| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/20/2001 | EP1108266A2 Method for forming a copper film on a substrate |
| 06/20/2001 | EP1108264A1 Method and device for surface processing with plasma at atmospheric pressure |
| 06/20/2001 | EP0616723B1 Process for fabricating layered superlattice materials |
| 06/20/2001 | CN1300524A processing system with dual ion sources |
| 06/20/2001 | CN1300328A Film deposition system |
| 06/20/2001 | CN1299708A Pre-cleaning process of Nd-Fe-B permanent magnet surface to be coated with anticorrosive p-xylene polymer layer |
| 06/20/2001 | CN1067446C Superhigh vacuum chemical vapor phase deposition epitoxy system |
| 06/19/2001 | US6248672 Method of producing a semiconductor device in a heating furnace having a reaction tube with a temperature-equalizing zone |
| 06/19/2001 | US6248658 Method of forming submicron-dimensioned metal patterns |
| 06/19/2001 | US6248440 Method for obtaining a floor covering and product obtained |
| 06/19/2001 | US6248434 Composite body comprising a hard metal, cermet or ceramic substrate body and method of producing same |
| 06/19/2001 | US6248400 Vapor phase diamond synthesis method |
| 06/19/2001 | US6248397 Contacting hot glass with gaseous mixture of oxygen enriched with ozone and source of silicon selected from tetraethoxysilane and octamethylcyclotetrasiloxane |
| 06/19/2001 | US6248394 Process for fabricating device comprising lead zirconate titanate |
| 06/19/2001 | US6248176 Apparatus and method for delivering a gas |
| 06/19/2001 | CA2152769C Synthesizing diamond film |
| 06/14/2001 | WO2001042539A1 Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites |
| 06/14/2001 | WO2001042529A1 METHOD FOR FORMING TiSiN FILM, DIFFUSION PREVENTIVE FILM COMPRISING TiSiN FILM, SEMICONDUCTOR DEVICE AND ITS PRODUCTION METHOD, AND APPARATUS FOR FORMING TiSiN FILM |
| 06/14/2001 | WO2001042526A1 Plasma processing container internal member and production method therefor |
| 06/14/2001 | WO2001042261A1 Processes for the preparation of organoluthenium compounds useful for thin film formation by cvd |
| 06/14/2001 | WO2001041942A2 Method for depositing a coating on the wall of metallic containers |
| 06/14/2001 | US20010003670 Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by the same |
| 06/14/2001 | US20010003606 Anti-reflection coating layer covered by silicon oxynitride layer is provided, surface treatment step is performed with oxidizer based plasma on oxynitride layer to form oxide layer, oxidizer-based plasma comprises oxygen, nitrous oxide |
| 06/14/2001 | US20010003603 Chemical vapor deposition method, comprising the steps of generating a source gas by heating to sublimate a molded solid body formed by molding a solid raw material and forming a film on the substrate by using the source gas |
| 06/14/2001 | US20010003298 Comprising primary electrode chargeable to form plasma of the gas in the chamber, dielectric covering primary electrode, dielectric having surface adapted to receive substrate and having a conduit therethrough |
| 06/14/2001 | US20010003287 Fluid control apparatus |
| 06/14/2001 | US20010003272 Method for improving the rate of a plasma enhanced vacuum treatment |
| 06/14/2001 | US20010003271 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film |
| 06/14/2001 | US20010003270 Rf powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 06/13/2001 | EP1107653A1 Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device |
| 06/13/2001 | EP1107303A2 Surface treatment anneal of silicon-oxy-carbide semiconductor surface layer |
| 06/13/2001 | EP1107302A2 Method and apparatus for reducing fixed charges in a semiconductor device |
| 06/13/2001 | EP1107297A1 Apparatus for manufacturing semiconductor device and method of manufacture thereof |
| 06/13/2001 | EP1106715A1 Self aligning non contact shadow ring process kit |
| 06/13/2001 | EP1105549A1 High throughput organometallic vapor phase epitaxy (omvpe) apparatus |
| 06/13/2001 | EP1105548A1 Sieve like structure for fluid flow through structural arrangement |
| 06/13/2001 | EP1105356A1 Process for coating glass |
| 06/13/2001 | EP0880607B1 Oxidation protective coating for refractory metals |
| 06/13/2001 | DE19959604A1 Reactor for plasma deposition and plasma diffusion processes comprises a closed or closable reactor vessel whose inner side is coated with a titanium nitride layer |
| 06/13/2001 | DE19959603A1 Process for coating the inner surface and/or the components of a reactor vessel comprises introducing a gas mixture containing a titanium dispenser and a nitrogen dispenser and depositing titanium nitride onto the surface and/or components |
| 06/13/2001 | CN1299517A Method for forming film |
| 06/13/2001 | CN1298963A Chemical gas-phase deposition method and equipment for metal oxide or alloy film |
| 06/13/2001 | CN1067119C Method and apparatus for large area high-speed thermal filament chemical vapor deposition of diamond |
| 06/12/2001 | US6245691 Forming trench isolation regions within isolation trenches of microelectronics integrated circuits |
| 06/12/2001 | US6245690 Method of improving moisture resistance of low dielectric constant films |
| 06/12/2001 | US6245673 Method of forming tungsten silicide film |
| 06/12/2001 | US6245648 Method of forming semiconducting materials and barriers |
| 06/12/2001 | US6245647 Method for fabrication of thin film |
| 06/12/2001 | US6245396 CVD apparatus and method of using same |
| 06/12/2001 | US6245261 Substituted phenylethylene precursor and synthesis method |
| 06/12/2001 | US6245202 Plasma treatment device |
| 06/12/2001 | US6245192 Gas distribution apparatus for semiconductor processing |
| 06/12/2001 | US6245151 Liquid delivery system comprising upstream pressure control means |
| 06/12/2001 | US6245149 Inert barrier for high purity epitaxial deposition systems |
| 06/12/2001 | US6244575 Method and apparatus for vaporizing liquid precursors and system for using same |
| 06/12/2001 | US6244211 Plasma processing apparatus |
| 06/10/2001 | CA2323824A1 System and method for coating non-planar surfaces of objects with diamond film |
| 06/07/2001 | WO2001041203A1 Improved flourine doped sio2 film |
| 06/07/2001 | WO2001041182A1 Plasma processor, cluster tool, and method of controlling plasma |
| 06/07/2001 | WO2001040705A1 Self-cleaning automotive head lamp |
| 06/07/2001 | WO2001040543A1 Method for producing functional layers with a plasma jet source |
| 06/07/2001 | WO2001040542A1 Method for producing composite layers using a plasma jet source |
| 06/07/2001 | WO2001040541A1 Atomic-layer-chemical-vapor-deposition of films that contain silicon dioxide |
| 06/07/2001 | WO2001040540A1 Improved reactor with heated and textured electrodes and surfaces |
| 06/07/2001 | WO2001040537A1 Method for producing fluorinated diamond-like carbon films |
| 06/07/2001 | WO2001040535A2 System and method relating to vapor deposition |
| 06/07/2001 | WO2001040072A1 Device for sealing the front edge of the neck of a container |
| 06/07/2001 | WO2001033619A8 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide |
| 06/07/2001 | US20010003015 Of titanium, by adding a flow of hydrogen and nitrogen to the reaction chamber; processor readable medium containing a program that causes the reactor chamber to passivate the titanium layer |
| 06/07/2001 | US20010003014 Plasma CVD apparatus and plasma CVD method |
| 06/07/2001 | US20010002585 Introducing a substrate into a reaction chamber which has atleast one gas feed port and one gas exhaust port, heating the substrate to a film forming temperature while supplying a prescribed gas to reaction chamber to form a film |
| 06/07/2001 | US20010002582 Showerhead diffuser with flexibility to adjust gas distribution flux in a number of different ways, allowing a diffuser to be dialed-in to account for many gas parameters such as reactivity |
| 06/07/2001 | US20010002581 System for manufacturing a semiconductor device |
| 06/07/2001 | US20010002578 Introducing a vaporizable gold compound, and another metal compound together with reaction gas oxygen and inert gas into first microwave plasma whereby cores covered with gold clusters are formed, tempering the clustered core for color |
| 06/07/2001 | US20010002573 Liquid raw material is deaerated and supplied from a container to a liquid flow control section by the pressure of first inert gas, inside a gas permeable fluoropolymer tube, passing second inert gas with low permeability than first |
| 06/07/2001 | US20010002510 Cavity-filling method for reducing surface topography and roughness |
| 06/07/2001 | DE19958473A1 Verfahren zur Herstellung von Kompositschichten mit einer Plasmastrahlquelle A process for the production of composite layers with a plasma beam source |
| 06/07/2001 | DE19957744A1 Vorrichtung zum Abdichten des Stirnrandes eines Behälterhalses Device for sealing the end edge of a container finish |
| 06/06/2001 | EP1104341A1 Surface coatings |
| 06/06/2001 | EP0781257B1 Glazing including a conductive and/or low-emissive layer |
| 06/06/2001 | CN1298328A Container with material coating having barrier effect and method and apparatus for making same |
| 06/05/2001 | US6243534 Method and apparatus to compensate for non-uniform film growth during chemical vapor deposition |
| 06/05/2001 | US6242771 Chemical vapor deposition of PB5GE3O11 thin film for ferroelectric applications |
| 06/05/2001 | US6242367 Forming silicon nitride layers on silicon using silane |
| 06/05/2001 | US6242364 Plasma deposition of spin chucks to reduce contamination of silicon wafers |
| 06/05/2001 | US6242359 Plasma cleaning and etching methods using non-global-warming compounds |
| 06/05/2001 | US6242347 Method for cleaning a process chamber |
| 06/05/2001 | US6242109 High-temperature-resistant component and method of providing protection thereof against oxidation |
| 06/05/2001 | US6242054 Using a reducing plasma |
| 06/05/2001 | US6242053 Process for coating plastic containers or glass containers by means of a PCVD coating process |
| 06/05/2001 | US6242049 Sealable stagnation flow geometries for the uniform deposition of materials and heat |
| 06/05/2001 | US6242045 Process of preparing metal nitride films using a metal halide and an amine |
| 06/05/2001 | US6241825 Compliant wafer chuck |
| 06/05/2001 | US6241824 Apparatus for the coating of substrates in a vacuum chamber |
| 06/05/2001 | US6241823 Array and method for coating of objects |
| 06/05/2001 | US6240875 Vertical oven with a boat for the uniform treatment of wafers |
| 06/05/2001 | CA2036768C Process for the manufacture of ceramic fibres |
| 05/31/2001 | WO2001039560A1 Device for hybrid plasma processing |
| 05/31/2001 | WO2001038625A2 Method for making a bowl in thermostructural composite material, resulting bowl and use of same as crucible support |
| 05/31/2001 | WO2001038602A1 Compound vapor spraying device and focusing ion beam device using it |