Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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07/17/2001 | US6261673 Coated grooving or parting insert |
07/17/2001 | US6261648 Plasma facing components of nuclear fusion reactors employing tungsten materials |
07/17/2001 | US6261634 Apparatus and method for forming film |
07/17/2001 | US6261469 Three dimensionally periodic structural assemblies on nanometer and longer scales |
07/17/2001 | US6261422 Production of hollowed/channeled protective thermal-barrier coatings functioning as heat-exchangers |
07/17/2001 | US6261408 Method and apparatus for semiconductor processing chamber pressure control |
07/17/2001 | US6261374 Clog resistant gas delivery system |
07/17/2001 | US6261373 Method and apparatus for metal oxide chemical vapor deposition on a substrate surface |
07/17/2001 | US6261372 Vacuum process system |
07/17/2001 | US6260588 Bulk chemical delivery system |
07/17/2001 | US6260510 PCVD apparatus and method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
07/12/2001 | WO2001050510A2 Low thermal budget metal oxide deposition for capacitor structures |
07/12/2001 | WO2001050498A1 Linear drive system for use in a plasma processing system |
07/12/2001 | WO2001050497A1 Electrode assembly |
07/12/2001 | WO2001050061A1 Method and device for forming required gas atmosphere |
07/12/2001 | WO2001049896A1 Methods of forming a high k dielectric layer and a capacitor |
07/12/2001 | WO2001049895A1 Diamond-like carbon coated pet |
07/12/2001 | WO2001049623A1 Diamond-like carbon coating on a non metal article for added hardness and abrasion resistance |
07/12/2001 | US20010007797 Method of forming a tungsten plug in a semiconductor device |
07/12/2001 | US20010007645 Ozone processing apparatus for semiconductor processing system |
07/12/2001 | US20010007246 Controlled heating; solar cells |
07/12/2001 | US20010007245 Hf-plasma coating chamber or pecvd coating chamber, its use and method of plating cds using the chamber |
07/12/2001 | US20010007244 Film forming apparatus and film forming method |
07/12/2001 | US20010007241 Improved purity silicon wafer for use in advanced semiconductor devices |
07/12/2001 | US20010007240 High efficiency silicon wafer optimized for advanced semiconductor devices |
07/12/2001 | US20010007174 Exhaust process and film depositing method using the exhaust process |
07/12/2001 | DE19962056A1 Schneidwerkzeug mit mehrlagiger, verschleissfester Beschichtung Cutting tool with multi-layer, wear-resistant coating |
07/12/2001 | DE19960092A1 Beschichtungsverfahren Coating process |
07/12/2001 | DE10100424A1 Korrosions- und abnutzungsbeständige, dünne Diamantfilmbeschichtung, Herstellungsverfahren und Anwendungen dafür Corrosion and wear-resistant, thin diamond film coating, manufacturing methods and applications for |
07/12/2001 | DE10060002A1 Vorrichtung zur Oberflächenbehandlung Surface treatment apparatus |
07/12/2001 | CA2390235A1 Diamond-like carbon coated pet film and pet film glass laminate glazing structures for added hardness and abrasion resistance |
07/12/2001 | CA2389798A1 Diamond-like carbon coating on a non metal article for added hardness and abrasion resistance |
07/11/2001 | EP1115148A1 Vapor growth method for metal oxide dielectric film and vapor growth device for metal oxide dielectric material |
07/11/2001 | EP1115147A1 Plasma process device |
07/11/2001 | EP1115146A1 Method and apparatus for vacuum processing |
07/11/2001 | EP1115140A2 Plasma processing apparatus |
07/11/2001 | EP1114881A1 Carbon film and method for formation thereof and article covered with carbon film and method for preparation thereof |
07/11/2001 | EP1114792A2 Cubic boron nitride and its gas phase synthesis method |
07/11/2001 | EP1114790A2 Bulk chemical delivery system |
07/11/2001 | EP1114464A1 Electronic devices with barrier film and process for making same |
07/11/2001 | EP1114442A2 Method for reducing particle emission or absorption on a surface |
07/11/2001 | EP1113884A1 Reusable mask and method for coating substrate |
07/11/2001 | EP0954622B1 Composite body and production process |
07/11/2001 | CN2438725Y Oxidation film epitaxial equipment |
07/11/2001 | CN1303125A Method and equipment for supplying liquid raw material |
07/10/2001 | US6259209 Plasma processing apparatus with coils in dielectric windows |
07/10/2001 | US6259105 System and method for cleaning silicon-coated surfaces in an ion implanter |
07/10/2001 | US6259066 Process and device for processing a material by electromagnetic radiation in a controlled atmosphere |
07/10/2001 | US6258735 Method for using bypass lines to stabilize gas flow and maintain plasma inside a deposition chamber |
07/10/2001 | US6258733 Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size |
07/10/2001 | US6258718 Method for reducing surface charge on semiconductor wafers to prevent arcing during plasma deposition |
07/10/2001 | US6258716 CVD titanium silicide for contact hole plugs |
07/10/2001 | US6258666 Method of producing semiconductor thin film and method of producing solar cell using same |
07/10/2001 | US6258408 Winding wed; deposit film; advancing web |
07/10/2001 | US6258407 Precursors for making low dielectric constant materials with improved thermal stability |
07/10/2001 | US6258237 Charging diamond particles by positive charge by suspending diamond particles in polar organic liquid in presence of additive; from suspension electrophoretically depositing diamond particles on surface of cathodic substrate |
07/10/2001 | US6258174 Gas supplying apparatus |
07/10/2001 | US6258173 Film forming apparatus for forming a crystalline silicon film |
07/10/2001 | US6258171 Direct liquid injection system with on-line cleaning |
07/10/2001 | US6258170 Vaporization and deposition apparatus |
07/10/2001 | US6258157 Beta-diketonates |
07/10/2001 | US6258153 Device for the deposition of substances |
07/10/2001 | US6257881 Combination CVI/CVD and heat treat susceptor lid |
07/06/2001 | CA2328266A1 Corrosion and erosion resistant thin film diamond coating and applications therefor |
07/05/2001 | WO2001048791A1 Method of manufacturing an electrode for a plasma reactor and such an electrode |
07/05/2001 | WO2001048788A1 Arrangement for coupling microwave energy into a treatment chamber |
07/05/2001 | WO2001048263A2 Method for producing a layer which influences the orientation of liquid crystal and a liquid crystal cell which has at least one layer of this type |
07/05/2001 | WO2001048260A1 Parts for vacuum film-forming device |
07/05/2001 | WO2001047704A1 Chemical vapor deposition method and coatings produced therefrom |
07/05/2001 | WO2001047646A1 System for automatic control of the wall bombardment to control wall deposition |
07/05/2001 | WO2001004377A8 Seal means and its application in deposition reactor |
07/05/2001 | WO2000003169A3 Manifold system of removable components for distribution of fluids |
07/05/2001 | US20010007034 Tetrahydrofuran-adducted Group II beta-diketonate complexes as source reagents for chemical vapor deposition |
07/05/2001 | US20010006843 Method for forming a gate insulating film for semiconductor devices |
07/05/2001 | US20010006838 Methods of forming ruthenium film by changing process conditions during chemical vapor deposition and ruthenium films formed thereby |
07/05/2001 | US20010006835 Method for manufacturing aluminum oxide film for use in a semiconductor device |
07/05/2001 | US20010006833 Forming tantalum, titanium mixed oxide |
07/05/2001 | US20010006826 Method for forming a capacitor for semiconductor devices |
07/05/2001 | US20010006724 Cutting tool with multilayer, wear-resistant coating |
07/05/2001 | US20010006709 Densification |
07/05/2001 | US20010006705 Metal organic chemical vapor deposition of an adduct of a metal beta-diketonate (MK) and tetraethylenepentamine (TEPA) for example, then regenerating the adduct by associating dissassociated MK with TEPA to form second thin film |
07/05/2001 | US20010006701 Chemical vapor deposition (CVD); trimethylvinylsilyl hexafluoroacetylacetonate (hfac) copper(I) with small deposition rate and allyltrimethylsilyl (hfac) copper(I) with large deposition rate to form copper interconnect film |
07/05/2001 | US20010006240 Method of forming titanium silicide and titanium by chemical vapor deposition and resulting apparatus |
07/05/2001 | US20010006148 Interference layer system |
07/05/2001 | US20010006093 For making raw material gas plasma by generating plasma in a casing provided with plasma generation means, raw material gas inlet and substrate support table, by plasma generation means and treatment of surface of substrate placed on table |
07/05/2001 | US20010006071 Heating a second fluid and flowing it through secondary containment line having primary containment line positioning therein, the seconday fluid surrounding primary containment line, flowing first fluid through first continment line |
07/05/2001 | US20010006070 Surface-treated shower head for use in a substrate processing chamber |
07/05/2001 | US20010006043 A vertical barrel, concentric cylinder design for a cold wall reactor cell which can be converted to a hot wall cell for cleaning the interior of the reactor |
07/05/2001 | DE10060886A1 Vorrichtung und Verfahren zum Beschichten nicht ebener Flächen von Gegenständen mit einem Diamantfilm Apparatus and method for coating non-planar surfaces of objects with a diamond film |
07/04/2001 | EP1113489A2 Film forming method and semiconductor device |
07/04/2001 | EP1113092A2 Cutting tool with multilayer, wear resistant coating |
07/04/2001 | EP1113089A1 MOCVD of lead zirconate titanate films |
07/04/2001 | EP1112989A1 Densification |
07/04/2001 | EP1112404A1 Textile articles or clothing having super hydrophobic coating |
07/04/2001 | EP1112391A1 Modulated plasma glow discharge treatments for making superhydrophobic substrates |
07/04/2001 | CN2437694Y Nonferrous based surface titanium silicide coating device |
07/04/2001 | CN1302453A Method and apparatus for treating semi-conductor substrate |
07/04/2001 | CN1302254A Low K dielectric inorganic/organic hybrid films and method of making |
07/04/2001 | CN1302079A Field emission display device by using vertical arranged carbon nanometer tube |
07/03/2001 | US6256148 Rugate filter and method of making same |