| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/27/2002 | US20020081174 Vacuum processing apparatus and a vacuum processing system |
| 06/27/2002 | US20020079294 Plasma processing apparatus |
| 06/27/2002 | US20020078894 Bubbler |
| 06/27/2002 | US20020078893 Plasma enhanced chemical processing reactor and method |
| 06/27/2002 | US20020078892 Substrate processing device and through-chamber |
| 06/27/2002 | US20020078886 Silica glass jig for semiconductor industry and method for producing the same |
| 06/27/2002 | DE10063492A1 Verfahren zum chemisch-mechanischen Polieren von Isolationsschichten nach der STI-Technik bei erhöhten Temperaturen A method for chemical mechanical polishing of insulating layers after the STI technology at elevated temperatures |
| 06/27/2002 | CA2431017A1 Injector and method for prolonged introduction of reagents into plasma |
| 06/26/2002 | EP1217682A2 Method of forming thin film of inorganic solid electrolyte |
| 06/26/2002 | EP1217648A2 Method of manufacturing an interlayer dielectric layer with low dielectric constant |
| 06/26/2002 | EP1217093A1 Densification of porous substrate by vapor phase chemical infiltration |
| 06/26/2002 | EP1217091A2 Packages and packaging aids |
| 06/26/2002 | EP1216109A1 METHOD AND SYSTEM FOR i IN SITU /i CLEANING OF SEMICONDUCTOR MANUFACTURING EQUIPMENT USING COMBINATION CHEMISTRIES |
| 06/26/2002 | EP1216106A1 Improved apparatus and method for growth of a thin film |
| 06/26/2002 | EP1171900A4 Large area atmospheric-pressure plasma jet |
| 06/26/2002 | EP1129233B1 Method for diamond-coating surfaces |
| 06/26/2002 | CN1355331A Uniform heat-field array method for growing diamond film tubes |
| 06/26/2002 | CN1355330A Circulating electrons enhanced hot-wire chemical gas-phase deposition process for preparing diamond film |
| 06/26/2002 | CN1355329A Photo-hot wire chemical gas-phase deposition method for growing large-area diamond film |
| 06/25/2002 | US6411490 Integrated power modules for plasma processing systems |
| 06/25/2002 | US6410889 Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system |
| 06/25/2002 | US6410463 Method for forming film with low dielectric constant on semiconductor substrate |
| 06/25/2002 | US6410462 Method of making low-K carbon doped silicon oxide |
| 06/25/2002 | US6410457 Method for improving barrier layer adhesion to HDP-FSG thin films |
| 06/25/2002 | US6410454 Using hydrogen free radicals generated by heating hydrogen or nonmetal halides using a hot filament in the presence of a free radical catalyst; forming conductor or insulator films |
| 06/25/2002 | US6410446 Method for gap filling |
| 06/25/2002 | US6410434 Low pressure chemical vapor deposition of silane and phosphine; reduced defects; uniform sheet resistance |
| 06/25/2002 | US6410433 Integrated circuits containing copper films |
| 06/25/2002 | US6410432 Tantalum (ta); tantalum nitride (tanx); chemical vapor deposition simultaneous nitriding and reduction to metal; integrated circuits containing copper film |
| 06/25/2002 | US6410408 CVD film formation method |
| 06/25/2002 | US6410400 Method of manufacturing Ta2O5capacitor using Ta2O5thin film as dielectric layer |
| 06/25/2002 | US6410383 Method of forming conducting diffusion barriers |
| 06/25/2002 | US6410381 Ru film is deposited by lpcvd, and re-deposited in situ by pecvd amorphous taon film on the lower electrode crystalled using thermal treatment; upper electrode on the crystallized taon film. |
| 06/25/2002 | US6410346 Method of forming ferroelastic lead germanate thin films |
| 06/25/2002 | US6410343 C-axis oriented lead germanate film and deposition method |
| 06/25/2002 | US6410331 Combinatorial screening of inorganic and organometallic materials |
| 06/25/2002 | US6410172 Articles coated with aluminum nitride by chemical vapor deposition |
| 06/25/2002 | US6410102 Plasma process method |
| 06/25/2002 | US6410090 Method and apparatus for forming insitu boron doped polycrystalline and amorphous silicon films |
| 06/25/2002 | US6410089 Chemical vapor deposition of copper using profiled distribution of showerhead apertures |
| 06/25/2002 | US6410088 CVI (chemical vapor infiltration) densification of porous structures |
| 06/25/2002 | US6410087 Deposition of pyrocarbon |
| 06/25/2002 | US6410086 Electrophoretically depositing green coating; gas phase deposition of second coating; heat resistance |
| 06/25/2002 | US6409839 Method and apparatus for vapor generation and film deposition |
| 06/25/2002 | US6409837 Processing system and method for chemical vapor deposition of a metal layer using a liquid precursor |
| 06/25/2002 | US6409830 Process for preparing a limo2 type heterometallic oxide film |
| 06/25/2002 | US6409828 Method and apparatus for achieving a desired thickness profile in a flow-flange reactor |
| 06/25/2002 | US6409503 Heat treatment method and heat treatment apparatus |
| 06/25/2002 | US6408786 Semiconductor processing equipment having tiled ceramic liner |
| 06/25/2002 | US6408653 Apparatus and method for manufacturing optical fiber preform by MCVD |
| 06/25/2002 | CA2366175A1 Method of treatment with a microwave plasma |
| 06/20/2002 | WO2002049098A1 Processing method and processing apparatus |
| 06/20/2002 | WO2002049088A1 Sheet type plasma processing device, method of assembling and disassembling electrode for plasma processing device, and exclusive jig for the method |
| 06/20/2002 | WO2002048434A2 Gallium nitride materials and methods for forming layers thereof |
| 06/20/2002 | WO2002048429A1 Manufacture of silica waveguides with minimal absorption |
| 06/20/2002 | WO2002048428A1 Method for forming thin film, article having thin film, optical film, dielectric coated electrode, and plasma discharge processor |
| 06/20/2002 | WO2002048427A1 Thin film forming method and thin film forming device |
| 06/20/2002 | WO2002048423A2 Method for coating substrates and mask holder |
| 06/20/2002 | WO2002048421A1 Method for regenerating container for plasma treatment, member inside container for plasma treatment, method for preparing member inside container for plasma treatment, and apparatus for plasma treatment |
| 06/20/2002 | WO2002047829A1 Surface modification process |
| 06/20/2002 | WO2002019390A3 Cleaning of semiconductor process equipment chamber parts using organic solvents |
| 06/20/2002 | WO2002015239A3 Dispersion plate for flowing vaporized compounds used in chemical vapor deposition of films onto semiconductor surfaces |
| 06/20/2002 | WO2002005329A3 Chemical vapor deposition of barrier layers |
| 06/20/2002 | WO2002005308A3 A plasma reactor having a symmetric parallel conductor coil antenna |
| 06/20/2002 | WO2001080309A3 A method to enhance the adhesion of silicon nitride to low-k fluorinated amorphous carbon using a silicon carbide adhesion promoter layer |
| 06/20/2002 | WO2001069642A3 Plasma deposition method and system |
| 06/20/2002 | WO2001063637A3 Method for producing an addressable field-emission cathode and an associated display structure |
| 06/20/2002 | WO2001061071A3 Condensation coating method |
| 06/20/2002 | US20020076947 Combined gate cap or digit line and spacer deposition using HDP |
| 06/20/2002 | US20020076946 Method for forming Ta2O5 dielectric layer |
| 06/20/2002 | US20020076944 Applying on semiconductor or integrated circuit surface substituted organosilane compound precursor, wherein precursor reacts with and deposits on surface and dielectric film |
| 06/20/2002 | US20020076939 High density plasma chemical vapor deposition (HDP-CVD) processing of gallium arsenide wafers |
| 06/20/2002 | US20020076837 Thin films for magnetic device |
| 06/20/2002 | US20020076562 Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition |
| 06/20/2002 | US20020076509 Upper face of the substrate held by the substrate holding device and an upper face of the substrate holding device are almost on one plane; prevents vapor deposition gas from leaking, contacting air |
| 06/20/2002 | US20020076508 Varying conductance out of a process region to control gas flux in an ALD reactor |
| 06/20/2002 | US20020076507 Process sequence for atomic layer deposition |
| 06/20/2002 | US20020076506 Plasma enhanced polymer deposition onto fixtures |
| 06/20/2002 | US20020076493 Method of manufacturing a preform exhibiting a precisely defined refractive index profile by means of a chemical vapour deposition (CVD) technique |
| 06/20/2002 | US20020076492 Film processing system |
| 06/20/2002 | US20020076491 Part of the flow of reactive gas admitted into the enclosure is guided to the inside of the volume defined by a concave inside face of the hollow shaped substrate at pressure equilibrium |
| 06/20/2002 | US20020076490 Variable gas conductance control for a process chamber |
| 06/20/2002 | US20020076489 Container that holds the liquid starting material, pressure reducing means for depressurizing inside the container, heater for boiling; chemical vapor deposition of aluminum films |
| 06/20/2002 | US20020076488 Method for forming metallic-based coating |
| 06/20/2002 | US20020076485 Dissolving metal compounds in solvent, atomizing metal compound solution, introducing atomized solution into film-forming chamber, forming complex oxide thin film |
| 06/20/2002 | US20020076481 Introducing first gas into chamber for reacting with surface of substrate to form layer on substrate, first gas creating first pressure, detecting change in pressure, supplying second gas in response to detection of change in pressure |
| 06/20/2002 | US20020076479 Method of monitoring chemical vapor deposition conditions |
| 06/20/2002 | US20020076367 Plasma processing apparatus |
| 06/20/2002 | US20020076316 Wafer boat and boat holder |
| 06/20/2002 | US20020075625 High temperature electrostatic chuck |
| 06/20/2002 | US20020074582 Semiconductor device and method of manufacturing thereof |
| 06/20/2002 | US20020074552 Gallium nitride materials and methods |
| 06/20/2002 | US20020074324 Heat treatment apparatus and controller for heat treatment apparatus and control method for heat treatment apparatus |
| 06/20/2002 | US20020074309 Integrated low k dielectrics and etch stops |
| 06/20/2002 | US20020074013 Converting a non-cleaning feed gas to a cleaning gas by heat, microwave, plasma or electric energy activation in a remote location and then delivering it to process chamber for cleaning |
| 06/20/2002 | US20020073925 Apparatus and method for exposing a substrate to plasma radicals |
| 06/20/2002 | US20020073924 Gas introduction system for a reactor |
| 06/20/2002 | US20020073923 Top end of the exhaust pipe is split into two vents, one of which is used for discharging exhaust gas for forming silicon dioxide and silicon nitride films and other, which is used to discharge hydrogen fluoride for pipe cleaning |
| 06/20/2002 | US20020073922 Can provide high temperature deposition, heating and efficient cleaning, for forming dielectric films having thickness uniformity, good gap fill capability, high density and low moisture |
| 06/20/2002 | DE10038800A1 Production of combined direct manufacture of highly active electrodes used for fuel cells and electrolysis cells comprises using carbon carrier |