Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2001
07/17/2001US6261673 Coated grooving or parting insert
07/17/2001US6261648 Plasma facing components of nuclear fusion reactors employing tungsten materials
07/17/2001US6261634 Apparatus and method for forming film
07/17/2001US6261469 Three dimensionally periodic structural assemblies on nanometer and longer scales
07/17/2001US6261422 Production of hollowed/channeled protective thermal-barrier coatings functioning as heat-exchangers
07/17/2001US6261408 Method and apparatus for semiconductor processing chamber pressure control
07/17/2001US6261374 Clog resistant gas delivery system
07/17/2001US6261373 Method and apparatus for metal oxide chemical vapor deposition on a substrate surface
07/17/2001US6261372 Vacuum process system
07/17/2001US6260588 Bulk chemical delivery system
07/17/2001US6260510 PCVD apparatus and method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith
07/12/2001WO2001050510A2 Low thermal budget metal oxide deposition for capacitor structures
07/12/2001WO2001050498A1 Linear drive system for use in a plasma processing system
07/12/2001WO2001050497A1 Electrode assembly
07/12/2001WO2001050061A1 Method and device for forming required gas atmosphere
07/12/2001WO2001049896A1 Methods of forming a high k dielectric layer and a capacitor
07/12/2001WO2001049895A1 Diamond-like carbon coated pet
07/12/2001WO2001049623A1 Diamond-like carbon coating on a non metal article for added hardness and abrasion resistance
07/12/2001US20010007797 Method of forming a tungsten plug in a semiconductor device
07/12/2001US20010007645 Ozone processing apparatus for semiconductor processing system
07/12/2001US20010007246 Controlled heating; solar cells
07/12/2001US20010007245 Hf-plasma coating chamber or pecvd coating chamber, its use and method of plating cds using the chamber
07/12/2001US20010007244 Film forming apparatus and film forming method
07/12/2001US20010007241 Improved purity silicon wafer for use in advanced semiconductor devices
07/12/2001US20010007240 High efficiency silicon wafer optimized for advanced semiconductor devices
07/12/2001US20010007174 Exhaust process and film depositing method using the exhaust process
07/12/2001DE19962056A1 Schneidwerkzeug mit mehrlagiger, verschleissfester Beschichtung Cutting tool with multi-layer, wear-resistant coating
07/12/2001DE19960092A1 Beschichtungsverfahren Coating process
07/12/2001DE10100424A1 Korrosions- und abnutzungsbeständige, dünne Diamantfilmbeschichtung, Herstellungsverfahren und Anwendungen dafür Corrosion and wear-resistant, thin diamond film coating, manufacturing methods and applications for
07/12/2001DE10060002A1 Vorrichtung zur Oberflächenbehandlung Surface treatment apparatus
07/12/2001CA2390235A1 Diamond-like carbon coated pet film and pet film glass laminate glazing structures for added hardness and abrasion resistance
07/12/2001CA2389798A1 Diamond-like carbon coating on a non metal article for added hardness and abrasion resistance
07/11/2001EP1115148A1 Vapor growth method for metal oxide dielectric film and vapor growth device for metal oxide dielectric material
07/11/2001EP1115147A1 Plasma process device
07/11/2001EP1115146A1 Method and apparatus for vacuum processing
07/11/2001EP1115140A2 Plasma processing apparatus
07/11/2001EP1114881A1 Carbon film and method for formation thereof and article covered with carbon film and method for preparation thereof
07/11/2001EP1114792A2 Cubic boron nitride and its gas phase synthesis method
07/11/2001EP1114790A2 Bulk chemical delivery system
07/11/2001EP1114464A1 Electronic devices with barrier film and process for making same
07/11/2001EP1114442A2 Method for reducing particle emission or absorption on a surface
07/11/2001EP1113884A1 Reusable mask and method for coating substrate
07/11/2001EP0954622B1 Composite body and production process
07/11/2001CN2438725Y Oxidation film epitaxial equipment
07/11/2001CN1303125A Method and equipment for supplying liquid raw material
07/10/2001US6259209 Plasma processing apparatus with coils in dielectric windows
07/10/2001US6259105 System and method for cleaning silicon-coated surfaces in an ion implanter
07/10/2001US6259066 Process and device for processing a material by electromagnetic radiation in a controlled atmosphere
07/10/2001US6258735 Method for using bypass lines to stabilize gas flow and maintain plasma inside a deposition chamber
07/10/2001US6258733 Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size
07/10/2001US6258718 Method for reducing surface charge on semiconductor wafers to prevent arcing during plasma deposition
07/10/2001US6258716 CVD titanium silicide for contact hole plugs
07/10/2001US6258666 Method of producing semiconductor thin film and method of producing solar cell using same
07/10/2001US6258408 Winding wed; deposit film; advancing web
07/10/2001US6258407 Precursors for making low dielectric constant materials with improved thermal stability
07/10/2001US6258237 Charging diamond particles by positive charge by suspending diamond particles in polar organic liquid in presence of additive; from suspension electrophoretically depositing diamond particles on surface of cathodic substrate
07/10/2001US6258174 Gas supplying apparatus
07/10/2001US6258173 Film forming apparatus for forming a crystalline silicon film
07/10/2001US6258171 Direct liquid injection system with on-line cleaning
07/10/2001US6258170 Vaporization and deposition apparatus
07/10/2001US6258157 Beta-diketonates
07/10/2001US6258153 Device for the deposition of substances
07/10/2001US6257881 Combination CVI/CVD and heat treat susceptor lid
07/06/2001CA2328266A1 Corrosion and erosion resistant thin film diamond coating and applications therefor
07/05/2001WO2001048791A1 Method of manufacturing an electrode for a plasma reactor and such an electrode
07/05/2001WO2001048788A1 Arrangement for coupling microwave energy into a treatment chamber
07/05/2001WO2001048263A2 Method for producing a layer which influences the orientation of liquid crystal and a liquid crystal cell which has at least one layer of this type
07/05/2001WO2001048260A1 Parts for vacuum film-forming device
07/05/2001WO2001047704A1 Chemical vapor deposition method and coatings produced therefrom
07/05/2001WO2001047646A1 System for automatic control of the wall bombardment to control wall deposition
07/05/2001WO2001004377A8 Seal means and its application in deposition reactor
07/05/2001WO2000003169A3 Manifold system of removable components for distribution of fluids
07/05/2001US20010007034 Tetrahydrofuran-adducted Group II beta-diketonate complexes as source reagents for chemical vapor deposition
07/05/2001US20010006843 Method for forming a gate insulating film for semiconductor devices
07/05/2001US20010006838 Methods of forming ruthenium film by changing process conditions during chemical vapor deposition and ruthenium films formed thereby
07/05/2001US20010006835 Method for manufacturing aluminum oxide film for use in a semiconductor device
07/05/2001US20010006833 Forming tantalum, titanium mixed oxide
07/05/2001US20010006826 Method for forming a capacitor for semiconductor devices
07/05/2001US20010006724 Cutting tool with multilayer, wear-resistant coating
07/05/2001US20010006709 Densification
07/05/2001US20010006705 Metal organic chemical vapor deposition of an adduct of a metal beta-diketonate (MK) and tetraethylenepentamine (TEPA) for example, then regenerating the adduct by associating dissassociated MK with TEPA to form second thin film
07/05/2001US20010006701 Chemical vapor deposition (CVD); trimethylvinylsilyl hexafluoroacetylacetonate (hfac) copper(I) with small deposition rate and allyltrimethylsilyl (hfac) copper(I) with large deposition rate to form copper interconnect film
07/05/2001US20010006240 Method of forming titanium silicide and titanium by chemical vapor deposition and resulting apparatus
07/05/2001US20010006148 Interference layer system
07/05/2001US20010006093 For making raw material gas plasma by generating plasma in a casing provided with plasma generation means, raw material gas inlet and substrate support table, by plasma generation means and treatment of surface of substrate placed on table
07/05/2001US20010006071 Heating a second fluid and flowing it through secondary containment line having primary containment line positioning therein, the seconday fluid surrounding primary containment line, flowing first fluid through first continment line
07/05/2001US20010006070 Surface-treated shower head for use in a substrate processing chamber
07/05/2001US20010006043 A vertical barrel, concentric cylinder design for a cold wall reactor cell which can be converted to a hot wall cell for cleaning the interior of the reactor
07/05/2001DE10060886A1 Vorrichtung und Verfahren zum Beschichten nicht ebener Flächen von Gegenständen mit einem Diamantfilm Apparatus and method for coating non-planar surfaces of objects with a diamond film
07/04/2001EP1113489A2 Film forming method and semiconductor device
07/04/2001EP1113092A2 Cutting tool with multilayer, wear resistant coating
07/04/2001EP1113089A1 MOCVD of lead zirconate titanate films
07/04/2001EP1112989A1 Densification
07/04/2001EP1112404A1 Textile articles or clothing having super hydrophobic coating
07/04/2001EP1112391A1 Modulated plasma glow discharge treatments for making superhydrophobic substrates
07/04/2001CN2437694Y Nonferrous based surface titanium silicide coating device
07/04/2001CN1302453A Method and apparatus for treating semi-conductor substrate
07/04/2001CN1302254A Low K dielectric inorganic/organic hybrid films and method of making
07/04/2001CN1302079A Field emission display device by using vertical arranged carbon nanometer tube
07/03/2001US6256148 Rugate filter and method of making same