| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/01/2003 | US20030082313 Method for surface treatment of metal enclosure |
| 05/01/2003 | US20030082307 Integration of ALD tantalum nitride and alpha-phase tantalum for copper metallization application |
| 05/01/2003 | US20030082301 Enhanced copper growth with ultrathin barrier layer for high performance interconnects |
| 05/01/2003 | US20030082300 Vapor deposition using silane compound; uniform thickness |
| 05/01/2003 | US20030082296 Vapor deposition using metal halide; removal by-products; using scavenger |
| 05/01/2003 | US20030080363 Electronic device with electrode and its manufacture |
| 05/01/2003 | US20030080325 Chemical vapor deposition method of making layered superlattice materials using trimethylbismuth |
| 05/01/2003 | US20030080112 System of controlling the temperature of a processing chamber |
| 05/01/2003 | US20030080110 Hot plate |
| 05/01/2003 | US20030080109 Heater assembly for manufacturing a semiconductor device |
| 05/01/2003 | US20030080090 Method and apparatus for restricting process fluid flow within a showerhead assembly |
| 05/01/2003 | US20030080085 Coated microfluidic delivery system |
| 05/01/2003 | US20030079853 Substrate support and method of fabricating the same |
| 05/01/2003 | US20030079837 Semiconductor processing apparatus for continuously forming semiconductor film on flexible substrate |
| 05/01/2003 | US20030079834 Shielding system for plasma chamber |
| 05/01/2003 | US20030079757 Method of cleaning cvd device and cleaning device therefor |
| 05/01/2003 | US20030079690 Metallization module for cathode-ray tube (CRT) applications |
| 05/01/2003 | US20030079689 Induction heating devices and methods for controllably heating an article |
| 05/01/2003 | US20030079686 Gas delivery apparatus and method for atomic layer deposition |
| 04/30/2003 | CN1415115A Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition |
| 04/30/2003 | CN1414636A Electron device with electrode and its manufacture |
| 04/30/2003 | CN1414615A Manufacturing method of semiconductor device |
| 04/30/2003 | CN1414604A Manufacturing method of semiconductor |
| 04/30/2003 | CN1414603A Method of forming TiN barrier by chemical rapour phase deposition |
| 04/30/2003 | CN1107124C Modification of surfaces of polymers, polymers with modified surface |
| 04/29/2003 | USRE38097 In situ removal of deposits from gas apparatus; maintenance |
| 04/29/2003 | US6555845 Method for manufacturing group III-V compound semiconductors |
| 04/29/2003 | US6555701 CVD material compound and method for manufacturing the same and CVD method of ruthenium or ruthenium compound thin film |
| 04/29/2003 | US6555454 Semiconductor memory device incorporating therein ruthenium electrode and method for the manufacture thereof |
| 04/29/2003 | US6555421 Method and apparatus for manufacturing semiconductor device |
| 04/29/2003 | US6555394 Methods of fabricating capacitors including Ta2O5 layers in a chamber including changing a Ta2O5 layer to heater separation or chamber pressure |
| 04/29/2003 | US6555257 Corrosion-resistant member, method of manufacturing the same and apparatus for heating corrosive substance |
| 04/29/2003 | US6555183 Plasma treatment of a titanium nitride film formed by chemical vapor deposition |
| 04/29/2003 | US6555167 Method for growing high quality group-III nitride thin film by metal organic chemical vapor deposition |
| 04/29/2003 | US6555166 Identifying a growth-rate-limiting reactant, calculating a dilution factor, and adjusting the film growth rate and/or the dilution factor to satisfy a numerical criterion for reducing the microloading effect; use in a single-wafer reactor |
| 04/29/2003 | US6555165 Method for forming a thin film and a thin film forming apparatus therefor |
| 04/29/2003 | US6554970 Undercoat of non-evaporating getter deposited on the whole surface of the metal wall defining the chamber; and a thin film of catalyst is on this undercoat |
| 04/29/2003 | US6554910 Treatment gas interacts with the metal-based residue to form a removable treatment product that is substantially stable when exposed to air as compared with the metal-based residue; and opening the processing chamber to remove the product |
| 04/29/2003 | US6554907 Susceptor with internal support |
| 04/29/2003 | US6554879 Trap apparatus |
| 04/29/2003 | US6554548 Hard refractory coated insert with tungsten carbide substrate containing a binder alloy of cobalt and chromium |
| 04/29/2003 | US6553933 Apparatus for injecting and modifying gas concentration of a meta-stable species in a downstream plasma reactor |
| 04/29/2003 | US6553932 Reduction of plasma edge effect on plasma enhanced CVD processes |
| 04/29/2003 | US6553811 Trap apparatus |
| 04/24/2003 | WO2003034477A1 Method and apparatus for chemical vapor ddeposition capable of preventing contamination and enhancing film growth rate |
| 04/24/2003 | WO2003034474A1 Semiconductor manufacturing apparatus and method for manufacturing semiconductor device |
| 04/24/2003 | WO2003034463A2 Tunable multi-zone gas injection system |
| 04/24/2003 | WO2003033973A1 Heating medium circulating device and thermal treatment equipment using the device |
| 04/24/2003 | WO2003033763A1 Method and device for monitoring a cvd process |
| 04/24/2003 | WO2003033762A1 Atomic layer deposition apparatus and process |
| 04/24/2003 | WO2003033761A2 Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor |
| 04/24/2003 | WO2003033169A1 Method of titanium and titanium nitride layer deposition |
| 04/24/2003 | WO2002083979A3 Process and device for the deposition of an at least partially crystalline silicium layer on a substrate |
| 04/24/2003 | US20030077921 Carbon doped oxide deposition |
| 04/24/2003 | US20030077920 Method for fabricating a semiconductor device and a substrate processing apparatus |
| 04/24/2003 | US20030077917 Method of fabricating a void-free barrier layer |
| 04/24/2003 | US20030077888 Reduced thickness variation in a material layer deposited in norrow and wide integrated circuit trenches |
| 04/24/2003 | US20030077883 Deposition method, deposition apparatus, and semiconductor device |
| 04/24/2003 | US20030077857 Post-deposition treatment to enhance properties of SI-O-C low films |
| 04/24/2003 | US20030077477 Article protected by thermal barrier coating having a sintering inhibitor, and its fabrication |
| 04/24/2003 | US20030077400 Gas barriers for plastic containers; carbonated beverages |
| 04/24/2003 | US20030077388 Method and apparatus for chemical vapor deposition capable of preventing contamination and enhancing film growth rate |
| 04/24/2003 | US20030075925 Source chemical container assembly |
| 04/24/2003 | US20030075535 Heat treating device |
| 04/24/2003 | US20030075527 Method and apparatus for supplying gas used in semiconductor processing |
| 04/24/2003 | US20030075522 Procedure and device for the production of a plasma |
| 04/24/2003 | US20030075434 Storage plate support for receiving disk-shaped storage plates |
| 04/24/2003 | US20030075387 Wafer loading device |
| 04/24/2003 | US20030075274 Wafer support system |
| 04/24/2003 | US20030075273 Atomic layer deposition reactor |
| 04/24/2003 | US20030075109 Vapor phase growth apparatus |
| 04/24/2003 | US20030075107 Apparatus and method for manufacturing semiconductor |
| 04/23/2003 | EP1304748A2 Method for producing a solar cell |
| 04/23/2003 | EP1304731A1 Method of cleaning cvd device and cleaning device therefor |
| 04/23/2003 | EP1304397A2 Article protected by thermal barrier coating having a sintering inhibitor, and its fabrication |
| 04/23/2003 | EP1303869A2 Heated substrate support assembly and method |
| 04/23/2003 | EP1303644A1 Production of carbon and carbon-based materials |
| 04/23/2003 | EP1042528B1 Method for deposition of ferroelectric thin films |
| 04/23/2003 | CN1413363A Method for producing electrode for lithium secondary cell |
| 04/23/2003 | CN1413355A Method of manufacturing electrode for plasma reactor and such electrode |
| 04/23/2003 | CN1413261A Deposited thin films and their use in detection, attachment and bio-medical application |
| 04/23/2003 | CN1412350A Working platform for deposition process |
| 04/23/2003 | CN1412347A Surface treatment method related to plasma polymerization reaction |
| 04/23/2003 | CN1412346A Method for preparing diamond film by using UV photon composite glow discharge chemical gas phase deposition process |
| 04/23/2003 | CN1412344A Gate switch equipment of continuous polymerization system using plasma |
| 04/23/2003 | CN1412339A Electrode for plasma polymerization treatment equipment |
| 04/23/2003 | CN1106670C Plasma generator |
| 04/23/2003 | CN1106456C Preparation process of diamond film suitable for inkage technology on silicon substrate |
| 04/23/2003 | CN1106455C Large area diamond film material growth technology of nanometer diamond powder pretreatment |
| 04/22/2003 | US6553170 Method and system for a combination of high boron and low boron BPSG top clad fabrication process for a planar lightwave circuit |
| 04/22/2003 | US6552403 Binary non-crystalline oxide analogs of silicon dioxide for use in gate dielectrics |
| 04/22/2003 | US6552297 RF matching network with distributed outputs |
| 04/22/2003 | US6551949 Vapor deposition; overcoating semiconductor substrate |
| 04/22/2003 | US6551932 Method for forming metal line in a semiconductor device |
| 04/22/2003 | US6551929 Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques |
| 04/22/2003 | US6551718 Low friction coating |
| 04/22/2003 | US6551665 Flowing a mixture of a diamagnetic ozone or hydrogen peroxide and diatomic oxygen over the silicate glass; tetraethoxysilane (teos) |
| 04/22/2003 | US6551447 Inductive plasma reactor |
| 04/22/2003 | US6551444 Plasma processing apparatus and method of processing |
| 04/22/2003 | US6551406 Apparatus for growing thin films |