| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/05/2001 | CN1311707A ESRF coolant degassing process |
| 09/05/2001 | CN1311531A Semiconductor storage having ruthenium pole, and its mfg. method |
| 09/05/2001 | CN1311284A Ultraviolet short wave broad zone luminescent InAlGaN, and its prepn. method, and ultraviolet luminescent means therewith |
| 09/05/2001 | CN1070540C Coated hard alloy blade member |
| 09/04/2001 | US6285048 Barium strontium titanate integrated circuit capacitors and process for making the same |
| 09/04/2001 | US6284677 Method of forming fluorosilicate glass (FSG) layers with moisture-resistant capability |
| 09/04/2001 | US6284674 Plasma processing device and a method of plasma process |
| 09/04/2001 | US6284673 Method for providing uniform gas delivery to substrates in CVD and PECVD processes |
| 09/04/2001 | US6284659 Method of minimizing defect sources inside high density plasma reactor |
| 09/04/2001 | US6284655 Integraed circuits |
| 09/04/2001 | US6284654 Chemical vapor deposition process for fabrication of hybrid electrodes |
| 09/04/2001 | US6284649 Chemical vapor phase growing method of a metal nitride film and a method of manufacturing an electronic device using the same |
| 09/04/2001 | US6284646 Methods of forming smooth conductive layers for integrated circuit devices |
| 09/04/2001 | US6284633 Method for forming a tensile plasma enhanced nitride capping layer over a gate electrode |
| 09/04/2001 | US6284583 Semiconductor device and method of manufacturing the same |
| 09/04/2001 | US6284556 Diamond surfaces |
| 09/04/2001 | US6284376 Ornamental article and process for producing the same |
| 09/04/2001 | US6284366 Cutting tool and method of making same |
| 09/04/2001 | US6284323 Thermal barrier coating systems and materials |
| 09/04/2001 | US6284316 Chemical vapor deposition of titanium |
| 09/04/2001 | US6284315 Placing surface of diamond on surface of metal selected from iron and steel; heating metal surface to form liquid metal carbide film at points of contact; maintaining surface of diamond in contact with liquid carbide film to polish |
| 09/04/2001 | US6284312 Using a quartz envelope on a base plate; vertically emplacing within envelope on base plate enclosed tubular silicon casing, heating, flowing carrier gas and silicon reactant material for chemical vapor deposition; removing |
| 09/04/2001 | US6284052 In-situ method of cleaning a metal-organic chemical vapor deposition chamber |
| 09/04/2001 | US6284051 Cooled window |
| 09/04/2001 | US6284050 UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition |
| 09/04/2001 | US6284049 Processing apparatus for fabricating LSI devices |
| 09/04/2001 | US6284042 Such as gallium, aluminum, indium, and boron which is one of iii-v compound semiconductor materials and applicable to light-emitting, cladding, or conductive layers of semiconductor light-emitting elements or devices |
| 09/04/2001 | US6283175 Enveloping device and vertical heat-treating apparatus for semiconductor process system |
| 09/04/2001 | US6283130 Plasma cleaning method and placement area protector used in the method |
| 09/04/2001 | US6283066 Continuous gas saturation system and method |
| 09/04/2001 | US6283060 Plasma CVD apparatus |
| 09/04/2001 | CA2175439C Surface alloyed high temperature alloys |
| 08/30/2001 | WO2001063639A1 E-beam/microwave gas jet pecvd method and apparatus for depositing and/or surface modification of thin film materials |
| 08/30/2001 | WO2001063637A2 Method for producing an addressable field-emission cathode and an associated display structure |
| 08/30/2001 | WO2001063358A1 Organic polymeric antireflective coatings deposited by chemical vapor deposition |
| 08/30/2001 | WO2001063025A1 Polycrystalline diamond thin film, photocathode and electron tube using it |
| 08/30/2001 | WO2001063004A1 Method for chemical vapor deposition of titanium films |
| 08/30/2001 | WO2001063003A1 Device and method for carrying out plasma enhanced surface treatment of substrates in a vacuum |
| 08/30/2001 | WO2001063002A1 Method for removing adsorbed molecules from a chamber |
| 08/30/2001 | WO2001062665A1 Carbon nanotube and method for producing the same, electron source and method for producing the same, and display |
| 08/30/2001 | WO2001062624A1 Plastic container for dry solid food |
| 08/30/2001 | WO2001062605A1 Plastic container for liquid containing volatile organic substance |
| 08/30/2001 | WO2001062202A1 Plastic container for liquid medicine |
| 08/30/2001 | WO2000047404A9 Chemical vapor deposition of tungsten nitride |
| 08/30/2001 | US20010018275 Method of using SACVD deposition and corresponding deposition reactor |
| 08/30/2001 | US20010018269 Method for PECVD deposition of selected material films |
| 08/30/2001 | US20010018268 Method for PECVD deposition of selected material films |
| 08/30/2001 | US20010018267 Single-substrate-heat-processing apparatus and method for performing reformation and crystallization |
| 08/30/2001 | US20010018254 Semiconductor device manufacturing method and semiconductor device manufacturing by the same method |
| 08/30/2001 | US20010018223 Passivation of ink jet print heads |
| 08/30/2001 | US20010018127 Diamond-like carbon coatings on inorganic phosphors |
| 08/30/2001 | US20010018097 Protective overcoating contact image detector |
| 08/30/2001 | US20010017524 Plasma processing system |
| 08/30/2001 | US20010017286 Low rate removal etch process in the manufacture of semiconductor integrated devices using a dielectric film deposition chamber |
| 08/30/2001 | US20010017205 Method of substrate temperature control and method of assessing substrate temperature controllability |
| 08/30/2001 | US20010017109 Enhanced plasma mode and system for plasma immersion ion implantation |
| 08/30/2001 | US20010017099 Method of manufacturing semiconductor substrate |
| 08/30/2001 | US20010017080 Apparatus for controlling polymerized teos build-up in vacuum pump lines |
| 08/30/2001 | CA2400157A1 Organic polymeric antireflective coatings deposited by chemical vapor deposition |
| 08/30/2001 | CA2399895A1 E-beam/microwave gas jet pecvd method and apparatus for depositing and/or surface modification of thin film materials |
| 08/29/2001 | EP1128446A2 InAIGaN emitting light in ultraviolet short-wavelenght region and process for preparing the same as well as ultraviolet light-emitting device using the same |
| 08/29/2001 | EP1128421A2 Method of fabricating an interlayer insulating film comprising Si, O, C and H for semiconductor devices |
| 08/29/2001 | EP1128420A2 Trenchfilling method of a semiconductor device |
| 08/29/2001 | EP1127961A1 Pyrolytic boron nitride double container and manufacture thereof |
| 08/29/2001 | EP1127959A1 Thermal barrier coating method and article |
| 08/29/2001 | EP1127957A1 A film forming apparatus having cleaning function |
| 08/29/2001 | EP1127956A2 Tantalum nitride CVD deposition by tantalum oxide densification |
| 08/29/2001 | EP1127955A1 Low resistivity silicon carbide |
| 08/29/2001 | EP1127366A1 Device for the plasma deposition of a polycrystalline diamond |
| 08/29/2001 | EP1127176A1 Device for producing and processing semiconductor substrates |
| 08/29/2001 | CN1310861A Semiconductor thin film and thin film device |
| 08/28/2001 | US6282368 Liquid feed vaporization system and gas injection device |
| 08/28/2001 | US6281511 Apparatus for forming materials |
| 08/28/2001 | US6281469 Capacitively coupled RF-plasma reactor |
| 08/28/2001 | US6281377 Reacting dichloromethane with copper oxide; adding 1-methyl-1-cyclohexene; stirring, adding diketone; heating;filtration |
| 08/28/2001 | US6281161 Platinum-containing materials and catalysts |
| 08/28/2001 | US6281147 Plasma CVD method |
| 08/28/2001 | US6281146 Plasma enhanced chemical vapor deposition (PECVD) method for forming microelectronic layer with enhanced film thickness uniformity |
| 08/28/2001 | US6281144 Exclusion of polymer film from semiconductor wafer edge and backside during film (CVD) deposition |
| 08/28/2001 | US6281138 System and method for forming a uniform thin gate oxide layer |
| 08/28/2001 | US6281125 From vaporized (diene)ru(co)3 |
| 08/28/2001 | US6281124 Methods and systems for forming metal-containing films on substrates |
| 08/28/2001 | US6281123 Generating a plasma adjacent the layer from a component gas, the component gas consisting essentially of n2 and/or ar; and utilizing the plasma to remove the carbon from the layer. |
| 08/28/2001 | US6281098 Process for Polycrystalline film silicon growth |
| 08/28/2001 | US6281072 Multiple step methods for forming conformal layers |
| 08/28/2001 | US6281066 Method of manufacturing a capacitor in a memory device |
| 08/28/2001 | US6281037 Method for the targeted production of N-type conductive areas in diamond layers by means of ion implantation |
| 08/28/2001 | US6281022 Multi-phase lead germanate film deposition method |
| 08/28/2001 | US6280895 Silicon or germanium with light receiver layers |
| 08/28/2001 | US6280834 Coated article of glass substrate with hydrophobic coating |
| 08/28/2001 | US6280821 Reusable mask and method for coating substrate |
| 08/28/2001 | US6280793 Electrostatic method and apparatus for vaporizing precursors and system for using same |
| 08/28/2001 | US6280792 Surface-treating process using support member having plate-like elements |
| 08/28/2001 | US6280790 Supporting a substrate, heating with radiation adding a purge fluid, reflection and purging |
| 08/28/2001 | US6280525 Apparatus for manufacturing silica film |
| 08/28/2001 | US6280518 Organic titanium compound suitable for MOCVD |
| 08/28/2001 | US6280183 Substrate support for a thermal processing chamber |
| 08/28/2001 | US6279506 Reactor for coating plane substrates and method for producing said substrates |
| 08/28/2001 | US6279505 Plastic containers with an external gas barrier coating |
| 08/28/2001 | US6279504 Plasma CVD system |