Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2003
03/13/2003WO2001078115A3 Barrier coating for vitreous materials
03/13/2003WO2001073870A3 Integrated capacitor-like battery and associated method
03/13/2003US20030050724 Low-bias-deposited high-density-plasma chemical-vapor-deposition silicate glass layers
03/13/2003US20030049943 Method of forming a metal oxide film
03/13/2003US20030049942 Low temperature gate stack
03/13/2003US20030049933 Apparatus for handling liquid precursor material for semiconductor processing
03/13/2003US20030049932 Technique for high efficiency metalorganic chemical vapor deposition
03/13/2003US20030049580 Susceptor pocket profile to improve process performance
03/13/2003US20030049566 Heating the antireflective compound so as to vaporize it, and then pyrolizing to form stable diradicals which are polymerized on a substrate surface
03/13/2003US20030049558 Vacuum processing method, vacuum processing apparatus, semiconductor device manufacturing method and semiconductor device
03/13/2003US20030049548 Integrated circuits; dielectrics; photolithography
03/13/2003US20030049468 Gas impervious protective coatings; vapor vacuum deposition
03/13/2003US20030049460 Low dielectric constant material and method of processing by CVD
03/13/2003US20030049434 Diamond coated cutting tool and method for making the same
03/13/2003US20030049390 Feedback control of plasma-enhanced chemical vapor deposition processes
03/13/2003US20030049388 Silicon carbide deposited by high density plasma chemical-vapor deposition with bias
03/13/2003US20030049376 Feedback control of sub-atmospheric chemical vapor deposition processes
03/13/2003US20030049375 Nanolayer thick film processing system and method
03/13/2003US20030049374 Chemical vapor deposition apparatus and method
03/13/2003US20030049372 Vapor deposition; gas flow; controlling heaters; monitoring temperature; uniformity
03/13/2003US20030049083 Amorphous carbon coated tool and fabrication method thereof
03/13/2003US20030047729 Organic thin-film semiconductor element and manufacturing method for the same
03/13/2003US20030047464 Electrochemically roughened aluminum semiconductor processing apparatus surfaces
03/13/2003US20030047442 Creating an electric discharge in a starting gas between two exciting electrodes to which is applied an electric supply voltage, so that the discharge excites at least a portion of the gaseous constituents of the starting gas
03/13/2003US20030047283 Apparatus for supporting a substrate and method of fabricating same
03/13/2003US20030047282 Surface processing apparatus
03/13/2003US20030047281 Gas introduction system for temperature adjustment of object to be processed
03/13/2003US20030047191 Method and apparatus for plasma cleaning of workpieces
03/13/2003US20030047141 Coating gas generator and method
03/13/2003US20030047138 Spiral gas flow plasma reactor
03/13/2003US20030047133 Apparatus and method for photo-induced process
03/13/2003US20030047132 Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition
03/13/2003US20030047129 Method of manufacturing compound single crystal
03/12/2003EP1291932A2 Organic thin-film semiconductor element and manufacturing method for the same
03/12/2003EP1291903A2 Workpiece holder for processing apparatus, and processing apparatus using the same
03/12/2003EP1291450A2 Diamond coated cutting tool and method for making the same
03/12/2003EP1290722A2 Method for depositing a selected thickness of an interlevel dielectric material to achieve optimum global planarity on a semiconductor wafer
03/12/2003EP1290715A2 Mobile plating system and method
03/12/2003EP1290251A1 Thick single crystal diamond layer method for making it and gemstones produced from the layer
03/12/2003EP1290240A1 Methods for replication, replicated articles, and replication tools
03/12/2003EP1289807A1 Method and device for coating at least one wiper-blade element
03/12/2003EP1289709A1 Method of containing a phase change material in a porous carbon material and articles produced thereby
03/12/2003EP1214462B1 Method for making a metal part coated with diamond and metal part obtained by said method
03/12/2003EP1029106A4 Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor
03/12/2003EP0990060B1 A method of coating edges with diamond-like carbon
03/12/2003EP0922122B1 Plasma cvd system with an array of microwave plasma electrodes and plasma cvd process
03/12/2003EP0792383B1 Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same
03/12/2003CN2539749Y Evaporator for chemical vapour-phase deposition proplastid
03/12/2003CN1402027A Oxide member capable of using for optic waveguide and mfg. method thereof
03/12/2003CN1401818A Method for mfg. large hole diamond coating drawing die
03/12/2003CN1401817A Metal organic chemical vapor deposition for ferroelectric film and annealing treatment
03/12/2003CN1401600A Method for improving longitudinal uniformity of optic fibre preform rod
03/12/2003CN1401558A Method for preparing AIN nanowire and its array
03/12/2003CN1103116C Process for making electronic devices having low-leakage current and low-polarization fatigue
03/11/2003US6532134 Silicon coating on air bearing surface for magnetic thin film heads
03/11/2003US6532069 Particle-measuring system and particle-measuring method
03/11/2003US6531654 Semiconductor thin-film formation process, and amorphous silicon solar-cell device
03/11/2003US6531415 Silicon nitride furnace tube low temperature cycle purge for attenuated particle formation
03/11/2003US6531412 Method for low temperature chemical vapor deposition of low-k films using selected cyclosiloxane and ozone gases for semiconductor applications
03/11/2003US6531398 Method of depositing organosillicate layers
03/11/2003US6531324 MFOS memory transistor & method of fabricating same
03/11/2003US6531193 Low temperature, high quality silicon dioxide thin films deposited using tetramethylsilane (TMS) for stress control and coverage applications
03/11/2003US6531192 Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound
03/11/2003US6531182 Water and soil repellant coating including diamond-like carbon and a fluoroalkylsilane; initial contact angle 0 with a drop of water of at least 80 degrees.
03/11/2003US6530994 Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing
03/11/2003US6530990 Susceptor designs for silicon carbide thin films
03/11/2003US6530977 Abatement of semiconductor processing gases
03/11/2003US6530342 Large area plasma source
03/11/2003US6530341 Deposition apparatus for manufacturing thin film
03/11/2003CA2402089A1 Workpiece holder for processing apparatus, and processing apparatus using the same
03/10/2003CA2401936A1 Coating gas generator and method
03/06/2003WO2003019645A1 Method and apparatus for forming film
03/06/2003WO2003019634A1 Purging method for semiconductor production device and production method for semiconductor device
03/06/2003WO2003019633A1 Method of surface-processing components of vacuum processing device
03/06/2003WO2003019624A2 Dielectric barrier discharge process for depositing silicon nitride film on substrates
03/06/2003WO2003019622A2 System and method of fast ambient switching for rapid thermal processing
03/06/2003WO2003019619A2 A low-k pre-metal dielectric semiconductor structure
03/06/2003WO2003019244A1 Optically coated article and method for its preparation
03/06/2003WO2003018870A2 Device for reactive plasma treatment of substrates and method for the use thereof
03/06/2003WO2003018869A1 Method for coating oxidizable materials with oxide-containing layers
03/06/2003WO2003018868A1 Film forming method
03/06/2003WO2003018867A1 Semiconductor processing using an efficiently coupled gas source
03/06/2003WO2003018866A1 Protective shield and system for gas distribution
03/06/2003WO2003018863A2 Method for producing a fluorescent material layer
03/06/2003WO2003018860A2 Atmospheric pressure wafer processing reactor having an internal pressure control system and method
03/06/2003WO2002080258A9 Integrated circuit structure
03/06/2003WO2002078042A3 Neutral particle beam processing apparatus
03/06/2003WO2002058115B1 Method for deposit copper on metal films
03/06/2003US20030045961 Method for manufacturing semiconductor device
03/06/2003US20030045960 Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, semiconductor device manufacturing system, and cleaning method for semiconductor device manufacturing apparatus
03/06/2003US20030045736 Method for recycling organometallic compound for MOCVD
03/06/2003US20030045217 Superhard material article of manufacture
03/06/2003US20030045128 Wafer transfer method performed with vapor thin film growth system and wafer support member used for this method
03/06/2003US20030045113 Fabrication method of semiconductor integrated circuit device
03/06/2003US20030045102 Method of manufacturing compound single crystal
03/06/2003US20030045094 Method and apparatus for manufacturing semiconductor devices
03/06/2003US20030045063 Semiconductor device and method for manufacturing the same
03/06/2003US20030045048 Dielectric material forming methods and enhanced dielectric materials
03/06/2003US20030045006 Capacitor constructions comprising perovskite-type dielectric materials, and methods of forming capacitor constructions comprising perovskite-type dielectric materials
03/06/2003US20030044621 Process for controlling thin film uniformity and products produced thereby
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