| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 09/12/2002 | US20020124965 Method for fabricating a III-V nitride film and an apparatus for fabricating the same |
| 09/12/2002 | US20020124964 Wafer support plate assembly having recessed upper pad and vacuum processing apparatus comprising the same |
| 09/12/2002 | US20020124961 Manifolded fluid delivery system |
| 09/12/2002 | US20020124960 Substrate processing apparatus |
| 09/12/2002 | US20020124959 Plasma monitoring method and semiconductor production apparatus |
| 09/12/2002 | US20020124866 Plasma film-forming apparatus and cleaning method for the same |
| 09/12/2002 | US20020124641 Flow controller |
| 09/12/2002 | DE10102742C1 Tungsten deposition process used in semiconductor manufacture comprises passing reactive mixed gas consisting of tungsten hexafluoride, silane and nitrogen through chamber to form tungsten crystal, and treating with silane and mixed gas |
| 09/11/2002 | EP1239511A1 RF plasma processor |
| 09/11/2002 | EP1239203A1 Modular fluid delivery apparatus |
| 09/11/2002 | EP1238948A1 Method of depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass |
| 09/11/2002 | EP1238421A1 Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition |
| 09/11/2002 | EP1238121A1 Surface preparation of a substrate for thin film metallization |
| 09/11/2002 | EP1237815A1 Abatement of effluents from chemical vapor deposition processes using organometallicsource reagents |
| 09/11/2002 | EP1156992B1 Densification of porous bodies |
| 09/11/2002 | EP1017641B1 Method for lubricating glass molds, plungers and the like |
| 09/11/2002 | CN1369021A Pulsed plasma processing method and apparatus |
| 09/11/2002 | CN1368904A Method of forming thin metal layer on insulating substrate |
| 09/11/2002 | CN1368501A Di (cyclopentadienyl) ruthenium derivative and its preparation method and method for preparing ruthenium or ruthenium compound film |
| 09/11/2002 | CN1090816C Treatment unit of gas heat-transfer plasma |
| 09/11/2002 | CN1090807C Device for processing workpiece using plasma |
| 09/11/2002 | CN1090539C Procedure for depositing thin layer on surface of plastic matrix |
| 09/10/2002 | US6449521 Decontamination of a plasma reactor using a plasma after a chamber clean |
| 09/10/2002 | US6448688 Hard carbon film and surface-acoustic-wave substrate |
| 09/10/2002 | US6448666 Semiconductor; silicon oxyfluoride |
| 09/10/2002 | US6448536 Single-substrate-heat-processing apparatus for semiconductor process |
| 09/10/2002 | US6448191 Dissolving barium, strontium, and titanium dipivaloyl compounds in an organic solvent, vaporizing, depositing to form barium strontium titanium oxide coating |
| 09/10/2002 | US6448187 Depositing a silicon oxide film by oxidation of silicon compound, exposing to water or a hydrophobic-imparting surfactant such as hexamethyldisilazane and curing |
| 09/10/2002 | US6448186 Method and apparatus for use of hydrogen and silanes in plasma |
| 09/10/2002 | US6448181 Introducing only one of a high melting metal composition gas and a reducing gas for a short time as a pre-process just before the film forming process to improve repeatability of a thickness and uniformity of thickness of the film |
| 09/10/2002 | US6448180 Deposition of in-situ doped semiconductor film and undoped semiconductor film in the same reaction chamber |
| 09/10/2002 | US6448178 Heating in an oxidizing atmosphere prevents dopants such as the phosphorous atoms from escaping from the thin film and increasing the resistance of the film |
| 09/10/2002 | US6448128 Capacitor for semiconductor memory device and method of manufacturing the same |
| 09/10/2002 | US6447912 Coated cemented carbide cutting tool and method of coating it with diamond |
| 09/10/2002 | US6447891 Low emissivity; infrared reflecting layer and a protective diamond-like carbon on (directly or indirectly) a substrate of glass, plastic, ceramic |
| 09/10/2002 | US6447890 Coatings for cutting tools |
| 09/10/2002 | US6447853 Method and apparatus for processing semiconductor substrates |
| 09/10/2002 | US6447851 Field emission from bias-grown diamond thin films in a microwave plasma |
| 09/10/2002 | US6447850 Polycrystalline silicon thin film forming method |
| 09/10/2002 | US6447843 Synthetic diamond wear component and method |
| 09/10/2002 | US6447842 Process for producing a corrosion-resistant member |
| 09/10/2002 | US6447652 Thin-film forming method and thin-film forming apparatus |
| 09/10/2002 | US6447651 High-permeability magnetic shield for improved process uniformity in nonmagnetized plasma process chambers |
| 09/10/2002 | US6447613 Substrate dechucking device and substrate dechucking method |
| 09/10/2002 | US6447612 Film-forming apparatus for forming a deposited film on a substrate, and vacuum-processing apparatus and method for vacuum-processing an object |
| 09/10/2002 | US6447607 Apparatus for growing thin films |
| 09/10/2002 | US6447604 Depositing nitride homoepitaxial layer by vapor phase epitaxy (vpe) |
| 09/10/2002 | US6447576 Cleaning agent and cleaning process of harmful gas |
| 09/10/2002 | US6446573 Plasma process device |
| 09/10/2002 | CA2060823C Diamond-or diamond-like carbon-coated hard materials |
| 09/06/2002 | WO2002069380A2 Atomically thin highly resistive barrier layer in a copper via |
| 09/06/2002 | WO2002069376A1 Hybrid deposition system & methods |
| 09/06/2002 | WO2002069371A2 SOURCE REAGENT COMPOSITION FOR CVD FORMATION OF Zr/Hf DOPED GATE DIELECTRIC AND HIGH DIELECTRIC CONSTANT METAL OXIDE THIN FILMS AND METHOD OF USING SAME |
| 09/06/2002 | WO2002069065A2 Flow controller |
| 09/06/2002 | WO2002068713A1 Vaporizer |
| 09/06/2002 | WO2002068712A2 Removal of etchant residues |
| 09/06/2002 | WO2002068711A1 Heat treating device |
| 09/06/2002 | WO2002068710A1 Method for producing parts and a vacuum processing system |
| 09/06/2002 | WO2002068709A1 A chemical vapor deposition process and apparatus thereof |
| 09/06/2002 | WO2002068127A2 Manifolded fluid delivery system |
| 09/06/2002 | WO2002067770A2 Implantable device using ultra-nanocrystalline diamond |
| 09/06/2002 | WO2002052617B1 Method and device for treating semiconductor substrates |
| 09/06/2002 | WO2002038515B1 Solar management coating system including protective dlc |
| 09/06/2002 | WO2002031219A8 Electrostatically clamped edge ring for plasma processing |
| 09/06/2002 | WO2002027061A8 Process chamber lid |
| 09/05/2002 | US20020123246 Method for fabricating a III nitride film, an underlayer for fabricating a III nitride film and a method for fabricating the same underlayer |
| 09/05/2002 | US20020123245 Used to prevent the exposure light for exposing the resist from reflecting at a film lying under the resist |
| 09/05/2002 | US20020123239 Method and apparatus for preparing nitride semiconductor surfaces |
| 09/05/2002 | US20020123230 Gas distribution apparatus for semiconductor processing |
| 09/05/2002 | US20020123215 Process for producing barrier film and barrier film thus produced |
| 09/05/2002 | US20020123189 Method of manufacturing a transistor in a semiconductor device |
| 09/05/2002 | US20020122897 Maintaining reduced pressure in a plasma-treating chamber for treatment with a plasma in which a substrate that is to be treated is contained, introducing treating gas and microwaves into chamber wherein a metallic antenna is disposed |
| 09/05/2002 | US20020122885 Methods, systems, and apparatus for uniform chemical-vapor depositions |
| 09/05/2002 | US20020122884 Method for growing thin films by catalytic enhancement |
| 09/05/2002 | US20020122879 Forming a crystalline thin film on inner surfaces of voids in a porous amorphous film; generating image data representing porous amorphous film having said crystalline thin film with using a transmission electron microscope |
| 09/05/2002 | US20020122701 Oxide coated cutting tool |
| 09/05/2002 | US20020121345 Multi-chamber system for semiconductor process |
| 09/05/2002 | US20020121342 Lid assembly for a processing system to facilitate sequential deposition techniques |
| 09/05/2002 | US20020121249 Vaporizer |
| 09/05/2002 | US20020121241 Processing chamber and method of distributing process fluids therein to facilitate sequential deposition of films |
| 09/05/2002 | DE10136858A1 Device for coating a substrate with a structured layer in a process chamber used in the production of organic light-emitting diodes has a gas inlet with openings that can be heated |
| 09/05/2002 | DE10062713C1 Verfahren zum Beschichten von Substraten und Maskenhaltern A process for coating substrates and mask holders |
| 09/04/2002 | EP1237210A1 Method for producing electrode for lithium secondary cell |
| 09/04/2002 | EP1236811A2 Chemical vapor deposition apparatus and chemical deposition method |
| 09/04/2002 | EP1236381A1 Device for hybrid plasma processing |
| 09/04/2002 | EP1236224A1 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide |
| 09/04/2002 | EP1161573B1 Tool with a molybdenum sulphide coating and method for producing the same |
| 09/04/2002 | EP1073531B1 Device and method for alternating pressure flushing |
| 09/04/2002 | EP0914497A4 Hard graphite-like material bonded by diamond-like framework |
| 09/04/2002 | EP0900287B1 Substrate with a superhard coating containing boron and nitrogen and method of making the same |
| 09/04/2002 | EP0684908B2 Safety document and process for producing the same |
| 09/04/2002 | CN1367713A Apparatus and method for point-of-use treatment of effluent gas streams |
| 09/04/2002 | CN1367525A Equipment for producing gallium nitride film semiconductor and waste gas purifying equipment |
| 09/04/2002 | CN1367205A Organosilicon precursor for interlayer medium film with low dielectric constant |
| 09/03/2002 | US6444940 Heat treating device and heat treating method |
| 09/03/2002 | US6444898 Transparent layered product and glass article using the same |
| 09/03/2002 | US6444818 Metal complexes with chelating C-, N-donor ligands for forming metal-containing films |
| 09/03/2002 | US6444556 Chemistry for chemical vapor deposition of titanium containing films |
| 09/03/2002 | US6444482 Method of monitoring power supplied to heat a substrate |
| 09/03/2002 | US6444480 Providing a semiconductor device fabrication apparatus comprising a thermal treatment device selected from the group consisting of a chemical vapor deposition sputtering device and a thermal diffusion device including an annealing furnace, |