| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 10/04/2001 | WO2001073868A2 Device enclosures and devices with integrated battery |
| 10/04/2001 | WO2001073866A2 Method and apparatus for integrated-battery devices |
| 10/04/2001 | WO2001073865A2 Continuous processing of thin-film batteries and like devices |
| 10/04/2001 | WO2001073864A2 Thin-film battery having ultra-thin electrolyte and associated method |
| 10/04/2001 | WO2001073837A1 Method for depositing a doped silicon oxide |
| 10/04/2001 | WO2001073835A1 Method and arrangement for depositing a dielectric layer |
| 10/04/2001 | WO2001073822A2 Visibly marked parts and method for using same |
| 10/04/2001 | WO2001073820A2 Flow control of process gas in semiconductor manufacturing |
| 10/04/2001 | WO2001073161A1 Method for producing ceramic and apparatus for producing the same, semiconductor device, and piezoelectric device |
| 10/04/2001 | WO2001073160A1 Method for preparing zinc oxide semi-conductor material |
| 10/04/2001 | WO2001073159A1 Method for forming metallic film and apparatus for forming the same |
| 10/04/2001 | WO2001073158A1 Method for producing a polycrystalline diamond element and element produced according to said method |
| 10/04/2001 | WO2001073157A2 Method and apparatus for reducing contamination in a loadlock |
| 10/04/2001 | WO2001073146A2 Cemented carbide tool and method of making |
| 10/04/2001 | WO2001072618A1 Method and apparatus for processing semiconductor wafers |
| 10/04/2001 | WO2001072377A2 Treatment of hazardous gases in effluent |
| 10/04/2001 | WO2001024227A3 IMPROVED PECVD AND CVD PROCESSES FOR WNx DEPOSITION |
| 10/04/2001 | US20010027031 MOCVD method of tantalum oxide film |
| 10/04/2001 | US20010027030 Method for cleaning a process chamber |
| 10/04/2001 | US20010027026 Gas distribution apparatus for semiconductor processing |
| 10/04/2001 | US20010026963 Method and apparatus for manufacturing semiconductor devices |
| 10/04/2001 | US20010026849 Depositing a silicon oxide film by oxidation of silicon compound, exposing to water or a hydrophobic-imparting surfactant such as hexamethyldisilazane and curing |
| 10/04/2001 | US20010026749 Multi-position load lock chamber |
| 10/04/2001 | US20010026575 Plasma processing system |
| 10/04/2001 | US20010026482 Semiconductor memory device and electrode therefor |
| 10/04/2001 | US20010025989 Semiconductor device and method of manufacturing the same |
| 10/04/2001 | US20010025645 Injecting plasma forming gas; moving susceptor vertically in face of wafer while applying radio frequency electric power; controlling plasma position and density |
| 10/04/2001 | US20010025606 Plasma CVD apparatus and dry cleaning method of the same |
| 10/04/2001 | US20010025605 Air-tight vessel equipped with gas feeder uniformly supplying gaseous component around plural wafers |
| 10/04/2001 | US20010025604 Substrate processing apparatus |
| 10/04/2001 | US20010025601 Apparatus and method for forming a deposited film by means of plasma CVD |
| 10/04/2001 | US20010025600 Substrate processing apparatus and substrate processing method |
| 10/04/2001 | EP1139418A2 Reduced fluorine contamination for tungsten cvd |
| 10/04/2001 | EP1139403A1 Method for depositing a doped silicon oxide |
| 10/04/2001 | EP1139402A1 Method and arrangement for depositing a dielectric layer |
| 10/04/2001 | EP1139399A2 Film-forming surface reforming method and semiconductor device manufacturing method |
| 10/04/2001 | EP1139386A2 Monitoring an effluent from a chamber |
| 10/04/2001 | EP1138802A2 Fluorine process for cleaning semiconductor process chamber |
| 10/04/2001 | EP1138801A1 Method of forming thin film onto semiconductor substrate |
| 10/04/2001 | EP1138800A1 Coated cutting tool and method for producing the same |
| 10/04/2001 | EP1138717A1 Method for preparation of a polymer-metal cluster composite |
| 10/04/2001 | EP1138498A1 Passivation of ink jet print heads |
| 10/04/2001 | EP1138066A1 Plasma preclean with argon, helium, and hydrogen gases |
| 10/04/2001 | EP1138055A1 Semiconductor processing equipment having tiled ceramic liner |
| 10/04/2001 | CA2404294A1 Cemented carbide tool and method of making |
| 10/03/2001 | CN1316099A Method and apparatus for forming film on substrate |
| 10/03/2001 | CN1316021A ESRF chamber cooling system and process |
| 10/03/2001 | CN1315926A Creating silica soot with plug-free system |
| 10/03/2001 | CN1315591A Forming method of plating chrome on copper layer of printed circuit board |
| 10/03/2001 | CN1315588A Equipment for thermochemical vapour deposition and method for making carbon nm tube with this equipment |
| 10/03/2001 | CN1315587A Device and method for forming deposition film by plasma CVD method |
| 10/03/2001 | CN1072277C Carbon-coating method for quartz crucible or pipe |
| 10/02/2001 | US6297555 Semiconductor with titanium nitride barrier layer |
| 10/02/2001 | US6297539 Zicronium or hafnium oxide doped with calcium, strontium, aluminum, lanthanum, yttrium, or scandium |
| 10/02/2001 | US6297522 Highly uniform silicon carbide epitaxial layers |
| 10/02/2001 | US6297468 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
| 10/02/2001 | US6297175 Depositing silicate glass on substrates, plasma enhanced vapor deposition |
| 10/02/2001 | US6297165 Etching and cleaning methods |
| 10/02/2001 | US6297152 CVD process for DCS-based tungsten silicide |
| 10/02/2001 | US6297147 Plasma treatment for ex-situ contact fill |
| 10/02/2001 | US6297134 Deposition of titanium oxide film containing droping element on Si substrate |
| 10/02/2001 | US6297122 Forming a conductive film of alkaline earth ruo3, vapor deposition and beta diketone complexes of ruthenium |
| 10/02/2001 | US6296946 Plastic substrate and method of manufacturing the same, and ink jet printer head and method of manufacturing the same |
| 10/02/2001 | US6296910 Feeding material solution to outlet to provide stream of droplets of material solution; applying potential difference between outlet and substrate to electrostatically attract droplets from outlet towards substrate; heating to deposit |
| 10/02/2001 | US6296793 Composition for preparing water-repellent coatings on optical substrates |
| 10/02/2001 | US6296735 Plasma treatment apparatus and method for operation same |
| 10/02/2001 | US6296716 Process for cleaning ceramic articles |
| 10/02/2001 | US6296712 Chemical vapor deposition hardware and process |
| 10/02/2001 | US6296711 Film processing system |
| 10/02/2001 | US6296710 Multi-port gas injector for a vertical furnace used in semiconductor processing |
| 10/02/2001 | US6296026 Chemical delivery system having purge system utilizing multiple purge techniques |
| 10/02/2001 | US6296025 Chemical delivery system having purge system utilizing multiple purge techniques |
| 10/02/2001 | CA2082819C Materials for chemical vapor deposition processes |
| 09/27/2001 | WO2001071814A1 METHOD FOR PREPARING LOW-RESISTANT p-TYPE SrTiO¿3? |
| 09/27/2001 | WO2001071785A1 Method for producing semiconductor crystal |
| 09/27/2001 | WO2001071784A1 Method of manufacturing semiconductor and manufacturing apparatus |
| 09/27/2001 | WO2001071056A2 Nickel vapour deposition manufacture of aircraft engine parts |
| 09/27/2001 | WO2001070366A1 Deaerator and deaerating method |
| 09/27/2001 | WO2001070005A2 Method of forming a low temperature metal bond for use in the transfer of bulk and thin film materials |
| 09/27/2001 | WO2001029281A9 Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions |
| 09/27/2001 | WO2001025167A8 Process for cleaning ceramic articles |
| 09/27/2001 | US20010025205 Construction of a film on a semiconductor wafer |
| 09/27/2001 | US20010024874 Manufacture of a semiconductor device |
| 09/27/2001 | US20010024871 Semiconductor device and method and apparatus for manufacturing semiconductor device |
| 09/27/2001 | US20010024867 Semiconductor device and method of manufacturing the same |
| 09/27/2001 | US20010024835 Ferroelastic lead germanate thin film and deposition method |
| 09/27/2001 | US20010024737 For machine parts, cutting tools, molds |
| 09/27/2001 | US20010024679 Microelectronics |
| 09/27/2001 | US20010024633 Method of vertically aligning carbon nanotubes on substrates at low pressure and low pressure using thermal chemical vapor deposition with DC bias |
| 09/27/2001 | US20010024387 Conformal thin films over textured capacitor electrodes |
| 09/27/2001 | US20010023971 Film forming method and film forming apparatus as well as silicon-based film, photovoltaic device and solar cell, sensor and image pick-up device using the same |
| 09/27/2001 | US20010023744 Plasma treatment method and apparatus |
| 09/27/2001 | DE10056564A1 Plasma-activated surface treatment involves placing insulator between two electrodes with no shape-locking contact in defined surface areas |
| 09/27/2001 | DE10011917A1 Piston ring used in internal combustion engines has a wear-resistant layer made from titanium, boron and nitrogen in the region of the running surface |
| 09/26/2001 | EP1137053A2 Water cooled support for lamps and rapid thermal processing chamber |
| 09/26/2001 | EP1137042A2 Plasma processing chamber |
| 09/26/2001 | EP1136593A1 A method for renewing diffusion coatings on superalloy substrates |
| 09/26/2001 | EP1136590A2 Apparatus and method for controlling the temperature of a wall of a reaction chamber |
| 09/26/2001 | EP1136589A1 CVD apparatus having movable gas inlet |
| 09/26/2001 | EP1136588A2 MOCVD method of tantalum oxide film |