| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/03/2001 | WO2001031700A1 Wafer holder and epitaxial growth device |
| 05/03/2001 | WO2001031693A1 Method and apparatus for monitoring process exhaust gas, semiconductor-manufacturing device, and method and system for managing semiconductor-manufacturing device |
| 05/03/2001 | WO2001031680A1 Vacuum circuit for a device for treating a receptacle with low pressure plasma |
| 05/03/2001 | WO2001031082A1 Improved diamond thermal management components |
| 05/03/2001 | WO2001030511A1 Low temperature chemical vapor deposition of thin film magnets |
| 05/03/2001 | WO2001004931A3 Method and apparatus for providing uniform gas delivery to substrates in cvd and pecvd processes |
| 05/03/2001 | US20010000759 Substrate handling chamber |
| 05/03/2001 | DE19951017A1 Verfahren und Vorrichtung zur Plasmabehandlung von Oberflächen Method and apparatus for plasma treatment of surfaces |
| 05/03/2001 | DE10051933A1 Reaction chamber for molding semiconductor wafer, comprises chamber body with chamber for semiconductor wafer, through-holes in wall of chamber body and temperature sensors arranged in through-holes |
| 05/03/2001 | CA2388335A1 Vacuum circuit for a device for treating a receptacle with low pressure plasma |
| 05/02/2001 | EP1096554A1 Plasma processing apparatus |
| 05/02/2001 | EP1096038A1 Method and apparatus for depositing a film |
| 05/02/2001 | EP1095395A1 Rf matching network with distributed outputs |
| 05/02/2001 | EP1095378A1 Primary target for forming fission products |
| 05/02/2001 | EP1095169A1 Method and device for producing a powder aerosol and use thereof |
| 05/02/2001 | CN1293722A Apparatus for moving exhaust tube of barrel reactor |
| 05/02/2001 | CN1293717A Plasma processing system and method |
| 05/01/2001 | US6225668 Semiconductor device having a single crystal gate electrode and insulation |
| 05/01/2001 | US6225602 Vertical furnace for the treatment of semiconductor substrates |
| 05/01/2001 | US6225601 Heating a substrate support in a substrate handling chamber |
| 05/01/2001 | US6225241 Catalytic deposition method for a semiconductor surface passivation film |
| 05/01/2001 | US6225237 Method for forming metal-containing films using metal complexes with chelating O- and/or N-donor ligands |
| 05/01/2001 | US6225228 Silicon oxide co-deposition/etching process |
| 05/01/2001 | US6224968 Layer of titanium nitride; layer of a carbonitride of an element of the group iva of the periodic system; a layer of aluminum oxide or zirconium oxide;a layer of a carbonitride of zirconium,hafnium,vanadium,niobium or chromium |
| 05/01/2001 | US6224952 Electrostatic-erasing abrasion-proof coating and method for forming the same |
| 05/01/2001 | US6224950 Method for formation of thin film |
| 05/01/2001 | US6224948 Plasma enhanced chemical deposition with low vapor pressure compounds |
| 05/01/2001 | US6224941 Pulsed-vapor phase aluminide process for high temperature oxidation-resistant coating applications |
| 05/01/2001 | US6224682 CVD of metals capable of receiving nickel or alloys thereof using inert contact |
| 05/01/2001 | US6224681 Vaporizing reactant liquids for chemical vapor deposition film processing |
| 05/01/2001 | US6224680 Wafer transfer system |
| 05/01/2001 | US6224678 Modified thermocouple mounting bushing and system including the same |
| 05/01/2001 | US6224677 Gas recovery unit utilizing dual use of gas |
| 05/01/2001 | US6224676 Gas supply apparatus and film forming apparatus |
| 05/01/2001 | US6223686 Apparatus for forming a thin film by plasma chemical vapor deposition |
| 05/01/2001 | US6223685 Film to tie up loose fluorine in the chamber after a clean process |
| 05/01/2001 | US6223684 Film deposition apparatus |
| 05/01/2001 | US6223683 Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating |
| 05/01/2001 | CA2089883C Treatment of textile fibers, devices therefor and products obtained using the process |
| 04/26/2001 | WO2001029914A1 Method for producing electrode for lithium secondary cell |
| 04/26/2001 | WO2001029913A1 Method for producing material for electrode for lithium cell |
| 04/26/2001 | WO2001029893A1 Method for depositing nanolaminate thin films on sensitive surfaces |
| 04/26/2001 | WO2001029891A1 Conformal lining layers for damascene metallization |
| 04/26/2001 | WO2001029886A1 Method for creating a layer during the production of a semiconductor element and a semiconductor component |
| 04/26/2001 | WO2001029873A1 Method and apparatus for controlling wafer uniformity using spatially resolved sensors |
| 04/26/2001 | WO2001029282A2 Fluid processing system |
| 04/26/2001 | WO2001029281A1 Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions |
| 04/26/2001 | WO2001029280A1 Deposition of transition metal carbides |
| 04/26/2001 | WO2001029141A1 Deposition of fluorosilsesquioxane films |
| 04/26/2001 | WO2001029137A1 Color shifting carbon-containing interference pigments |
| 04/26/2001 | WO2001029052A1 Deposition of films using organosilsesquioxane-precursors |
| 04/26/2001 | WO2001028917A1 Abatement of effluents from chemical vapor deposition processes using organometallicsource reagents |
| 04/26/2001 | WO2001003856A8 Method of forming a thin metal layer on an insulating substrate |
| 04/26/2001 | US20010000476 As silicon source, increases deposition rate of dielectric films while providing good step coverage and gap-fill properties |
| 04/26/2001 | US20010000415 Method of processing films prior to chemical vapor deposition using electron beam processing |
| 04/26/2001 | DE10049257A1 Verfahren zur Dünnfilmerzeugung mittels atomarer Schichtdeposition A process for thin film production by means of atomic layer deposition |
| 04/25/2001 | EP1094509A2 Low dielectric constant silicon oxide-based dielectric layer for integrated circuit structures having improved compatibility with via filler materials, and method of making same |
| 04/25/2001 | EP1094506A2 Capping layer for extreme low dielectric constant films |
| 04/25/2001 | EP1094504A2 PVD-IMP tungsten and tungsten nitride as a liner, barrier, and/or seed layer |
| 04/25/2001 | EP1094503A2 Barrier layer for aluminium metallisation |
| 04/25/2001 | EP1094502A2 Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing |
| 04/25/2001 | EP1094134A1 Electrochemical system and process for stripping metallic coatings |
| 04/25/2001 | EP1094132A1 Multi-layer coated material for cutting tool |
| 04/25/2001 | EP1094130A2 Method and apparatus for plasma processing of surfaces |
| 04/25/2001 | EP1094129A2 Method for in-situ cleaning of surfaces of a substrate processing chamber |
| 04/25/2001 | EP1094128A1 Process for interior coating of hollow bodies |
| 04/25/2001 | EP1093665A1 Multiple step methods for forming conformal layers |
| 04/25/2001 | EP1093664A1 Temperature control system for a thermal reactor |
| 04/25/2001 | EP1093558A1 System for supply of multiple chemicals to a process tool |
| 04/25/2001 | EP1093532A1 A method and apparatus for the formation of dielectric layers |
| 04/25/2001 | CN1292431A Method for forming film by using atomic layer deposition method |
| 04/24/2001 | US6222718 Integrated power modules for plasma processing systems |
| 04/24/2001 | US6222164 Temperature control system for a thermal reactor |
| 04/24/2001 | US6221794 Method of reducing incidence of stress-induced voiding in semiconductor interconnect lines |
| 04/24/2001 | US6221793 Process for forming PECVD undoped oxide with a super low deposition rate on a single state deposition |
| 04/24/2001 | US6221792 Metal and metal silicide nitridization in a high density, low pressure plasma reactor |
| 04/24/2001 | US6221771 Method of forming tungsten silicide film, method of fabricating semiconductor devices and semiconductor manufactured thereby |
| 04/24/2001 | US6221770 Low temperature plasma-enhanced formation of integrated circuits |
| 04/24/2001 | US6221757 Method of making a microelectronic structure |
| 04/24/2001 | US6221755 Film formation method and manufacturing method of semiconductor device |
| 04/24/2001 | US6221742 Method for fabricating polysilicon film for semiconductor device |
| 04/24/2001 | US6221712 Method for fabricating gate oxide layer |
| 04/24/2001 | US6221512 Metallic article having a thermal barrier coating and a method of application thereof |
| 04/24/2001 | US6221493 Post treated diamond coated body |
| 04/24/2001 | US6221482 Heating, pressurization |
| 04/24/2001 | US6221469 Coated cemented carbide body; cutting steels |
| 04/24/2001 | US6221440 Process for plating metal coating |
| 04/24/2001 | US6221174 Forming seed layer of titanium nitride (tin) upon titanium (ti) film from thermal reaction between titanium tetrachloride (ticl.sub.4) and ammonia (nh.sub.3) |
| 04/24/2001 | US6221166 Multi-thermal zone shielding apparatus |
| 04/24/2001 | US6221164 Method of in-situ cleaning for LPCVD teos pump |
| 04/24/2001 | US6221155 Chemical vapor deposition system for polycrystalline silicon rod production |
| 04/24/2001 | US6220286 Gas blanket distributor |
| 04/24/2001 | US6220202 Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition |
| 04/24/2001 | US6220091 Liquid level pressure sensor and method |
| 04/24/2001 | CA2207235C Large-scale, low pressure plasma-ion deposition of diamondlike carbon films |
| 04/20/2001 | CA2323190A1 Method for manufacturing objects of metallic material and objects manufactured with this method |
| 04/19/2001 | WO2001028300A1 Matching device and plasma processing apparatus |
| 04/19/2001 | WO2001027363A1 A device and a method for heat treatment of an object in a susceptor |
| 04/19/2001 | WO2001027347A1 Method of depositing transition metal nitride thin films |
| 04/19/2001 | WO2001027346A1 Method of modifying source chemicals in an ald process |