| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/29/2003 | EP1088116B1 Method for applying a coating system to surfaces |
| 01/29/2003 | EP0933803B1 Method of plasma treatment |
| 01/29/2003 | CN1393907A Method and apparatus for mfg. single crystal silicon carbide |
| 01/29/2003 | CN1100163C Cold cathode structure of diamond film and its preparing process |
| 01/29/2003 | CN1100162C Alpha-SiCOF film as insulating medium with low dielectric constant and its preparing process |
| 01/28/2003 | US6512885 Liquid raw material vaporizer, semiconductor device and method of manufacturing semiconductor device |
| 01/28/2003 | US6512667 Supercapacitor using iron oxide as active material of electrodes formed on current collector which is portion of peripheral surface of case, chassis, compartment, cover, frame or housing of appliance or vehicle |
| 01/28/2003 | US6512297 Liquid chemical vapor deposition source material including at least one organometallic compound of platinum group metal dissolved in tetrahydrofuran and having moisture content of not more than 200 ppm |
| 01/28/2003 | US6512240 Method and apparatus for reading a radiation image that has been stored in a photostimulable screen |
| 01/28/2003 | US6511924 Method of forming a silicon oxide layer on a substrate |
| 01/28/2003 | US6511922 Methods and apparatus for producing stable low k FSG film for HDP-CVD |
| 01/28/2003 | US6511909 Method of depositing a low K dielectric with organo silane |
| 01/28/2003 | US6511903 Method of depositing a low k dielectric with organo silane |
| 01/28/2003 | US6511875 Method for making high K dielectric gate for semiconductor device |
| 01/28/2003 | US6511760 Applying corrosion protective coating; dehydrating and evacuating container; completely covering surface by multiple cycles of heat and pressure reduction of silicon hydride while preventing formation of silicon dust |
| 01/28/2003 | US6511718 Method and apparatus for fabrication of thin films by chemical vapor deposition |
| 01/28/2003 | US6511717 Method for coating substrates with improved substrate preheating |
| 01/28/2003 | US6511706 MOCVD of SBT using tetrahydrofuran-based solvent system for precursor delivery |
| 01/28/2003 | US6511700 Chemical vapor deposition of thin or thick film directly or as freestanding film on a substrate for later joining to tool stick |
| 01/28/2003 | US6511577 Reduced impedance chamber |
| 01/28/2003 | US6511575 Treatment apparatus and method utilizing negative hydrogen ion |
| 01/28/2003 | US6511539 Apparatus and method for growth of a thin film |
| 01/28/2003 | US6510888 Substrate support and method of fabricating the same |
| 01/23/2003 | WO2003007661A1 Ceramic heater and ceramic joined article |
| 01/23/2003 | WO2003007339A2 Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides |
| 01/23/2003 | WO2003006933A2 System and method for detecting occlusions in a semiconductor manufacturing device |
| 01/23/2003 | WO2003006707A1 Method for bst deposition by cvd |
| 01/23/2003 | WO2003006706A1 Method for making diamond-coated composite materials |
| 01/23/2003 | WO2003006393A1 Visible-light-responsive photoactive coating, coated article, and method of making same |
| 01/23/2003 | WO2003006218A1 Cutting member with dual profile tip |
| 01/23/2003 | WO2002035265A3 Using deuterated source gases to fabricate low loss germanium-doped silicon oxy nitride (gestion-sion) |
| 01/23/2003 | WO2002029861A3 System architecture of semiconductor manufacturing equipment |
| 01/23/2003 | US20030017684 Method of producing doped polysilicon layers and polysilicon layered structures |
| 01/23/2003 | US20030017666 Integrated structure comprising a patterned feature substantially of single grain polysilicon |
| 01/23/2003 | US20030017633 Semiconductor light emitting device and method of fabricating semiconductor light emitting device |
| 01/23/2003 | US20030017359 Increased stability low concentration gases, products comprising same, and methods of making same |
| 01/23/2003 | US20030017339 Method for coating ceramic discs and ceramic disc obtained by said method |
| 01/23/2003 | US20030017297 Panel display device and method for forming protective layer within the same |
| 01/23/2003 | US20030017268 .method of cvd titanium nitride film deposition for increased titanium nitride film uniformity |
| 01/23/2003 | US20030017267 Controlling phosphorous dopant deposition profile and/or distance of the phosphorus dopant from nitride surface in order to reduce the silicon nitride layer consumption |
| 01/23/2003 | US20030017266 Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers, including such layers having a varied concentration of barium and strontium within the layer |
| 01/23/2003 | US20030017265 Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers |
| 01/23/2003 | US20030017087 Process and apparatus for abatement of by products generated from deposition processes and cleaning of deposition chambers |
| 01/23/2003 | US20030016035 Direct detection of dielectric etch system magnet driver and coil malfunctions |
| 01/23/2003 | US20030015719 Zinc oxide semiconductor member formed on silicon substrate |
| 01/23/2003 | US20030015570 Method of joining different metal materials by friction welding |
| 01/23/2003 | US20030015293 Apparatus for plasma treatment |
| 01/23/2003 | US20030015292 Apparatus for fabricating a semiconductor device |
| 01/23/2003 | US20030015291 Semiconductor device fabrication apparatus having multi-hole angled gas injection system |
| 01/23/2003 | US20030015288 Sealable surface method and device |
| 01/23/2003 | US20030015287 Inner wall protection member for chamber and plasma procressing apparatus |
| 01/23/2003 | US20030015142 Apparatus for fabricating a semiconductor device |
| 01/23/2003 | US20030015141 Wafer supporting device in semiconductor manufacturing device |
| 01/23/2003 | US20030015138 Substrate processing apparatus and method for manufacturing semiconductor device |
| 01/23/2003 | US20030015137 Chemical vapor deposition apparatus and chemical vapor deposition method |
| 01/23/2003 | US20030015136 Workpiece support |
| 01/23/2003 | CA2453934A1 Method for making diamond-coated composite materials |
| 01/22/2003 | EP1278244A2 Panel display device and method for forming protective layer within the same |
| 01/22/2003 | EP1277718A2 Method for coating ceramic discs and ceramic disc obtained by said method |
| 01/22/2003 | EP1277716A1 Method for fabricating ceramic matrix composite |
| 01/22/2003 | EP1277233A2 Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
| 01/22/2003 | EP1060301B1 Ceiling arrangement for an epitaxial growth reactor |
| 01/22/2003 | EP0871796B1 Coated milling insert and method of making it |
| 01/22/2003 | CN1392595A Chemical vapor deposition equipment and chemical vapor deposition method |
| 01/22/2003 | CN1392288A Method for forming silicon containing film by using tri(dimethylamino) silicane atomic shell deposition |
| 01/22/2003 | CN1392285A PCVO plasma impregnation composite reinforced method for precise vane hot forging die |
| 01/21/2003 | US6509542 Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor |
| 01/21/2003 | US6509282 Silicon-starved PECVD method for metal gate electrode dielectric spacer |
| 01/21/2003 | US6509280 Method for forming a dielectric layer of a semiconductor device |
| 01/21/2003 | US6509268 Thermal densification in the early stages of copper MOCVD for depositing high quality Cu films with good adhesion and trench filling characteristics |
| 01/21/2003 | US6509239 Method of fabricating a field effect transistor |
| 01/21/2003 | US6509227 Formation of conductive rugged silicon |
| 01/21/2003 | US6509124 Method of producing diamond film for lithography |
| 01/21/2003 | US6509067 Conveying substrate at uniform velocity |
| 01/21/2003 | US6508990 In situ monitoring and controlling removal of contaminants from semiconductor surface using infrared radiation |
| 01/21/2003 | US6508911 Diamond coated parts in a plasma reactor |
| 01/21/2003 | US6508885 Edge sealing structure for substrate in low-pressure processing environment |
| 01/21/2003 | US6508883 Throughput enhancement for single wafer reactor |
| 01/21/2003 | US6508197 Apparatus for dispensing gas for fabricating substrates |
| 01/16/2003 | WO2003005432A1 Method and apparatus for forming film having low dielectric constant, and electronic device using the film |
| 01/16/2003 | WO2003005429A1 Method for preparing low dielectric films |
| 01/16/2003 | WO2003005428A1 Method and apparatus for removing a reaction by-product in the semiconductor and the liquid crystal display manufactured field |
| 01/16/2003 | WO2003005427A1 Processing system and cleaning method |
| 01/16/2003 | WO2003005396A2 Method and apparatus for scanned instrument calibration |
| 01/16/2003 | WO2003004724A1 Cvd system comprising a thermally differentiated substrate support |
| 01/16/2003 | WO2003004723A1 Source chemical container assembly |
| 01/16/2003 | WO2003004722A1 Method for cleaning reaction container and film deposition system |
| 01/16/2003 | WO2003004721A1 Feed material for chemical vapor deposition and process for producing ceramic from the same |
| 01/16/2003 | WO2002074445A8 Atomizer |
| 01/16/2003 | WO2002058115A3 Method for deposit copper on metal films |
| 01/16/2003 | WO2002056348A3 Method for incorporating silicon into cvd metal films |
| 01/16/2003 | WO2002048434A3 Gallium nitride materials and methods for forming layers thereof |
| 01/16/2003 | US20030013320 Method of forming a thin film using atomic layer deposition |
| 01/16/2003 | US20030013315 Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
| 01/16/2003 | US20030013300 Method and apparatus for depositing tungsten after surface treatment to improve film characteristics |
| 01/16/2003 | US20030013280 Semiconductor thin film forming method, production methods for semiconductor device and electrooptical device, devices used for these methods, and semiconductor device and electrooptical device |
| 01/16/2003 | US20030013212 System and method for removing deposited material from within a semiconductor fabrication device |
| 01/16/2003 | US20030012890 Method for producing a plasma by microwave irradiation |
| 01/16/2003 | US20030012877 Reacting a silicon-containing compound and a compound containing peroxide bonding to deposit a short-chain polysiloxane on the surface of the semiconductor substrate. |
| 01/16/2003 | US20030012875 CVD BST film composition and property control with thickness below 200 A for DRAM capacitor application with size at 0.1mum or below |