| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/29/2003 | US6599588 Method for surface treatment of metal enclosure |
| 07/29/2003 | US6599581 Method of fabricating jig for vacuum apparatus |
| 07/29/2003 | US6599580 Method for improving electrical conductivity of a metal oxide layer on a substrate utilizing high energy beam mixing |
| 07/29/2003 | US6599574 Forming smoother, more uniform, higher deposition borophos-phosilicate glass layer with superior gap fill and reflow capability |
| 07/29/2003 | US6599572 Process for growing metalloid thin films utilizing boron-containing reducing agents |
| 07/29/2003 | US6599569 Plastic containers with an external gas barrier coating, method and system for coating containers using vapor deposition, method for recycling coated containers, and method for packaging a beverage |
| 07/29/2003 | US6599447 Zirconium-doped BST materials and MOCVD process forming same |
| 07/29/2003 | US6599368 System architecture of semiconductor manufacturing equipment |
| 07/29/2003 | US6599367 Vacuum processing apparatus |
| 07/29/2003 | US6599178 Diamond cutting tool |
| 07/29/2003 | US6598610 Method of depositing a thick dielectric film |
| 07/29/2003 | US6598559 Temperature controlled chamber |
| 07/24/2003 | WO2003060978A1 Cvd method and device for forming silicon-containing insulation film |
| 07/24/2003 | WO2003060976A1 Contamination suppression in chemical fluid deposition |
| 07/24/2003 | WO2003060970A1 Semiconductor integrated circuit device manufacturing method |
| 07/24/2003 | WO2003060969A1 Processing device and processing method |
| 07/24/2003 | WO2003060968A1 Boat for heat treatment and vertical heat treatment equipment |
| 07/24/2003 | WO2003060967A1 Susceptor for epitaxial growth and epitaxial growth method |
| 07/24/2003 | WO2003060189A1 Emissivity-change-free pumping plate kit in a single wafer chamber |
| 07/24/2003 | WO2003060188A1 Showerhead assembly for a processing chamber |
| 07/24/2003 | WO2003060187A1 Process chamber having component with yttrium-aluminum coating |
| 07/24/2003 | WO2003060186A1 Chamber hardware design for titanium nitride atomic layer deposition |
| 07/24/2003 | WO2003060185A1 Anti-corrosive metal reaction chamber for chemical vapour deposition or rapid thermal annealing process |
| 07/24/2003 | WO2003060184A2 Method and apparatus for forming silicon containing films |
| 07/24/2003 | WO2003060183A1 Method and installation for the densification of substrates by means of chemical vapour infiltration |
| 07/24/2003 | WO2003059816A1 HIGHLY PURE ULTRA-FINE SiOX POWDER AND METHOD FOR PRODUCTION THEREOF |
| 07/24/2003 | WO2003009364A3 Low dielectric constant layers |
| 07/24/2003 | WO2002093630A3 Deposition of tungsten silicide films |
| 07/24/2003 | WO2002093623A3 Assembly comprising heat distributing plate and edge support |
| 07/24/2003 | WO2002055246A3 Coated saw blade |
| 07/24/2003 | US20030139835 System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor device |
| 07/24/2003 | US20030139064 Method for forming dielectric thin film and dielectric thin film formed thereby |
| 07/24/2003 | US20030139062 Method for fabricating an ultralow dielectric constant material |
| 07/24/2003 | US20030139035 Reacting a gas mixture containing hydrogen, argon, an aliphatic unsaturated hydrocarbon with double or triple bond, and an organosilicon compound in a plasma to deposit silicon carbide on a substrate |
| 07/24/2003 | US20030139026 Methods of forming binary noncrystalline oxide analogs of silicon dioxide |
| 07/24/2003 | US20030139005 Process conditions and precursors for atomic layer deposition (ald) of al2o3 |
| 07/24/2003 | US20030138999 Laser irradiation apparatus |
| 07/24/2003 | US20030138645 Condensation copolymerization to form a polyethersiloxane biocompatible coatings for medical implants; gas phase polymerization |
| 07/24/2003 | US20030138619 Plasma treatment of porous materials |
| 07/24/2003 | US20030138611 Multilayer structure used especially as a material of high relative permittivity |
| 07/24/2003 | US20030138562 Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD |
| 07/24/2003 | US20030138367 System and method for the abatement of toxic constituents of effluent gases |
| 07/24/2003 | US20030138242 Vapor flow controller |
| 07/24/2003 | US20030137737 Color shifting carbon-containing interference pigments and foils |
| 07/24/2003 | US20030137736 Color shifting carbon-containing interference pigments and foils |
| 07/24/2003 | US20030137250 Segmented electrode apparatus and method for plasma processing |
| 07/24/2003 | US20030136670 Mobile plating system and method |
| 07/24/2003 | US20030136520 Ceramic substrate support |
| 07/24/2003 | US20030136517 Vacuum-processing apparatus and method for vacuum-processing an object |
| 07/24/2003 | US20030136514 Method of supercritical processing of a workpiece |
| 07/24/2003 | US20030136428 Solution of hydrogen fluoride and nitric acid; then inert gas flow |
| 07/24/2003 | US20030136365 Exhaust pipe with reactive by-product adhesion preventing means and method of preventing the adhesion |
| 07/24/2003 | US20030136332 In situ application of etch back for improved deposition into high-aspect-ratio features |
| 07/24/2003 | US20030136265 Abatement of effluents from chemical vapor deposition processes using organometallic source reagents |
| 07/24/2003 | CA2471596A1 Contamination suppression in chemical fluid deposition |
| 07/24/2003 | CA2445501A1 Method and installation for the densification of substrates by means of chemical vapour infiltration |
| 07/23/2003 | EP1329540A2 An apparatus for the delivery of precursors in the vapour phase to epitaxial reactor sites |
| 07/23/2003 | EP1329534A2 Combination CVI/CVD and heat treat susceptor lid |
| 07/23/2003 | EP1328982A2 Device enclosures and devices with integrated battery |
| 07/23/2003 | EP1251973A4 Plasma-deposited coatings, devices and methods |
| 07/23/2003 | EP1131838A4 Self-oriented bundles of carbon nanotubes and method of making same |
| 07/23/2003 | CN1432147A Flow control of process gas in semiconductor mfg. |
| 07/23/2003 | CN1432071A Visibly marked parts and method for using same |
| 07/23/2003 | CN1432035A Barrier layer for polymers and containers |
| 07/23/2003 | CN1431716A Semiconductor device and mfg. method of semiconductor device |
| 07/23/2003 | CN1115717C Mfg. Process for semiconductor device |
| 07/23/2003 | CN1115596C Light receiving member and its prodn. tech, electrophotographic appts. and electrophotographic method |
| 07/23/2003 | CN1115426C Appts. for mfg. silica film and method for mfg. silica film using same |
| 07/23/2003 | CN1115425C Gas injection system for semiconductor processing |
| 07/22/2003 | US6597117 Plasma coil |
| 07/22/2003 | US6597029 Nonvolatile semiconductor memory device |
| 07/22/2003 | US6596968 Method of producing through-hole in aromatic polyimide film |
| 07/22/2003 | US6596655 Silicon oxide layer produced by plasma assisted chemical vapor deposition of an organosilane, using RF or microwave power to generate reactive oxygen atoms |
| 07/22/2003 | US6596654 Gap fill for high aspect ratio structures |
| 07/22/2003 | US6596653 Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD |
| 07/22/2003 | US6596652 Method of fabricating low dielectric constant film |
| 07/22/2003 | US6596649 Method and apparatus for supplying gas used in semiconductor processing |
| 07/22/2003 | US6596636 ALD method to improve surface coverage |
| 07/22/2003 | US6596627 Very low dielectric constant plasma-enhanced CVD films |
| 07/22/2003 | US6596344 Method of depositing a high-adhesive copper thin film on a metal nitride substrate |
| 07/22/2003 | US6596343 Tetraethylorthosilicate Si(OC2H5)4, as a suitable organometallic compound which, when coming in contact with hydroxyl radicals, decomposes or breaks down into SiO2 |
| 07/22/2003 | US6596340 Method of regulating a high temperature gaseous phase process and use of said method |
| 07/22/2003 | US6596339 Method and apparatus for non-contact, in-situ temperature measurement of a substrate film during chemical vapor deposition of the substrate film |
| 07/22/2003 | US6596187 Method of forming a nano-supported sponge catalyst on a substrate for nanotube growth |
| 07/22/2003 | US6596186 Mask for the selective growth of a solid, a manufacturing method for the mask, and a method for selectively growing a solid using the mask |
| 07/22/2003 | US6596133 Thin film material layers; microelectronics; PVD target is offset from the central axis to provide material to the substrate at an angle; processing efficiency; copper |
| 07/22/2003 | US6596123 Method and apparatus for cleaning a semiconductor wafer processing system |
| 07/22/2003 | US6596095 Epitaxial silicon wafer free from autodoping and backside halo and a method and apparatus for the preparation thereof |
| 07/22/2003 | US6596091 Method for sweeping contaminants from a process chamber |
| 07/22/2003 | US6596086 Apparatus for thin film growth |
| 07/22/2003 | US6596085 Methods and apparatus for improved vaporization of deposition material in a substrate processing system |
| 07/22/2003 | US6596084 Pyrolytic carbon coating apparatus having feed gas actuator |
| 07/22/2003 | US6596080 Silicon carbide and method for producing the same |
| 07/22/2003 | US6595623 Plastic base material and method for the manufacture thereof; and head for ink-jet printer and method for the manufacture thereof |
| 07/22/2003 | US6595370 Particle filter |
| 07/17/2003 | WO2003058680A2 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 07/17/2003 | WO2003058679A2 System and method of processing composite substrate within a high throughput reactor |
| 07/17/2003 | WO2003058644A2 Superhard dielectric compounds and methods of preparation |
| 07/17/2003 | WO2003057942A1 Methods for silicon oxide and oxynitride deposition using single wafer low pressure cvd |
| 07/17/2003 | WO2003057706A1 Ruthenium compounds, process for their preparation, and ruthenium-containing thin films made by using the compounds |