Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/2003
05/30/2003WO2002034960A3 Method for synthesizing diamond
05/29/2003US20030100691 Porous low k (<2.0) thin film derived from homo-transport-polymerization
05/29/2003US20030100194 Method of manufacturing semiconductor device
05/29/2003US20030100193 Method for forming a dielectric layer in a semiconductor device
05/29/2003US20030100183 CVD of PtRh with good adhesion and morphology
05/29/2003US20030100162 Method for forming capacitor of semiconductor device
05/29/2003US20030099835 Scratch resistance (SR) of a coated article is improved by buffing the coated article after deposition of the layer(s) of the coating. For example, in certain embodiments a diamond-like carbon (DLC) inclusive layer(s) is deposited on a
05/29/2003US20030099784 To produce uniform coating on a substrate
05/29/2003US20030099763 Shaped microcomponent via reactive conversion of biologically-derived microtemplates
05/29/2003US20030098487 Semiconductor device with metal gate electrode and silicon oxynitride spacer
05/29/2003US20030098372 Multi-sectored flat board type showerhead used in CVD apparatus
05/29/2003US20030098367 Processes and systems for determining the identity of metal alloys
05/29/2003US20030098125 Method of and apparatus for performing sequential processes requiring different amounts of time in the manufacturing of semiconductor devices
05/29/2003US20030098093 .7-1.2% carbon and 4-12% chromium; applying a group 5 metal with an atomic number of < 41 to the surface by agitating with a halide catalyst at 1600-2000 degrees f
05/29/2003US20030098039 Device for deposition with chamber cleaner and method for cleaning the chamber
05/29/2003US20030098038 System and method for on-site generation and distribution of fluorine for fabrication processes
05/29/2003US20030097988 Apparatus and method for depositing large area coatings on non-planar surfaces
05/29/2003US20030097987 Plasma CVD apparatus conducting self-cleaning and method of self-cleaning
05/29/2003US20030097986 Arrangement for coupling microwave energy into a treatment chamber
05/29/2003US20030097985 Vacuum processing apparatus and control method therefor
05/28/2003EP1315201A1 Radial antenna and plasma processing apparatus comprising the same
05/28/2003EP1315199A1 Formation of high-mobility silicon-germanium structures by low-energy plasma enhanced chemical vapor deposition
05/28/2003EP1315194A2 Plasma CVD apparatus and method with self-cleaning capability
05/28/2003EP1314790A2 Cemented carbide with binder phase enriched surface zone
05/28/2003EP1314191A1 Composite structure for electronic microsystems and method for production of said composite structure
05/28/2003EP1314183A1 Plasma processing
05/28/2003EP1313897A1 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates
05/28/2003EP1313891A1 Cvd coating device
05/28/2003EP1313890A2 Barrier coating for vitreous materials
05/28/2003EP1313744A1 Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
05/28/2003EP1293588A9 Plasma cvd apparatus and method
05/28/2003EP1019553B1 Method for dissociating metals or dissociating metal compounds
05/28/2003EP0854891B1 Process for preparing coated plastic surfaces
05/28/2003CN2552945Y Cutter device with diamond-coating film
05/28/2003CN1421043A Plasma processing system and method therefor
05/28/2003CN1420978A Hot wall rapid thermal processor
05/28/2003CN1420803A In-Situ air oxidation treatment of MOCVD process effluent
05/28/2003CN1420533A System and method for enhancing dielectric film
05/28/2003CN1420207A Corrosion-resistant bydrophilic multi-layer film forming method by plasma
05/28/2003CN1420206A Spray coating device using plasma continuous polymerization system
05/28/2003CN1420205A Method for corrosion-resistant treatment of metal by plasma
05/28/2003CN1420204A Method for anticorrosion treatment of metal by plasma technique
05/28/2003CN1420203A Method for mfg. thin film and feedstock for chemical vapor growth
05/28/2003CN1109779C Dual vertical thermal treatment furnace
05/28/2003CN1109776C Method and apparatus for coating diamond-like carbon onto particles
05/28/2003CN1109775C Hard carbon coating
05/27/2003US6569812 Method for fabricating an yttrium-based high temperature superconducting tape
05/27/2003US6569782 Insulating layer, semiconductor device and methods for fabricating the same
05/27/2003US6569765 Hybrid deposition system and methods
05/27/2003US6569501 Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
05/27/2003US6569496 CVD of metals capable of receiving nickel or alloys thereof using inert contact
05/27/2003US6569295 Depositing a layer of filler material on the surface, covering the surface irregularities and etching the layer of filler material by directing particles at an oblique incident angle at the layer of filler material
05/27/2003US6569257 Method for cleaning a process chamber
05/27/2003US6569253 Injecting carbon tetrafluoride (CF4) and perfluoro ethane (C2F6) gas mixtures into the chamber of chemical vapor deposition machine, immersing the elements in a cleaing solution containing ammonia water and hydrogen peroxide
05/27/2003US6569250 Gas-driven rotation apparatus and method for forming silicon carbide layers
05/27/2003US6569239 Silicon epitaxial wafer and production method therefor
05/27/2003US6569238 Apparatus and method for depositing semi conductor film
05/27/2003CA2307036C Nickel carbonyl vapour deposition apparatus and process
05/22/2003WO2003043073A2 A method of depositing low k barrier layers
05/22/2003WO2003043069A1 Apparatus of chemical vapor deposition for forming a thin film
05/22/2003WO2003043068A1 Cvd thin film manufacturing apparatus
05/22/2003WO2003043066A2 Layered structures
05/22/2003WO2003041881A1 Source liquid supply apparatus having a cleaning function
05/22/2003WO2003018870A3 Device for reactive plasma treatment of substrates and method for the use thereof
05/22/2003WO2003018863A3 Method for producing a fluorescent material layer
05/22/2003WO2003017737A3 Cascade arc plasma and abrasion resistant coatings made therefrom
05/22/2003WO2002089238A3 Abraded fluid diffusion layer for an electrochemical fuel cell
05/22/2003WO2002056912A3 Pharmaceutical combination for the treatment of cancer containing a 4-quinazolineamine and another anti-neoplastic agent
05/22/2003US20030096472 Oxygen radical annealing or plasma annealing a lower or upper electrode or a dielectric layer of a microelectronic capacitor on a substrate to reduce the leakage current and the impurities in the dielectric layer
05/22/2003US20030096467 Semiconductors having a high K dielectric as a hafnium oxide gate with excellent leakage current and low interface state with a gate electrode and silicon substrate; a gate dielectric on a trench ; a gate line on the gate dielectric
05/22/2003US20030096098 Semiconductor with coordinatively irregular structures
05/22/2003US20030094909 Process and device for treatment by dielectric barrier discharge lamps
05/22/2003US20030094903 Selectively controllable gas feed zones for a plasma reactor
05/22/2003US20030094711 Device for producing a gas mixture
05/22/2003US20030094646 Semiconductor device and method for manufacturing semiconductor device
05/22/2003US20030094644 Method for manufacturing semiconductor device and capacitor
05/22/2003US20030094451 Heating apparatus
05/22/2003US20030094238 Plasma processing apparatus for spatial control of dissociation and ionization
05/22/2003US20030094136 Atmospheric pressure wafer processing reactor having an internal pressure control system and method
05/22/2003US20030094135 Discharges exhaust gas generated as a result of chemical processing
05/22/2003US20030094134 By-product deposited on an interior wall in the main exhaust pipe is exhausted by a dust collection exhaust pipe having exhaust power higher than that of the main exhaust pipe
05/22/2003US20030094133 Piezoelectric vaporizer
05/22/2003US20030094130 Low mass, rapid heating furnace in combination with three pumping packages
05/22/2003US20030094085 Surface-coated carbide alloy cutting tool
05/21/2003EP1313140A1 Method of forming a liner for tungsten plugs
05/21/2003EP1313134A1 Semiconductor polysilicon component and method of manufacture thereof
05/21/2003EP1313127A1 Metal film production apparatus
05/21/2003EP1312698A1 Heating element CVD System and heating element CVD method using the same
05/21/2003EP1312697A1 CVD of dielectric films
05/21/2003EP1312696A2 Metal barrier film production apparatus, metal barrier film production method, metal film production method, and metal film production apparatus
05/21/2003EP1312695A1 Sputtering target producing few particles, backing plate or sputtering apparatus and sputtering method producing few particles
05/21/2003EP1312429A1 Method and device for preventing solid product from adhering to inner surface of exhaust gas pipe and exhaust gas treatment device with the device
05/21/2003EP1312422A2 Plasma polymerization on surface of material
05/21/2003EP1311712A2 Method for increasing compression stress or reducing internal tension stress of a cvd, pcvd or pvd layer and cutting insert for machining
05/21/2003EP1204622B1 Silicon nitride components with protective coating
05/21/2003EP1064416B1 Method for deposition and etching of a dielectric layer
05/21/2003CN1419268A Heat generator CVD device and heat generator CVD method adopting same
05/21/2003CN1419265A Method and apparatus for making semiconductor device, cleaning method thereof and making system
05/21/2003CN1419045A Method and system for avoiding anomaly stop of production device
05/21/2003CN1109356C Fabrication process of semiconductor device
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