| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/16/2003 | US20030012709 Including recharge container block, pressurization gas block, purge gas block, waste recovery block, vacuum block, solvent supply block, degas block, control block, filtration block; use in electronics, optical fiber, semiconductor manufacturing |
| 01/16/2003 | US20030012538 Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides |
| 01/16/2003 | US20030011143 Metallic gasket for vacuum device and method of producing thereof |
| 01/16/2003 | US20030011022 Semiconductor device and a process for manufacturing a oxide film |
| 01/16/2003 | US20030010765 Hot plate |
| 01/16/2003 | US20030010645 Barrier enhancement process for copper interconnects |
| 01/16/2003 | US20030010452 Shower head of a wafer treatment apparatus having a gap controller |
| 01/16/2003 | US20030010451 Lid assembly for a processing system to facilitate sequential deposition techniques |
| 01/16/2003 | US20030010446 Method of manufacturing a processing apparatus |
| 01/16/2003 | US20030010355 Local and remote gas dissociators coupled to a semiconductor processing chamber |
| 01/16/2003 | US20030010354 Fluorine process for cleaning semiconductor process chamber |
| 01/16/2003 | US20030010292 Electrostatic chuck with dielectric coating |
| 01/16/2003 | US20030010291 Hig molecular weight polymer forms effective entanglements or associations with neighboring starch molecules; melt spinning |
| 01/16/2003 | US20030010290 Apparatus and method for coating a substrate by means of a chemical gas phase separation process |
| 01/16/2003 | US20030010281 Semiconductor substrate |
| 01/16/2003 | US20030010256 Compounds for forming alumina films using chemical vapor deposition method and process for preparing the compound |
| 01/16/2003 | US20030010091 System and method for detecting occlusions in a semiconductor manufacturing device |
| 01/15/2003 | EP1276031A1 Gas delivery metering tube |
| 01/15/2003 | EP1275168A2 Method and apparatus for integrated-battery devices |
| 01/15/2003 | EP1275139A1 Uv pretreatment process of ultra-thin oxynitride for formation of silicon nitride films |
| 01/15/2003 | EP1275135A1 Methods and apparatus for thermally processing wafers |
| 01/15/2003 | EP1275129A1 E-beam/microwave gas jet pecvd method and apparatus for depositing and/or surface modification of thin film materials |
| 01/15/2003 | EP1274879A1 A process for the purification of organometallic compounds or heteroatomic organic compounds with hydrogenated getter alloys |
| 01/15/2003 | EP1274878A1 A process for the purification of organometallic compounds or heteroatomic organic compounds with a catalyst based on iron and manganese supported on zeolites |
| 01/15/2003 | EP1274877A2 A method of determining the end point of a plasma cleaning operation |
| 01/15/2003 | EP1274876A2 Cleaning of a plasma processing system silicon roof |
| 01/15/2003 | EP1274875A2 Method and apparatus for providing uniform gas delivery to substrates in cvd and pecvd processes |
| 01/15/2003 | EP1099006B1 Liquid precursor for chemical vapor deposition |
| 01/15/2003 | EP1038048B1 Gas feeding system for chemical vapor deposition reactor and method of controlling the same |
| 01/15/2003 | EP0953065B1 Coated cutting insert |
| 01/15/2003 | CN1391283A Semiconductor device and manufacture thereof |
| 01/15/2003 | CN1390667A Amorphous carbon coated tools and manufacture thereof |
| 01/14/2003 | US6507007 System of controlling the temperature of a processing chamber |
| 01/14/2003 | US6506994 Low profile thick film heaters in multi-slot bake chamber |
| 01/14/2003 | US6506691 High rate silicon nitride deposition method at low pressures |
| 01/14/2003 | US6506686 Plasma processing apparatus and plasma processing method |
| 01/14/2003 | US6506676 Method of manufacturing semiconductor devices with titanium aluminum nitride work function |
| 01/14/2003 | US6506667 Growth of epitaxial semiconductor material with improved crystallographic properties |
| 01/14/2003 | US6506666 Method of fabricating an SrRuO3 film |
| 01/14/2003 | US6506451 Composite structure and process for producing it |
| 01/14/2003 | US6506450 Reactor for coating flat substrates and process for manufacturing such substrates |
| 01/14/2003 | US6506352 Method for removing substances from gases |
| 01/14/2003 | US6506312 Vapor deposition chamber components and methods of making the same |
| 01/14/2003 | US6506255 Apparatus for supplying gas used in semiconductor processing |
| 01/14/2003 | US6506254 Semiconductor processing equipment having improved particle performance |
| 01/14/2003 | US6506253 Photo-excited gas processing apparatus for semiconductor process |
| 01/14/2003 | US6506252 Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition |
| 01/14/2003 | CA2114739C Diamond film coating for mating parts |
| 01/09/2003 | WO2003003471A1 Semiconductor device |
| 01/09/2003 | WO2003003404A2 Process chamber components having textured internal surfaces and method of manufacture |
| 01/09/2003 | WO2003003118A2 Mask repair with electron beam-induced chemical etching |
| 01/09/2003 | WO2003002779A1 Method for forming ultra-high strength elastic diamond like carbon structure |
| 01/09/2003 | WO2003002673A1 Cubic boron nitride composition, coating and articles made therefrom, methods of making and using said composition, coating and articles |
| 01/09/2003 | WO2003002629A1 Prduction method for copolymer film, copolymer film produced by the forming method, and semiconductor device using copolymer film |
| 01/09/2003 | WO2003002456A2 Method for the selective production of ordered carbon nanotubes in a fluidised bed |
| 01/09/2003 | WO2003002269A2 Article having a plasmapolymer coating and method for producing the same |
| 01/09/2003 | WO2002059926A3 Fabrication of high resistivity structures using focused ion beams |
| 01/09/2003 | WO2002031875A3 Dielectric interface films and methods therefor |
| 01/09/2003 | US20030009044 For producing ceramic protective layers |
| 01/09/2003 | US20030008528 Surface treatment of c-doped SiO2 film to enhance film stability during 02 ashing |
| 01/09/2003 | US20030008501 Tantalum nitride CVD deposition by tantalum oxide densification |
| 01/09/2003 | US20030008500 Plasma semiconductor processing system and method |
| 01/09/2003 | US20030008454 Fabricating capacitor of semiconductor device |
| 01/09/2003 | US20030008419 Induction magnet for use in producing high-density plasma and method of manufacturing the same, and semiconductor manufacturing equipment comprising the induction magnet |
| 01/09/2003 | US20030008417 Semiconductor integrated circuit device and method of manufacturing the same |
| 01/09/2003 | US20030008181 Oxide coated cutting tool |
| 01/09/2003 | US20030008072 Atomic layer deposition using organometallic complex with beta-diketone ligand |
| 01/09/2003 | US20030008070 Using organometallic compound; heating decomposition |
| 01/09/2003 | US20030008069 Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers |
| 01/09/2003 | US20030008067 Method for fabricating ceramic matrix composite |
| 01/09/2003 | US20030006218 Deposited film forming method and deposited film forming apparatus |
| 01/09/2003 | US20030006130 Non-conductive hollow substrate material inside of which a plasma is generated from a process gas by producing a magnetic field perpendicular to a driection of a substrate depth |
| 01/09/2003 | US20030006019 Electrically controlled plasma uniformity in a high density plasma source |
| 01/09/2003 | US20030005886 Horizontal reactor for compound semiconductor growth |
| 01/09/2003 | US20030005879 Method for producing coated workpieces, uses and installation for the method |
| 01/09/2003 | CA2455086A1 Method for the selective production of ordered carbon nanotubes in a fluidised bed |
| 01/08/2003 | EP1273683A2 Atomic layer deposition method using a group IV metal precursor |
| 01/08/2003 | EP1273677A2 Method of depositing optical films |
| 01/08/2003 | EP1273523A1 Plastic container for liquid containing volatile organic substance |
| 01/08/2003 | EP1273058A2 Thin-film battery having ultra-thin electrolyte and associated method |
| 01/08/2003 | EP1273054A2 Battery-operated wireless-communication apparatus and method |
| 01/08/2003 | EP1273027A1 Reaction chamber with at least one hf feedthrough |
| 01/08/2003 | EP1272693A1 Method for growing semiconductor crystalline materials containing nitrogen |
| 01/08/2003 | EP1272683A1 Dlc layer system and method for producing said layer system |
| 01/08/2003 | EP1097253B1 Ion energy attenuation |
| 01/08/2003 | EP0919066B1 Magnetron |
| 01/08/2003 | EP0910686B1 Temperature controlling method and apparatus for a plasma processing chamber |
| 01/08/2003 | EP0832312B1 Method and apparatus for silicon deposition in a fluidized-bed reactor |
| 01/08/2003 | EP0828867B1 Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities |
| 01/08/2003 | CN2529876Y Metallic organic compound vapor deposition appts. for growth of zinc oxide thin film |
| 01/08/2003 | CN1389910A Method for forming film using atomic layer deposition |
| 01/08/2003 | CN1389905A Semiconducting film, semiconductor device and their production methods |
| 01/08/2003 | CN1389904A Transverse epitaxial growth process of high-quality gallium nitride film |
| 01/08/2003 | CN1389901A Method for producing smooth-surface crystalization phase-change layer of atomic distinguish storage device |
| 01/08/2003 | CN1389891A Substrate processing method, film-forming method and method and apparatus for producing electronic resource |
| 01/08/2003 | CN1389593A Normal temperature diamond crystal film and its formation |
| 01/08/2003 | CN1389592A Method for heating lining |
| 01/08/2003 | CN1389591A Low-permittivity material and processing method via CVD |
| 01/08/2003 | CN1389589A Deposition process of low-stress superthick nitride and silicide film |
| 01/08/2003 | CN1389305A Coating method of making antistatic coating of display panel stick to earthing element directly |