Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2003
06/19/2003US20030113085 HDP-CVD film for uppercladding application in optical waveguides
06/19/2003US20030111963 Inductively coupled plasma system
06/19/2003US20030111678 CVD deposition of M-SION gate dielectrics
06/19/2003US20030111662 H:SiOC coated substrates
06/19/2003US20030111438 Process operation supplementation with oxygen
06/19/2003US20030111334 Process for preparing carbon nanotubes
06/19/2003US20030111015 Reaction chamber with at least one HF feedthrough
06/19/2003US20030111014 Vaporizer/delivery vessel for volatile/thermally sensitive solid and liquid compounds
06/19/2003US20030111013 Method for the deposition of silicon germanium layers
06/19/2003US20030111012 Method for forming a thin film and a thin film forming apparatus therefor
06/19/2003US20030111009 Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition
06/19/2003US20030111007 Method for vaporizing and supplying
06/19/2003US20030110822 Gas-barrier synthetic resin vessel, device for producing the same, and article-received gas-barrier synthetic resin vessel
06/19/2003US20030110808 Method of manufacturing an optical core
06/18/2003EP1320134A2 Photovoltaic device and manufacturing method thereof
06/18/2003EP1320125A2 Seed layer processes for mocvd of ferroelectric thin films on high-K gate oxides
06/18/2003EP1320118A2 Reactor for simultaneously coating both sides of spectacle glasses
06/18/2003EP1319887A2 Vapor delivery from a low vapor pressure liquefied compressed gas
06/18/2003EP1319733A2 Method and apparatus for deposition of three-dimensional object
06/18/2003EP1161572B1 Cutting insert for cutting metallic materials with a molybdenum sulfide containing coating and method for its production
06/18/2003EP1062088B1 Tabletting tool
06/18/2003EP0948571B1 Gloss pigment based on reduced titanium dioxide-coated silicon dioxide platelets
06/18/2003CN1425194A Method of depositing metal film and metal deposition cluster including supercritical drying/cleaning module
06/18/2003CN1425078A Process for purification of organometallic compounds or heteroato mic organic compounds with a catalyst based on iron and manganese supported on zeolites
06/18/2003CN1425077A Process for purification of organometallic compounds or heteroatomic getter alloys
06/18/2003CN1424429A Method and system for preferential chemical vapor phase deposition
06/18/2003CN1111616C Method of forming hard carbon film on inner circumferential surface of guide bush
06/18/2003CN1111615C Free floating shield and semiconductor processing system
06/17/2003US6579811 Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating
06/17/2003US6579805 In situ chemical generator and method
06/17/2003US6579793 Method of achieving high adhesion of CVD copper thin films on TaN Substrates
06/17/2003US6579789 Method for fabricating metal wiring and the metal wiring
06/17/2003US6579731 Temperature measuring method and apparatus in semiconductor processing apparatus, and semiconductor processing method and apparatus
06/17/2003US6579614 Structure having refractory metal film on a substrate
06/17/2003US6579428 Arc evaporator, method for driving arc evaporator, and ion plating apparatus
06/17/2003US6579374 Apparatus for fabrication of thin films
06/17/2003US6579372 Apparatus and method for depositing thin film on wafer using atomic layer deposition
06/17/2003US6578515 Film formation apparatus comprising movable gas introduction members
06/17/2003US6578514 Modular device of tubular plasma source
06/13/2003CA2414390A1 Volume-optimized reactor for simultaneously coating eyeglasses on both sides
06/12/2003WO2003049172A1 Lanthanide series layered superlattice materials for integrated circuit applications
06/12/2003WO2003049161A1 Interconnects with improved barrier layer adhesion
06/12/2003WO2003049141A2 Device for applying an electromagnetic microwave to a plasma container
06/12/2003WO2003048430A1 Device and method for producing, removing or treating layers on a substrate
06/12/2003WO2003048415A1 Arrangement for monitoring a thickness of a layer depositing on a sidewall of a processing chamber
06/12/2003WO2003048414A1 Chemical vapor deposition reactor
06/12/2003WO2003048413A1 Mixer, and device and method for manufacturing thin-film
06/12/2003WO2003048412A1 Chemical vapor deposition vaporizer
06/12/2003WO2003048411A1 Method for forming thin film, substrate having transparent electroconductive film and photoelectric conversion device using the substrate
06/12/2003WO2003048410A1 Method for inducing controlled cleavage of polyrystalline silicon rod
06/12/2003WO2003048409A1 Apparatus for depositing a plasma chemical vapor deposition coating on the inside of an optical fiber preform
06/12/2003WO2003048408A1 Precursor and method of growing doped glass films
06/12/2003WO2003048406A2 Coating method and coating
06/12/2003WO2003048041A1 Method for creating silicon dioxide film
06/12/2003WO2003047735A1 High flow rate bubbler system and method
06/12/2003WO2003047731A1 Gas supplying method and system
06/12/2003WO2003047725A2 Method and installation for treating flue gas containing hydrocarbons
06/12/2003WO2003035926A3 Improved precursors for chemical vapour deposition
06/12/2003US20030109734 Beta-diketonatocopper (I) complex containing allene compounds as ligand and process for producing the same
06/12/2003US20030109147 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby
06/12/2003US20030109136 Semiconductor device and method of manufacturing the same
06/12/2003US20030109135 Method for forming capacitor of semiconductor device
06/12/2003US20030109134 Method of manufacturing semiconductor device and method of determining film formation time, chamber, chemical vapor deposition apparatus and boat thereof, etching apparatus, and film formation process system
06/12/2003US20030109128 Semiconductor device and method of manufacturing the same
06/12/2003US20030109110 Method for forming capacitor of a semiconductor device
06/12/2003US20030109107 Method for forming nitride spacer by using atomic layer deposition
06/12/2003US20030109094 Massively parallel atomic layer deposition/chemical vapor deposition system
06/12/2003US20030109069 Seed layer processes for MOCVD of ferroelectric thin films on high-k gate oxides
06/12/2003US20030108752 Substrate body coated with multiple layers and method for the production thereof
06/12/2003US20030108676 Glass coating agent and method for coating glass material using the same
06/12/2003US20030108674 Forming copper/tungsten films with titanium/tantalum-silicon nitride barrier/adhesion layer via pulses of pentakis-(dimethylamino)-tantalum/titanium, silane, and ammonia
06/12/2003US20030108478 Carbon nanotubes and method of manufacturing same, electron emission source, and display
06/12/2003US20030108476 Method for producing a polycrystalline diamond element and element produced according to said method
06/12/2003US20030107282 Magnetic bearing and magnetic levitation apparatus
06/12/2003US20030107098 Ultraviolet-transparent conductive film and process for producing the same
06/12/2003US20030106647 Apparatus for holding an object to be processed
06/12/2003US20030106646 Plasma chamber insert ring
06/12/2003US20030106643 Surface treatment apparatus
06/12/2003US20030106495 Heat treatment system and method
06/12/2003US20030106494 Gas supplying apparatus and method of testing the same for clogs
06/12/2003US20030106490 Apparatus and method for fast-cycle atomic layer deposition
06/11/2003EP1318542A1 Cleaning gasses and etching gases
06/11/2003EP1318211A1 Arrangement for monitoring a thickness of a layer depositing on a sidewall of a processing chamber
06/11/2003EP1318210A2 Method for deposition and etching of a dielectric layer
06/11/2003EP1317353A1 Method for providing a semitransparent metallic aspect to cosmetic case or compact components and resulting components
06/11/2003EP1080247B1 Method for producing metallized substrate materials
06/11/2003EP0891366B1 Volatile magnesium alkylaluminum alkoxide and deposition of magnesium aluminate film using the same
06/11/2003CN1423834A UV prtreatment process for ultra-thin oxynitride for formation of silicon nitridefilms
06/11/2003CN1423833A Method and apparatus for plasma cleaning of workpieces
06/11/2003CN1423828A Method and apparatus for controlling the volume of a plasma
06/11/2003CN1423827A Method and apparatus for producing uniform process rates
06/11/2003CN1423824A Materials and gas chemistries for processing systems
06/11/2003CN1422979A Transparent conductive film, its forming method and product having same
06/10/2003US6577915 To predict ion and neutral flux distributions on a substrate as a function of reactor settings using a calibrated profile simulator during semiconductor plasma processing
06/10/2003US6577113 Apparatus and method for measuring substrate biasing during plasma processing of a substrate
06/10/2003US6576980 Surface treatment anneal of hydrogenated silicon-oxy-carbide dielectric layer
06/10/2003US6576928 Semiconductor device capacitor with high permittivity tantalum pentoxide/niobium pentoxide dielectric
06/10/2003US6576860 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
06/10/2003US6576778 Methods for preparing ruthenium and osmium compounds
06/10/2003US6576570 Method for improving thickness uniformity of deposited ozone-teos silicate glass layers
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