| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 05/21/2003 | CN1109130C Method and apparatus for depositing carbon-rich coating on moving substrate |
| 05/21/2003 | CN1109129C Gas-conveying quantitative distributing pipe |
| 05/21/2003 | CN1109128C System and method for controlled delivery of liquified gases |
| 05/20/2003 | US6567258 High temperature electrostatic chuck |
| 05/20/2003 | US6567219 Laser irradiation apparatus |
| 05/20/2003 | US6566704 Vertical nano-size transistor using carbon nanotubes and manufacturing method thereof |
| 05/20/2003 | US6566279 Method for fabricating a SiC film and a method for fabricating a SiC multi-layered film structure |
| 05/20/2003 | US6566278 Method for densification of CVD carbon-doped silicon oxide films through UV irradiation |
| 05/20/2003 | US6566247 Electronic devices with composite atomic barrier film and process for making same |
| 05/20/2003 | US6566199 Method and system for forming film, semiconductor device and fabrication method thereof |
| 05/20/2003 | US6566186 Capacitor with stoichiometrically adjusted dielectric and method of fabricating same |
| 05/20/2003 | US6566147 Method for controlling deposition of dielectric films |
| 05/20/2003 | US6565984 Durability |
| 05/20/2003 | US6565917 Depositing a paste in a via of a ceramic substrate and depositing the paste on the ceramic substrate; depositing, by a dry chemical vapor deposition (CVD) process, a nickel plating on paste, paste containing titania |
| 05/20/2003 | US6565791 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process |
| 05/20/2003 | US6565719 Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content |
| 05/20/2003 | US6565667 Removal surface impurities using dry ice |
| 05/20/2003 | US6565661 High flow conductance and high thermal conductance showerhead system and method |
| 05/20/2003 | US6565655 High vacuum apparatus for fabricating semiconductor device and method for forming epitaxial layer using the same |
| 05/20/2003 | US6564810 Supplying gas to remove deposits; applying radio frequency |
| 05/20/2003 | US6564744 Plasma CVD method and apparatus |
| 05/20/2003 | CA2035294C Encapsulated electroluminescent phosphor and method for making same |
| 05/15/2003 | WO2003041460A1 Plasma process apparatus and its processor |
| 05/15/2003 | WO2003041148A1 Gas for plasma reaction, process for producing the same, and use |
| 05/15/2003 | WO2003041146A1 Apparatus and method for reactive atom plasma processing for material deposition |
| 05/15/2003 | WO2003041142A1 Method for forming thin film |
| 05/15/2003 | WO2003041141A1 Apparatus for depositing |
| 05/15/2003 | WO2003041140A1 Apparatus of chemical vapor deposition |
| 05/15/2003 | WO2003041139A1 Thermal treating apparatus |
| 05/15/2003 | WO2003041132A2 Gas-assisted rapid thermal processing |
| 05/15/2003 | WO2003041124A2 Method of fabricating a gate stack at low temperature |
| 05/15/2003 | WO2003040636A1 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
| 05/15/2003 | WO2003040440A2 Apparatus and method for diamond production |
| 05/15/2003 | WO2003040429A1 Method for producing a continuous coating at the surface of a component |
| 05/15/2003 | WO2003039828A1 Honeycomb structural body forming ferrule and method of manufacturing the ferrule |
| 05/15/2003 | WO2003039827A1 Honeycomb structural body forming ferrule, and method of manufacturing the ferrule |
| 05/15/2003 | WO2002038515A9 Solar management coating system including protective dlc |
| 05/15/2003 | WO2002036511A9 Method of depositing dlc inclusive coating system on substrate including step of heating substrate during ion beam deposition of dlc inclusive coating system |
| 05/15/2003 | WO2002023599A9 Bi-directional processing chamber and method for bi-directional processing of semiconductor substrates |
| 05/15/2003 | US20030092287 Process for forming hafnium oxide films |
| 05/15/2003 | US20030092282 Susceptor of apparatus for manufacturing semiconductor device |
| 05/15/2003 | US20030092266 Gas inlets for wafer processing chamber |
| 05/15/2003 | US20030092264 Substrate processing apparatus and method |
| 05/15/2003 | US20030092262 Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide |
| 05/15/2003 | US20030091870 Method of forming a liner for tungsten plugs |
| 05/15/2003 | US20030091835 Comprises flame sprayed coating which prevents dust generation caused by peeling of film-like substances adhered to semiconductor parts during film deposition and precleaning, improving durability against plasma generated within |
| 05/15/2003 | US20030091753 Upward distribution of reactive gases; walls coated with a protective film having layers of different dielectric constant; antideposit agents; nitride layer formed of low hydrogen content, high density; oxidation resistance; quality |
| 05/15/2003 | US20030091742 Vacuum deposition in electrolytic cell |
| 05/15/2003 | US20030091740 Thin films; vapor deposition |
| 05/15/2003 | US20030091739 Nitriding; suppress diffusion |
| 05/15/2003 | US20030089992 Plasma enhanced chemical vapor deposition in the presence of an inert gas; low dielectric constant; useful in a damascene structure; passivation layer, resistant to moisture |
| 05/15/2003 | US20030089698 Hot wall rapid thermal processor |
| 05/15/2003 | US20030089697 Thermal processing system and thermal processing method |
| 05/15/2003 | US20030089680 Method and apparatus for the etching of photomask substrates using pulsed plasma |
| 05/15/2003 | US20030089678 Thin interface layer to improve copper etch stop |
| 05/15/2003 | US20030089600 Workpiece holder for processing apparatus, and processing apparatus using the same |
| 05/15/2003 | US20030089458 Wafer processing member |
| 05/15/2003 | US20030089315 Metal film production apparatus |
| 05/15/2003 | US20030089314 Plasma CVD film-forming device |
| 05/15/2003 | US20030089308 Apparatus and method for growth of a thin film |
| 05/14/2003 | EP1310500A1 Precursor compounds for metal oxide film deposition and methods of film deposition using the same |
| 05/14/2003 | EP1310466A2 Quartz glass parts, ceramic parts and process of producing those |
| 05/14/2003 | EP1310298A1 Process and device for treatment by dielectric barrier discharge lamps |
| 05/14/2003 | EP1309992A2 Method and apparatus for measuring reflectivity of deposited films |
| 05/14/2003 | EP1309737A1 Plasma coating method |
| 05/14/2003 | EP1309733A2 Chromium-containing cemented carbide body having a surface zone of binder enrichment |
| 05/14/2003 | EP1144722B1 Improved corrosion resistant coating |
| 05/14/2003 | EP0935589B1 Transparent substrate provided with at least one reflecting coating and method for obtaining same |
| 05/14/2003 | EP0837495B1 Vapor phase growth apparatus |
| 05/14/2003 | EP0787221B1 Platinum aluminide cvd coating method |
| 05/14/2003 | EP0748260B1 Ion beam process for deposition of highly abrasion-resistant coatings |
| 05/14/2003 | CN1418261A Gas supply device for precursors with low vapor pressure |
| 05/14/2003 | CN1417375A Method and equipment for raising speed of electronic cyclotron resonance chemical vapor deposition |
| 05/14/2003 | CN1108398C RF film-plating technology by siliconization |
| 05/14/2003 | CN1108225C 光学系统 Optical system |
| 05/13/2003 | US6563686 Pedestal assembly with enhanced thermal conductivity |
| 05/13/2003 | US6563578 In-situ thickness measurement for use in semiconductor processing |
| 05/13/2003 | US6563076 Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor |
| 05/13/2003 | US6562735 Control of reaction rate in formation of low k carbon-containing silicon oxide dielectric material using organosilane, unsubstituted silane, and hydrogen peroxide reactants |
| 05/13/2003 | US6562731 Method for forming dielectric layers |
| 05/13/2003 | US6562720 Apparatus and method for surface finishing a silicon film |
| 05/13/2003 | US6562715 Barrier layer structure for copper metallization and method of forming the structure |
| 05/13/2003 | US6562708 Method for incorporating silicon into CVD metal films |
| 05/13/2003 | US6562702 Semiconductor device and method and apparatus for manufacturing semiconductor device |
| 05/13/2003 | US6562690 Plasma processes for depositing low dielectric constant films |
| 05/13/2003 | US6562678 Chemical vapor deposition process for fabricating layered superlattice materials |
| 05/13/2003 | US6562445 Diamond-like carbon hard multilayer film and component excellent in wear resistance and sliding performance |
| 05/13/2003 | US6562404 Conformal chemically resistant coatings for microflow devices |
| 05/13/2003 | US6562190 System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamber |
| 05/13/2003 | US6562186 Apparatus for plasma processing |
| 05/13/2003 | US6562183 Anti-corrosive parts for etching apparatus |
| 05/13/2003 | US6562140 Apparatus for fabrication of thin films |
| 05/13/2003 | US6562079 Microwave discharge apparatus |
| 05/13/2003 | US6561796 Heating in a gas with a thermal conductivity and mean free path greater than that of oxygen, or by heating under a pressure less than 0.1 Torr. |
| 05/13/2003 | US6561498 Bubbler for use in vapor generation systems |
| 05/13/2003 | US6561226 Low pressure chemical vapor deposition chamber |
| 05/13/2003 | CA2153848C Oxide thin film having quartz crystal structure and process for producing the same |
| 05/08/2003 | WO2003039195A2 Induction heating devices and methods for controllably heating an article |
| 05/08/2003 | WO2003038892A2 Atomic-layer-deposited tantalum nitride and alpha-phase tantalum as barrier layers for copper metallization |
| 05/08/2003 | WO2003038145A2 Chemical vapor deposition system |