| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/06/2002 | US6429086 Method of depositing tungsten nitride using a source gas comprising silicon |
| 08/06/2002 | US6428894 Tunable and removable plasma deposited antireflective coatings |
| 08/06/2002 | US6428861 Apparatus and process for plasma treatment of particulate matter |
| 08/06/2002 | US6428859 Activation energy from impinging high energy ion flux; kinetic energy rather than thermal energy drives the reaction of gases; plasma power modulation or wafer bias; low temperature; higher density, superior purity and adhesion |
| 08/06/2002 | US6428850 Single-substrate-processing CVD method of forming film containing metal element |
| 08/06/2002 | US6428847 Gas flow vortex formation for uniform chemical vapor deposition (cvd) on stationary wafer |
| 08/06/2002 | US6428623 Chemical vapor deposition apparatus with liquid feed |
| 08/06/2002 | US6428399 Polishing apparatus for polishing a hard material-coated wafer |
| 08/06/2002 | US6427623 Chemical vapor deposition system |
| 08/06/2002 | US6427622 Hot wire chemical vapor deposition method and apparatus using graphite hot rods |
| 08/06/2002 | US6427621 Plasma processing device and plasma processing method |
| 08/01/2002 | WO2002059956A1 Method of producing electronic device material |
| 08/01/2002 | WO2002059955A1 Method and device for heat treatment |
| 08/01/2002 | WO2002059953A1 Conductor treating single-wafer type treating device and method for semi-conductor treating |
| 08/01/2002 | WO2002059936A2 Resistive heaters and uses thereof |
| 08/01/2002 | WO2002059926A2 Fabrication of high resistivity structures using focused ion beams |
| 08/01/2002 | WO2002059392A1 Method for growing carbon nanotubes above a base that is to be electrically contacted and a component |
| 08/01/2002 | WO2002059333A2 Gene promoters isolated from potato and use thereof |
| 08/01/2002 | WO2002058858A1 Non-plasma $m(f)i$m(g)in situ$m(f)/i$m(g) cleaning of processing chambers using static flow methods |
| 08/01/2002 | WO2002021590A3 Electrostatic chuck with porous regions |
| 08/01/2002 | WO2002014578A3 Chromium-containing cemented tungsten carbide coated cutting insert |
| 08/01/2002 | WO2001003858A9 Method and system for in situ cleaning of semiconductor manufacturing equipment using combination chemistries |
| 08/01/2002 | WO2001002617A9 Semiconductor vacuum deposition system and method having a reel-to-reel substrate cassette |
| 08/01/2002 | US20020103395 Method of producing bis (cyclopentadienyl) ruthenium derivative, bis (cyclopentadienyl) ruthenium derivative produced by the same method, and method of producing thin film of ruthenium or ruthenium compound |
| 08/01/2002 | US20020103394 Organometallic copper complex and preparation of copper thin film by CVD |
| 08/01/2002 | US20020103361 Mammalian chemokines; receptors; reagents; uses |
| 08/01/2002 | US20020103087 Zirconium-doped BST materials and MOCVD process forming same |
| 08/01/2002 | US20020102864 In situ wafer heat for reduced backside contamination |
| 08/01/2002 | US20020102862 Method for fabricating a SiC film and a method for fabricating a SiC multi-layered film structure |
| 08/01/2002 | US20020102861 Fabrication of high resistivity structures using focused ion beams |
| 08/01/2002 | US20020102860 Process for fabricating films of uniform properties on semiconductor devices |
| 08/01/2002 | US20020102859 Method for ultra thin film formation |
| 08/01/2002 | US20020102858 Low contamination high density plasma etch chambers and methods for making the same |
| 08/01/2002 | US20020102847 MOCVD-grown InGaAsN using efficient and novel precursor, tertibutylhydrazine, for optoelectronic and electronic device applications |
| 08/01/2002 | US20020102842 Low temperature integrated metallization process and apparatus |
| 08/01/2002 | US20020102826 Chemical vapor deposition using an organoruthenium precursor, limiting introduction of the oxidation gas to when the precursor is supplying, and reacting at low oxygen partial pressure to form ruthenium film with low oxygen contamination |
| 08/01/2002 | US20020102818 Deposition methods and apparatuses providing surface activation |
| 08/01/2002 | US20020102409 Attaching a foil which comprises the bond coating to the substrate surface, and then fusing the foil to the substrate surface, so that the bond coating adheres to the substrate. |
| 08/01/2002 | US20020102403 Method of coating cutting tools |
| 08/01/2002 | US20020102364 Optical layers are applied by means of a chemical plasma-impulse vaporization (PICVC). |
| 08/01/2002 | US20020102363 Method of making a coating of a microtextured surface |
| 08/01/2002 | US20020102361 Jet plasma process and apparatus for deposition of coatings and the coatings thereof |
| 08/01/2002 | US20020102353 CVD process in which the reaction chamber is flushed with a carbon containing gas; substrate is heated by induction to a temperature at which carbon from the gas phase is deposited on the substrate while forming nanotubes thereon. |
| 08/01/2002 | US20020102318 Die for die compacting of powdered material |
| 08/01/2002 | US20020101952 Apparatus and methods for protecting a jet pump nozzle assembly and inlet-mixer |
| 08/01/2002 | US20020100984 Semiconductor device and its fabrication method |
| 08/01/2002 | US20020100959 Capacitor for semiconductor memory device and method of manufacturing the same |
| 08/01/2002 | US20020100751 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification |
| 08/01/2002 | US20020100556 Method and apparatus having pin electrode for surface treatment using capillary discharge plasma |
| 08/01/2002 | US20020100555 Linear drive system for use in a plasma processing system |
| 08/01/2002 | US20020100554 Substrate processing using a member comprising an oxide of a group IIIB metal |
| 08/01/2002 | US20020100423 Method of fabricating jig for vacuum apparatus |
| 08/01/2002 | US20020100421 Deposited film forming apparatus and deposited film forming method |
| 08/01/2002 | US20020100420 Method and device for vacuum-coating a substrate |
| 08/01/2002 | US20020100418 Versatile atomic layer deposition apparatus |
| 08/01/2002 | US20020100417 Heating-type trap device and film-deposition apparatus |
| 08/01/2002 | US20020100412 Low dislocation buffer and process for production thereof as well as device provided with low dislocation buffer |
| 08/01/2002 | DE10104193A1 Verfahren zur Herstellung einer Halbleiterstruktur mit Siliziumclustern und/oder -nanokristallen und eine Halbleiterstruktur dieser Art A process for producing a semiconductor structure with silicon clusters and / or nanocrystals, and a semiconductor structure of this type |
| 08/01/2002 | DE10102745A1 CVD-Reaktor sowie Verfahren zu seiner Reinigung CVD reactor and method for its purification |
| 08/01/2002 | CA2429983A1 Resistive heaters and uses thereof |
| 07/31/2002 | EP1227172A2 Method of reducing plasma charge damage for plasma processes |
| 07/31/2002 | EP1227171A1 Method for heating a wafer |
| 07/31/2002 | EP1227079A2 Asymmetric beta-ketoiminate ligand compound, preparation method thereof and organometal percursor comprising the same |
| 07/31/2002 | EP1226911A2 Method of manufacturing honeycomb extrusion die and die manufactured according to this method |
| 07/31/2002 | EP1226395A1 Hot wall rapid thermal processor |
| 07/31/2002 | EP1226292A1 Apparatus for growing epitaxial layers on wafers |
| 07/31/2002 | EP1226286A1 Apparatus for atomic layer chemical vapor deposition |
| 07/31/2002 | EP1226285A1 Single crystal tungsten alloy penetrator and method of making |
| 07/31/2002 | EP1133581A4 Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces |
| 07/31/2002 | EP1102616A4 Esrf coolant degassing process |
| 07/31/2002 | EP0708688B1 Method for the improved microwave deposition of thin films |
| 07/31/2002 | CN1362003A Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 07/31/2002 | CN1361784A Copper source reagent compositions, and method of making and using same for microelectronic device structures |
| 07/31/2002 | CN1361710A Auto-switching gas delivery system utilizing sub-atmospheric pressure gas supply vessels |
| 07/30/2002 | US6426477 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate |
| 07/30/2002 | US6426308 Methods for forming films having high dielectric constants |
| 07/30/2002 | US6426307 Ammonia activation gas is delivered into a reactor at the same time as trimethylaluminum and using methanol, ethanol or isopropanol as oxygen source instead of water vapor |
| 07/30/2002 | US6426144 Transparent covering |
| 07/30/2002 | US6426133 Graphite material coated with silicon carbide |
| 07/30/2002 | US6426126 Continuous thin film; electrolysis using organometallic polymer |
| 07/30/2002 | US6426125 Plasma gas flow |
| 07/30/2002 | US6426117 Method for forming a three-component nitride film containing metal and silicon |
| 07/30/2002 | US6425994 Process chamber including stage having improved base and substrate mounting member |
| 07/30/2002 | US6425953 Heating, injecting cleaning gas |
| 07/30/2002 | US6425951 In situ passivation |
| 07/30/2002 | US6425805 Superhard material article of manufacture |
| 07/30/2002 | CA2074896C Process for making cuo superconductors |
| 07/25/2002 | WO2002058141A1 Carburetor, various types of devices using the carburetor, and method of vaporization |
| 07/25/2002 | WO2002058130A1 Method for producing material of electronic device |
| 07/25/2002 | WO2002058129A1 Ferroelectric thin film, metal thin film or oxide thin film, and method and apparatus for preparation thereof, and electric or electronic device using said thin film |
| 07/25/2002 | WO2002058127A1 Plasma treatment device, baffle plate, and method of manufacturing the baffle plate |
| 07/25/2002 | WO2002058126A1 Device and method for treatment |
| 07/25/2002 | WO2002058123A1 Plasma device and plasma generating method |
| 07/25/2002 | WO2002058121A1 Method and device for plasma cvd |
| 07/25/2002 | WO2002058115A2 Method for deposit copper on metal films |
| 07/25/2002 | WO2002058112A2 Copper diffusion barriers |
| 07/25/2002 | WO2002056912A2 Pharmaceutical combination for the treatment of cancer containing a 4-quinazolineamine and another anti-neoplastic agent |
| 07/25/2002 | WO2002019411A3 Method of forming a pre-metal dielectric film on a semiconductor substrate |
| 07/25/2002 | WO2001073865A3 Continuous processing of thin-film batteries and like devices |
| 07/25/2002 | US20020099619 Supply system of compound for chemical vapor deposition and thin - film manufacturing system having the same compound supply system |