| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 05/22/2001 | US6234679 Rolling bearing with coated element |
| 05/22/2001 | US6234107 Auxiliary vacuum chamber and vacuum processing unit using same |
| 05/17/2001 | WO2001035453A1 Heat treatment device |
| 05/17/2001 | WO2001034871A1 Apparatus and method for performing simple chemical vapor deposition |
| 05/17/2001 | WO2001034382A1 Aerogel substrate and method for preparing the same |
| 05/17/2001 | US20010001297 Forming a titanium film upon a substrate, forming an intermediate layer comprising silicon upon said titanium film, and forming a titanium nitride film upon said intermediate layer; barrier |
| 05/17/2001 | US20010001191 Method for forming dielectric layers |
| 05/17/2001 | US20010001185 Plasma processing apparatus and method of cleaning the apparatus |
| 05/17/2001 | US20010001175 Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power |
| 05/17/2001 | DE19940033A1 Verfahren und Vorrichtung zum Abscheiden von Schichten auf rotierenden Substraten in einem allseits beheizten Strömungskanal Method and apparatus for depositing layers on rotating substrates in a well-heated flow channel |
| 05/17/2001 | DE10055431A1 Production of a capacitor used in the production of DRAMs comprises forming a lower electrode on a semiconductor substrate, depositing an amorphous thin layer and forming an upper electrode |
| 05/16/2001 | EP1100121A2 Process for forming low k silicon oxide dielectric material while suppressing pressure spiking and inhibiting increase in dielectric constant |
| 05/16/2001 | EP1100119A1 Plasma processing method |
| 05/16/2001 | EP1100116A1 Method for relaxing stress in blanket tungsten film formed by chemical vapor deposition |
| 05/16/2001 | EP1100115A1 Device and method for plasma processing |
| 05/16/2001 | EP1099779A1 Surface treatment apparatus |
| 05/16/2001 | EP1099778A2 Trap apparatus |
| 05/16/2001 | EP1099241A2 Gas flow control in a substrate processing system |
| 05/16/2001 | EP1099008A1 Cvd apparatus |
| 05/16/2001 | EP1099007A1 Susceptor for barrel reactor |
| 05/16/2001 | EP1099006A1 Liquid precursor for chemical vapor deposition |
| 05/16/2001 | EP1099005A1 Material deposition |
| 05/16/2001 | EP1098845A2 New class of diamond-based materials and techniques for their synthesis |
| 05/16/2001 | CN1295342A Manufacture of capacitor for semiconductor device |
| 05/16/2001 | CN1295341A Method for manufacture of Ta2O5 capacitor using Ta2O5 film as dielectric film |
| 05/16/2001 | CN1065926C Infrared anti-reflection filter window of diamond and its preparing method |
| 05/16/2001 | CN1065925C Low-temp, method and device for preparation of large area eka-diamond carbon film |
| 05/15/2001 | US6232706 Self-oriented bundles of carbon nanotubes and method of making same |
| 05/15/2001 | US6232658 Process to prevent stress cracking of dielectric films on semiconductor wafers |
| 05/15/2001 | US6232580 Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes |
| 05/15/2001 | US6232248 Single-substrate-heat-processing method for performing reformation and crystallization |
| 05/15/2001 | US6232246 Method of fabricating semiconductor device |
| 05/15/2001 | US6232234 Method of reducing in film particle number in semiconductor manufacture |
| 05/15/2001 | US6232216 Thin film forming method |
| 05/15/2001 | US6232204 Semiconductor manufacturing system with getter safety device |
| 05/15/2001 | US6232196 Method of depositing silicon with high step coverage |
| 05/15/2001 | US6232135 Passivation of ink jet printheads |
| 05/15/2001 | US6231933 Bellow disturbance and sonic disturbance in interior of reactor reducting thickness of gas boundary layer |
| 05/15/2001 | US6231923 Forming monolithic disk shaped ceramics, using tools, shafts and vapor deposition |
| 05/15/2001 | US6231918 Film on integrated circuits with oxide layers |
| 05/15/2001 | US6231777 Surface treatment method and system |
| 05/15/2001 | US6231674 Wafer edge deposition elimination |
| 05/15/2001 | US6231673 Manufacturing method of semiconductor wafer, semiconductor manufacturing apparatus, and semiconductor device |
| 05/15/2001 | US6231672 Apparatus for depositing thin films on semiconductor wafer by continuous gas injection |
| 05/15/2001 | US6231658 Chemical vapor deposition source for depositing lead zirconate titanate film |
| 05/15/2001 | US6230652 Apparatus and methods for upgraded substrate processing system with microwave plasma source |
| 05/15/2001 | US6230651 Gas injection system for plasma processing |
| 05/10/2001 | WO2001033619A1 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide |
| 05/10/2001 | WO2001033617A1 Semiconductor-manufacturing apparatus |
| 05/10/2001 | WO2001033616A1 Method and apparatus for thin film deposition |
| 05/10/2001 | WO2001033615A2 Method and apparatus for supercritical processing of multiple workpieces |
| 05/10/2001 | WO2001032966A1 Method for producing an initial polycrystalline silicon in the form of plates having a large surface and chamber for the precipitation of silicon |
| 05/10/2001 | WO2001032950A1 Deposition of pyrocarbon |
| 05/10/2001 | WO2001032799A1 Particle dispersions |
| 05/10/2001 | WO2001032513A1 Nitrogen-free dlc film coated plastic container, and method and apparatus for manufacturing the same |
| 05/10/2001 | WO2001032359A2 Ultrasonic metal finishing involving cavitational erosion |
| 05/10/2001 | US20010000866 Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition |
| 05/10/2001 | US20010000865 Wafer produced by method of quality control for chemical vapor deposition |
| 05/10/2001 | DE19951991A1 Process for charging a substrate wafer onto a heated susceptor or a susceptor segment of a deposition reactor with comprises holding the wafer and susceptor or susceptor segment away from each other before contacting them |
| 05/10/2001 | DE19950565A1 Schichterzeugungsverfahren bei der Herstellung eines Halbleiterbauelements und Halbleiterbauelement Layer forming process in the manufacture of a semiconductor device and semiconductor device |
| 05/10/2001 | DE10055450A1 Capacitor for semiconductor memory such as DRAM has silicon nitride film formed between lower electrode and tantalum oxide film on which upper electrode is formed |
| 05/10/2001 | DE10046021A1 Capacitor production on a substrate by forming a lower electrode on the substrate, forming a dielectric layer on the electrode, oxygen radical or plasma heat treating the dielectric layer and forming the upper electrode |
| 05/10/2001 | DE10042881A1 CVD apparatus comprises a reaction chamber, a material gas introduction path, an inert gas introduction path, an introduction path for a gas having a high heat conductivity, a moisture measuring device and a vacuum pump |
| 05/10/2001 | CA2387341A1 Method and apparatus for supercritical processing of multiple workpieces |
| 05/09/2001 | EP1098354A2 Apparatus for controlling temperature in a semiconductor processing system |
| 05/09/2001 | EP1098015A1 Evaporator for a CVD apparatus |
| 05/09/2001 | EP1097778A2 Method for manufacturing objects of metallic material and objects manufactured with this method |
| 05/09/2001 | EP1097473A1 Plasma process to deposit silicon nitride with high film quality and low hydrogen content |
| 05/09/2001 | EP1097472A1 Vapor deposition routes to nanoporous silica |
| 05/09/2001 | EP1097470A1 Infra-red transparent thermal reactor cover member |
| 05/09/2001 | EP1097469A1 Method and apparatus for reducing contamination of a substrate in a substrate processing system |
| 05/09/2001 | EP1097468A1 Method and apparatus for processing wafers |
| 05/09/2001 | EP1097253A1 Ion energy attenuation |
| 05/09/2001 | EP1097252A1 Multi-position load lock chamber |
| 05/09/2001 | EP1097251A1 System and method for reducing particles in epitaxial reactors |
| 05/09/2001 | EP1097111A1 Heating a substrate support in a substrate handling chamber |
| 05/09/2001 | EP0811082B1 Cvd diamond burrs for odontological and related uses |
| 05/09/2001 | EP0802988B1 Method of forming diamond-like carbon film (dlc) |
| 05/09/2001 | CN1294542A Diamond cutting tool |
| 05/09/2001 | CN1294481A Microwave plasma processor and method thereof |
| 05/09/2001 | CN1065573C Guide bush and method of forming hard carbon film over inner surface of guide bush |
| 05/08/2001 | US6229118 Wafer handling apparatus for transferring a wafer to and from a process chamber |
| 05/08/2001 | US6228781 Sequential in-situ heating and deposition of halogen-doped silicon oxide |
| 05/08/2001 | US6228702 Method of manufacturing semiconductor device |
| 05/08/2001 | US6228510 Coating and method for minimizing consumption of base material during high temperature service |
| 05/08/2001 | US6228502 Material having titanium dioxide crystalline orientation film and method for producing the same |
| 05/08/2001 | US6228471 Coating comprising layers of diamond like carbon and diamond like nanocomposite compositions |
| 05/08/2001 | US6228439 Multistage; concurrent cleaning substrate, depositing |
| 05/08/2001 | US6228434 Plasma polymerized polymer films, enhanced chemical vapordeposition with a flash evaporated feed source of a low vapor pressure compound. |
| 05/08/2001 | US6228420 Method to maintain consistent thickness of thin film deposited by chemical vapor deposition |
| 05/08/2001 | US6228297 Method for producing free-standing silicon carbide articles |
| 05/08/2001 | US6228175 Apparatus for generating a wet oxygen stream for a semiconductor processing furnace |
| 05/08/2001 | US6228174 Heat treatment system using ring-shaped radiation heater elements |
| 05/08/2001 | US6228173 Single-substrate-heat-treating apparatus for semiconductor process system |
| 05/08/2001 | US6228170 Method and apparatus for regulating chamber pressure |
| 05/08/2001 | US6228166 Method for boron contamination reduction in IC fabrication |
| 05/08/2001 | US6227141 RF powered plasma enhanced chemical vapor deposition reactor and methods |
| 05/08/2001 | US6227140 Semiconductor processing equipment having radiant heated ceramic liner |
| 05/08/2001 | CA2073642C Substoichiometric zirconium nitride coating |
| 05/07/2001 | WO2001048790A1 Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate |