| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/13/2001 | US20010021414 Vapor deposition; prevent peeling of film; pretreatment by passivation |
| 09/13/2001 | US20010020712 Method of depositing silicon with high step coverage |
| 09/13/2001 | US20010020651 Gas injector and gas injection direction adjusting method |
| 09/13/2001 | US20010020608 Plasma film forming method and plasma film forming apparatus |
| 09/13/2001 | US20010020478 Supplying a cleaning gas that has a substance directly complexing prescribed metal into a chamber, and exhausting the cleaning gas |
| 09/13/2001 | US20010020448 Method and apparatus for vaporizing liquid precursors and system for using same |
| 09/13/2001 | US20010020447 Sequential in-situ heating and deposition of halogen-doped silicon oxide |
| 09/13/2001 | US20010020439 Method and apparatus for controlling rise and fall of temperature in semiconductor substrates |
| 09/13/2001 | DE10109507A1 Halbleiterherstellungsverfahren und Halbleiterherstellungsgerät A semiconductor manufacturing method and semiconductor manufacturing apparatus |
| 09/13/2001 | DE10011276A1 Process employing indirect atmospheric plasmatron, surface-treats or coats thin metallic foil or polymer sheet |
| 09/13/2001 | DE10010831A1 Low pressure microwave plasma treatment method for plastic bottles involves filling bottles with process gas and subjecting to microwaves from a plasma in a vacuum chamber |
| 09/13/2001 | DE10010286A1 Verfahren zum Auffüllen von Vertiefungen in einer Oberfläche einer Halbleiterstruktur und eine auf diese Weise aufgefüllte Halbleiterstruktur A method for filling recesses in a surface of a semiconductor structure and a padded in this way semiconductor structure |
| 09/13/2001 | DE10009530A1 Process for the isothermal and isobaric chemical gas infiltration or refractory materials into a porous structure comprises sealing a part of the surface of a porous structure |
| 09/13/2001 | CA2400674A1 Radiation-transmissive films on glass articles |
| 09/12/2001 | EP1132953A1 Process and apparatus for cleaning a silicon surface |
| 09/12/2001 | EP1132950A1 Wafer support of semiconductor manufacturing system |
| 09/12/2001 | EP1132663A2 Piston ring with wear resistant layer and wear resistant layer for piston ring |
| 09/12/2001 | EP1132504A1 Thin film depositing process and device, ftir gas analyzer used in the thin film depositing process, and mixed gas supplying device used in the thin film depositing process |
| 09/12/2001 | EP1132496A1 Method and apparatus for cleaning a vacuum line in a CVD system |
| 09/12/2001 | EP1132495A1 Plasma-inert cover and plasma cleaning process and apparatus employing same |
| 09/12/2001 | EP1132494A2 Deposition and annealing of multicomponent ZrSnTi and HfSnTi oxide thin films using solventless liquid mixture of precursors |
| 09/12/2001 | EP1132198A1 Gas barrier film having polypropylene as a base film and method of manufacturing the same |
| 09/12/2001 | EP1132195A2 Surface treatment or coating of strips using an atmospheric, non-transferred arc plasmatron |
| 09/12/2001 | EP1131846A1 Cvd nanoporous silica low dielectric constant films |
| 09/12/2001 | EP1131838A1 Self-oriented bundles of carbon nanotubes and method of making same |
| 09/12/2001 | EP1131475A1 Nickel carbonyl vapour deposition apparatus and process |
| 09/12/2001 | EP1032722A4 Low pressure vapor phase deposition of organic thin films |
| 09/12/2001 | EP0873432B1 Cvd-coated titanium based carbonitride cutting tool insert |
| 09/12/2001 | EP0778902B1 Jet plasma deposition process and apparatus |
| 09/12/2001 | EP0751844B1 Diamond-coated body with integral chip former |
| 09/12/2001 | EP0680384B1 Microwave energized process for the preparation of high quality semiconductor material |
| 09/12/2001 | CN1312585A Semiconductor making method and semiconductor making apparatus |
| 09/11/2001 | US6288493 Antenna device for generating inductively coupled plasma |
| 09/11/2001 | US6288449 Integrated circuit device with aspect ratio of up to about 15:1 and a metal stack within made of layers of tantalum, tantalum nitride, titanium nitride and copper; at least one of the layers is formed by chemical vapor deposition |
| 09/11/2001 | US6288325 A single or dual layer front contact is positioned on a substrate with at least one amorphous silicon containing thin film semiconductor is deposited on it; stability, quality, durability, and performance |
| 09/11/2001 | US6287990 CVD plasma assisted low dielectric constant films |
| 09/11/2001 | US6287981 Electrode for generating a plasma and a plasma processing apparatus using the same |
| 09/11/2001 | US6287965 Method of forming metal layer using atomic layer deposition and semiconductor device having the metal layer as barrier metal layer or upper or lower electrode of capacitor |
| 09/11/2001 | US6287963 Method for forming a metal contact |
| 09/11/2001 | US6287943 Deposition of semiconductor layer by plasma process |
| 09/11/2001 | US6287910 Method for forming a capacitor using tantalum nitride as a capacitor dielectric |
| 09/11/2001 | US6287889 Diamond thin film or the like, method for forming and modifying the thin film, and method for processing the thin film |
| 09/11/2001 | US6287699 Mask for the selective growth of a solid |
| 09/11/2001 | US6287682 Diamond coated tools and process for making |
| 09/11/2001 | US6287643 Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor |
| 09/11/2001 | US6287642 Vapor deposition using gas plasma and laser; forming protective coating |
| 09/11/2001 | US6287635 High rate silicon deposition method at low pressures |
| 09/11/2001 | US6287430 Apparatus and method forming thin film |
| 09/11/2001 | US6287413 Apparatus for processing both sides of a microelectronic device precursor |
| 09/11/2001 | US6286454 Plasma process device |
| 09/11/2001 | US6286451 Dome: shape and temperature controlled surfaces |
| 09/11/2001 | US6286230 Method of controlling gas flow in a substrate processing system |
| 09/08/2001 | CA2339673A1 Method of surface treating or coating of materials |
| 09/07/2001 | WO2001065895A2 Electrically controlled plasma uniformity in a high density plasma source |
| 09/07/2001 | WO2001064594A1 MATERIAL FOR SiON-OPTICAL WAVEGUIDES AND METHOD FOR FABRICATING SUCH WAVEGUIDES |
| 09/07/2001 | WO2001012433A3 Nanostructure coatings |
| 09/07/2001 | CA2397845A1 Material for sion-optical waveguides and method for fabricating such waveguides |
| 09/06/2001 | US20010019903 Inductively coupled plasma CVD |
| 09/06/2001 | US20010019900 Semiconductor manufacturing method and semiconductor manufacturing apparatus |
| 09/06/2001 | US20010019896 Chemical vapor deposition apparatus for manufacturing semiconductor devices, its driving method and method of optimizing recipe of cleaning process for process chamber |
| 09/06/2001 | US20010019891 Method of forming copper interconnections and thin films using chemical vapor deposition with catalyst |
| 09/06/2001 | US20010019889 Method for PECVD deposition of selected material films |
| 09/06/2001 | US20010019847 Method of forming thin copper film |
| 09/06/2001 | US20010019752 Pressure gradient CVI/CVD apparatus, process and product |
| 09/06/2001 | US20010019750 Vapor deposition; molecular beam epitaxial |
| 09/06/2001 | US20010019747 Plasma enhanced chemical deposition with low vapor pressure compounds |
| 09/06/2001 | US20010019746 In vacuum; glow discharges |
| 09/06/2001 | US20010019744 Process for plating metal coatings |
| 09/06/2001 | US20010019741 Vacuum enclosure; reduced peeling |
| 09/06/2001 | US20010019737 Method for protecting refractory metal thin film requiring high temperature processing in an oxidizing atmosphere and structure formed thereby |
| 09/06/2001 | US20010019238 Self-oriented bundles of carbon nanotubes and method of making same |
| 09/06/2001 | US20010019237 Plasma processing apparatus |
| 09/06/2001 | US20010019158 Semiconductor device having gate insulating film of silicon oxide and silicon nitride films |
| 09/06/2001 | US20010019037 Three dimensionally periodic structural assemblies on nanometer and longer scales |
| 09/06/2001 | US20010019016 For use in semiconductor fabrication; recessing the coil reduces deposition of material onto the coil, reducing particulate matter shed by the coil onto the workpiece |
| 09/06/2001 | US20010018951 Plasma processing apparatus and plasma processing method |
| 09/06/2001 | US20010018949 Method of producing semiconductor thin film and method of producing solar cell using same |
| 09/06/2001 | US20010018894 Vertical low-pressure chemical vapor deposition furnace |
| 09/06/2001 | DE10108344A1 Component used in the production of machine parts, cutting tools and molds comprises a substrate, an intermediate layer made from a group IVa, Va, VIa, IIIb or IVb element |
| 09/06/2001 | DE10010642A1 Coating machine for simultaneously coating the inner surfaces of several bottles has a matrix of product holding positions facing a dividing wall with a similar matrix of holes and microwave units |
| 09/06/2001 | DE10008829A1 Verfahren zum Entfernen von adsorbierten Molekülen aus einer Kammer A method for removing adsorbed molecules from a chamber |
| 09/06/2001 | DE10000663A1 Process for forming a layer on a substrate comprises coupling electromagnetic radiation energy with microwave frequency to form a plasma and electromagnetic energy of lower frequency, and removing reaction products |
| 09/06/2001 | CA2338876A1 Titanium nitrate coating |
| 09/05/2001 | EP1130948A1 Inner-electrode plasma processing apparatus and method of plasma processing |
| 09/05/2001 | EP1130655A2 Method of forming metal electrodes |
| 09/05/2001 | EP1130633A1 A method of depositing silicon oxynitride polimer layers |
| 09/05/2001 | EP1130628A1 Semiconductor device and method for manufacturing the same |
| 09/05/2001 | EP1130135A1 Silicon carbide film and method for manufacturing the same |
| 09/05/2001 | EP1130130A1 Method and reactor for SACVD deposition |
| 09/05/2001 | EP1129990A1 Process for controlled growth of carbon nanotubes |
| 09/05/2001 | EP1129763A1 Abatement of semiconductor processing gases |
| 09/05/2001 | EP1129466A1 Device and method for generating a local plasma by micro-structure electrode discharges with microwaves |
| 09/05/2001 | EP1129235A1 Internally heated exhaust unit |
| 09/05/2001 | EP1129234A1 Dual channel gas distribution plate |
| 09/05/2001 | EP1129233A1 Method for diamond-coating surfaces |
| 09/05/2001 | EP0862543B1 Cutting tool, process for coating a cutting tool, and use thereof |
| 09/05/2001 | EP0785868B1 Glass coating method and glass coated thereby |
| 09/05/2001 | EP0562035B2 Minimization of particle generation in cvd reactors and methods |
| 09/05/2001 | CN1311897A Misted precursor deposition apparatus and method with improved mist and mist flow |
| 09/05/2001 | CN1311764A Process for coating glass |