| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/07/2002 | US20020028300 Manufacturing method of optical waveguide |
| 03/07/2002 | US20020028290 Rotation in gas flow; forming polycrystalline silicon |
| 03/07/2002 | US20020028286 Method for depositing a protective film on a data recording disk, and apparatus for depositing a thin film on a data recording disk |
| 03/07/2002 | US20020026984 By which a predetermined number of flat workpieces may be parallel processed, whereby the number of operating cycles for such treatment is minimalized so as to reach optimal short throughput times with optimal low handling |
| 03/07/2002 | US20020026983 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 03/07/2002 | US20020026951 Method and apparatus for removing processing liquid from a processing liquid delivery line |
| 03/07/2002 | US20020026900 Depolymerization of starch particles, heating, acidolysis and spray drying to form starch hydrolzylates having heat and enzyme resistance, used for tablets, dietery fiber, fat substitutes and antiicing agents |
| 03/07/2002 | US20020026899 Apparatus and method for coating substrates with vacuum depositable materials |
| 03/07/2002 | US20020026892 Impurity doping method for semiconductor as well as system therefor and semiconductor materials prepared thereby |
| 03/07/2002 | DE19635736C2 Diamantähnliche Beschichtung Diamond-like coating |
| 03/07/2002 | CA2417236A1 Method of forming a pre-metal dielectric film on a semiconductor substrate |
| 03/06/2002 | EP1184489A2 Impurity doping method for semiconductor as well as system therefor and semiconductor materials prepared thereby |
| 03/06/2002 | EP1184485A1 MOCVD precursors in mixed solvents |
| 03/06/2002 | EP1184365A2 Novel group IV metal precursors and chemical vapor deposition method using thereof |
| 03/06/2002 | EP1183719A1 Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material |
| 03/06/2002 | EP1183716A1 Substrate support for plasma processing |
| 03/06/2002 | EP1183406A1 Sequential chemical vapor deposition |
| 03/06/2002 | EP1183405A1 Method for vacuum treatment of workpieces and vacuum treatment facility |
| 03/06/2002 | EP0951394B1 Passivation of ink-jet printheads |
| 03/06/2002 | CN1338782A Method for forming films |
| 03/05/2002 | US6353201 Discharge electrode, RF plasma generation apparatus using the same, and power supply method |
| 03/05/2002 | US6352945 Introducing silicon compound having two alkoxy groups or less with no additive gas into reaction chamber for plasma chemical vapor deposition containing semiconductor substrate, activating plasma polymerization to form silicone film |
| 03/05/2002 | US6352944 Positioning semiconductor substrate within chemical vapor deposition reactor, feeding ammonia and trialkylaluminum compound to reactor at specified temperature and pressure to deposit layer comprising amorphous aluminum nitride |
| 03/05/2002 | US6352910 Method of depositing amorphous silicon based films having controlled conductivity |
| 03/05/2002 | US6352865 Method for fabricating a capacitor for a semiconductor device |
| 03/05/2002 | US6352636 Electrochemical system and process for stripping metallic coatings |
| 03/05/2002 | US6352611 Ceramic composition for an apparatus and method for processing a substrate |
| 03/05/2002 | US6352594 Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
| 03/05/2002 | US6352593 Mini-batch process chamber |
| 03/05/2002 | US6352592 Free floating shield and semiconductor processing system |
| 03/05/2002 | US6352591 Methods and apparatus for shallow trench isolation |
| 03/05/2002 | US6352406 Method for assessing quality of a coating process and assembly therefor |
| 03/05/2002 | US6352244 Auxiliary gasline-heating unit in chemical vapor deposition |
| 03/05/2002 | US6352050 Remote plasma mixer |
| 02/28/2002 | WO2002017374A1 Low-dielectric silicon nitride film and method of forming the same, semiconductor device and fabrication process thereof |
| 02/28/2002 | WO2002017368A1 Semiconductor polysilicon component and method of manufacture thereof |
| 02/28/2002 | WO2002017359A2 High carrier concentration p-type transparent conducting oxide films |
| 02/28/2002 | WO2002016679A1 Polycrystalline semiconductor material and method of manufacture thereof |
| 02/28/2002 | WO2002016012A1 Method for purifying fluorinated gas effluents |
| 02/28/2002 | WO2001066834A3 Chemical vapor deposition process for fabricating layered superlattice materials |
| 02/28/2002 | WO2001055478A3 Method and device for depositing a precursor on a substrate, said precursor being present in liquid form |
| 02/28/2002 | US20020025693 Method of manufacturing low dielectric film by a vacuum ultraviolet chemical vapor deposition |
| 02/28/2002 | US20020025684 Etching silicon oxide surface using anhydrous fluorine gas |
| 02/28/2002 | US20020025660 Growth of epitaxial semiconductor material with improved crystallographic properties |
| 02/28/2002 | US20020025657 Wafer processing in a chamber with novel gas inlets |
| 02/28/2002 | US20020025651 Semiconductor device manufacturing method and semiconductor manufacturing apparatus |
| 02/28/2002 | US20020025646 Method for forming capacitor of semiconductor device |
| 02/28/2002 | US20020025453 Perovskite mixed oxide |
| 02/28/2002 | US20020025389 Lens plasma coating system |
| 02/28/2002 | US20020025378 Exposing the primary carbides embedded in a steel matrix by at least one of uncovering and cutting, forming recess in the surface for one of detaching or removing the exposed primary carabides, depositing a hard material coating on the surface |
| 02/28/2002 | US20020025377 Method of producing a ferroelectric solid-state layer using an auxiliary substance |
| 02/28/2002 | US20020025374 Parallel and selective growth method of carbon nanotube on the substrates for electronic-spintronic device applications |
| 02/28/2002 | US20020024118 Semiconductor device having a capacitor and a fabrication process thereof |
| 02/28/2002 | US20020024108 Novel non-crystalline oxides for use in microelectronic, optical, and other applications |
| 02/28/2002 | US20020024072 Ferroelastic lead germanate thin film and deposition method |
| 02/28/2002 | US20020023906 Method of producing through-hole in aromatic polyimide film |
| 02/28/2002 | US20020023589 Plasma generating apparatus |
| 02/28/2002 | US20020023588 Substrate holder, a blow inlet for source gas, exhaust outlets for source gas; where direction of flow of source gas relative the substrate is varied with time using valves; barium strontium titanate films |
| 02/28/2002 | DE10136682A1 Selektives Epitaxieverfahren für Halbleiterbauelemente Selective epitaxy for semiconductor devices |
| 02/28/2002 | DE10134181A1 P-type nitride semiconductor manufacturing method for light emitting and receiving elements, involves cooling substrate of nitride semiconductor layer in environment of hydrogen |
| 02/28/2002 | DE10120184A1 Herstellung einer Halbleitervorrichtung mit Kupferverdrahtung Manufacturing a semiconductor device having copper wiring |
| 02/28/2002 | DE10039596A1 Metal membrane for removing hydrogen from gas mixtures contains metal membrane formed on supporting surface of porous membrane carrier |
| 02/28/2002 | DE10038887A1 Production of a silicon nitride layer used in the production of a semiconductor device comprises reacting silicon wafers with ammonia gas in two separate chambers |
| 02/28/2002 | DE10027427A1 Production of a substrate used in the production of heat sinks comprises depositing a polycrystalline diamond layer in the gas phase containing activated carbon using coating parameters |
| 02/27/2002 | EP1182276A2 Process for the production of a ferroelectric solid layer using an additive |
| 02/27/2002 | EP1182275A2 Method of forming an interlayer insulating film |
| 02/27/2002 | EP1182274A1 Coated hard metal cutting tool and its fabrication method |
| 02/27/2002 | EP1182273A2 Gas chemistry cycling to achieve high aspect ratio gapfill with hdp-cvd |
| 02/27/2002 | EP1182271A2 Apparatus and method for coating substrate |
| 02/27/2002 | EP1181095A1 The surface modification of solid supports through the thermal decomposition and functionalization of silanes |
| 02/27/2002 | CN1338007A Indium source reagent compositions |
| 02/27/2002 | CN1337736A Method for producing semiconductor integrated circuit device |
| 02/27/2002 | CN1079843C Deposited film forming apparatus and electrode for use in it |
| 02/26/2002 | US6351036 Electronic devices with a barrier film and process for making same |
| 02/26/2002 | US6350961 Method and device for improving surfaces |
| 02/26/2002 | US6350708 Silicon nitride deposition method |
| 02/26/2002 | US6350697 Method of cleaning and conditioning plasma reaction chamber |
| 02/26/2002 | US6350686 Vapor deposition multi-metallic mixture of metalloamides; alloying, boriding, siliciding, oxidation, nitriding, and/or sulfiding; controlled stoichiometry; semiconductors |
| 02/26/2002 | US6350648 Formation of conductive rugged silicon |
| 02/26/2002 | US6350644 Ferroelectric thin-film device and method for producing the same |
| 02/26/2002 | US6350643 Vapor deposition; annealing to ferroelectric layer; semiconductors, integrated circuits |
| 02/26/2002 | US6350510 Cermet or ceramic substrate with multilayer coating and covering with hafnium or zirconium carbides, nitrides or carbonitrides formed by vapor deposition |
| 02/26/2002 | US6350497 Plasma processing method |
| 02/26/2002 | US6350489 Deposited-film forming process and deposited-film forming apparatus |
| 02/26/2002 | US6350488 Forming insulating layer over substrate, etching and growing carbon |
| 02/26/2002 | US6350320 Heater for processing chamber |
| 02/26/2002 | US6350317 Linear drive system for use in a plasma processing system |
| 02/26/2002 | US6350191 Surface functionalized diamond crystals and methods for producing same |
| 02/26/2002 | US6349887 Liquid delivery system |
| 02/26/2002 | US6349744 Manifold for modular gas box system |
| 02/26/2002 | US6349669 Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction |
| 02/26/2002 | US6349668 Method and apparatus for thin film deposition on large area substrates |
| 02/26/2002 | US6349454 Method of making thin film resonator apparatus |
| 02/21/2002 | WO2002015649A2 Close coupled match structure for rf drive electrode |
| 02/21/2002 | WO2002015275A1 Method for manufacturing semiconductor device |
| 02/21/2002 | WO2002015255A1 System and method for cleaning semiconductor fabrication equipment parts |
| 02/21/2002 | WO2002015243A1 Device and method for processing substrate |
| 02/21/2002 | WO2002015239A2 Dispersion plate for flowing vaporized compounds used in chemical vapor deposition of films onto semiconductor surfaces |
| 02/21/2002 | WO2002014579A1 Method for depositing a glass layer on a substrate |
| 02/21/2002 | WO2002014578A2 Chromium-containing cemented tungsten carbide coated cutting insert |