2000WO2000055388A2 Method and apparatus for arc deposition
09/21/2000WO2000055387A1 Method and apparatus for formation of thin film
09/21/2000WO2000055091A1 Compositions for forming metal oxide films
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