| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/09/2001 | WO2001058223A1 Plasma processing system and method |
| 08/09/2001 | WO2001057289A1 Device and method for depositing one or more layers onto a substrate |
| 08/09/2001 | WO2001056706A1 Device for coating the inner surface of a hollow body |
| 08/09/2001 | US20010012701 Method of forming a silicon nitride thin film |
| 08/09/2001 | US20010012700 Semiconductor processing methods of chemical vapor depositing sio2 on a substrate |
| 08/09/2001 | US20010012699 Base thermal SiO2 film 1a is exposed to any gas selected from silicon,germanium or stanium halides |
| 08/09/2001 | US20010012697 Apparatus for manufacturing a semiconductor device in a CVD reactive chamber |
| 08/09/2001 | US20010012667 Clustered system and method for formation of integrated circuit devices |
| 08/09/2001 | US20010012604 Single-substrate-heat-treating apparatus for semiconductor process system |
| 08/09/2001 | US20010012567 Material having titanium dioxide crystalline orientation film and method for producing the same |
| 08/09/2001 | US20010011748 Semiconductor thin film and thin film device |
| 08/09/2001 | US20010011637 Tilting in respect to substrate |
| 08/09/2001 | US20010011609 Method and apparatus for measurement of weight during cvi/cvd process |
| 08/09/2001 | US20010011526 Processing chamber for atomic layer deposition processes |
| 08/09/2001 | US20010011525 Microwave plasma processing system |
| 08/09/2001 | US20010011523 Chemical vapor deposition apparatus |
| 08/09/2001 | DE10065454A1 Verfahren zur Herstellung eines Aluminiumoxidfilms zur Verwendung in einem Halbleitergerät A process for producing an aluminum oxide film for use in a semiconductor device |
| 08/08/2001 | EP1122774A1 Plasma treatment of a titanium nitride film formed by chemical vapor deposition |
| 08/08/2001 | EP1122766A2 Method and apparatus for enhanced chamber cleaning |
| 08/08/2001 | EP1122344A2 Graphite nanofibers and their use |
| 08/08/2001 | EP1122337A2 Apparatus and method for forming deposited film |
| 08/08/2001 | EP1122336A2 Apparatus and method for forming a deposited film by means of plasma CVD |
| 08/08/2001 | EP1122335A1 Methods and apparatus for vaporization of liquids |
| 08/08/2001 | EP1122334A1 Deposition of gamma-AL2O3 by means of CVD |
| 08/08/2001 | EP1122333A2 UV cure process and tool for low k film formation |
| 08/08/2001 | EP1122332A1 Method and apparatus for deposition of low residual halogen content TiN film |
| 08/08/2001 | EP1122221A1 Apparatus for surface treatment and/or coating, respectively manufacture of building elements, in particular planar building elements made of glass, glass alloys or metal, in a continuous process |
| 08/08/2001 | EP1121706A1 Integrated power modules for plasma processing systems |
| 08/08/2001 | EP1121474A2 Organocopper precursors for chemical vapor deposition |
| 08/08/2001 | EP1121334A1 Three dimensionally periodic structural assemblies on nanometer and longer scales |
| 08/08/2001 | EP1121333A1 Creating silica soot with a plug-free system |
| 08/08/2001 | EP0956373B1 Surface alloyed high temperature alloys |
| 08/08/2001 | EP0787222B1 Method for depositing a hard protective coating |
| 08/08/2001 | EP0763144B1 Production of carbon-coated barrier films with increased concentration of carbon with tetrahedral coordination |
| 08/08/2001 | CN1307647A Susceptor for barrel reactor |
| 08/08/2001 | CN1307359A Method of manufacturing capacitor for semiconductor device |
| 08/08/2001 | CN1307326A Device and method for manufacture of liquid crystal display |
| 08/08/2001 | CN1069439C Surface treatment method and system |
| 08/07/2001 | US6271802 Three dimensional micromachined electromagnetic device and associated methods |
| 08/07/2001 | US6271576 Laser synthesized ceramic sensors and method for making |
| 08/07/2001 | US6271498 Apparatus for vaporizing liquid raw material and method of cleaning CVD apparatus |
| 08/07/2001 | US6271148 Method for improved remote microwave plasma source for use with substrate processing system |
| 08/07/2001 | US6271146 Electron beam treatment of fluorinated silicate glass |
| 08/07/2001 | US6271137 Method of producing an aluminum stacked contact/via for multilayer |
| 08/07/2001 | US6271136 Vapor deposition using organometallic compounds |
| 08/07/2001 | US6271131 Methods for forming rhodium-containing layers such as platinum-rhodium barrier layers |
| 08/07/2001 | US6271129 Method for forming a gap filling refractory metal layer having reduced stress |
| 08/07/2001 | US6271121 Applying hydrogen plasma; then hydrogen and tungsten fluoride |
| 08/07/2001 | US6271077 Thin film deposition method, capacitor device and method for fabricating the same, and semiconductor device and method for fabricating the same |
| 08/07/2001 | US6270862 Placing substrate on substrate holder in processing chamber, wherein an interior surface of a dielectric member forming a wall of process chamber faces substrate holder; supplying process gas into chamber; energizing to deposit film |
| 08/07/2001 | US6270859 Plasma treatment of titanium nitride formed by chemical vapor deposition |
| 08/07/2001 | US6270839 Device for feeding raw material for chemical vapor phase deposition and method therefor |
| 08/07/2001 | US6270618 Plasma processing apparatus |
| 08/07/2001 | US6270580 Modified material deposition sequence for reduced detect densities in semiconductor manufacturing |
| 08/07/2001 | US6270572 Method for manufacturing thin film using atomic layer deposition |
| 08/07/2001 | CA2113048C Fabrication process of sio2 electrets and to the electrets obtained |
| 08/02/2001 | WO2001056099A1 Electrode for lithium cell and lithium secondary cell |
| 08/02/2001 | WO2001055489A2 Protective and/or diffusion barrier layer |
| 08/02/2001 | WO2001055479A1 Apparatus and method for epitaxially processing a substrate |
| 08/02/2001 | WO2001055478A2 Method and device for depositing a precursor on a substrate, said precursor being present in liquid form |
| 08/02/2001 | WO2001054829A1 Coating method on the inner walls of the reaction tubes in a hydrocarbon pyrolysis reactor |
| 08/02/2001 | US20010010950 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system |
| 08/02/2001 | US20010010867 Solution containing metal alkoxides and organometallic compounds obtainable by hydrolyzing composite metal alkoxides with water alone or with catalyst |
| 08/02/2001 | US20010010841 Forming a covering layer of a material different to a substance of the sample surface, forming a protective layer by spraying and irridiating the vicinity of cross-section to be observed with ion beam so as to open hole for observation |
| 08/02/2001 | US20010010835 Mixing a substance liquid at the room temperature under the atmospheric pressure and a pressurized gas, and causing the resultant mixture to spout as a gas from a nozzle to generate a cluster which is a lumpy group of atoms or molecules |
| 08/02/2001 | US20010010309 System of controlling the temperature of a processing chamber |
| 08/02/2001 | US20010010257 Gas injection system for plasma processing |
| 08/02/2001 | US20010010256 Substrate support mechanism and substrate rotation device |
| 08/02/2001 | US20010010228 Method of protecting quartz hardware from etching during plasma-enhanced cleaning of a semiconductor processing chamber |
| 08/02/2001 | US20010010207 Plasma process apparatus |
| 08/02/2001 | US20010010204 Substrate transfer apparatus of substrate processing system |
| 08/02/2001 | US20010010112 Manufacturing method of semiconductor wafer, semiconductor manufacturing apparatus, and semiconductor device |
| 08/02/2001 | DE19955288A1 Verfahren zum Herstellen von dotiertem polykristallinem Silicium für piezoresistive Anordnungen A process for the manufacture of doped polycrystalline silicon piezoresistive arrangements for |
| 08/02/2001 | DE10005820C1 Gasversorungsvorrichtung für Precursoren geringen Dampfdrucks Gas Verso reasoning apparatus for precursors with a low vapor pressure |
| 08/02/2001 | DE10004274A1 Apparatus to coat the inner surface of a hollow body comprises a feed pipe for process gas and a waste gas line outside of the hollow body connected to a waste gas pipe |
| 08/02/2001 | DE10003758A1 Vorrichtung und Verfahren zum Abscheiden wenigstens eines in flüssiger oder gelöster Form vorliegenden Prekursors Device and method for separating at least one present in liquid or dissolved form precursor |
| 08/01/2001 | EP1120817A2 Corrosion-resistant member |
| 08/01/2001 | EP1120815A2 Free floating shield and semiconductor processing system |
| 08/01/2001 | EP1120814A2 Method and apparatus for cleaning a semiconductor wafer processing system |
| 08/01/2001 | EP1120480A2 Enhanced coating system for turbine airfoil applications |
| 08/01/2001 | EP1120475A1 A method and system for MOCVD of PGO films |
| 08/01/2001 | EP1120474A1 Method for plasma-enhanced chemical vapor deposition of a metal nitride layer |
| 08/01/2001 | EP0914486B1 Coating substrate |
| 08/01/2001 | CN1306301A Prodn tech of semiconductor device and its conductive structure |
| 08/01/2001 | CN1305880A Coated blade with nm crystal CVD coating having cutter edge tenacity increased and reducing friction |
| 08/01/2001 | CN1069112C Method for forming ferrioelectric thin film and appts. therefor |
| 07/31/2001 | US6269221 Liquid feed vaporization system and gas injection device |
| 07/31/2001 | US6268700 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
| 07/31/2001 | US6268631 Glass substrate assembly, semiconductor device and method of heat-treating glass substrate |
| 07/31/2001 | US6268297 Self-planarizing low-temperature doped-silicate-glass process capable of gap-filling narrow spaces |
| 07/31/2001 | US6268288 Plasma treated thermal CVD of TaN films from tantalum halide precursors |
| 07/31/2001 | US6268068 Multilayer thin film |
| 07/31/2001 | US6268067 Surfaced alloyed high temperature alloys |
| 07/31/2001 | US6268061 Crystal structure |
| 07/31/2001 | US6268045 Hard material coating of a cemented carbide or carbide containing cermet substrate |
| 07/31/2001 | US6267867 Coating a tungsten carbide base material substrate. |
| 07/31/2001 | US6267840 Low pressure stagnation flow reactor with a flow barrier |
| 07/31/2001 | US6267821 Substrate clamp design for minimizing substrate to clamp sticking during thermal processing of thermally flowable layers |
| 07/31/2001 | US6267820 Clog resistant injection valve |
| 07/31/2001 | US6267074 Plasma treatment systems |