| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/06/2003 | US20030044616 Semiconductor wafer and vapor phase growth apparatus |
| 03/06/2003 | US20030044552 Gas barrier film |
| 03/06/2003 | US20030044546 One step chemical vapor deposition process such that the deposited coating comprises at least one interface containing chemical groups having sufficient intrinsic reactivity to react with target molecules; especially polyxylylenes. |
| 03/06/2003 | US20030044539 Process for producing photovoltaic devices |
| 03/06/2003 | US20030044538 Deposition methods |
| 03/06/2003 | US20030044533 From bis(trimethylsilyl)methane and oxygen retaining gas and hydrogen |
| 03/06/2003 | US20030044154 Oxide structure useable for optical waveguide and method of forming the oxide structure |
| 03/06/2003 | US20030044151 Method and system for a combination of high boron and low boron bpsg top clad fabrication process for a planar lightwave circuit |
| 03/06/2003 | US20030042613 Barrier dielectric covering copper wires |
| 03/06/2003 | US20030042226 Method of forming a nano-supported sponge catalyst on a substrate for nanotube growth |
| 03/06/2003 | US20030042129 Using direct current discharge plasma; one step plasma polymerization; applying voltage between anode, cathode |
| 03/06/2003 | US20030041910 Fluid control apparatus |
| 03/06/2003 | US20030041806 PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 03/06/2003 | US20030041805 Apparatus for improved low pressure inductively coupled high density plasma reactor |
| 03/06/2003 | US20030041804 HDP-CVD apparatus |
| 03/06/2003 | US20030041802 Vacuum pumping system and method for monitoring of the same |
| 03/06/2003 | US20030041799 Modified susceptor for use in chemical vapor deposition process |
| 03/06/2003 | DE10141522C1 Verfahren zur Herstellung einer Leuchtstoffschicht A process for preparing a phosphor layer |
| 03/06/2003 | DE10119463C2 Verfahren zur Herstellung einer Chalkogenid-Halbleiterschicht des Typs ABC¶2¶ mit optischer Prozesskontrolle A process for producing a chalcogenide semiconductor layer of the type ABC¶2¶ with optical process control |
| 03/05/2003 | EP1289025A1 Method to deposit an oxyde layer on a substrate and photovoltaic cell using such substrate |
| 03/05/2003 | EP1289006A1 Wafer supporting device of semiconductor manufacturing device |
| 03/05/2003 | EP1289003A1 Plasma processing apparatus |
| 03/05/2003 | EP1289002A2 Wafer holding apparatus |
| 03/05/2003 | EP1288511A1 Magnetic bearing and magnetic levitation apparatus |
| 03/05/2003 | EP1288347A2 Method of manufacturing compund single crystal |
| 03/05/2003 | EP1288346A2 Method of manufacturing compound single crystal |
| 03/05/2003 | EP1288335A1 Surface-coated carbide alloy cutting tool |
| 03/05/2003 | EP1288333A1 Method for supplying with accuracy a liquid to a CVD apparatus |
| 03/05/2003 | EP1288163A2 Purified silicon production system |
| 03/05/2003 | EP1287188A1 Epitaxial silicon wafer free from autodoping and backside halo |
| 03/05/2003 | EP1287187A2 Modified susceptor for use in chemical vapor deposition process |
| 03/05/2003 | EP1287178A1 Method for making an extreme ultraviolet microlithography transmission modulator and resulting modulator |
| 03/05/2003 | EP1286790A1 Combinatorial synthesis of material chips |
| 03/05/2003 | EP1159464A4 Wafer processing reactor having a gas flow control system and method |
| 03/05/2003 | CN1401014A Exhaust pipe with reactive by-product adhesion preventing means and method of preventing the adhesion |
| 03/05/2003 | CN1400639A Manufacture of semiconductor device |
| 03/05/2003 | CN1400336A Pyrolyzing borium nitride crucible and method |
| 03/05/2003 | CN1400331A Method for growing ZnO film by solid source chemical gas-phase deposition |
| 03/05/2003 | CN1400214A Trialkyl VA metal compound |
| 03/05/2003 | CN1102542C Glazing including conductive and/or low emissive layer |
| 03/05/2003 | CN1102470C Mold for pressing and molded glass substrate for computer memory by using it |
| 03/05/2003 | CA2401305A1 Diamond coated cutting tool and method for making the same |
| 03/04/2003 | US6528865 Thin amorphous fluorocarbon films |
| 03/04/2003 | US6528812 Radiation image read-out method and apparatus |
| 03/04/2003 | US6528767 Pre-heating and load lock pedestal material for high temperature CVD liquid crystal and flat panel display applications |
| 03/04/2003 | US6528435 Plasma processing |
| 03/04/2003 | US6528433 Method for monitoring nitrogen processes |
| 03/04/2003 | US6528430 Method of forming silicon containing thin films by atomic layer deposition utilizing Si2C16 and NH3 |
| 03/04/2003 | US6528420 Double acting cold trap |
| 03/04/2003 | US6528364 Methods to form electronic devices and methods to form a material over a semiconductive substrate |
| 03/04/2003 | US6528361 Process for preparing a polycrystalline silicon thin film |
| 03/04/2003 | US6528338 Silica-based optical device fabrication |
| 03/04/2003 | US6528172 Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereof |
| 03/04/2003 | US6528171 Tool with a molybdenum sulfide containing coating and method for its production |
| 03/04/2003 | US6528170 Metal substrate with a corrosion-resistant coating produced by means of plasma polymerization |
| 03/04/2003 | US6528130 Liquefaction and cooling of oil smoke using vacuum and diffusion pumps; vapor deposition |
| 03/04/2003 | US6528116 Apparatus generally comprises a process chamber having one or more walls and a lid and two heat exchangers. A first heat exchanger is coupled to the walls and a second heat exchanger is coupled to the lid. The two heat exchangers are configured |
| 03/04/2003 | US6528115 Hard carbon thin film and method of forming the same |
| 03/04/2003 | US6528108 A reactant gas is introduced into a process chamber under a temperature which is lower than reactive temperature of the reactant gas so that voids in a porous amorphous insulation film on a sample is filled with the introduced reactant gas. |
| 03/04/2003 | US6527910 Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD |
| 03/04/2003 | US6527908 Plasma process apparatus |
| 03/04/2003 | US6527876 Silicon steel sheet and method for producing the same |
| 03/04/2003 | US6527865 Temperature controlled gas feedthrough |
| 03/04/2003 | US6527855 Onto a noble metal or semi-noble metal substrate by hydrogen reduction, where the metallorganic precursor does not decompose by thermolysis at a temperature less than or equal to a deposition temperature |
| 03/04/2003 | US6527848 Complex of group IV or V element and alkoxide ligand with diketonate, ketiminate and/or diiminate; chemical vapor deposition of SrBi2Ta2O3 (SBT); hydrolysis does not liberate reducing agent; thin films; memory technology |
| 03/04/2003 | US6526910 Apparatus and method for forming a deposited film by means of plasma CVD |
| 02/27/2003 | WO2003017737A2 Cascade arc plasma and abrasion resistant coatings made therefrom |
| 02/27/2003 | WO2003017378A1 Photoelectric conversion device-use substrate |
| 02/27/2003 | WO2003017377A1 Glass plate having electroconductive film formed thereon |
| 02/27/2003 | WO2003017345A1 Chemical vapor phase epitaxial device |
| 02/27/2003 | WO2003017341A2 Methods of forming metal-comprising materials and capacitor electrodes; and capacitor constructions |
| 02/27/2003 | WO2003017333A1 Method for producing high carrier concentration p-type transparent conducting oxides |
| 02/27/2003 | WO2003016961A2 Optical materials and optical devices |
| 02/27/2003 | WO2003016591A1 Process chamber having multiple gas distributors and method |
| 02/27/2003 | WO2003016590A2 Device for supplying gas mixtures to a cvd reactor |
| 02/27/2003 | WO2003016589A1 Coatings with low permeation of gases and vapors |
| 02/27/2003 | WO2003016588A1 Method of forming tungsten film |
| 02/27/2003 | WO2003016587A1 Atomic layer deposition reactor |
| 02/27/2003 | WO2003016586A1 Chemical vapor deposition system |
| 02/27/2003 | WO2003016240A2 Components with bearing or wear-resistant surfaces |
| 02/27/2003 | WO2003016149A1 System for producing dlc film coated plastic container and method for producing the same |
| 02/27/2003 | WO2002102903A3 Direct synthesis and deposition of luminescent films |
| 02/27/2003 | WO2002080228A3 Structure including cubic boron nitride films |
| 02/27/2003 | WO2002072278A3 Protective cage for coating of medical devices |
| 02/27/2003 | WO2002068127A8 Manifolded fluid delivery system |
| 02/27/2003 | WO2002052636A3 Method and apparatus for measuring reflectivity of deposited films |
| 02/27/2003 | WO2002013239A3 Heater for jmf type wafers |
| 02/27/2003 | US20030040199 Photo-assisted remote plasma apparatus and method |
| 02/27/2003 | US20030040181 Method of manufacturing semiconductor device |
| 02/27/2003 | US20030040167 Compound crystal and method of manufacturing same |
| 02/27/2003 | US20030039951 Apparatus and process for controlling the temperature of a substrate in a plasma reactor |
| 02/27/2003 | US20030039860 Vacuum vapor deposition; metallization, alloying |
| 02/27/2003 | US20030039847 Optically coated article and method for its preparation |
| 02/27/2003 | US20030039843 Photocatalyst; vapor deposition of organometallic compound, oxidation |
| 02/27/2003 | US20030039766 Mutlistage pressurized vapor deposition; for semiconductors |
| 02/27/2003 | US20030039693 Three-dimensional biocatalyst |
| 02/27/2003 | US20030039520 Cutting tool coated with diamond |
| 02/27/2003 | US20030039091 Capacitor in semiconductor device |
| 02/27/2003 | US20030038311 Chemical vapor depositing dielectric material over the first capacitor electrode with different amount of crystallinity at the edge region and other portion |
| 02/27/2003 | US20030038127 Annealing, diffusion, oxidation, doping,and vapor deposition; semiconductors |