| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/03/2002 | US20020000201 Plasma chemical vapor deposition apparatus |
| 01/03/2002 | US20020000200 Chemical vapor deposition apparatus |
| 01/03/2002 | US20020000199 Film forming apparatus and method for producing tungsten nitride film |
| 01/03/2002 | US20020000198 The dome: shape and temperature controlled surfaces |
| 01/03/2002 | US20020000197 Vacuum processing apparatus and multi-chamber vacuum processing apparatus |
| 01/03/2002 | US20020000196 Reactor for depositing thin film on wafer |
| 01/03/2002 | US20020000195 Concentration profile on demand gas delivery system (individual divert delivery system) |
| 01/03/2002 | US20020000175 New complex of an element of transition group IV or V for forming an improved precursor combination |
| 01/03/2002 | US20020000034 Continuous processing of thin-film batteries and like devices |
| 01/03/2002 | DE10029905A1 Reflektor, insbesondere zur Anwendung bei einem Kraftfahrzeug Reflector, in particular for use in a motor vehicle |
| 01/03/2002 | DE10024573C1 Apparatus for coating substrates in a plasma CVD coating process has metallic electrically conducting elements with a predetermined electrical potential arranged in the dark chamber between the substrate and the plasma |
| 01/02/2002 | EP1168427A1 Method of plasma depositing silicon nitride |
| 01/02/2002 | EP1168426A2 Method of plasma depositing a low dielectric constant insulating film |
| 01/02/2002 | EP1168420A2 Nozzle plate member for supplying fluids in dispersed manner and manufacturing method of the same |
| 01/02/2002 | EP1168415A2 Power supply antenna and power supply method |
| 01/02/2002 | EP1167573A1 Substrate support for a semiconductor processing chamber |
| 01/02/2002 | EP1167572A2 Lid assembly for a semiconductor processing chamber |
| 01/02/2002 | EP1167571A2 Showerhead for semiconductor processing chamber |
| 01/02/2002 | EP1167570A1 Reactor for depositing thin film |
| 01/02/2002 | EP1167569A1 Apparatus and method for depositing thin film on wafer using atomic layer deposition |
| 01/02/2002 | EP1167568A1 Heat treatment apparatus and cleaning method of the same |
| 01/02/2002 | EP1167567A1 Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer |
| 01/02/2002 | EP1167485A1 CVD titanium-boron or chromium-boron coating of diamond |
| 01/02/2002 | EP1167291A1 Hexagonal boron nitride film with low dielectric constant, layer dielectric film and method of production thereof, and plasma CVD apparatus |
| 01/02/2002 | EP1166900A2 Multiple contents container assembly for ultrapure solvent purging |
| 01/02/2002 | EP1166324A2 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 01/02/2002 | EP1166323A1 Method and apparatus for compensating non-uniform wafer processing in plasma processing |
| 01/02/2002 | EP1166180A1 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system |
| 01/02/2002 | EP1165860A1 Diamond-coated tool and process for producing thereof |
| 01/02/2002 | EP1165856A1 Method of making a multilayer article by arc plasma deposition |
| 01/02/2002 | EP1165855A1 Method for treating polymer surface |
| 01/02/2002 | EP1028798B1 Gas purification system with safety device and method for purifying gases |
| 01/02/2002 | EP0963455B1 A coating comprising layers of diamond like carbon and diamond like nanocomposite compositions |
| 01/02/2002 | EP0958195B1 Method for coating surfaces using an installation with sputter electrodes |
| 01/02/2002 | EP0954620A4 Vapor deposition components and corresponding methods |
| 01/02/2002 | CN1328888A Direct quick precision metal type forming method based on liquid thermochemical reaction |
| 01/01/2002 | US6335288 Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD |
| 01/01/2002 | US6335281 Deposited film forming process |
| 01/01/2002 | US6335277 Method for forming metal nitride film |
| 01/01/2002 | US6335268 Plasma immersion ion processor for fabricating semiconductor integrated circuits |
| 01/01/2002 | US6335263 Method of forming a low temperature metal bond for use in the transfer of bulk and thin film materials |
| 01/01/2002 | US6335261 Directional CVD process with optimized etchback |
| 01/01/2002 | US6335232 Method of manufacturing a thin film transistor |
| 01/01/2002 | US6335105 For forming part for a gas turbine engine, heat resistance |
| 01/01/2002 | US6335054 Air lock for introducing substrates to and/or removing them from a treatment chamber |
| 01/01/2002 | US6335049 Chemical vapor deposition methods of forming a high K dielectric layer and methods of forming a capacitor |
| 01/01/2002 | US6334983 Processing system |
| 01/01/2002 | US6334928 Semiconductor processing system and method of using the same |
| 01/01/2002 | US6334907 Method of controlling thickness and aluminum content of a diffusion aluminide coating |
| 01/01/2002 | US6334404 Method and apparatus for reducing particle contamination on wafers |
| 01/01/2002 | US6334249 Cavity-filling method for reducing surface topography and roughness |
| 01/01/2002 | CA2134290C Process for depositing a thin layer on the surface of a plastic material substrate |
| 12/31/2001 | WO2001094291A1 Self-reducible copper(ii) source reagents for chemical vapor deposition of copper metal |
| 12/31/2001 | CA2419837A1 Self-reducible copper(ii) source reagents for chemical vapor deposition of copper metal |
| 12/27/2001 | WO2001099171A1 Gas supply device and treating device |
| 12/27/2001 | WO2001099166A1 Thin film forming method |
| 12/27/2001 | WO2001099165A1 Method for forming thin film and apparatus for forming thin film |
| 12/27/2001 | WO2001099145A1 A method for fault identification in a plasma process |
| 12/27/2001 | WO2001098556A2 Temperature controlled gas feedthrough |
| 12/27/2001 | WO2001098555A1 Method and device for cleaning a pvd or cvd reactor and waste-gas lines of the same |
| 12/27/2001 | US20010055889 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers |
| 12/27/2001 | US20010055888 Semiconductor vacuum deposition system and method having a reel-to-reel substrate cassette |
| 12/27/2001 | US20010055877 Methods, complexes, and systems for forming metal-containing films on semiconductor structures |
| 12/27/2001 | US20010055875 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 12/27/2001 | US20010055869 Oxidation using organometallic compound as catalyst |
| 12/27/2001 | US20010055824 Oxidation rate of the thermal oxidation is reduced and the growth of the oxide layer on the silicon surface is inhibited. The thickness of the oxide layer is thus used as a measure for the nitrogen content. |
| 12/27/2001 | US20010055821 Vapor deposition |
| 12/27/2001 | US20010055775 Generating preferential layouts; mix particles, allow particle to form layout, recover layout |
| 12/27/2001 | US20010055738 Heat treatment apparatus and cleaning method of the same |
| 12/27/2001 | US20010055672 Low dielectric constant materials and processes |
| 12/27/2001 | US20010055669 Magnetoresistive cobalt oxide mixture |
| 12/27/2001 | US20010055654 Method and apparatus for the deposition of metal nanoclusters and films on a substrate |
| 12/27/2001 | US20010055650 Apparatus and method for selectively coating internal and external surfaces of an airfoil |
| 12/27/2001 | US20010055649 Coating, modification and etching of substrate surface with particle beam irradiation of the same |
| 12/27/2001 | US20010054769 Protective layers prior to alternating layer deposition |
| 12/27/2001 | US20010054765 Semiconductor device and method and apparatus for manufacturing the same |
| 12/27/2001 | US20010054749 Method for filling depressions in a surface of a semiconductor structure, and a semiconductor structure filled in this way |
| 12/27/2001 | US20010054601 Etchant and polymer precursor species contain fluorine (especially CHF3 AND CH2F2), and the chamber ceiling semiconductor material includes a fluorine scavenger precursor material |
| 12/27/2001 | US20010054484 Plasma processor, cluster tool, and method of controlling plasma |
| 12/27/2001 | US20010054483 Thermal control apparatus for inductively coupled rf plasma reactor having an overhead solenoidal antenna |
| 12/27/2001 | US20010054430 Method of cleaning a film deposition apparatus, method of dry etching a film deposition apparatus, and an article production method including a process based on the cleaning or dry etching method |
| 12/27/2001 | US20010054391 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes |
| 12/27/2001 | US20010054390 Wafer support system |
| 12/27/2001 | US20010054389 Electro-static chucking mechanism and surface processing apparatus |
| 12/27/2001 | US20010054388 Single-substrate-film-forming method and single-substrate-heat-processing apparatus |
| 12/27/2001 | US20010054386 Oxidation processing unit |
| 12/27/2001 | US20010054385 Single-substrate-processing apparatus for semiconductor process |
| 12/27/2001 | US20010054382 Chemical vapor deposition system |
| 12/27/2001 | US20010054381 High temperature chemical vapor deposition chamber |
| 12/27/2001 | US20010054379 Film or coating deposition on a substrate |
| 12/27/2001 | US20010054377 Method of growing a thin film onto a substrate |
| 12/26/2001 | CN1328562A Complex compound of element of sub-group IV |
| 12/26/2001 | CN1328344A Substrate of silicon structure on insulating layer using alumina as buried layer and its preparing process |
| 12/26/2001 | CN1328172A Non-crystalline hard carbon film, mechanical part and method for producing non-crystalline hard carbon film |
| 12/26/2001 | CN1076864C Laser process |
| 12/25/2001 | US6333601 Planar gas introducing unit of a CCP reactor |
| 12/25/2001 | US6333269 Plasma treatment system and method |
| 12/25/2001 | US6333266 Manufacturing process for a semiconductor device |
| 12/25/2001 | US6333246 Semiconductor device manufacturing method using electrostatic chuck and semiconductor device manufacturing system |
| 12/25/2001 | US6333130 Method and apparatus for correcting defects in photomask |