| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/06/2003 | WO2002036513B1 Low-e coating system including protective dlc |
| 02/06/2003 | US20030027431 Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition |
| 02/06/2003 | US20030027427 Integrated system for oxide etching and metal liner deposition |
| 02/06/2003 | US20030027054 Method for making photomask material by plasma induction |
| 02/06/2003 | US20030027019 Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content |
| 02/06/2003 | US20030027000 Formed via chemical vapor deposition onto float glass ribbon; photocatalytic upon exposure to electromagnetic energy; insulating glass window panes |
| 02/06/2003 | US20030026989 Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films |
| 02/06/2003 | US20030026921 Low temperature synthesis of semiconductor fiber |
| 02/06/2003 | US20030026920 Generating plasma in vacuum; controlling distribution |
| 02/06/2003 | US20030026917 Process chamber components having textured internal surfaces and method of manufacture |
| 02/06/2003 | US20030026904 Smooth support plate; depressurization; vapor deposition |
| 02/06/2003 | US20030026901 Glass, ceramic plate with recesses; high temperature infrared radiators |
| 02/06/2003 | US20030025142 Integrated capacitors fabricated with conductive metal oxides |
| 02/06/2003 | US20030024920 Hot wall rapid thermal processor |
| 02/06/2003 | US20030024901 Method of reducing plasma charge damage for plasma processes |
| 02/06/2003 | US20030024896 Methods of etching silicon-oxide-containing compositions |
| 02/06/2003 | US20030024680 Substrate support and method of fabricating the same |
| 02/06/2003 | US20030024647 Plasma processing apparatus |
| 02/06/2003 | US20030024642 Method and apparatus for processing semiconductor substrates |
| 02/06/2003 | US20030024477 Substrate processing apparatus |
| 02/05/2003 | EP1281987A2 Oxide structure useable for optical waveguide and method of forming the oxide structure |
| 02/05/2003 | EP1281680A2 Method for making glass by plasma deposition and so obtained photomask material |
| 02/05/2003 | EP1082470A4 Microchamber |
| 02/05/2003 | CN1395743A Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring |
| 02/05/2003 | CN1395294A Ashing device and method, and method for mfg. semiconductor |
| 02/05/2003 | CN1395261A Oxide superconductor and its manufacturing method |
| 02/04/2003 | US6515843 Semiconductor capacitive device |
| 02/04/2003 | US6515339 Method of horizontally growing carbon nanotubes and field effect transistor using the carbon nanotubes grown by the method |
| 02/04/2003 | US6515297 CVD-SiC self-supporting membrane structure and method for manufacturing the same |
| 02/04/2003 | US6515261 Enhanced lift pin |
| 02/04/2003 | US6514884 Method for reforming base surface, method for manufacturing semiconductor device and equipment for manufacturing the same |
| 02/04/2003 | US6514880 Vaporizing a silicon-containing hydrocarbon compound producing gas for polysiloxane, chemical vapor deposition wherein semiconductor is placed, introducing additive gas (inert and oxidizing), forming film via plasma polymerization |
| 02/04/2003 | US6514870 In situ wafer heat for reduced backside contamination |
| 02/04/2003 | US6514869 Method for use in manufacturing a semiconductor device |
| 02/04/2003 | US6514837 High density plasma chemical vapor deposition apparatus and gap filling method using the same |
| 02/04/2003 | US6514667 Lithography structure |
| 02/04/2003 | US6514564 Dynamic blending gas delivery system and method |
| 02/04/2003 | US6514563 Method of on-line coating film on the inner walls of the reaction tubes in a hydrocarbon pyrolysis reactor |
| 02/04/2003 | US6514376 Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
| 02/04/2003 | US6514348 Substrate processing apparatus |
| 02/04/2003 | US6514347 Apparatus and method for plasma treatment |
| 02/04/2003 | US6514313 Gas purification system and method |
| 01/30/2003 | WO2003009390A1 Mis type transistor and its manufacturing method |
| 01/30/2003 | WO2003009364A2 Low dielectric constant layers |
| 01/30/2003 | WO2003009360A2 Method and apparatus for depositing tungsten after surface treatment to improve film characteristics |
| 01/30/2003 | WO2003009358A1 Thermal treatment apparatus and thermal treatment method |
| 01/30/2003 | WO2003009352A1 Reactor for thin film deposition and method for depositing thin film on wafer using the reactor |
| 01/30/2003 | WO2003009318A2 Support with getter-material for microelectronic, microoptoelectronic or micromechanical device |
| 01/30/2003 | WO2003009317A2 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 01/30/2003 | WO2003009061A2 Photoactive coating, coated article, and method of making same |
| 01/30/2003 | WO2003008675A1 Process chamber with a base with sectionally different rotational drive and layer deposition method in such a process chamber |
| 01/30/2003 | WO2003008666A1 Electrostatic chuck with dielectric coating |
| 01/30/2003 | WO2003008665A1 Method and apparatus for bpsg deposition |
| 01/30/2003 | WO2003008664A2 Method of making a passivated surface |
| 01/30/2003 | WO2003008663A1 Formation of titanium nitride films using a cyclical deposition process |
| 01/30/2003 | WO2003008323A2 Lifting and supporting device |
| 01/30/2003 | WO2003008186A1 Insulating and functionalizing fine metal-containing particles with comformal ultra-thin films |
| 01/30/2003 | WO2003008110A1 A method of depositing an inorganic film on an organic polymer |
| 01/30/2003 | WO2002095804A8 Method and device for the thermal treatment of substrates |
| 01/30/2003 | WO2002044765A3 Multilayered optical structures |
| 01/30/2003 | WO2001001442A9 A plasma reaction chamber component having improved temperature uniformity |
| 01/30/2003 | US20030023338 Atomic layer deposition apparatus |
| 01/30/2003 | US20030022528 Improved Process for Deposition of Semiconductor Films |
| 01/30/2003 | US20030022521 Method for fabricating semiconductor device having ruthenium layer and equipment for fabricating the same |
| 01/30/2003 | US20030022519 Production apparatus of semiconductor layer employing DC bias and VHF power |
| 01/30/2003 | US20030022509 Plasma treatment for copper oxide reduction |
| 01/30/2003 | US20030022487 Barrier formation using novel sputter-deposition method |
| 01/30/2003 | US20030022469 Semiconductor manufacturing method and semiconductor manufacturing apparatus |
| 01/30/2003 | US20030022468 Manufacturing method of semiconductor device |
| 01/30/2003 | US20030022457 Method for fabricating a metal carbide layer and method for fabricating a trench capacitor containing a metal carbide |
| 01/30/2003 | US20030022065 Plasma enhanced chemical vapor deposition vanadium oxide thin films |
| 01/30/2003 | US20030022029 Surface coated sintered alloy member |
| 01/30/2003 | US20030022026 Wear resistant tool |
| 01/30/2003 | US20030022012 Thermal barrier coating method and article |
| 01/30/2003 | US20030021997 Solar management coating system including protective DLC |
| 01/30/2003 | US20030021910 Plasma vapor deposition using microwaves |
| 01/30/2003 | US20030021909 Method and device for coating substrates |
| 01/30/2003 | US20030021896 Film forming method and film forming apparatus as well as silicon-based film, photovoltaic device and solar cell, sensor and image pick-up device using the same |
| 01/30/2003 | US20030021895 Method for producing coated substrates |
| 01/30/2003 | US20030021894 Method of producing high-purity polycrystallin silicon |
| 01/30/2003 | US20030021885 Processing line having means to monitor crystallographic orientation |
| 01/30/2003 | US20030021595 Apparatus and method for vaporizing a liquid chemical |
| 01/30/2003 | US20030021578 GeBPSG top clad for a planar lightwave circuit |
| 01/30/2003 | US20030021079 Ceramic film and manufacturing method therefor, ferroelectric capacitors, semiconductor device and other devices |
| 01/30/2003 | US20030020157 Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element |
| 01/30/2003 | US20030020113 Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same |
| 01/30/2003 | US20030019858 Ceramic heater with thermal pipe for improving temperature uniformity, efficiency and robustness and manufacturing method |
| 01/30/2003 | US20030019843 Corrosion treatment of a dense ceramic base material in an acid etchant |
| 01/30/2003 | US20030019842 Plasma reaction chamber assemblies |
| 01/30/2003 | US20030019841 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| 01/30/2003 | US20030019839 Maintenance method and system for plasma processing apparatus etching and apparatus |
| 01/30/2003 | US20030019834 using polishing system comprising an abrasive, a polishing pad, an acid, and a carrier |
| 01/30/2003 | US20030019585 Using lawnmower tool having elongated handle which has length greater than radius of mower blade, shaft, and attached scraping blade with sharpened edge facing away from handle and shaft, and perpendicular to longitudinal axis of handle |
| 01/30/2003 | US20030019580 Method of and apparatus for tunable gas injection in a plasma processing system |
| 01/30/2003 | US20030019507 Cleaning and drying method and apparatus |
| 01/30/2003 | US20030019429 Purified silicon production system |
| 01/30/2003 | US20030019428 Chemical vapor deposition chamber |
| 01/30/2003 | US20030019427 In situ stabilized high concentration BPSG films for PMD application |
| 01/29/2003 | EP1280194A2 Manufacturing method of semiconductor device |
| 01/29/2003 | EP1278825A2 Methods of producing membrane vesicles |