| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 10/02/2002 | DE10120766C1 Depositing a layer in a reactor comprises feeding a sputtering gas into the reactor, igniting a plasma, growing a layer on a deposition surface |
| 10/02/2002 | DE10114468A1 Korrosionsstabiles Laminat, Verfahren zu seiner Herstellung und seine Verwendung Stable corrosion laminate, process for its preparation and its use |
| 10/02/2002 | DE10112731A1 Beschichtung von Substraten Coating of substrates |
| 10/02/2002 | CN2514007Y Heater for tung sten filament non-deformable at high-temp and special tungsten filament winding frame |
| 10/02/2002 | CN1372646A Anti-reflection coatings and coated articles |
| 10/02/2002 | CN1372302A Cvd方法 Cvd method |
| 10/01/2002 | US6458722 Controlled method of silicon-rich oxide deposition using HDP-CVD |
| 10/01/2002 | US6458721 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers |
| 10/01/2002 | US6458719 Low dielectric constant film composed of boron, nitrogen, and hydrogen having thermal resistance, process for forming the film, use of the film between semiconductor device layers, and the device formed from the film |
| 10/01/2002 | US6458718 Providing a substrate; providing a chemical precursor of the formula (f3c)4-m-nmxmrn, wherein m is silicon or germenium, x is halogen, r is hydrogen or d, activating the precursor to deposit a fluorine containing material onto the substrate |
| 10/01/2002 | US6458716 Method of manufacturing a semiconductor device |
| 10/01/2002 | US6458707 Tool for semiconductor manufacturing apparatus and method for using the same |
| 10/01/2002 | US6458701 Method for forming metal layer of semiconductor device using metal halide gas |
| 10/01/2002 | US6458699 Methods of forming a contact to a substrate |
| 10/01/2002 | US6458684 Single step process for blanket-selective CVD aluminum deposition |
| 10/01/2002 | US6458416 Deposition methods |
| 10/01/2002 | US6458415 Method of forming diamond film and film-forming apparatus |
| 10/01/2002 | US6458330 Installation in which an operation is performed requiring over the atmosphere inside a chamber |
| 10/01/2002 | US6458212 Mesh filter design for LPCVD TEOS exhaust system |
| 10/01/2002 | US6457494 Chemical delivery system having purge system utilizing multiple purge techniques |
| 10/01/2002 | CA2218518C Slip free vertical rack design |
| 09/26/2002 | WO2002075801A2 Method of fabricating oxides with low defect densities |
| 09/26/2002 | WO2002075790A2 Method and apparatus for transferring heat from a substrate to a chuck |
| 09/26/2002 | WO2002075021A1 Method for plasma coating and device for carrying out the method |
| 09/26/2002 | WO2002075020A1 Plating method of metal film on the surface of polymer |
| 09/26/2002 | WO2002075019A1 Processing system for semiconductor |
| 09/26/2002 | WO2002075018A1 A ccvd method for producing tubular carbon nanofibers |
| 09/26/2002 | WO2002075011A2 Thin film forming method and apparatus |
| 09/26/2002 | WO2002074473A2 Method of producing tantalum and niobium alkoxides |
| 09/26/2002 | WO2002074445A2 Atomizer |
| 09/26/2002 | WO1999036931A3 Low ceiling temperature process for a plasma reactor with heated source of a polymer-hardening precursor material |
| 09/26/2002 | US20020137362 Method for forming crystalline silicon nitride |
| 09/26/2002 | US20020137359 Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same |
| 09/26/2002 | US20020137336 Method for forming a tungsten silicide layer |
| 09/26/2002 | US20020137335 Methods of chemical vapor depositing ruthenium by varying chemical vapor deposition parameters |
| 09/26/2002 | US20020137334 Process for producing semiconductor and apparatus for production |
| 09/26/2002 | US20020137323 Metal ion diffusion barrier layers |
| 09/26/2002 | US20020137315 Method for depositing a tungsten silicide layer |
| 09/26/2002 | US20020137312 Emissivity-change-free pumping plate kit in a single wafer chamber |
| 09/26/2002 | US20020137311 Within atomic layer or chemical vapor deposition reactors , delivering a purge gas in a sleeve surrounding a conductor associated with an electric heating assembly for a wafer so that the purge gas envelopes the electrical conductor in the sleeve and escapes from an unsealed end into an exhaust system |
| 09/26/2002 | US20020137274 Lower electrode, a dielectric layer formed on the lower electrode of a titanium tantalum oxynitride, and an upper electrode; capacitor; increased storage capacitance, preventing leakage current |
| 09/26/2002 | US20020136909 Fluid injector for and method of prolonged delivery and distribution of reagents into plasma |
| 09/26/2002 | US20020136893 Musical instrument strings with polymer treated surface |
| 09/26/2002 | US20020136671 Production apparatus for producing gallium nitride film semiconductor and cleaning apparatus for exhaust gas |
| 09/26/2002 | US20020135969 Electrostatic chuck having composite dielectric layer and method of manufacture |
| 09/26/2002 | US20020134672 Depositing a layer of filler material on the surface, covering the surface irregularities and etching the layer of filler material by directing particles at an oblique incident angle at the layer of filler material |
| 09/26/2002 | US20020134511 Substrate supporting table,method for producing same, and processing system |
| 09/26/2002 | US20020134508 Matching unit and plasma processing system |
| 09/26/2002 | US20020134507 Gas delivery metering tube |
| 09/26/2002 | US20020134505 Semiconductor substrate processing chamber having interchangeable lids actuating plural gas interlock levels |
| 09/26/2002 | US20020134466 Silicon steel sheet and method for producing the same |
| 09/26/2002 | US20020134439 Gas recirculation flow control method and apparatus for use in vacuum system |
| 09/26/2002 | US20020134309 Gas delivering device |
| 09/26/2002 | US20020134308 Vacuum processing apparatus |
| 09/26/2002 | US20020134307 Thin film deposition apparatus for semiconductor |
| 09/26/2002 | US20020134244 Trap apparatus and method for condensable by-products of deposition reactions |
| 09/26/2002 | US20020134233 Exhausting perfluoro compounds (PFC's) produced by etching and/or vapor deposition into a common stream then scrubbing |
| 09/26/2002 | DE10113169A1 Production of niobium or tantalum penta-alcoholate for use in chemical vapor deposition, comprises dissolution of the corresponding metal pentachloride at low temperature in alkanol containing excess ammonia |
| 09/26/2002 | CA2426648A1 Plating method of metal film on the surface of polymer |
| 09/25/2002 | EP1244136A2 Material handling system and method for a multi-workpiece plasma treatment system |
| 09/25/2002 | EP1243679A2 Carbon fiber and composite using the same |
| 09/25/2002 | EP1243667A2 Gas recirculation flow control method and apparatus for use in vacuum system for semiconductor manufacture |
| 09/25/2002 | EP1243021A2 Method and apparatus for supercritical processing of a workpiece |
| 09/25/2002 | EP1243017A1 Linear drive system for use in a plasma processing system |
| 09/25/2002 | EP1242656A1 Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites |
| 09/25/2002 | EP1242649A1 Method for producing composite layers using a plasma jet source |
| 09/25/2002 | EP1242648A1 Coating method |
| 09/25/2002 | EP1242647A1 Method of depositing transition metal nitride thin films |
| 09/25/2002 | EP1242646A1 Liquid delivery mocvd of sbt |
| 09/25/2002 | EP1242328A1 Diamond-like carbon coating on a non-metal article for added hardness and abrasion resistance |
| 09/25/2002 | EP1218916A4 Electron beam plasma formation for surface chemistry |
| 09/25/2002 | EP0946407B1 Device and method for the storage, transportation and production of active fluorine |
| 09/25/2002 | EP0840811B1 System and method for thermal processing of a semiconductor substrate |
| 09/25/2002 | EP0804631B1 Method of depositing thin group iiia metal films |
| 09/24/2002 | US6455882 Semiconductor device having a hydrogen barrier layer |
| 09/24/2002 | US6455814 Backside heating chamber for emissivity independent thermal processes |
| 09/24/2002 | US6455717 For forming films during preparation of semiconductor structures using chemical vapor deposition |
| 09/24/2002 | US6455445 Silicone polymer insulation film on semiconductor substrate and method for forming the film |
| 09/24/2002 | US6455442 Evaporating ultraviolet light absorber of hydroxyphenyl-s-triazine class under vacuum while exposing it to plasma and allowing it to deposit on substrate |
| 09/24/2002 | US6455437 Method and apparatus for monitoring the process state of a semiconductor device fabrication process |
| 09/24/2002 | US6455421 Plasma treatment of tantalum nitride compound films formed by chemical vapor deposition |
| 09/24/2002 | US6455418 Barrier for copper metallization |
| 09/24/2002 | US6455414 Method for improving the adhesion of sputtered copper films to CVD transition metal based underlayers |
| 09/24/2002 | US6455108 Method for preparation of a thermal spray coated substrate for use in an electrical energy storage device |
| 09/24/2002 | US6455101 Depositing a magnetic film layer as a data recording layer on a surface of a substrate while the substrate is at a recording layer on a surface of a substrate while the substrate is at a magnetic film deposition temperature; |
| 09/24/2002 | US6454957 Ruthenium and ruthenium dioxide removal method and material |
| 09/24/2002 | US6454912 Method and apparatus for the fabrication of ferroelectric films |
| 09/24/2002 | US6454909 Method and apparatus for forming a film on an object to be processed |
| 09/24/2002 | US6454898 Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
| 09/24/2002 | US6454877 Laser phase transformation and ion implantation in metals |
| 09/24/2002 | US6454866 Wafer support system |
| 09/24/2002 | US6454865 Low mass wafer support system |
| 09/24/2002 | US6454863 Compact process chamber for improved process uniformity |
| 09/24/2002 | US6454860 Deposition reactor having vaporizing, mixing and cleaning capabilities |
| 09/24/2002 | US6454855 Method for producing coated workpieces, uses and installation for the method |
| 09/24/2002 | US6454854 Semiconductor wafer and production method therefor |
| 09/24/2002 | US6454852 High efficiency silicon wafer optimized for advanced semiconductor devices |
| 09/24/2002 | US6454563 Wafer treatment chamber having thermal reflector |
| 09/24/2002 | US6453992 Temperature controllable gas distributor |
| 09/24/2002 | US6453913 Method of cleaning a film deposition apparatus, method of dry etching a film deposition apparatus, and an article production method including a process based on the cleaning or dry etching method |