| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/21/2002 | WO2002014569A2 Chromium-containing cemented tungsten carbide body |
| 02/21/2002 | WO2002014568A2 Chromium-containing cemented carbide body having a surface zone of binder enrichment |
| 02/21/2002 | WO2001086034A3 Modified susceptor for use in chemical vapor deposition process |
| 02/21/2002 | WO2001080291B1 Methods and apparatus for thermally processing wafers |
| 02/21/2002 | WO2001073146A3 Cemented carbide tool and method of making |
| 02/21/2002 | WO2001068271A8 Controlling surface chemistry on solid substrates |
| 02/21/2002 | WO2000066506A9 Highly tetrahedral amorphous carbon coating on glass |
| 02/21/2002 | US20020022365 Method and apparatus for wiring, wire, and integrated circuit |
| 02/21/2002 | US20020022349 Semiconductor thin-film formation process, and amorphous silicon solar-cell device |
| 02/21/2002 | US20020022347 Doping source gas, etching gas, and reducing gas to produce smooth uniform layer of silicon/germanium over semiconductor substrate |
| 02/21/2002 | US20020022283 Apparatus for conditioning the atmosphere in a chamber |
| 02/21/2002 | US20020022278 Capacitor utilizing C-axis oriented lead germanate film |
| 02/21/2002 | US20020022210 Wafer treatment chamber having thermal reflector |
| 02/21/2002 | US20020022139 Applying radio frequency; durability; waterproofing; ink repellents |
| 02/21/2002 | US20020022137 Plastic overcoated with iridium film |
| 02/21/2002 | US20020022129 Friction resistance; wear resistance; mixture of hydrocarbon and metal oxide |
| 02/21/2002 | US20020022089 Method of forming a MOCVD-TiN thin film |
| 02/21/2002 | US20020022088 Purified silicon production system |
| 02/21/2002 | US20020022087 Mixing organometallic compound gases |
| 02/21/2002 | US20020021545 Electrostatic chucking device and manufacturing method thereof |
| 02/21/2002 | US20020021542 Lock for vacuum chamber |
| 02/21/2002 | US20020020869 Semiconductor device incorporated therein high K capacitor dielectric and method for the manufacture thereof |
| 02/21/2002 | US20020020767 Showerhead and liquid raw material supply apparatus using the same |
| 02/21/2002 | US20020020499 Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
| 02/21/2002 | US20020020498 Plasma processing apparatus and plasma processing method |
| 02/21/2002 | US20020020496 Substrate treatment apparatus |
| 02/21/2002 | US20020020429 Systems and methods for remote plasma clean |
| 02/21/2002 | US20020020358 Method and apparatus for improving film deposition uniformity on a substrate |
| 02/21/2002 | US20020020353 Gas panel |
| 02/21/2002 | US20020020344 Semiconductor manufacturing method, substrate processing method, and semiconductor manufacturing apparatus |
| 02/21/2002 | US20020020298 Supported metal membrane, a process for its preparation and use |
| 02/21/2002 | US20020020189 Temperature adjustment apparatus |
| 02/21/2002 | DE10063717C1 Chemical vapor deposition of thin film e.g. dielectric material, metal (alloy) or metal nitride or silicide on semiconductor, especially for filling deep trench capacitors and contact holes, is carried out in presence of nitroxyl radical |
| 02/20/2002 | EP1180793A2 Electrostatic chuck and manufacturing method thereof |
| 02/20/2002 | EP1180791A1 Method for forming a nitride layer on a semiconductor substrate |
| 02/20/2002 | EP1180785A2 Means for directing a flow of gas in a substrate processing chamber |
| 02/20/2002 | EP1180554A2 Method of depositing organosilicate layers |
| 02/20/2002 | EP1180553A1 CVD process for depositing copper on a barrier layer |
| 02/20/2002 | EP1180429A2 Lens plasma coating system |
| 02/20/2002 | EP1180392A1 Supported metal membrane, method for the production and the use thereof |
| 02/20/2002 | EP1099007B1 Susceptor for barrel reactor |
| 02/20/2002 | EP1076732B1 Injector for reactor |
| 02/20/2002 | EP1017874B1 Colorless diamond-like carbon coatings |
| 02/20/2002 | CN1079577C Vertical rack used for semiconductor round chip |
| 02/19/2002 | US6348725 Plasma processes for depositing low dielectric constant films |
| 02/19/2002 | US6348705 Low temperature process for high density thin film integrated capacitors and amorphously frustrated ferroelectric materials therefor |
| 02/19/2002 | US6348421 Dielectric gap fill process that effectively reduces capacitance between narrow metal lines using HDP-CVD |
| 02/19/2002 | US6348420 Situ dielectric stacks |
| 02/19/2002 | US6348412 Organometallic compound mixtures in chemical vapor deposition |
| 02/19/2002 | US6348376 Method of forming metal nitride film by chemical vapor deposition and method of forming metal contact and capacitor of semiconductor device using the same |
| 02/19/2002 | US6348238 Thin film fabrication method and thin film fabrication apparatus |
| 02/19/2002 | US6348237 Jet plasma process for deposition of coatings |
| 02/19/2002 | US6348099 Methods and apparatus for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions |
| 02/19/2002 | US6348096 Method for manufacturing group III-V compound semiconductors |
| 02/19/2002 | US6347918 Inflatable slit/gate valve |
| 02/19/2002 | US6347749 Semiconductor processing reactor controllable gas jet assembly |
| 02/19/2002 | US6347636 Methods and apparatus for gettering fluorine from chamber material surfaces |
| 02/19/2002 | US6347602 Plasma processing apparatus |
| 02/19/2002 | US6347601 Film forming apparatus |
| 02/19/2002 | CA2198453C Metalorganic compounds |
| 02/19/2002 | CA2076029C Method of depositing a silicon oxide film bonded to a polymer substrate |
| 02/14/2002 | WO2002013275A1 Electronic component and method for producing an electronic component |
| 02/14/2002 | WO2002013251A1 Vapor phase deposition method for metal oxide dielectric film |
| 02/14/2002 | WO2002013249A1 Radial antenna and plasma processing apparatus comprising the same |
| 02/14/2002 | WO2002013246A1 Process for growing a magnesium oxide film on a silicon (100) substrate coated with a cubic silicon carbide buffer layer |
| 02/14/2002 | WO2002013239A2 Heater for jmf type wafers |
| 02/14/2002 | WO2002012972A2 Direct temperature control for a component of a substrate processing chamber |
| 02/14/2002 | WO2002012589A2 Barrier layer structure for copper metallization and method of forming the structure |
| 02/14/2002 | WO2002012588A1 Gas collector for epitaxial reactor |
| 02/14/2002 | WO2002012587A2 Processing apparatus and cleaning method |
| 02/14/2002 | WO2002012585A2 Processing apparatus and cleaning method |
| 02/14/2002 | WO2002011980A1 Electronic and optical materials |
| 02/14/2002 | WO2002011912A1 Method and device for preventing solid product from adhering to inner surface of exhaust gas pipe and exhaust gas treatment device with the device |
| 02/14/2002 | WO2001073820A3 Flow control of process gas in semiconductor manufacturing |
| 02/14/2002 | WO2001066832A3 Graded thin films |
| 02/14/2002 | WO2001061068A3 Tumble coater |
| 02/14/2002 | WO2001055489A3 Protective and/or diffusion barrier layer |
| 02/14/2002 | US20020019149 Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process |
| 02/14/2002 | US20020019147 Plasma CVD method |
| 02/14/2002 | US20020019144 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 02/14/2002 | US20020019131 Manufacture of semiconductor device with copper wiring |
| 02/14/2002 | US20020019116 To deposit a multi-component layer on a semiconductor substrate; for example a dielectric layer from a gaseous titanium organometallic precursor, reactive silane-based gas and gaseous oxidant |
| 02/14/2002 | US20020019093 Barium strontium titanate, (Sr,Ba)TiO3 (BST) by supplying BST sources into a chamber; and inducing textured growth of the film over the substrate in a uniform desired crystal orientation; metal-organic chemical vapor deposition (MOCVD) |
| 02/14/2002 | US20020018921 Multilayer coating |
| 02/14/2002 | US20020018904 Ferroelectric |
| 02/14/2002 | US20020018862 Method of annealing large area glass substrates |
| 02/14/2002 | US20020018849 Vapor deposition using basic catalyst |
| 02/14/2002 | US20020018737 Removal waste gases from semiconductors by scrubbing, oxidation |
| 02/14/2002 | US20020018025 Power supply antenna and power supply method |
| 02/14/2002 | US20020017724 Chemical vapor deposition of titanium |
| 02/14/2002 | US20020017694 Electrostatic attraction mechanism, surface processing method and surface processing device |
| 02/14/2002 | US20020017377 Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus |
| 02/14/2002 | US20020017363 Substrate processing apparatus and substrate processing method |
| 02/14/2002 | US20020017246 Gas phase growth system, method of operating the system, and vaporizer for the system |
| 02/14/2002 | US20020017244 Gas collector for epitaxial reactor |
| 02/14/2002 | US20020017243 Showerhead in chemical-enhanced chemical vapor deposition equipment |
| 02/14/2002 | US20020017242 Inner tube for CVD apparatus |
| 02/14/2002 | US20020017241 Semiconductor-manufacturing device |
| 02/14/2002 | DE10039327A1 Elektronisches Bauelement und Herstellungsverfahren für elektronisches Bauelement Electronic device and manufacturing method of electronic component |
| 02/13/2002 | EP1179859A2 Method of heat-treating nitride compound semiconductor layer and method of producing semiconductor device |