| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/08/2003 | US6589869 Film thickness control using spectral interferometry |
| 07/08/2003 | US6589868 Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput |
| 07/08/2003 | US6589822 Manufacturing method for top-gate type and bottom-gate type thin film transistors |
| 07/08/2003 | US6589619 Recycling method |
| 07/08/2003 | US6589611 Forming a material along the sidewalls during the forming of the deposit over the substrate; impacting the material along the sidewalls with the activated species to treat the material and thereby decrease flaking |
| 07/08/2003 | US6589610 Deposition chamber and method for depositing low dielectric constant films |
| 07/08/2003 | US6589599 Easily loaded and unloaded getter device for reducing evacuation time and contamination in a vacuum chamber and method for use of same |
| 07/08/2003 | US6589362 Light emitting element |
| 07/08/2003 | US6589352 Self aligning non contact shadow ring process kit |
| 07/08/2003 | US6589350 Vacuum processing chamber with controlled gas supply valve |
| 07/08/2003 | US6589329 Composition and process for production of copper circuitry in microelectronic device structures |
| 07/03/2003 | WO2003054949A1 Substrate processing method and substrate processing apparatus |
| 07/03/2003 | WO2003054941A1 Plasma treatment apparatus and control method thereof |
| 07/03/2003 | WO2003054940A1 Plasma treatment apparatus, matching box, impedance matching device, and coupler |
| 07/03/2003 | WO2003054911A2 Plasma process apparatus |
| 07/03/2003 | WO2003054257A1 Method for producing particles with diamond structure |
| 07/03/2003 | WO2003054248A1 Plasma chamber insert ring |
| 07/03/2003 | WO2003054247A2 Cleaning gas composition for semiconductor production equipment and cleaning method using the gas |
| 07/03/2003 | WO2003054246A1 Method for monitoring the course of a process using a reactive gas containing one or several hydrocarbons |
| 07/03/2003 | WO2003054245A1 Device for producing pcvd coated glass tubes for the drawing of optical fibers |
| 07/03/2003 | WO2003053801A1 System for forming carbon film on inner surface of plastic container and method for producing plastic container having inner surface coated with carbon film |
| 07/03/2003 | WO2003053673A1 Semiconductor with coordinatively irregular structures |
| 07/03/2003 | US20030124877 Method of heat-treating nitride compound semiconductor layer and method of producing semiconductor device |
| 07/03/2003 | US20030124876 Apparatus and method for use in manufacturing a semiconductor device |
| 07/03/2003 | US20030124875 Method for forming dielectric film of capacitor |
| 07/03/2003 | US20030124873 Method of annealing an oxide film |
| 07/03/2003 | US20030124872 Combined gate cap or digit line and spacer deposition using HDP |
| 07/03/2003 | US20030124870 Forming low k dielectric layers |
| 07/03/2003 | US20030124863 Method of forming insulating layer and method of fabricating thin film transistor using the same |
| 07/03/2003 | US20030124859 Fiber materials of the present invention have been found to be able exhibit superior softness |
| 07/03/2003 | US20030124842 Dual-gas delivery system for chemical vapor deposition processes |
| 07/03/2003 | US20030124820 Systems and methods for epitaxially depositing films on a semiconductor substrate |
| 07/03/2003 | US20030124819 Method of manufacturing photovoltaic element and apparatus therefor |
| 07/03/2003 | US20030124818 Method and apparatus for forming silicon containing films |
| 07/03/2003 | US20030124799 Formation of conductive rugged silicon |
| 07/03/2003 | US20030124798 Method of manufacturing a semiconductor device using a two-step deposition process |
| 07/03/2003 | US20030124794 Electronic component incorporating an integrated circuit and planar microcapacitor |
| 07/03/2003 | US20030124785 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 07/03/2003 | US20030124761 Method for depositing polycrystalline sige suitable for micromachining and devices obtained thereof |
| 07/03/2003 | US20030124760 Method for forming thin films of semiconductor devices |
| 07/03/2003 | US20030124717 Method of manufacturing carbon cylindrical structures and biopolymer detection device |
| 07/03/2003 | US20030124449 Process and apparatus for manufacturing electrophotographic photosensitive member |
| 07/03/2003 | US20030124394 Multilayer structure used especially as a material of high relative permittivity |
| 07/03/2003 | US20030124393 Method for fabricating a III nitride film, substrate for epitaxial growth, III nitride film, epitaxial growth substrate for III nitride element and III nitride element |
| 07/03/2003 | US20030124363 Hard metal wearing part with mixed oxide coating |
| 07/03/2003 | US20030124267 CVD method without using reaction gas at low deposition temperature; metal (particularly iridium, cobalt or rhodium) compound having a neutral ligand in addition to an anion; may be performed in the absence of oxygen or hydrogen |
| 07/03/2003 | US20030124262 Depositing a refractory metal containing crystalline barrier layer that inhibits atomic migration on a metal layer by alternately introducing pulses of a metal-containing compound and pulses of a nitrogen- containing compound; seed layer |
| 07/03/2003 | US20030124252 Method of forming thin ruthenium-containing layer |
| 07/03/2003 | US20030124251 Process of forming thin film and precursor for chemical vapor deposition |
| 07/03/2003 | US20030124250 Device for producing PCVD coated glass tubes for the drawing of optical fibers |
| 07/03/2003 | US20030124229 Plastic container for dry solid food |
| 07/03/2003 | US20030121898 For semiconductor wafers; uniform temperature distribution |
| 07/03/2003 | US20030121891 Ruthenium and ruthenium dioxide removal method and material |
| 07/03/2003 | US20030121796 In situ generation of nitrogen fluoride |
| 07/03/2003 | US20030121777 Components for vacuum deposition apparatus and vacuum deposition apparatus therewith , and target apparatus |
| 07/03/2003 | US20030121776 Mobile plating system and method |
| 07/03/2003 | US20030121608 Gas delivery apparatus for atomic layer deposition |
| 07/03/2003 | US20030121469 Method and apparatus of growing a thin film |
| 07/02/2003 | EP1324381A1 Workpiece holding mechanism |
| 07/02/2003 | EP1324379A1 Multilayer structure and material with high permitivity |
| 07/02/2003 | EP1324378A1 Mehrlagige Struktur, verwendet für Materialine mit hoher Permitivität |
| 07/02/2003 | EP1324376A1 Electronic component comprising an integrated circuit and a planar micro capacitor |
| 07/02/2003 | EP1324374A2 Etching System for an insulation-film |
| 07/02/2003 | EP1324371A1 Plasma processing apparatus |
| 07/02/2003 | EP1323851A2 Method for fabricating a III nitride film and products and elements obtained therefrom |
| 07/02/2003 | EP1323847A2 Coated cemented carbide body and method for use |
| 07/02/2003 | EP1323845A1 Multilayer structure |
| 07/02/2003 | EP1323783A2 Conductive silicon oxide powder, preparation thereof, and negative electrode material for non-aqueous electrolyte secondary cell |
| 07/02/2003 | EP1323671A1 Process for the fabrication of at least one nanotube between two electrically conductive elements and device for carrying out this process |
| 07/02/2003 | EP1323182A2 Apparatus and method for reducing contamination on thermally processed semiconductor substrates |
| 07/02/2003 | EP1323180A2 System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber |
| 07/02/2003 | EP1322901A2 System and method for controlling movement of a workpiece in a thermal processing system |
| 07/02/2003 | EP1322801A1 Gas inlet mechanism for cvd-method and device |
| 07/02/2003 | EP1322797A1 Method of growing a thin film onto a substrate |
| 07/02/2003 | EP1246694A4 In-situ air oxidation treatment of mocvd process effluent |
| 07/02/2003 | EP1198611B1 Device for treating a container with microwave plasma |
| 07/02/2003 | CN1427749A Deposited thin film and their use in separation and sarcrificial layer applications |
| 07/02/2003 | CN1426712A Diamond film watch band and its production method |
| 07/02/2003 | CN1113400C Formation method of aluminium film for wiring |
| 07/02/2003 | CN1113399C Method for mfg. Bi layer structure strong electrolyte thin-film |
| 07/02/2003 | CN1113397C Plasma processing method and apparatus |
| 07/02/2003 | CN1113391C Method for boron contamination reduction between silicon substrate and epitaxial Si or Si1-x Gex layer |
| 07/02/2003 | CN1113113C Process for growing gallium nitride and its compound film |
| 07/02/2003 | CN1112954C Gas purification system with safety device and method for purifying gases |
| 07/01/2003 | US6586349 Integrated process for fabrication of graded composite dielectric material layers for semiconductor devices |
| 07/01/2003 | US6586344 Mixing zirconium/hafnium chloride with zirconium/hafnium-tetramethylheptanedione complex and benzene, refluxing in argon atmosphere, removing solvents, then sublimating; chemical vapor deposition; semiconductors |
| 07/01/2003 | US6586340 Wafer processing apparatus and wafer processing method using the same |
| 07/01/2003 | US6586330 Method for depositing conformal nitrified tantalum silicide films by thermal CVD |
| 07/01/2003 | US6586285 Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers |
| 07/01/2003 | US6586260 Integrated circuits |
| 07/01/2003 | US6586056 Silicon based films formed from iodosilane precursors and method of making the same |
| 07/01/2003 | US6586055 Method for depositing functionally gradient thin film |
| 07/01/2003 | US6585830 Method for cleaning tungsten from deposition wall chambers |
| 07/01/2003 | US6585828 Process chamber lid service system |
| 07/01/2003 | US6585823 Atomic layer deposition |
| 07/01/2003 | US6584987 Method for improved cleaning in HDP-CVD process with reduced NF3 usage |
| 06/30/2003 | CA2415324A1 Multilayer structure, used in particular as a material with high relative permittivity |
| 06/30/2003 | CA2415312A1 Multilayer structure, used in particular as a material with high relative permittivity |
| 06/30/2003 | CA2415309A1 Multilayer structure, used in particular as a material with high relative permittivity |
| 06/30/2003 | CA2414400A1 Electronic component incorporating an integrated circuit and a planar microcondenser |