| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/11/2001 | WO2001003158A1 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers |
| 01/11/2001 | WO2001003156A1 METHOD FOR PREPARING A CsX PHOTOSTIMULABLE PHOSPHOR AND PHOSPHORS THEREFROM |
| 01/11/2001 | WO2001002622A2 Method of coating ceramics using ccvd |
| 01/11/2001 | WO2001002617A1 Semiconductor vacuum deposition system and method having a reel-to-reel substrate cassette |
| 01/11/2001 | WO2000052973A3 Plasma reactor having a helicon wave high density plasma source |
| 01/11/2001 | DE19931257A1 Continuous chemical coating of substrate with boron nitride, especially fiber used in fiber-reinforced composite, uses organic boron compound and large excess of ammonia at high temperature |
| 01/11/2001 | DE19931256A1 After-treatment of boron nitride-coated substrate, especially fiber used in fiber-reinforced composite, comprises tempering in ammonia at high temperature |
| 01/10/2001 | EP1067642A1 Optoelectric device comprising Bragg layers |
| 01/10/2001 | EP1067595A2 Liquid precursor mixtures for deposition of multicomponent metal containing materials |
| 01/10/2001 | EP1067588A2 Thermal reaction chamber for semiconductor wafer processing operations |
| 01/10/2001 | EP1067586A2 A semiconductor processing system |
| 01/10/2001 | EP1067432A1 High-efficiency plasma treatment of polyolefins |
| 01/10/2001 | EP1067211A1 Hard coating and coated member |
| 01/10/2001 | EP1067210A2 Method for providing a hard carbon film on a substrate and electric shaver blade |
| 01/10/2001 | CN1279729A Method and apparatus for coating diamond-like carbon onto particles |
| 01/10/2001 | CN1279705A Diamond carbon coatings on inorganic phosphors |
| 01/10/2001 | CN1060537C Diamond-coated wire-drawing die |
| 01/09/2001 | US6172812 Anti-reflection coatings and coated articles |
| 01/09/2001 | US6172337 System and method for thermal processing of a semiconductor substrate |
| 01/09/2001 | US6172322 Annealing an amorphous film using microwave energy |
| 01/09/2001 | US6172009 Controlled conversion of metal oxyfluorides into superconducting oxides |
| 01/09/2001 | US6172008 Process for preparing high crystallinity oxide thin film |
| 01/09/2001 | US6171974 High selectivity oxide etch process for integrated circuit structures |
| 01/09/2001 | US6171958 Process for preparation of diffusion barrier for semiconductor |
| 01/09/2001 | US6171953 Processes for making electronic devices with rubidum barrier film |
| 01/09/2001 | US6171945 CVD nanoporous silica low dielectric constant films |
| 01/09/2001 | US6171943 Forming a contact in an integrated circuit by chemical vapor deposition |
| 01/09/2001 | US6171674 Hard carbon coating for magnetic recording medium |
| 01/09/2001 | US6171662 Method of surface processing |
| 01/09/2001 | US6171661 Deposition of copper with increased adhesion |
| 01/09/2001 | US6171650 Moisture insensitive electroluminescent phosphor |
| 01/09/2001 | US6171454 Coating a substrate with sputtering |
| 01/09/2001 | US6171396 Growing system for uniformly growing thin film over semiconductor wafer through rotation |
| 01/09/2001 | US6171343 Ultra high molecular weight polyethylene components treated to resist shearing and frictional wear |
| 01/09/2001 | US6170496 Apparatus and method for servicing a wafer platform |
| 01/09/2001 | US6170492 Monitoring a position of a valve regulating a gas outlet of the chamber; in the process of making integrated circuit and flat panel display fabrication |
| 01/09/2001 | US6170433 Method and apparatus for processing a wafer |
| 01/09/2001 | US6170432 Showerhead electrode assembly for plasma processing |
| 01/09/2001 | US6170431 Plasma reactor with a deposition shield |
| 01/09/2001 | US6170430 Gas feedthrough with electrostatic discharge characteristic |
| 01/09/2001 | US6170428 Symmetric tunable inductively coupled HDP-CVD reactor |
| 01/08/2001 | CA2314534A1 Optoelectronic component containing a bragg stack |
| 01/04/2001 | WO2001001472A1 Method and apparatus for forming a film on a substrate |
| 01/04/2001 | WO2001001462A1 Method for producing a noble-metal electrode |
| 01/04/2001 | WO2001001442A1 A plasma reaction chamber component having improved temperature uniformity |
| 01/04/2001 | WO2001000900A1 Device for monitoring intended or unavoidable layer deposits and corresponding method |
| 01/04/2001 | WO2000059045A3 Multilayer semiconductor structure with phosphide-passivated germanium substrate |
| 01/04/2001 | DE19927427A1 Gurtaufroller mit schaltbarem Kraftbegrenzer Belt retractor with switchable force limiter |
| 01/04/2001 | DE10019807A1 Titanium oxide film used in solar cell, contains dopant element whose density is high towards silicon substrate surface |
| 01/03/2001 | EP1065913A2 Pyrolytic boron nitride radiation heater |
| 01/03/2001 | EP1065703A2 Vacuum processing method and apparatus |
| 01/03/2001 | EP1065701A2 Inert barrier for high purity epitaxial deposition systems |
| 01/03/2001 | EP1065528A2 Radiation image read out method and apparatus |
| 01/03/2001 | EP1065527A2 Radiation image read-out method and apparatus |
| 01/03/2001 | EP1065526A2 Radiation image detector |
| 01/03/2001 | EP1065525A2 Radiation image read out apparatus |
| 01/03/2001 | EP1065524A2 Radiation image read out method and apparatus |
| 01/03/2001 | EP1065523A2 Radiation image read-out method and apparatus |
| 01/03/2001 | EP1065296A1 Method for forming metallic-based coating |
| 01/03/2001 | EP1065295A1 Plasma cleaning method for processing chambers |
| 01/03/2001 | EP1065294A1 Method and apparatus for pressure measurement in a CVI/CVD furnace |
| 01/03/2001 | EP1065293A1 Method of controlling thickness and aluminum content of a diffusion aluminide coating |
| 01/03/2001 | EP1065179A1 Process for the deposition of a tungsten and/or molybdenum based layer on a glass, ceramic or glass ceramic substrate and coated substrate according to the process |
| 01/03/2001 | EP1064418A1 Apparatus for moving exhaust tube of barrel reactor |
| 01/03/2001 | EP1064416A1 Method and apparatus for deposition and etching of a dielectric layer |
| 01/03/2001 | CN1278750A All-surface biosable and/or temperatures-controlled electrostatically-shielded rf plasma source |
| 01/03/2001 | CN1060233C Vapor growth apparatus and vapor growth method capable of growing a compound semicondcutor layer having an evenness and an interfacial sharpness in units of atomic layers with good productivity |
| 01/03/2001 | CN1060224C Forming method for lead-lanthanum titanate film |
| 01/02/2001 | US6169032 CVD film formation method |
| 01/02/2001 | US6169031 Chemical vapor deposition for titanium metal thin film |
| 01/02/2001 | US6169027 Method of removing surface oxides found on a titanium oxynitride layer using a nitrogen containing plasma |
| 01/02/2001 | US6169004 Production method for a semiconductor device |
| 01/02/2001 | US6168837 Chemical vapor depositions process for depositing titanium silicide films from an organometallic compound |
| 01/02/2001 | US6168827 Fiber coating method |
| 01/02/2001 | US6168645 Having a safety system for cutting off gas flow to and removing impure gas from a gas purifier. |
| 01/02/2001 | US6167837 Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor |
| 01/02/2001 | US6167836 Plasma-enhanced chemical vapor deposition apparatus |
| 01/02/2001 | US6167835 Two chamber plasma processing apparatus |
| 01/02/2001 | US6167834 Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process |
| 12/28/2000 | WO2000079844A1 Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device |
| 12/28/2000 | WO2000079843A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 12/28/2000 | WO2000079576A1 Chemical deposition reactor and method of forming a thin film using the same |
| 12/28/2000 | WO2000079575A1 Plasma process device, electrode structure thereof, and stage structure |
| 12/28/2000 | WO2000079568A2 Plasma reactor with multiple small internal inductive antennas |
| 12/28/2000 | WO2000079022A1 Coated hard alloy |
| 12/28/2000 | WO2000079021A1 Method for treating carbon-based coating and carbon-based coating and parts having carbon-based coating |
| 12/28/2000 | WO2000079020A1 Carbon film and method for formation thereof and article covered with carbon film and method for preparation thereof |
| 12/28/2000 | WO2000079019A1 Apparatus for atomic layer chemical vapor deposition |
| 12/28/2000 | WO2000078124A1 Cold-plasma deposition treatment of seeds and other living matter |
| 12/28/2000 | WO2000062830A3 Coating medical devices using air suspension |
| 12/28/2000 | DE19928876A1 Vorrichtung zur lokalen Erzeugung eines Plasmas in einer Behandlungskammer durch Mikrowellenanregung Device for local generation of a plasma in a treatment chamber by microwave excitation |
| 12/28/2000 | DE19928498A1 Torque-conveying working surface for e.g. screwdrivers, spanners and bits has a thin smooth amorphous hard layer containing silicon covering the working surface |
| 12/28/2000 | CA2376015A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 12/28/2000 | CA2368180A1 Cold-plasma deposition treatment of seeds and other living matter |
| 12/27/2000 | EP1063695A2 Method of passivating copper interconnects in a semiconductor device |
| 12/27/2000 | EP1063692A1 Process for depositing a low dielectric constant film |
| 12/27/2000 | EP1063690A1 Plasma processing apparatus and plasma processing method |
| 12/27/2000 | EP1063678A2 Device for microwave powered plasma generation in a cavity |
| 12/27/2000 | EP1063319A1 Method and apparatus for cooling a CVI/CVD furnace |
| 12/27/2000 | EP1063318A1 Combination CVI/CVD and heat treat susceptor lid |