| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/25/2002 | US20020098714 Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device |
| 07/25/2002 | US20020098713 Clustertool system software using plasma immersion ion implantation |
| 07/25/2002 | US20020098671 Method of forming silicon-germanium film |
| 07/25/2002 | US20020098627 Surface preparation prior to deposition |
| 07/25/2002 | US20020098360 Cutting tool coated with diamond |
| 07/25/2002 | US20020098346 Reacting substrate having a surface-exposed monolayer with a bifunctional reagent that reacts with exposed reactive group, producing coupling layer having exposed reactive group with which reactive group of selected compound can react |
| 07/25/2002 | US20020098296 Polypropylene (PP) film whose surface is bonded with chains having, as a main skeleton, an -O-Si-O-; made by activating carbon's of PP with plasma treatment, oxidizing in air and reacting with an organic silane compound |
| 07/25/2002 | US20020098285 Applying a negative bias to a substrate and immersing in a plasma such as from a gas mixture including acetylene and hexafluoroethane |
| 07/25/2002 | US20020098083 Low-pressure steam turbine |
| 07/25/2002 | US20020097512 Method for the coating of substrates made of plastic |
| 07/25/2002 | US20020097295 Method of surface treatment, device of surface treatment, and head for use in ink jet printer |
| 07/25/2002 | US20020096999 Inductively coupled RF plasma source |
| 07/25/2002 | US20020096512 Resistive heaters and uses thereof |
| 07/25/2002 | US20020096495 Apparatus and method for monitoring backflow vapors |
| 07/25/2002 | US20020096259 Regenerative thermal oxidizer process and so2 scrubbing |
| 07/25/2002 | US20020096258 Systems and methods for enhancing plasma processing of a semiconductor substrate |
| 07/25/2002 | US20020096257 RF power delivery for plasma processing using modulated power signal |
| 07/25/2002 | US20020096194 To allow use of a strong etchant such as nitrogen trifluoride (NF3) gas to clean selected surfaces in rapid thermal processing (RTP) systems; e.g. selectively clean polysilicon deposits |
| 07/25/2002 | US20020096188 Chemical vapor deposition (CVD); generating active seeds of cleaning gas by applying high-frequency electric power to plasma-generator, feeding the active species into the processing space through holes in the partition plate |
| 07/25/2002 | US20020096117 Gas processing apparatus for object to be processed |
| 07/25/2002 | US20020096115 Method for manufacturing semiconductor device |
| 07/25/2002 | US20020096114 Series chamber for substrate processing |
| 07/25/2002 | US20020096113 Apparatus and method for the removal of backflow vapors |
| 07/25/2002 | US20020096107 Method for manufacturing a diamond cylinder array having dents therein |
| 07/25/2002 | DE10200279A1 Gasinjektor mit einem Keramikmaterialblock mit Gasinjektionslöchern, die sich durch diesen erstrecken, und ein den Gasinjektor enthaltendes Ätzgerät Gas injector with a ceramic block with gas injection holes extending therethrough, and a gas injector containing etcher |
| 07/24/2002 | EP1225794A1 Matching device and plasma processing apparatus |
| 07/24/2002 | EP1225194A2 Method of forming a dielectric interlayer film with organosilicon precursors |
| 07/24/2002 | EP1224964A1 Method and device for processing pfc |
| 07/24/2002 | EP1185538A4 Copper source reagent compositions, and method of making and using same for microelectronic device structures |
| 07/24/2002 | EP1153340B1 Method of regulating a high temperature gaseous phase process and use of said method |
| 07/24/2002 | EP1068633B1 Method and device for specifically manipulating and depositing particles |
| 07/24/2002 | EP1015658B1 Vapor deposition apparatus |
| 07/24/2002 | EP0985056B1 Film or coating deposition on a substrate |
| 07/24/2002 | EP0815284B1 Method and apparatus for plasma deposition on a double-sided substrate |
| 07/24/2002 | EP0653499B1 Coated cutting tool and method for producing the same |
| 07/24/2002 | CN1360681A Narrow-band optical interference filter |
| 07/24/2002 | CN1088258C Crystal wafer temp. on-situ controler for single wafer tool |
| 07/23/2002 | US6424800 Bubbler |
| 07/23/2002 | US6423949 Multi-zone resistive heater |
| 07/23/2002 | US6423654 Method of manufacturing a semiconductor device having silicon oxynitride passavation layer |
| 07/23/2002 | US6423593 Semiconductor integrated circuit device and process for manufacturing the same |
| 07/23/2002 | US6423400 Electrostatic chucks formed by lamination of aluminum nitride with high melting metals and an adhesive layer, for coating silicon wafers; corrosion resistance |
| 07/23/2002 | US6423384 HDP-CVD deposition of low dielectric constant amorphous carbon film |
| 07/23/2002 | US6423383 Converting reactive carbon compounds into a gas plasma by resonance using microwaves and magnetic fields, then coating amorphous carbon films on substrates |
| 07/23/2002 | US6423373 Surface treated aluminum nitride and fabricating method thereof |
| 07/23/2002 | US6423202 Process for making gold salt for use in electroplating |
| 07/23/2002 | US6423177 Apparatus for performing plasma process on particles |
| 07/23/2002 | US6422798 Process and arrangement for continuous treatment of objects |
| 07/23/2002 | US6422172 Plasma processing apparatus and plasma processing method |
| 07/18/2002 | WO2002056420A2 Fabrication of high current coated high temperature superconducting tapes |
| 07/18/2002 | WO2002056395A1 System for the conversion of water into non-oxidizing gases and electronic devices containing said systems |
| 07/18/2002 | WO2002056357A1 Sheet-fed treating device |
| 07/18/2002 | WO2002056348A2 Method for incorporating silicon into cvd metal films |
| 07/18/2002 | WO2002056342A2 Copper vias in low-k technology |
| 07/18/2002 | WO2002056338A2 Device for the plasma-mediated working of surfaces on planar substrates |
| 07/18/2002 | WO2002055757A1 Liquid distribution unit for dividing a liquid current into a plurality of partial currents |
| 07/18/2002 | WO2002055756A1 Apparatus for exhaust whie powder elimination in substrate processing |
| 07/18/2002 | WO2002055246A2 Coated saw blade |
| 07/18/2002 | WO2002036850A3 Method and device for coating hollow bodies |
| 07/18/2002 | WO2001082341B1 Thermal processing system and thermal processing method |
| 07/18/2002 | WO2001079586A9 A process for the purification of organometallic compounds or heteroatomic organic compounds with a catalyst based on iron and manganese supported on zeolites |
| 07/18/2002 | WO2001078869A9 A process for the purification of organometallic compounds or heteroatomic organic compounds with a palladium-based catalyst |
| 07/18/2002 | WO2001067087A3 Fluid handling devices with diamond-like films |
| 07/18/2002 | WO2001006033A9 Method of coating an article |
| 07/18/2002 | US20020094689 Apparatus and method for depositing thin film on wafer using atomic layer deposition |
| 07/18/2002 | US20020094686 Semiconductor processing article |
| 07/18/2002 | US20020094682 Reactor and a susceptorr is coated with an aluminum gallium indium nitride, which is heated to >/= 1000 degress C to generate chemical vapor deposition between a III and a V raw material gases |
| 07/18/2002 | US20020094681 In-situ monitoring of chemical vapor deposition process by mass spectrometry |
| 07/18/2002 | US20020094634 Methods of forming an integrated circuit capacitor in which a metal preprocessed layer is formed on an electrode thereof |
| 07/18/2002 | US20020094600 Substrate processing apparatus and method for manufacturing a semiconductor device employing same |
| 07/18/2002 | US20020094502 Substrate processing apparatus and method for manufacturing semiconductor device |
| 07/18/2002 | US20020094425 Process for depositing a tungsten-based and/or molybdenum-based layer on a rigid substrate, and substrate thus coated |
| 07/18/2002 | US20020094388 Low temperature, high quality silicon dioxide thin films deposited using tetramethylsilane (TMS) for stress control and coverage applications |
| 07/18/2002 | US20020094387 Method for improving chemical vapor deposition of titanium |
| 07/18/2002 | US20020094383 Immersing in solution, generating waves and collecting image data; varying and controlling frequency to remove particles of different sizes |
| 07/18/2002 | US20020094380 Abatement of effluents from chemical vapor deposition processes using organometallicsource reagents |
| 07/18/2002 | US20020094379 Cast diamond tools and formation thereof by chemical vapor deposition |
| 07/18/2002 | US20020094378 Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
| 07/18/2002 | US20020094371 Methods of forming coatings on gas-dispersion fixtures in chemical-vapor-deposition systems |
| 07/18/2002 | US20020093286 Organic EL display and method for producing the same |
| 07/18/2002 | US20020092840 Reaction chamber for processing a substrate wafer, and method for operating the chamber |
| 07/18/2002 | US20020092826 Low ceiling temperature process for a plasma reactor with heated source of a polymer-hardening precursor material |
| 07/18/2002 | US20020092617 Single wafer LPCVD apparatus |
| 07/18/2002 | US20020092616 Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 07/18/2002 | US20020092602 Quartz glass wafer support jig and method for producing the same |
| 07/18/2002 | US20020092564 Flow control of process gas in semiconductor manufacturing |
| 07/18/2002 | US20020092471 Semiconductor deposition apparatus and shower head |
| 07/18/2002 | US20020092281 Residual gas removing device and method thereof |
| 07/18/2002 | US20020092144 Removable lid and floating pivot |
| 07/18/2002 | DE10164603A1 Production of an iron nitride thin layer used in the production of magnetic heads comprises forming an iron nitride epitaxial layer on a substrate by reacting a vaporized iron |
| 07/18/2002 | DE10159702A1 Verfahren und Vorrichtung zur Bearbeitung von Halbleitersubstraten Method and apparatus for processing semiconductor substrates |
| 07/17/2002 | EP1223231A1 Device for holding an optical element made from a cristalline material during a vapor deposition process |
| 07/17/2002 | EP1222687A2 IMPROVED PECVD AND CVD PROCESSES FOR WNx DEPOSITION |
| 07/17/2002 | EP1222679A1 Method and apparatus for controlling wafer uniformity using spatially resolved sensors |
| 07/17/2002 | EP1222316A1 Coated cemented carbide insert |
| 07/17/2002 | EP1222196A1 Deposition of films using organosilsesquioxane-precursors |
| 07/17/2002 | EP1222034A1 Method of forming a thin metal layer on an insulating substrate |
| 07/17/2002 | EP1047506B1 Spinning disk evaporator |
| 07/17/2002 | EP0963459B1 Wafer support apparatus |
| 07/17/2002 | EP0824605B1 Diamond coated body and method of its production |