| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/09/2002 | US6368658 Coating medical devices using air suspension |
| 04/09/2002 | US6368567 Point-of-use exhaust by-product reactor |
| 04/09/2002 | US6368452 Plasma treatment apparatus and method of semiconductor processing |
| 04/09/2002 | US6368450 Processing apparatus |
| 04/09/2002 | US6368410 Semiconductor processing article |
| 04/09/2002 | US6368405 Apparatus for growing single crystal silicon and method for forming single crystal silicon layer using the same |
| 04/09/2002 | US6368404 Induction heated chemical vapor deposition reactor |
| 04/09/2002 | US6368398 Method of depositing films by using carboxylate complexes |
| 04/09/2002 | US6368051 Multi-position load lock chamber |
| 04/09/2002 | US6367415 View port of a chemical vapor deposition device for manufacturing semiconductor devices |
| 04/09/2002 | US6367412 Porous ceramic liner for a plasma source |
| 04/09/2002 | US6367411 Plasma CVD apparatus |
| 04/09/2002 | CA2077205C Titanium carbonitride coated stratified substrate |
| 04/04/2002 | WO2002027772A1 Heat-treating apparatus and heat-treating method |
| 04/04/2002 | WO2002027771A1 Semiconductor industry-use silica glass jig and production method therefor |
| 04/04/2002 | WO2002027078A1 Method for depositing, in particular, crystalline layers, a gas inlet element, and device for carrying out said method |
| 04/04/2002 | WO2002027064A1 Method and device for depositing especially, organic layers by organic vapor phase deposition |
| 04/04/2002 | WO2002027063A2 Vapor deposition of oxides, silicates and phosphates |
| 04/04/2002 | WO2002027061A2 Process chamber lid |
| 04/04/2002 | WO2002027060A2 Process chamber lid service system |
| 04/04/2002 | WO2002027059A2 System and method for controlling movement of a workpiece in a thermal processing system |
| 04/04/2002 | WO2002026435A1 Apparatus and method for controlling temperature uniformity of substrates |
| 04/04/2002 | WO2002026401A1 Method for deposition of an internal coating in a plastic container |
| 04/04/2002 | WO2002001615A3 Crystal structure control of polycrystalline silicon in a single wafer chamber |
| 04/04/2002 | WO2001073157A3 Method and apparatus for reducing contamination in a loadlock |
| 04/04/2002 | US20020039835 Method of depositing a conformal hydrogen-rich silicon nitride layer onto a patterned structure |
| 04/04/2002 | US20020039832 Forming an amorphous silicon film where the silicon product and the flow rate of a gas mixture of hydrogen and silicon compound(s) are set to meet a given relation; large area, high conversion efficiency, increased film forming rate |
| 04/04/2002 | US20020039803 Method for CVD process control for enhancing device performance |
| 04/04/2002 | US20020039626 Formation of said plasma is performed by applying an RF power and a DC power, and said DC power is applied to an electrode carrying the deposition target object. |
| 04/04/2002 | US20020039625 Contoured plate or profiler is provided for modifying the distribution. |
| 04/04/2002 | US20020038870 Nitride-based semiconductor element and method of preparing nitride-based semiconductor |
| 04/04/2002 | US20020038791 Plasma processing method and apparatus |
| 04/04/2002 | US20020038692 Plasma Processing apparatus |
| 04/04/2002 | US20020038690 Electric arc spraying |
| 04/04/2002 | US20020038689 Reduced and atmospheric pressure process capable epitaxial chamber |
| 04/04/2002 | US20020038688 Plasma processing apparatus and system, performance validation system and inspection method therefor |
| 04/04/2002 | US20020038676 Refillable ampule and method re same |
| 04/04/2002 | US20020038669 Gas-line system for semiconductor-manufacturing apparatus |
| 04/04/2002 | US20020038665 Substrate treatment process |
| 04/04/2002 | US20020038632 Plasma treatment method and plasma treatment apparatus |
| 04/04/2002 | US20020038631 Plasma processing apparatus and method using active matching |
| 04/04/2002 | US20020038630 Apparatus and method for forming deposited film |
| 04/04/2002 | US20020038528 Inflatable slit/gate valve |
| 04/04/2002 | DE10134866A1 Horizontally growing carbon nanotubes for field effect transistors, involves synthesizing carbon nanotubes at exposed surfaces of catalyst pattern |
| 04/04/2002 | DE10045958A1 Unit introducing gas into and from plasma processing chamber has lines of identical flow resistance connecting between gas connection and chamber |
| 04/04/2002 | DE10043511A1 Kompositstruktur für elektronische Mikrosysteme sowie Verfahren zur Herstellung der Kompositstruktur The composite structure for electronic microsystems, and process for producing the composite structure |
| 04/03/2002 | EP1193331A2 Chemical vapor deposition apparatus and chemical vapor deposition method |
| 04/03/2002 | EP1193327A1 Silica glass apparatus for semiconductor industry and method for producing the same |
| 04/03/2002 | EP1193326A2 Apparatus for reducing particle residues in a semiconductor processing chamber |
| 04/03/2002 | EP1193325A1 Process and apparatus for forming semiconductor thin film |
| 04/03/2002 | EP1193324A2 A method of producing high aspect ratio domes by vapor deposition |
| 04/03/2002 | EP1192637A1 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers |
| 04/03/2002 | EP1192294A1 Chamber for chemical vapour deposition |
| 04/03/2002 | EP1192293A1 CVD OF INTEGRATED Ta AND TaNx FILMS FROM TANTALUM HALIDE PRECURSORS |
| 04/03/2002 | EP1192292A1 Plasma treatment of thermal cvd tan films from tantalum halide precursors |
| 04/03/2002 | EP1192291A1 Device for monitoring intended or unavoidable layer deposits and corresponding method |
| 04/03/2002 | EP1192050A1 Substrate treatment method |
| 04/03/2002 | EP1191834A1 Cold-plasma deposition treatment of seeds and other living matter |
| 04/03/2002 | EP1042529B1 Method for selectively depositing bismuth based ferroelectric films |
| 04/03/2002 | EP1029107B1 Method for applying a diamond layer on substrates made of sintered metallic carbide |
| 04/03/2002 | EP1009543A4 Application of diamond-like carbon coatings to cobalt-cemented tungsten carbide components |
| 04/03/2002 | EP0991792B1 Gas injection disc assembly for cvd applications |
| 04/03/2002 | EP0953067B1 A process and apparatus for depositing a carbon-rich coating on a moving substrate |
| 04/03/2002 | EP0888213A4 Diamond film deposition |
| 04/03/2002 | CN1343266A Truncated susceptor for vapor-phase deposition |
| 04/03/2002 | CN1082100C Industrial pulse or DC plasma and chemical gas phase deposition equipment for strengthening surface of tool or mould |
| 04/03/2002 | CN1082099C Process for selective growth of diamond film by nano crystal introduction |
| 04/02/2002 | US6366346 Method and apparatus for optical detection of effluent composition |
| 04/02/2002 | US6365921 Low-temperature buffer layer; underlying layer; and gan flattening layer containing a group iv element |
| 04/02/2002 | US6365528 Providing reactor having a semiconductor substrate mounted on a substrate support; formingfluorine and carbon-containing silicon oxide dielectric material by reacting together: oxidizer and silane compound |
| 04/02/2002 | US6365527 Method for depositing silicon carbide in semiconductor devices |
| 04/02/2002 | US6365519 Placing wafers into diffusion furnace, increasing temperature of wafers, introducing aluminum nitride precursor into diffusion furnace, forming layer of aluminum nitride |
| 04/02/2002 | US6365517 Simultaneously subjecting the semiconductor wafer to titanium chloride (ticl.sub.4), hydrogen and nitrogen; subjecting the semiconductor wafer to plasma to cause deposition of titanium nitride based film, reacting with silane |
| 04/02/2002 | US6365495 Method for performing metallo-organic chemical vapor deposition of titanium nitride at reduced temperature |
| 04/02/2002 | US6365460 Silicon carbide mass by chemical vapor deposition, and thermally treating the silicon carbide mass under vacuum or in an inert gas |
| 04/02/2002 | US6365237 Method of making non-planar micro-optical structures |
| 04/02/2002 | US6365235 Streams of active particles are created, these being directed onto the surface which is to be treated, and caused to interact with the surface |
| 04/02/2002 | US6365231 Ammonium halide eliminator, chemical vapor deposition system and chemical vapor deposition process |
| 04/02/2002 | US6365230 Method of manufacturing a diamond film coated cutting tool |
| 04/02/2002 | US6365225 Ingots; using a consumable, removable, thin wall tubular casing, heating the reaction chamber radiantly, flowing and counterflowing reactant gas, depositing polysilicon directly upon the interior wall of the tubular casing. |
| 04/02/2002 | US6365063 Plasma reactor having a dual mode RF power application |
| 04/02/2002 | US6365016 Method and apparatus for arc plasma deposition with evaporation of reagents |
| 04/02/2002 | US6365015 Method for depositing high density plasma chemical vapor deposition oxide in high aspect ratio gaps |
| 04/02/2002 | US6365013 Coating method and device |
| 04/02/2002 | US6364958 Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges |
| 04/02/2002 | US6364957 Support assembly with thermal expansion compensation |
| 04/02/2002 | US6364954 High temperature chemical vapor deposition chamber |
| 04/02/2002 | US6364951 Moisture insensitive electroluminescent phosphor |
| 04/02/2002 | US6364949 300 mm CVD chamber design for metal-organic thin film deposition |
| 04/02/2002 | US6363958 Flow control of process gas in semiconductor manufacturing |
| 04/02/2002 | US6363882 Lower electrode design for higher uniformity |
| 04/02/2002 | US6363881 Plasma chemical vapor deposition apparatus |
| 04/02/2002 | US6363624 Apparatus for cleaning a semiconductor process chamber |
| 03/28/2002 | WO2002025713A1 Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon-containing compounds |
| 03/28/2002 | WO2002025712A1 Heating element cvd device |
| 03/28/2002 | WO2002025696A2 Reducing deposition of process residues on a surface in a chamber |
| 03/28/2002 | WO2002025695A2 Tunable focus ring for plasma processing |
| 03/28/2002 | WO2002025693A1 Method and device for treating surfaces using a glow discharge plasma |
| 03/28/2002 | WO2002024985A1 Gas inlet mechanism for cvd-method and device |
| 03/28/2002 | WO2000049198A9 Method and apparatus for controlling polymerized teos build-up in vacuum pump lines |