| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/18/2002 | US20020043341 Plasma process apparatus |
| 04/18/2002 | US20020043337 Low mass wafer support system |
| 04/18/2002 | US20020043216 Atomic layer deposition method and semiconductor device fabricating apparatus having rotatable gas injectors |
| 04/18/2002 | US20020043215 Liquid substance supply device for vaporizing system, vaporizer, and vaporization performance appraisal method |
| 04/18/2002 | DE10029286A1 Monitoring of nitrogen processes involves subjecting silicon surface to nitrogen process, producing oxide layer on the surface by thermal oxidation, and determining a thickness of oxide layer as measure for nitrogen process quality |
| 04/18/2002 | CA2419130A1 Electrostatically clamped edge ring for plasma processing |
| 04/17/2002 | EP1197997A1 Method for producing semiconductor crystal |
| 04/17/2002 | EP1197995A2 A method for fabricating a III nitride film |
| 04/17/2002 | EP1197994A1 Apparatus for manufacturing semiconductor device |
| 04/17/2002 | EP1197993A1 Apparatus for manufacturing semiconductor device |
| 04/17/2002 | EP1197583A1 Vapor-coating system including coating container with control of vapor-source activity |
| 04/17/2002 | EP1197582A1 Carbon coated object for contact with human skin |
| 04/17/2002 | EP1197581A1 Dlc film, dlc-coated plastic container, and method and apparatus for manufacturing dlc-coated plastic container |
| 04/17/2002 | EP1196938A2 Apparatus and method for exposing a substrate to plasma radicals |
| 04/17/2002 | EP1196645A1 Seal means and its application in deposition reactor |
| 04/17/2002 | EP0989915A4 Passivating a gas vessel and article produced |
| 04/17/2002 | EP0958399A4 Barrier films having vapor coated evoh surfaces |
| 04/17/2002 | EP0797480B1 Fluidized bed with uniform heat distribution and multiple port nozzle |
| 04/17/2002 | CN1345402A Conveyor for treating hollow bodies comprising advanced pressure distribution circuit |
| 04/17/2002 | CN1345261A Coating method on inner walls of reaction tubes in hydrocarbon pyrolysis reactor |
| 04/17/2002 | CN1344819A Method for manufacture of ferroelectric solid layer by using assistants |
| 04/17/2002 | CN1344817A Chemical vapour deposition device and method |
| 04/17/2002 | CN1083018C Passivation of metallic product of super alloy based on nickel and iron |
| 04/17/2002 | CN1082936C Material array and its prep. |
| 04/17/2002 | CN1082888C laminate and method for preparing same |
| 04/16/2002 | US6374194 System and method of diagnosing particle formation |
| 04/16/2002 | US6372928 Layer forming material and wiring forming method |
| 04/16/2002 | US6372672 Plasma enhanced vapor deposition; low hydrogen for popping removal; reduced thermal stress variation |
| 04/16/2002 | US6372670 Method and apparatus for forming an interlayer insulating film, and semiconductor device |
| 04/16/2002 | US6372669 Method of depositing silicon oxides |
| 04/16/2002 | US6372668 Method of forming silicon oxynitride films |
| 04/16/2002 | US6372667 Method of manufacturing a capacitor for semiconductor memory devices |
| 04/16/2002 | US6372661 Method to improve the crack resistance of CVD low-k dielectric constant material |
| 04/16/2002 | US6372643 Method for forming a selective contact and local interconnect in situ and semiconductor devices carrying the same |
| 04/16/2002 | US6372598 Forming sacrificial metal layer; replacement |
| 04/16/2002 | US6372364 Nanostructure coatings |
| 04/16/2002 | US6372305 Locating a substrate tube along cylindrical axis and within inner wall of resonant cavity, substrate tube having an inner surface and length; using plasma chemical vapor deposition to deposit layers of doped silica on inside surface of substrate |
| 04/16/2002 | US6372304 Applying magnetic field to a plasma generating chamber ; introducing microwaves into chamber; passing electron cyclotron resonance generated plasma; depositing silicon carbide film on surface of base material |
| 04/16/2002 | US6372303 Method and device for vacuum-coating a substrate |
| 04/16/2002 | US6372291 In situ deposition and integration of silicon nitride in a high density plasma reactor |
| 04/16/2002 | US6372286 Forming metal electrode, depositing liquid precursor comprising barium, strontium, and titanium in common solution to form film, annealing film to form peroyskite layer of barium strontium titanate on electrode |
| 04/16/2002 | US6372084 Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate |
| 04/16/2002 | US6372048 Gas processing apparatus for object to be processed |
| 04/16/2002 | US6371737 Conveying pumped gases in a vacuum pump or in pipes |
| 04/16/2002 | US6371712 Support frame for substrates |
| 04/16/2002 | US6370934 Extrusion tool, process for the production thereof and use thereof |
| 04/16/2002 | CA2258388C Surface processing of thin film cvd diamond coatings for improved resistive properties and integrated circuit packages incorporating processed coatings |
| 04/11/2002 | WO2002029877A1 Vacuum processing device |
| 04/11/2002 | WO2002029861A2 System architecture of semiconductor manufacturing equipment |
| 04/11/2002 | WO2002029849A2 System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber |
| 04/11/2002 | WO2002029843A1 Carbon-based field emission electron device for high current density applications |
| 04/11/2002 | WO2002029131A1 Method for automatic organisation of microstructures or nanostructures and related device obtained |
| 04/11/2002 | WO2002028548A2 Method and apparatus for forming a coating |
| 04/11/2002 | WO2002005969A3 Apparatus and method for synthesizing films and coatings by focused particle beam deposition |
| 04/11/2002 | WO2002003427A3 Semiconductor processing equipment having improved particle performance |
| 04/11/2002 | WO2002001628A3 Formation of boride barrier layers using chemisorption techniques |
| 04/11/2002 | WO2002001622A3 Novel non-crystalline oxides for use in microelectronic, optical, and other applications |
| 04/11/2002 | WO1999058734A3 Corrosion-resistant multilayer coatings |
| 04/11/2002 | US20020042518 Pyrazolate copper complexes, and MOCVD of copper using same |
| 04/11/2002 | US20020042211 Decomposition of of organosilicon compound; heat treatment |
| 04/11/2002 | US20020042204 Plasma processing apparatus with reduced parasitic capacity and loss in RF power |
| 04/11/2002 | US20020042192 Shower head, substrate treatment apparatus and substrate manufacturing method |
| 04/11/2002 | US20020042191 Chemical vapor deposition apparatus and chemical vapor deposition method |
| 04/11/2002 | US20020042165 Process for producing oxide thin films |
| 04/11/2002 | US20020041990 Grains of a high-melting metal having a melting point of not less than 1,900 degrees C. and/or grains of an alloy containing high melting metal and secured in position by yttria doped zirconia to present the form of a cubic lattice |
| 04/11/2002 | US20020041967 Composite and manufacturing method therefor |
| 04/11/2002 | US20020041942 Shaped as desired and inside surface is coated with thin layers of barrier material |
| 04/11/2002 | US20020041931 Method for growing thin films |
| 04/11/2002 | US20020041930 Method to produce ultra-low friction carbon films |
| 04/11/2002 | US20020041620 Thermal process apparatus for a semiconductor substrate |
| 04/11/2002 | US20020041031 Silicon nitride film, semiconductor device, and method for fabricating semiconductor device |
| 04/11/2002 | US20020040897 Thermal process apparatus for measuring accurate temperature by a radiation thermometer |
| 04/11/2002 | US20020040848 Method of smoothing diamond coating, and method of manufacturing diamond-coated body |
| 04/11/2002 | US20020040764 High density plasma vapor deposition |
| 04/11/2002 | DE10064944A1 Verfahren zum Abscheiden von insbesondere kristallinen Schichten, Gaseinlassorgan sowie Vorrichtung zur Durchführung des Verfahrens A method for depositing in particular crystalline layers, gas inlet element, and device for carrying out the method |
| 04/11/2002 | DE10064941A1 Gaseinlassorgan Gas inlet element |
| 04/11/2002 | DE10048759A1 Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD Method and apparatus for depositing in particular of organic layers by means of OVPD |
| 04/10/2002 | EP1195799A1 High pressure process for the formation of crystallized ceramic films at low temperatures |
| 04/10/2002 | EP1195451A1 Method of decreasing the dielectric constant in a SiOC layer |
| 04/10/2002 | EP1194950A1 Process for polycrystalline silicon film growth and apparatus for same |
| 04/10/2002 | EP1194799A1 Narrow-band optical interference filter |
| 04/10/2002 | EP1194611A1 Installation and method for vacuum treatment or the production of powder |
| 04/10/2002 | EP1194610A1 Method and system for pumping semiconductor equipment from transfer chambers |
| 04/10/2002 | EP1002142B1 Method and apparatus for reducing deposition of contaminants |
| 04/10/2002 | EP0972092A4 Multipurpose processing chamber for chemical vapor deposition processes |
| 04/10/2002 | EP0802892B1 Chemical vapor deposition of mullite coatings and powders |
| 04/10/2002 | CN1082721C Mfg. method of semiconductor device |
| 04/10/2002 | CN1082569C Microwave plasma processing appts. and method therefor |
| 04/09/2002 | US6370165 Diamond coatings deposited on WC-Co substrate by multiple laser |
| 04/09/2002 | US6369256 Self-reducible copper(II) source reagents for chemical vapor deposition of copper metal |
| 04/09/2002 | US6368988 Combined gate cap or digit line and spacer deposition using HDP |
| 04/09/2002 | US6368987 Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions |
| 04/09/2002 | US6368974 Shrinking equal effect critical dimension of mask by in situ polymer deposition and etching |
| 04/09/2002 | US6368944 Method of manufacturing photovoltaic element and apparatus therefor |
| 04/09/2002 | US6368880 Depositing barrier/wetting layer over surfaces of aperture, the barrier/wetting layer comprising tantalum, tantalum nitride, tungsten, tungsten nitride, and combinations thereof, depositing a conformal metal layer over the surface |
| 04/09/2002 | US6368717 Multilayer |
| 04/09/2002 | US6368678 Plasma processing system and method |
| 04/09/2002 | US6368676 Vacuum deposition; synchronized radio frequency and pulsedcurrents |
| 04/09/2002 | US6368665 Apparatus and process for controlled atmosphere chemical vapor deposition |
| 04/09/2002 | US6368664 Pretreating glass substrates |