| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/06/2001 | US6197121 Chemical vapor deposition apparatus |
| 03/06/2001 | US6197120 Apparatus for coating diamond-like networks onto particles |
| 03/06/2001 | US6197119 Method and apparatus for controlling polymerized teos build-up in vacuum pump lines |
| 03/06/2001 | US6197118 Thin film deposition apparatus |
| 03/06/2001 | US6197116 Plasma processing system |
| 03/06/2001 | US6197102 Small amount of separation (segregation, precipitation) of excessive metallic elements' particles, little leakage current, hydrogen heat treatment resistance as well as voltage resistance |
| 03/06/2001 | US6196155 Plasma processing apparatus and method of cleaning the apparatus |
| 03/06/2001 | US6196154 Air lock for introducing substrates to and/or removing them from a treatment chamber |
| 03/06/2001 | CA2225620C Process for the preparation of magnesium oxide films using organomagnesium compounds |
| 03/06/2001 | CA2125430C Synchronized process for catalysis of electroless metal plating on plastic |
| 03/01/2001 | WO2001015220A1 Method for bottomless deposition of barrier layers in integrated circuit metallization schemes |
| 03/01/2001 | WO2001015212A1 Plasma processing apparatus and method of plasma processing |
| 03/01/2001 | WO2001015210A1 Apparatus for forming polymer continuously on the surface of metal by dc plasma polymerization |
| 03/01/2001 | WO2001015209A1 Plasma polymerizing apparatus having an electrode with a lot of uniform edges |
| 03/01/2001 | WO2001015199A1 Electron beam plasma formation for surface chemistry |
| 03/01/2001 | WO2001014619A1 Method and device for depositing materials with a large electronic energy gap and high binding energy |
| 03/01/2001 | WO2000058995B1 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 03/01/2001 | WO2000021139A8 Low stress polysilicon film and method for producing same |
| 03/01/2001 | DE19952465C1 Production of an adhesive-tight amorphous hydrocarbon layer on a substrate surface for cutting tools uses ion-supported deposition during which the surface of the substrate electrode is temporarily cooled |
| 03/01/2001 | DE19935046A1 Plasma-CVD-Verfahren und Vorrichtung zur Herstellung einer mikrokristallinen Si:H-Schicht auf einem Substrat sowie deren Verwendung Plasma CVD method and apparatus for producing a microcrystalline Si: H layer on a substrate and the use thereof |
| 02/28/2001 | EP1079671A2 Antenna device for generating inductively coupled plasma |
| 02/28/2001 | EP1079425A1 Process and device for vacuum plasma treatment of substrate |
| 02/28/2001 | EP1079423A1 Apparatus for gas processing |
| 02/28/2001 | EP1079422A2 Method and apparatus for manufacturing semiconductor device |
| 02/28/2001 | EP1079001A1 Dual fritted bubbler |
| 02/28/2001 | EP1079000A1 Method for removing residue from an exhaust line |
| 02/28/2001 | EP1078396A1 A two-step borophosphosilicate glass deposition process and related devices and apparatus |
| 02/28/2001 | EP1078113A1 Energy transfer system and method for thermal processing applications |
| 02/28/2001 | EP1078112A1 A sub-atmospheric chemical vapor deposition system with dopant bypass |
| 02/28/2001 | EP1030788A4 Plasma processing methods and apparatus |
| 02/27/2001 | US6195504 Liquid feed vaporization system and gas injection device |
| 02/27/2001 | US6194691 Heating furnace and manufacturing method therefor |
| 02/27/2001 | US6194628 Method and apparatus for cleaning a vacuum line in a CVD system |
| 02/27/2001 | US6194314 Process for chemical vapor deposition layer production on a semiconductor surface with absorbing protective gasses |
| 02/27/2001 | US6194310 Method of forming amorphous conducting diffusion barriers |
| 02/27/2001 | US6194295 Production of a refractory metal by chemical vapor deposition of a bilayer-stacked tungsten metal |
| 02/27/2001 | US6194292 Method of fabricating in-situ doped rough polycrystalline silicon using a single wafer reactor |
| 02/27/2001 | US6194038 Variations in gas flow concentration |
| 02/27/2001 | US6194037 Applying radio frequency to mixture of silicon hydride and nitrous oxide |
| 02/27/2001 | US6194036 Deposition of coatings using an atmospheric pressure plasma jet |
| 02/27/2001 | US6194030 Containing liner tube, gas supply means and gas flow resistor |
| 02/27/2001 | US6194026 Dissolving embedded abrasive particles with hydroxide |
| 02/27/2001 | US6194023 Method of manufacturing a poly-crystalline silicon film |
| 02/27/2001 | US6193911 Combustion chemical vapor deposition (ccvd) solution in which is dissolved an additive which forms an electroconductivity adjusting metal oxide in the resulting thin film resistor |
| 02/27/2001 | US6193813 Tungsten silicide wafer film that exhibits hysteresis when stress of film is determined |
| 02/27/2001 | US6193811 Baking a semiconductor and isolation |
| 02/27/2001 | US6193804 Apparatus and method for sealing a vacuum chamber |
| 02/27/2001 | US6193803 Substrate holding apparatus for processing semiconductors |
| 02/27/2001 | US6193802 Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment |
| 02/27/2001 | US6193585 Method of polishing a hard material-coated wafer |
| 02/27/2001 | US6193506 Apparatus and method for batch thermal conditioning of substrates |
| 02/27/2001 | US6192979 Includes top functional layer capable of adjusting wetting behavior of base material, layer includes carbon and hydrogen and one of nonmetallic element and semimetallic element selected from 3rd, 4th, 5th, 6th, 7th groups of periodic table |
| 02/27/2001 | US6192938 Gas panel |
| 02/27/2001 | US6192919 Chemical delivery and containment system employing mobile shipping crate |
| 02/27/2001 | US6192898 Method and apparatus for cleaning a chamber |
| 02/27/2001 | US6192828 Thin film forming device for forming silicon thin film having crystallinity |
| 02/27/2001 | US6192601 Method and apparatus for reducing particle contamination during wafer transport |
| 02/22/2001 | WO2001013419A1 Processing apparatus and processing method |
| 02/22/2001 | WO2001013415A1 Production method of semiconductor device and production device therefor |
| 02/22/2001 | WO2001013404A1 Diamond coated parts in a plasma reactor |
| 02/22/2001 | WO2001013054A1 Hot wall rapid thermal processor |
| 02/22/2001 | WO2001012876A1 Process and composition for treating metals |
| 02/22/2001 | WO2001012875A1 Film forming device |
| 02/22/2001 | WO2001012874A1 Surface preparation of a substrate for thin film metallization |
| 02/22/2001 | WO2001012873A1 Pulsed plasma processing method and apparatus |
| 02/22/2001 | WO2001012634A1 Group(iii)-metal-hydrides with a guanidino-type ligand |
| 02/22/2001 | WO2001012433A2 Nanostructure coatings |
| 02/22/2001 | WO2001012300A1 Method for reducing the amount of perfluorocompound gas contained in exhaust emissions from plasma processing |
| 02/22/2001 | CA2383485A1 Process and composition for treating metals |
| 02/21/2001 | EP1077480A1 Method and apparatus to enchance properties of Si-O-C low K films |
| 02/21/2001 | EP1077479A1 Post-deposition treatment to enchance properties of Si-O-C low K film |
| 02/21/2001 | EP1077477A1 Surface treatment of C-doped Si02 film to enhance film stability during 02 ashing |
| 02/21/2001 | EP1077274A1 Lid cooling mechanism and method for optimized deposition of low-k dielectric using tri methylsilane-ozone based processes |
| 02/21/2001 | EP1077270A1 Transition metal boride coatings |
| 02/21/2001 | EP1076732A1 Injector for reactor |
| 02/21/2001 | EP1076729A1 Low pressure purging method |
| 02/21/2001 | CN1285008A PCVD apparatus and a method of manufacturing optical flber, preform rod and jacket tube as well as the optical fiber manufactured therewith |
| 02/21/2001 | CN1285007A Method for selectively depositing bismuth based ferroelectric films |
| 02/21/2001 | CN1285006A Free floating shield and semiconductor processing system |
| 02/21/2001 | CN1284742A Method for manufacturing semiconductor device with semiconductor layer |
| 02/21/2001 | CN1284613A Collecting device |
| 02/20/2001 | US6191399 System of controlling the temperature of a processing chamber |
| 02/20/2001 | US6191390 Heating element with a diamond sealing material |
| 02/20/2001 | US6191388 Thermal processor and components thereof |
| 02/20/2001 | US6191054 Method for forming film and method for fabricating semiconductor device |
| 02/20/2001 | US6191011 Selective hemispherical grain silicon deposition |
| 02/20/2001 | US6190925 Epitaxially grown lead germanate film and deposition method |
| 02/20/2001 | US6190732 Supporting substrate on chuck disposed in reaction chamber proximate a showerhead, reaction chamber having exhaust port, positioning the chuck to restrict flow path from showerhead to exhaust port, dispensing process gas over substrate |
| 02/20/2001 | US6190725 Coating method for the preparation of coated nuclear fuels with carbides borides or nitrides by using high temperature and high pressure combustion synthesis |
| 02/20/2001 | US6190629 Removing hazardous gas from exhaust stream; air pollution control; nontoxic, corrosion resistance |
| 02/20/2001 | US6190511 Sputtering; vacuum chamber, baffle, pump for pumping gases, screen chemical |
| 02/20/2001 | US6190495 Magnetron plasma processing apparatus |
| 02/20/2001 | US6190460 Apparatus for low pressure chemical vapor depostion |
| 02/20/2001 | US6190457 CVD system and CVD process |
| 02/20/2001 | US6190453 Growth of epitaxial semiconductor material with improved crystallographic properties |
| 02/20/2001 | US6190233 Method and apparatus for improving gap-fill capability using chemical and physical etchbacks |
| 02/20/2001 | US6189570 Gas panel |
| 02/20/2001 | US6189485 Plasma CVD apparatus suitable for manufacturing solar cell and the like |
| 02/20/2001 | US6189484 Plasma reactor having a helicon wave high density plasma source |
| 02/20/2001 | US6189483 Process kit |