| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/10/2003 | US6576569 Method of plasma-assisted film deposition |
| 06/10/2003 | US6576565 RTCVD process and reactor for improved conformality and step-coverage |
| 06/10/2003 | US6576564 Photo-assisted remote plasma apparatus and method |
| 06/10/2003 | US6576538 Technique for high efficiency metalorganic chemical vapor deposition |
| 06/10/2003 | US6576534 Method for forming a semiconductor |
| 06/10/2003 | US6576528 Capacitor for semiconductor memory device and method of manufacturing the same |
| 06/10/2003 | US6576481 Method of manufacturing semiconductor devices |
| 06/10/2003 | US6576318 Method to fabricate smooth-surfaced crystalline phase-change layer for atomic resolution storage device |
| 06/10/2003 | US6576293 Method to improve copper thin film adhesion to metal nitride substrates by the addition of water |
| 06/10/2003 | US6576292 Method of forming highly adhesive copper thin films on metal nitride substrates via CVD |
| 06/10/2003 | US6576064 Support apparatus for semiconductor wafer processing |
| 06/10/2003 | US6576063 Apparatus and method for use in manufacturing a semiconductor device |
| 06/10/2003 | US6576062 Film forming apparatus and film forming method |
| 06/10/2003 | US6576060 Protective gas shield apparatus |
| 06/10/2003 | US6575671 Chromium-containing cemented tungsten carbide body |
| 06/10/2003 | US6574993 Method of manufacturing a preform exhibiting a precisely defined refractive index profile by means of a chemical vapor deposition (CVD) technique |
| 06/05/2003 | WO2003046971A1 Method for forming an oxynitride spacer for a metal gate electrode using a pecvd process with a silicon-starving atmosphere |
| 06/05/2003 | WO2003046970A1 Low temperature compatible wide-pressure-range plasma flow device |
| 06/05/2003 | WO2003046969A1 Processing device, and gas discharge suppressing member |
| 06/05/2003 | WO2003046966A1 Susceptor, gaseous phase growing device, device and method for manufacturing epitaxial wafer, and epitaxial wafer |
| 06/05/2003 | WO2003046957A1 Heated vacuum support apparatus |
| 06/05/2003 | WO2003046255A1 Field emission device and method of fabricating same |
| 06/05/2003 | WO2003046254A1 Method for the fabrication of silicon nitride, silicon oxynitride, and silicon oxide films by chemical vapor deposition |
| 06/05/2003 | WO2003046253A1 Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition |
| 06/05/2003 | WO2003046252A2 Buffing diamond-like carbon (dlc) to improve scratch resistance |
| 06/05/2003 | WO2003046248A2 Improved method for coating a support |
| 06/05/2003 | WO2003046244A2 Generation, distribution, and use of molecular fluorine within a fabrication facility |
| 06/05/2003 | WO2003045959A1 Hexakis (monohydrocarbylamino) disilanes and method for the preparation thereof |
| 06/05/2003 | WO2003045860A1 Burner for a vapour deposition process |
| 06/05/2003 | WO2003008664A3 Method of making a passivated surface |
| 06/05/2003 | WO2002062111A3 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification |
| 06/05/2003 | WO2002058112A9 Copper diffusion barriers |
| 06/05/2003 | US20030104708 CVD plasma assisted lower dielectric constant sicoh film |
| 06/05/2003 | US20030104707 System and method for improved thin dielectric films |
| 06/05/2003 | US20030104689 Manufacturing method of semiconductor device |
| 06/05/2003 | US20030104667 Capacitor constructions comprising perovskite-type dielectric materials, and methods of forming capacitor constructions comprising perovskite-type dielectric materials |
| 06/05/2003 | US20030104664 Silicon film, semiconductor device, and process for forming silicon films |
| 06/05/2003 | US20030104255 Chemical deposition includes drawing a small amount of chromium from the steel substrate into the vanadium or niobium carbide coating to provide adhesion strength |
| 06/05/2003 | US20030104254 Substrate after coating is subjected to a dry blast treatment using a granular blast agent that has a maximum diameter of 150 mu m. |
| 06/05/2003 | US20030104209 Precursor and method of growing doped glass films |
| 06/05/2003 | US20030104202 Method for inducing controlled cleavage of polycrystalline silicon rod |
| 06/05/2003 | US20030104185 Method for producing a multi-functional, multi-ply layer on a transparent plastic substrate and a multi-functional multi-ply layer produced according to said method |
| 06/05/2003 | US20030104158 System and method for thin film protective overcoat |
| 06/05/2003 | US20030104141 Atmospheric pressure; thin film deposits on silicon surfaces for solar cells |
| 06/05/2003 | US20030104139 Apparatus for depositing a plasma chemical vapor deposition coating on the inside of an optical fiber preform |
| 06/05/2003 | US20030104126 Method for depositing refractory metal layers employing sequential deposition techniques |
| 06/05/2003 | US20030103871 Minimum volume oven for producing uniform pyrolytic oxide coatings on capacitor anodes |
| 06/05/2003 | US20030102811 Plasma coil |
| 06/05/2003 | US20030102501 Rhodium-rich integrated circuit capacitor electrode |
| 06/05/2003 | US20030102085 Chemical plasma cathode |
| 06/05/2003 | US20030101938 Apparatus for the deposition of high dielectric constant films |
| 06/05/2003 | US20030101934 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes |
| 06/05/2003 | US20030101927 Apparatus and method for growth of a thin film |
| 06/05/2003 | US20030101869 Washing pretreatment with oil; circulation |
| 06/05/2003 | US20030101699 Exhaust gas filtration device and auxiliary filtration device |
| 06/05/2003 | US20030101613 Cleaning efficiency improvement in a high density plasma process chamber using thermally hot gas |
| 06/04/2003 | EP1316626A2 Transparent conductive layer forming method, transparent conductive layer formed by the method, and material comprising the layer |
| 06/04/2003 | EP1316110A2 Electrostatic chuck with porous regions |
| 06/04/2003 | EP1316108A1 Low-dielectric silicon nitride film and method of forming the same, semiconductor device and fabrication process thereof |
| 06/04/2003 | EP1316107A2 Method of forming a pre-metal dielectric film on a semiconductor substrate |
| 06/04/2003 | EP1315854A2 Apparatus and method for cleaning a bell jar in a barrel epitaxial reactor |
| 06/04/2003 | EP1315853A1 Device for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates |
| 06/04/2003 | EP1092233A4 Method of forming a thin film |
| 06/04/2003 | EP1007757B1 Plastic containers with an external gas barrier coating |
| 06/04/2003 | EP0994973B1 Apparatus and method for nucleation and deposition of diamond using hot-filament dc plasma |
| 06/04/2003 | EP0888213B1 Diamond film deposition |
| 06/04/2003 | CN1422388A Selective deposition of material on a substrate according to an interference pattern |
| 06/04/2003 | CN1421543A CVD apparatus |
| 06/04/2003 | CN1110582C Apparatus for vaporizing and supplying material |
| 06/04/2003 | CN1110581C Improved hard alloy body for machining cast-iron |
| 06/03/2003 | US6573211 Perovskite mixed oxide |
| 06/03/2003 | US6573197 Thermally stable poly-Si/high dielectric constant material interfaces |
| 06/03/2003 | US6573196 Method of depositing organosilicate layers |
| 06/03/2003 | US6573185 Manufacture of a semiconductor device |
| 06/03/2003 | US6573184 Apparatus and method for depositing thin film on wafer using atomic layer deposition |
| 06/03/2003 | US6573182 Chemical vapor deposition using organometallic precursors |
| 06/03/2003 | US6573180 PECVD method of forming a tungsten silicide layer on a polysilicon layer |
| 06/03/2003 | US6573178 Manufacturing method for semiconductor device and semiconductor manufacturing apparatus |
| 06/03/2003 | US6572991 Deposition of γ-Al2O3 by means of CVD |
| 06/03/2003 | US6572975 Alternate layers of silicon dioxide and amorphous hydrogenated silicon coated by plasma enhanced chemical vapor deposition on such as aromatic polycarbonate; thermal stability; short wavelength infrared transparent |
| 06/03/2003 | US6572937 Method for producing fluorinated diamond-like carbon films |
| 06/03/2003 | US6572936 Hard carbon film-coated substrate and method for fabricating the same |
| 06/03/2003 | US6572935 Optically transparent, scratch-resistant, diamond-like carbon coatings |
| 06/03/2003 | US6572933 Combining plasma based implantation and deposition increasing film thickness and reducing stress |
| 06/03/2003 | US6572925 Doped silica |
| 06/03/2003 | US6572924 Two exhaust paths and three way flow control valve; reducing contamination of semiconductor wafers |
| 06/03/2003 | US6572708 Semiconductor wafer support lift-pin assembly |
| 06/03/2003 | US6572707 Vaporizer for sensitive precursors |
| 06/03/2003 | US6572706 Integrated precursor delivery system |
| 06/03/2003 | US6572705 Method and apparatus for growing thin films |
| 06/03/2003 | US6572371 Gas preheater which allows substantially uniform densification to be achieved without significantly affecting productivity of chemical vapor infiltration substrates |
| 06/03/2003 | US6571865 Heat transfer surface |
| 06/03/2003 | US6571729 Apparatus for depositing a thin film on a data recording disk |
| 06/03/2003 | CA2264371C Thin film deposition method |
| 05/30/2003 | WO2003044843A2 Forming low k dielectric layers |
| 05/30/2003 | WO2003044839A2 Formation of high-mobility silicon-germanium structures by low-energy plasma enhanced chemical vapor deposition |
| 05/30/2003 | WO2003044242A2 Atomic layer deposition of copper using a reducing gas and non-fluorinated copper precursors |
| 05/30/2003 | WO2003016590A3 Device for supplying gas mixtures to a cvd reactor |
| 05/30/2003 | WO2002089237A3 Method of making fluid diffusion layers and electrodes having reduced surface roughness |
| 05/30/2003 | WO2002045167A3 Thin films for magnetic devices |