| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/10/2003 | WO2003030207A1 Method and device for producing a plasma |
| 04/10/2003 | WO2003029517A1 Process for controlling thin film uniformity and products produced thereby |
| 04/10/2003 | WO2003029516A1 Apparatus for inverted cvd |
| 04/10/2003 | WO2003029515A2 Formation of composite tungsten films |
| 04/10/2003 | WO2003029514A2 Method of depositing cvd and ald films onto low-dielectric-constant dielectrics |
| 04/10/2003 | WO2003019624A3 Dielectric barrier discharge process for depositing silicon nitride film on substrates |
| 04/10/2003 | WO2003009318A8 Support with getter-material for microelectronic, microoptoelectronic or micromechanical device |
| 04/10/2003 | WO2003006933A3 System and method for detecting occlusions in a semiconductor manufacturing device |
| 04/10/2003 | WO2003005396A3 Method and apparatus for scanned instrument calibration |
| 04/10/2003 | WO2002097870A3 Diffuser and rapid cycle chamber |
| 04/10/2003 | WO2002085809A8 Photo-induced hydrophilic article and method of making same |
| 04/10/2003 | WO2002084729A3 Method for producing a chalcogenide-semiconductor layer of the abc2 type with optical process monitoring |
| 04/10/2003 | US20030068881 Method of depositing low k barrier layers |
| 04/10/2003 | US20030068869 Dopant precursors and processes |
| 04/10/2003 | US20030068853 Method for low temperature chemical vapor deposition of low-k films using selected cyclosiloxane and ozone gases for semiconductor applications |
| 04/10/2003 | US20030068851 Dopant precursors and processes |
| 04/10/2003 | US20030068848 MFOS memory transistor |
| 04/10/2003 | US20030068534 Formed by annealing vapor deposited film of aluminum oxide and/or silicon oxide; for manufacturing packaging container which prevents permeation of oxygen gas or steam; shelf-life; storage stability |
| 04/10/2003 | US20030068533 For use in moisture sensitive electronic and microelectronic devices such as screens containing electroluminescent materials |
| 04/10/2003 | US20030068448 Method for reducing contaminants in a CVD chamber |
| 04/10/2003 | US20030068444 Method to solve particle performance of FSG layer by using UFU season film for FSG process |
| 04/10/2003 | US20030068437 Method and apparatus for forming insulating film containing silicon oxy-nitride |
| 04/10/2003 | US20030066746 Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning |
| 04/10/2003 | US20030066607 Flexibly suspended gas distribution manifold for plasma chamber |
| 04/10/2003 | US20030066605 Air exhaust system of a chamber for manufacturing semiconductor device |
| 04/10/2003 | US20030066587 Susceptor for semiconductor manufacturing equipment and process for producing the same |
| 04/10/2003 | US20030066541 Etching; cleaning gas mixture containing fluoropolymer |
| 04/10/2003 | US20030066487 Plasma processing system and surface processing method |
| 04/10/2003 | US20030066486 Microwave heat shield for plasma chamber |
| 04/10/2003 | US20030066485 Plasma CVD apparatus |
| 04/10/2003 | US20030066484 Electrode cover, plasma apparatus utilizing the cover, and method of fitting the cover onto the plasma electrode |
| 04/10/2003 | US20030066483 Atomic layer deposition apparatus and method for operating the same |
| 04/10/2003 | US20030066482 Lid cooling mechanism and method for optimized deposition of low-K dielectric using TRI methylsilane-ozone based processes |
| 04/10/2003 | CA2462102A1 Apparatus for inverted cvd |
| 04/09/2003 | EP1300878A1 Device and method for plasma processing, and slow-wave plate |
| 04/09/2003 | EP1300877A1 Plasma processing device |
| 04/09/2003 | EP1300875A1 Plasma processing device |
| 04/09/2003 | EP1300380A1 Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating. |
| 04/09/2003 | EP1299900A2 METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((Al,In,Ga)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES |
| 04/09/2003 | EP1299573A2 Method to isolate multi zone heater from atmosphere |
| 04/09/2003 | EP1299572A2 Method for vapour deposition of a film onto a substrate |
| 04/09/2003 | EP1299571A1 Apparatus for performing at least one process on a substrate |
| 04/09/2003 | EP1299461A2 Barrier layer for polymers and containers |
| 04/09/2003 | EP1299404A1 Organometallic compounds and their use as precursors for forming films and powders of metal or metal derivatives |
| 04/09/2003 | EP1177156B1 Highly tetrahedral amorphous carbon coating on glass |
| 04/09/2003 | EP0959148B1 Method for producing diamond films using a vapour-phase synthesis system |
| 04/09/2003 | EP0858579B1 Modification of metal surfaces |
| 04/09/2003 | CN1409778A Magnesium-doped III-V nitrides & Methods |
| 04/09/2003 | CN1408717A Ruthenium complex, its producing method and method for producing film |
| 04/09/2003 | CN1105256C Gas panel |
| 04/08/2003 | US6545809 Color shifting carbon-containing interference pigments |
| 04/08/2003 | US6545420 Plasma reactor using inductive RF coupling, and processes |
| 04/08/2003 | US6545245 Method for dry cleaning metal etching chamber |
| 04/08/2003 | US6544901 Plasma thin-film deposition method |
| 04/08/2003 | US6544900 In situ dielectric stacks |
| 04/08/2003 | US6544889 Method for tungsten chemical vapor deposition on a semiconductor substrate |
| 04/08/2003 | US6544875 Chemical vapor deposition of silicate high dielectric constant materials |
| 04/08/2003 | US6544869 Method and apparatus for depositing semiconductor film and method for fabricating semiconductor device |
| 04/08/2003 | US6544857 Dielectric capacitor manufacturing method and semiconductor storage device manufacturing method |
| 04/08/2003 | US6544835 Method of forming a ruthenium film by CVD |
| 04/08/2003 | US6544599 Providing dry particles with electrostatic charges to form dry charged particles and substrate with an electrostatic potential; contacting dry charged particles with substrate to form particle coated substrate; growing polycrystalline layer |
| 04/08/2003 | US6544488 Gas, which differs from a cleaning gas and is not required to be decomposed for evacuation, is introduced upstream |
| 04/08/2003 | US6544482 Reducing effluents; cleaning gases |
| 04/08/2003 | US6544380 Plasma treatment method and apparatus |
| 04/08/2003 | US6544345 Etching, removal deposits |
| 04/08/2003 | US6544341 System for fabricating a device on a substrate with a process gas |
| 04/08/2003 | US6544340 Heater with detachable ceramic top plate |
| 04/08/2003 | US6544339 Rectilinear wedge geometry for optimal process control in chemical vapor deposition and rapid thermal processing |
| 04/08/2003 | US6544333 Chemical vapor deposition system for polycrystalline silicon rod production |
| 04/08/2003 | US6543459 Vapor deposition; cleaning; measuring capacitance; calibration |
| 04/08/2003 | CA2264317C Susceptor for semiconductor manufacturing equipment and process for producing the same |
| 04/03/2003 | WO2003028069A2 Method for cyclic cvd |
| 04/03/2003 | WO2003027350A1 Amorphous hydrogenated carbon film |
| 04/03/2003 | WO2003026796A2 A nano-supported sponge catalyst for nanotube growth |
| 04/03/2003 | US20030064610 Oxidizing silicon compounds with oxygen containing compound at a constant RF power level; electrodeposition |
| 04/03/2003 | US20030064607 Method for improving nucleation and adhesion of CVD and ALD films deposited onto low-dielectric-constant dielectrics |
| 04/03/2003 | US20030064556 Methods and apparatus for producing stable low k FSG film for HDP-CVD |
| 04/03/2003 | US20030064292 Solid-state thin-film batteries for example; creating multilayer materials by means of shadow masking a vacuum coating process on a fibrous substrate |
| 04/03/2003 | US20030064231 Glass having a photocatalytically active titanium oxide coating and has a visible light reflection measured on the coated side of </= 35% |
| 04/03/2003 | US20030064225 Diamond-coated member |
| 04/03/2003 | US20030064198 Method of manufacturing window using ion beam milling of glass substrate(s) |
| 04/03/2003 | US20030064169 Having a grid for enabling a deposition to be implemented at a low temperature |
| 04/03/2003 | US20030064154 Low-K dielectric thin films and chemical vapor deposition method of making same |
| 04/03/2003 | US20030063284 Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use |
| 04/03/2003 | US20030062554 Oriented ferroelectric thin-film device and method for manufacturing the same |
| 04/03/2003 | US20030062128 Apparatus and method for plasma treatment |
| 04/03/2003 | US20030062064 Method of removing PECVD residues of fluorinated plasma using in-situ H2 plasma |
| 04/03/2003 | US20030061991 Protective shield and system for gas distribution |
| 04/03/2003 | US20030061989 Semiconductor manufacturing system |
| 04/03/2003 | CA2458299A1 Amorphous hydrogenated carbon film |
| 04/02/2003 | EP1298234A2 Method of manufacturing a single crystal substrate |
| 04/02/2003 | EP1298182A2 Coating particles in a fluidized bed by vapor deposition |
| 04/02/2003 | EP1297396A2 Flow control of process gas in semiconductor manufacturing |
| 04/02/2003 | EP1296933A1 Self-reducible copper(ii) source reagents for chemical vapor deposition of copper metal |
| 04/02/2003 | EP1189676A4 Organic acid scrubber & methods |
| 04/02/2003 | EP1105356B1 Process for coating glass |
| 04/02/2003 | EP1068214B1 Lewis base adducts of anhydrous mononuclear tris(beta-diketonate) bismuth compositions for deposition of bismuth-containing films, and method of making the same |
| 04/02/2003 | EP1044291B1 In situ growth of oxide and silicon layers |
| 04/02/2003 | EP1036406B1 Improved low mass wafer support system |
| 04/02/2003 | CN1408030A Machine for coating hollow bodies |