| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/22/2001 | DE19945083A1 Production of metal-coated hard materials used in cutting, boring, sawing and grinding tools comprises producing the metal layer by decomposing metal carbonyls in the presence of the hard material |
| 03/22/2001 | DE19937513A1 Injection pipe for introducing a gas into a process reactor for treating semiconductor substrates has a channel with several lateral gas outlet openings having a uniform small diameter along the channel |
| 03/21/2001 | EP1085562A2 Apparatus and method for surface finishing a silicon film |
| 03/21/2001 | EP1085107A2 Gas dispersion head and method |
| 03/21/2001 | EP1085106A1 A method and an apparatus for gasifying a liquid material |
| 03/21/2001 | EP1084513A1 A method for treating a deposited film for resistivity reduction |
| 03/21/2001 | EP1084512A1 Plasma treatment for ex-situ contact fill |
| 03/21/2001 | EP1084284A1 Gas manifold for uniform gas distribuition and photochemistry |
| 03/21/2001 | EP1030855A4 Bismuth amide compounds and compositions, and method of forming bismuth-containing films therewith |
| 03/21/2001 | EP0628642B1 Superhard film-coated material and method of producing the same |
| 03/20/2001 | US6204402 Organometallic compound |
| 03/20/2001 | US6204206 Silicon nitride deposition method |
| 03/20/2001 | US6204204 Method and apparatus for depositing tantalum-based thin films with organmetallic precursor |
| 03/20/2001 | US6204201 Method of processing films prior to chemical vapor deposition using electron beam processing |
| 03/20/2001 | US6204199 Method for producing a semiconductor device |
| 03/20/2001 | US6204197 Semiconductor device, manufacturing method, and system |
| 03/20/2001 | US6204194 Method and apparatus for producing a semiconductor device |
| 03/20/2001 | US6204178 Depositing platinum metal onto substrate in chemical vapor deposition chamber at predetermined temperature and pressure; irradiating chamber interior with ultraviolet light; annealing substrate having deposited platinum inpresence of oxygen |
| 03/20/2001 | US6204176 Substituted phenylethylene precursor deposition method |
| 03/20/2001 | US6204175 Method of depositing a smooth conformal aluminum film on a refractory metal nitride layer |
| 03/20/2001 | US6204174 Method for high rate deposition of tungsten |
| 03/20/2001 | US6204155 Semiconductor device and production thereof |
| 03/20/2001 | US6203927 Substrate with ceramic coating on surface and sintering |
| 03/20/2001 | US6203898 Article comprising a substrate having a silicone coating |
| 03/20/2001 | US6203865 Laser approaches for diamond synthesis |
| 03/20/2001 | US6203863 Method of gap filling |
| 03/20/2001 | US6203862 Processing systems with dual ion sources |
| 03/20/2001 | US6203853 Vapor depositing layer of silicon or silicon oxide |
| 03/20/2001 | US6203851 Gas phase coating process and apparatus for gas-phase coating of workpieces |
| 03/20/2001 | US6203623 Aerosol assisted chemical cleaning method |
| 03/20/2001 | US6203622 Wafer support system |
| 03/20/2001 | US6203621 Vacuum chuck for holding thin sheet material |
| 03/20/2001 | US6203618 Exhaust system and vacuum processing apparatus |
| 03/20/2001 | US6202656 Uniform heat trace and secondary containment for delivery lines for processing system |
| 03/20/2001 | US6202653 Processing solution supplying apparatus, processing apparatus and processing method |
| 03/20/2001 | CA2030648C Flash vaporizer system for delivering reactants for flame hydrolysis deposition and method of forming optical waveguide preforms therewith |
| 03/15/2001 | WO2001019144A1 Inner-electrode plasma processing apparatus and method of plasma processing |
| 03/15/2001 | WO2001018856A1 Wafer holder |
| 03/15/2001 | WO2001018284A1 Method for making a metal part coated with diamond and metal part obtained by said method |
| 03/15/2001 | WO2001017692A1 Improved apparatus and method for growth of a thin film |
| 03/15/2001 | WO2001017569A2 Improved container composition for radiopharmaceutical agents |
| 03/15/2001 | US20010000030 Mixing a gas mixture of a neutral gas and silane in an amount below the autoignition limit in air and a gas stream of carrier gas with a controlled residual amount of oxidizer; siloxation of a polymer surface treatment |
| 03/14/2001 | EP1083161A1 Organometallic compounds for vapor-phase epitaxy of organometal |
| 03/14/2001 | EP1082470A1 Microchamber |
| 03/14/2001 | EP1082181A1 Process for the preparation of uv protective coatings by plasma-enhanced deposition |
| 03/14/2001 | EP0865715A4 Process depending on plasma discharges sustained by inductive coupling |
| 03/14/2001 | EP0652828B1 Abrasion wear resistant coated substrate product |
| 03/14/2001 | CN2423289Y Chemical gas-phase deposition diamoud homogeneous spray nozzle |
| 03/14/2001 | CN1063235C Silicon-cubic boron nitride film P-N node-like electronic device material and its producing process |
| 03/14/2001 | CN1063116C Guide bush and method for forming a hard carbon film on an internal circumferential surface of said bush |
| 03/13/2001 | US6201219 Chamber and cleaning process therefor |
| 03/13/2001 | US6200911 Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power |
| 03/13/2001 | US6200893 Radical-assisted sequential CVD |
| 03/13/2001 | US6200825 Method of manufacturing silicon based thin film photoelectric conversion device |
| 03/13/2001 | US6200675 Networks of carbon/hydrogen and silicon/oxygen where the hydrogen concentration is 40%-80% of carbon concentration; coefficient of friction against steel n 0.1 in air with a relative humidity <90%, or in water; metal dopes; adhesion |
| 03/13/2001 | US6200671 Coated turning insert and method of making it |
| 03/13/2001 | US6200652 Method for nucleation and deposition of diamond using hot-filament DC plasma |
| 03/13/2001 | US6200651 Forming dielectric |
| 03/13/2001 | US6200634 Thermal processing system with supplemental resistive heater and shielded optical pyrometry |
| 03/13/2001 | US6200412 Chemical vapor deposition system including dedicated cleaning gas injection |
| 03/13/2001 | US6200389 Single body injector and deposition chamber |
| 03/13/2001 | US6200388 Substrate support for a thermal processing chamber |
| 03/13/2001 | US6200183 Application of electron field emission from diamond grown by a multiple pulsed laser process |
| 03/13/2001 | US6199599 Chemical delivery system having purge system utilizing multiple purge techniques |
| 03/13/2001 | US6199506 Radio frequency supply circuit for in situ cleaning of plasma-enhanced chemical vapor deposition chamber using NF3 or NF3/He mixture |
| 03/13/2001 | US6199505 Plasma processing apparatus |
| 03/08/2001 | WO2001016396A1 Film deposition apparatus and method |
| 03/08/2001 | WO2001016395A1 Titanium containing dielectric films and methods of forming same |
| 03/08/2001 | WO2001016389A1 Coated milling insert |
| 03/08/2001 | WO2001016388A1 Coated grooving or parting insert |
| 03/08/2001 | DE19943741A1 Plasma assisted chemical vapor deposition of silicon nitride, from silane, ammonia, and inert carrier gas, employs optimized gas flowrates |
| 03/08/2001 | DE19941530A1 Manufacturing electronic component with nitride layer using plasma CVD process supplies gas flow at angle to substrate surface, with deposition at specified lower temperatures |
| 03/08/2001 | DE10031198A1 Low temperature coating of implantable devices uses plasma pre-treatment with inert gas, followed by plasma treatment with a monomer |
| 03/07/2001 | EP1081756A2 A method for producing silicon nitride series film |
| 03/07/2001 | EP1081751A2 Methods of pre-cleaning dielectric layers of substrates |
| 03/07/2001 | EP1081749A1 Protective member for inner surface of chamber and plasma processing apparatus |
| 03/07/2001 | EP1081744A2 Method and apparatus for preventing edge deposition |
| 03/07/2001 | EP1081249A1 Method for depositing fluorinated silica glass layers |
| 03/07/2001 | EP1081154A2 Materials and methods for growing complex perovskite oxide thin films |
| 03/07/2001 | EP1081115A1 Method and apparatus for manufacturing ceramic-based composite member |
| 03/07/2001 | EP1080485A1 Improved heater for use in substrate processing apparatus to deposit tungsten |
| 03/07/2001 | EP1080247A2 Method for producing metallized substrate materials |
| 03/07/2001 | EP1080244A1 Anti-adherent coating and method for the production thereof |
| 03/07/2001 | CN1286892A Substrate electrode plasma generator and substance/material processing method |
| 03/06/2001 | US6198074 System and method for rapid thermal processing with transitional heater |
| 03/06/2001 | US6197705 Placing substrate in parallel plate type reactor chamber; inducing reaction in gaseous mixture comprising tetraethoxysilane, ozone and fluorotriethoxysilane in presence of plasma to produce deposition of silicon oxide film |
| 03/06/2001 | US6197694 In situ method for cleaning silicon surface and forming layer thereon in same chamber |
| 03/06/2001 | US6197683 Method of forming metal nitride film by chemical vapor deposition and method of forming metal contact of semiconductor device using the same |
| 03/06/2001 | US6197674 Loading silicon wafer into chamber, setting chamber at predetermined reduced-pressure atmosphere; introducing titanium chloride (ticl4), hydrogen, and argon gases into chamber; generating plasma to form titanium film in hole |
| 03/06/2001 | US6197669 Reduction of surface defects on amorphous silicon grown by a low-temperature, high pressure LPCVD process |
| 03/06/2001 | US6197666 Method for the fabrication of a doped silicon layer |
| 03/06/2001 | US6197658 Providing silicon substrate having trench; filling trench by silicon oxide layer by ozone assisted thermal chemical vapor deposition; densifying gap filling silicon oxide by annealing in oxidizing atomsphere |
| 03/06/2001 | US6197600 Ferroelectric thin film, manufacturing method thereof and device incorporating the same |
| 03/06/2001 | US6197438 Foodware with ceramic food contacting surface |
| 03/06/2001 | US6197391 Pyrolytic boron nitride container and manufacture thereof |
| 03/06/2001 | US6197375 Forming a film of polycrystalline diamond removal of diamond from surface |
| 03/06/2001 | US6197374 Method for chemical vapor infiltration of refractory substances, especially carbon and silicon carbide |
| 03/06/2001 | US6197373 Low pressure chemical vapor deposition furnace |
| 03/06/2001 | US6197246 Hot-press sintering ceramic molding and electrostatic chucking electrode comprising a planar bulk metal under pressure applied in a thickness direction of said electrode, embedding electrode in dense substrate made of a monolithic sinter |
| 03/06/2001 | US6197123 Providing chamber having nozzle and exhaust from chamber; providing production mode in chamber; providing count of particles exhaust; causing gas supply mechanism to effect cleaning of chamber by supplying gas through nozzle to chamber |