Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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06/11/2002 | US6403151 Forming an inorganic antireflective coating layer above the first layer by introducing at least two gases at a first preselected ratio into said semiconductor processing tools; silane and nitrous oxide form silicon oxynitride |
06/11/2002 | US6402850 Depositing polysilicon films having improved uniformity and apparatus therefor |
06/11/2002 | US6402849 Process tube having slit type process gas injection portion and hole type waste gas exhaust portion, and apparatus for fabricating semiconductor device |
06/11/2002 | US6402848 Single-substrate-treating apparatus for semiconductor processing system |
06/11/2002 | US6402847 Dry processing apparatus and dry processing method |
06/11/2002 | US6402844 Substrate processing method and substrate processing unit |
06/11/2002 | US6402836 Method for epitaxial growth on a substrate |
06/11/2002 | US6402806 Method for unreacted precursor conversion and effluent removal |
06/11/2002 | US6402479 Apparatus for pumping out transfer chambers for transferring semiconductor equipment |
06/11/2002 | US6402126 Method and apparatus for vaporizing liquid precursors and system for using same |
06/11/2002 | US6401359 Vacuum processing method and apparatus |
06/06/2002 | WO2002045167A2 Thin films for magnetic devices |
06/06/2002 | WO2002045147A2 Method for pretreating dielectric layers to enhance the adhesion of cvd metal layers thereto |
06/06/2002 | WO2002045128A2 Zirconium-doped bst materials and mocvd process for forming same |
06/06/2002 | WO2002044769A1 Silica-based optical device fabrication |
06/06/2002 | WO2002044765A2 Multilayered optical structures |
06/06/2002 | WO2002044445A1 Method for depositing especially, crystalline layers and device for carrying out the method |
06/06/2002 | WO2002044441A2 Method and device for the metered delivery of low volumetric flows |
06/06/2002 | WO2002044437A2 High strength alloys and methods for making same |
06/06/2002 | WO2002044079A1 Method and apparatus for manufacturing ultra fine three-dimensional structure |
06/06/2002 | WO2002027059A3 System and method for controlling movement of a workpiece in a thermal processing system |
06/06/2002 | WO2002023594A3 Apparatus and method for reducing contamination on thermally processed semiconductor substrates |
06/06/2002 | WO2002020881A3 Apparatus and method for cleaning a bell jar in a barrel epitaxial reactor |
06/06/2002 | WO2002005321A3 Method to isolate multi zone heater from atmosphere |
06/06/2002 | WO2001073866A3 Method and apparatus for integrated-battery devices |
06/06/2002 | US20020069025 Heat treatment apparatus, calibration method for temperature measuring system of the apparatus, and heat treatment system |
06/06/2002 | US20020068467 Simultaneously flowing a plurality of reaction gases SiH4, N2, NH3, N2O into a chamber; and turning on a high frequency radio frequency power after some of said simultaneous flowing. |
06/06/2002 | US20020068466 Chemisorbing a first reactant adsorption layer combined with a halogen on a semiconductor substrate; removing the halogen with activated hydrogen gas; chemisorbing a second reactant into the first reactant adsorption layer |
06/06/2002 | US20020068463 Rapid chemical vapor deposition for spherical semiconductor processing |
06/06/2002 | US20020068458 Method for integrated in-situ cleaning and susequent atomic layer deposition within a single processing chamber |
06/06/2002 | US20020068448 Electron emitter substrate comprising emitters having at least a partial covering comprising aluminum nitride; and an electrode collector substrate spaced from the electron emitter substrate. |
06/06/2002 | US20020068427 Single step process for blanket-selective cvd aluminum deposition |
06/06/2002 | US20020068371 Temperature measuring method and apparatus in semiconductor processing apparatus, and semiconductor processing method and apparatus |
06/06/2002 | US20020068201 Providing expitaxially compatible sacrificial template, depositing single crystal aluminum, gallium indium nitride material on template to form composite sacrificial template/nitride article, parting |
06/06/2002 | US20020068178 Formed by varying temperature within reaction chamber while layer of material is formed |
06/06/2002 | US20020068129 MOCVD of SBT using toluene-based solvent system for precursor delivery |
06/06/2002 | US20020068128 Mixing a substance liquid at the room temperature under the atmospheric pressure and a pressurized gas, causing resultant mixture to spout as a gas from a nozzle to generate a cluster which is a lumpy group of atoms or molecules |
06/06/2002 | US20020067917 Vaporizer and apparatus for vaporizing and supplying |
06/06/2002 | US20020066726 Wafer chuck having thermal plate with interleaved heating and cooling elements, interchangeable top surface assemblies and hard coated layer surfaces |
06/06/2002 | US20020066536 Plasma processing apparatus |
06/06/2002 | US20020066535 Exhaust system for treating process gas effluent |
06/06/2002 | US20020066534 Process for fabricating films of uniform properties on semiconductor devices |
06/06/2002 | US20020066532 Corrosion-resistant protective coating for an apparatus and method for processing a substrate |
06/06/2002 | US20020066466 Immersing into an organic solvent, removing, inspecting for visible contaminants and testing for non-visible ones, repeating if necessary |
06/06/2002 | US20020066412 Wafer carrier and semiconductor apparatus for processing a semiconductor substrate |
06/06/2002 | US20020066411 Method and apparatus for improved temperature control in atomic layer deposition |
06/06/2002 | US20020066409 Fiber coating method and reactor |
06/06/2002 | US20020066408 Domed wafer reactor vessel window with reduced stress at atmospheric and above atmospheric pressures |
06/06/2002 | US20020066403 Growing areas using a mask patterned on a substrate surface and growing a nitride in the growing areas, while forming facet structures |
06/06/2002 | DE10151724A1 Verfahren und Vorrichtung zum Korrigieren eines Musterfilms auf einem Halbleitersubstrat Method and apparatus for correcting a pattern film on a semiconductor substrate |
06/06/2002 | DE10058803A1 Schneidwerkzeug zum Zerspanen Cutting tool for machining |
06/06/2002 | CA2427103A1 Multilayered optical structures |
06/05/2002 | EP1211715A2 A method for fabricating a IIIV nitride film |
06/05/2002 | EP1211695A1 Apparatus and methods for protecting a jet pump nozzle assembly and inlet-mixer |
06/05/2002 | EP1211333A2 Vaporizer for CVD apparatus |
06/05/2002 | EP1210468A1 Method and device for cleaning a pvd or cvd reactor and waste-gas lines of the same |
06/05/2002 | EP0889976B1 Apparatus for uniform distribution of plasma |
06/05/2002 | EP0850266B1 Method for obtaining a floor covering and product thus obtained |
06/04/2002 | US6399922 Single-substrate-heat-treating apparatus for semiconductor process system |
06/04/2002 | US6399921 System and method for thermal processing of a semiconductor substrate |
06/04/2002 | US6399772 Vapor deposition |
06/04/2002 | US6399522 Vapor deposition using plasma gases; pretreatment using nitrogen and nitrogen oxide gas flow |
06/04/2002 | US6399514 High temperature silicon surface providing high selectivity in an oxide etch process |
06/04/2002 | US6399510 Bi-directional processing chamber and method for bi-directional processing of semiconductor substrates |
06/04/2002 | US6399491 Method of manufacturing a barrier metal layer using atomic layer deposition |
06/04/2002 | US6399490 Highly conformal titanium nitride deposition process for high aspect ratio structures |
06/04/2002 | US6399489 Barrier layer deposition using HDP-CVD |
06/04/2002 | US6399484 Semiconductor device fabricating method and system for carrying out the same |
06/04/2002 | US6399411 Method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device |
06/04/2002 | US6399402 Passivation of ink jet print heads |
06/04/2002 | US6399225 Silicon-and-nitrogen-containing luminescent substance, method for forming the same, and light emitting device using the same |
06/04/2002 | US6399213 Surface treated vacuum material and a vacuum chamber having an interior surface comprising same |
06/04/2002 | US6399208 Vapor deposition thin film zirconium hafnium silicate barriers |
06/04/2002 | US6399177 Deposited thin film void-column network materials |
06/04/2002 | US6399151 For depositing a diamond thick film on a large substrate such as a silicon wafer; direct current plasma assisted chemical vapor deposition; includes holder for fixing the cathode to the chamber and has a cooling line for the cathode |
06/04/2002 | US6398873 Method and apparatus for forming an HSG-Si layer on a wafer |
06/04/2002 | US6398872 Circuit forming apparatus of semiconductor device |
06/04/2002 | US6398846 Gas purifier equipped with dual temperature detector which signals onset of exothermic reaction when high concentrations of impurities are present, inhibits formation of eutectic and shuts down column before breach of vessel |
06/04/2002 | US6397861 Processing chamber with a showerhead and a chuck, such as chemical vapor deposition chambers, is cleaned using an injection of a gaseous cleaning agent positioned below a showerhead having a porous face plate |
06/04/2002 | US6397776 Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators |
06/04/2002 | US6397775 Deposited film forming system and process |
06/04/2002 | CA2043987C Process for coating finely divided material with titania and moisture insensitive zinc sulfide luminescent materials made therefrom |
05/30/2002 | WO2002043125A2 Ald method to improve surface coverage |
05/30/2002 | WO2002043119A2 An ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device, a method for fabricating the same, and an electronic device containing the same |
05/30/2002 | WO2002043115A2 Surface preparation prior to deposition |
05/30/2002 | WO2002043114A2 Plasma enhanced pulsed layer deposition |
05/30/2002 | WO2002043080A1 Transparent conductive film and its manufacturing method, and photoelectric transducer comprising it |
05/30/2002 | WO2002043079A1 Conductive film, production method therefor, substrate provided with it and photoelectric conversion device |
05/30/2002 | WO2002042515A1 Method of making coated cemented carbide cutting tools |
05/30/2002 | WO2002007194A8 Cleaning gas for semiconductor production equipment |
05/30/2002 | WO2002002843A3 Carbide coated steel articles and method of making them |
05/30/2002 | WO2001073957A3 Battery-operated wireless-communication apparatus and method |
05/30/2002 | WO2001070005A3 Method of forming a low temperature metal bond for use in the transfer of bulk and thin film materials |
05/30/2002 | US20020065427 Organometallic compounds for chemical vapor deposition and their preparing processes, and processes for chemical vapor deposition of precious-metal films and precious-metal compound films |
05/30/2002 | US20020064970 Chemical vapor deposition; reacting a precursor such as metal alkoxide, metal alkoxide containing halogen, metal beta-diketonate, metal oxoacid, metal acetate, or metal alkene with oxidant gas, annealing for densification |
05/30/2002 | US20020064948 Preparation method of bis (alkylcyclopentadienyl) ruthenium |
05/30/2002 | US20020064927 Apparatus for forming strontium-tantalum-oxide thin film and a method thereof |
05/30/2002 | US20020064897 Silica-based optical device fabrication |
05/30/2002 | US20020064658 Carbon film and method of forming the same |
05/30/2002 | US20020064657 Skin-contact portion of the object to be in contact with the human's skin when used is coated with a carbon film that suppresses irritation of the human's skin; used to prevent bedsores and irritation from eyeglasses |