Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2003
09/09/2003US6616987 Procedure and device for specific particle manipulation and deposition
09/09/2003US6616986 Sequential chemical vapor deposition
09/09/2003US6616985 Contoured plate or profiler is provided for modifying the distribution.
09/09/2003US6616973 The build-up of residue in a stainless steel injection valve used to inject liquid triethyl phosphate or trimethyl- or triethylphosphine is reducedby using a low nickel, high chromium stainless steel
09/09/2003US6616972 Using as a precursor one or more of, and preferably a combination of, (RRN)xM(=NR)y and (RRN)xM(-R-N=C(R)(R))y where each R is H, alkyl or aryl and M is tantalum,niobium, tungsten or molydenum
09/09/2003US6616969 Apparatus and method for selectively coating internal and external surfaces of an airfoil
09/09/2003US6616870 Method of producing high aspect ratio domes by vapor deposition
09/09/2003US6616857 Ferroelectric
09/09/2003US6616818 Apparatus and method for coating substrates
09/09/2003US6616767 High temperature ceramic heater assembly with RF capability
09/09/2003US6616766 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes
09/09/2003US6616081 Belt retractor with switchable force limiter
09/09/2003US6615871 Fluid control apparatus
09/09/2003US6615547 Lock for vacuum chamber
09/04/2003WO2003073490A1 Shower head structure for processing semiconductor
09/04/2003WO2003073486A1 Heat treatment device and heat treatment method
09/04/2003WO2003072859A1 Direct synthesis of long single-walled carbon nanotube strands
09/04/2003WO2003072850A1 Semiconductor or liquid crystal producing device
09/04/2003WO2003072497A1 Method and apparatus for the production of carbon nanostructures
09/04/2003WO2003072268A1 Bladder-based apparatus and method for dispensing coatings
09/04/2003WO2003064718A3 Method for selectively coating a portion of a substrate with a gas-carried substance
09/04/2003WO2002097864A3 Low temperature load and bake
09/04/2003US20030166346 Methods of fabricating capacitors including TA2O5 layers in a chamber including changing a TA2O5 layer to heater separation or chamber pressure
09/04/2003US20030166304 Method of forming a ferroelectric film and fabrication process of a semiconductor device having a ferroelectric film
09/04/2003US20030165696 Silicon oxide membrane
09/04/2003US20030165635 Method for selectively removing hydrogen from molecules
09/04/2003US20030165633 Plating method of metal film on the surface of polymer
09/04/2003US20030165632 Method of reducing stress induced defects in an HDP-CVD process
09/04/2003US20030165620 Precoat film forming method, idling method of film forming device, loading table structure, film forming device and film forming method
09/04/2003US20030165619 Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound
09/04/2003US20030165618 Method of depositing a low k dielectric barrier film for copper damascene application
09/04/2003US20030165615 Vapor deposition with electroconductive metal, or alloy thereof; oxidation
09/04/2003US20030164362 Pre-heating and loadlock pedestal material for high temperature CVD liquid crystal and flat panel display applications
09/04/2003US20030164226 Wafer processing apparatus and a wafer stage and a wafer processing method
09/04/2003US20030164225 Processing apparatus, exhaust processing process and plasma processing
09/04/2003US20030164224 Method and apparatus for cleaning a semiconductor wafer processing system
09/04/2003US20030164177 CVD chamber cleaning using mixed PFCs from capture/recycle
09/04/2003US20030164143 Batch-type remote plasma processing apparatus
09/04/2003US20030164142 Plasma processing apparatus
09/03/2003EP1341219A2 Method of fabricating semiconductor device
09/03/2003EP1340838A1 Method and device for atmospheric plasma processing
09/03/2003EP1340837A1 Process for diamond coating of an iron-based substrate
09/03/2003EP1340835A2 Object coated with carbon film and method of manufacturing the same
09/03/2003EP1340269A2 Thin films for magnetic devices
09/03/2003EP1340247A1 Method of forming dielectric films
09/03/2003EP1340245A2 Method for incorporating silicon into cvd metal films
09/03/2003EP1339895A1 Method and device for treating the surface of electrically insulating substrates
09/03/2003EP1339892A1 Method of making coated cemented carbide cutting tools
09/03/2003EP1339625A1 Throughput enhancement for single wafer reactor
09/03/2003EP1144718A4 Indium source reagent compositions
09/03/2003EP0964741B1 Method for improving vacuum in a very high vacuum system
09/03/2003CN2571128Y Nondestructive heat-proof plasma resonant chamber
09/03/2003CN1440563A Semiconductor processing equipment having improved particle performance
09/03/2003CN1440465A Carbide coated steel articles and method of making them
09/03/2003CN1440417A Organometallic compounds and their use as precursors for forming films and powders of metal or metal derivatives
09/03/2003CN1120521C Formation of non-nomogenous device layer using inert gas shield
09/03/2003CN1120249C Method and apparatus for fabrication of thin films by chemical vapor deposition
09/02/2003US6614977 Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides
09/02/2003US6614181 UV radiation source for densification of CVD carbon-doped silicon oxide films
09/02/2003US6614107 Thin-film heat sink and method of manufacturing same
09/02/2003US6613696 Method of forming composite silicon oxide layer over a semiconductor device
09/02/2003US6613695 Surface preparation prior to deposition
09/02/2003US6613685 Method for supporting a semiconductor wafer during processing
09/02/2003US6613656 Sequential pulse deposition
09/02/2003US6613587 Method of replacing at least a portion of a semiconductor substrate deposition chamber liner
09/02/2003US6613442 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
09/02/2003US6613434 Method for treating polymer surface
09/02/2003US6613432 Plasma-deposited coatings, devices and methods
09/02/2003US6613394 Method of surface treating or coating of materials
09/02/2003US6613393 Depositing a wear protection matrix with the aid of a PECVD method, and incorporating optically functional inclusions in the form of particles or intermediate layers with the aid of a PVD process. The chemistry of the inclusion is influenced by
09/02/2003US6613385 Highly spin-polarized chromium dioxide thin films prepared by CVD using chromyl chloride precursor
09/02/2003US6613383 Atomic layer controlled deposition on particle surfaces
09/02/2003US6613242 Process for treating solid surface and substrate surface
09/02/2003US6613189 Apparatus for controlling the temperature of a gas distribution plate in a process reactor
09/02/2003US6612787 Chromium-containing cemented tungsten carbide coated cutting insert
08/2003
08/28/2003WO2003071588A1 Production method of sic monitor wafer
08/28/2003WO2003071504A1 Device for depositing thin layers with a wireless detection of process parameters
08/28/2003WO2003071011A1 Method and device for depositing semi-conductor layers
08/28/2003WO2003071003A1 Gas shower head, film forming device, and film forming method
08/28/2003WO2003044843A3 Forming low k dielectric layers
08/28/2003WO2003012835A3 Substrate support and method of fabricating the same
08/28/2003WO2002019363A3 Pre-polycoating of glass substrates
08/28/2003US20030163198 Methods for surface modification
08/28/2003US20030162412 Low-dielectric silicon nitride film and method of forming the same, semiconductor device and fabrication process thereof
08/28/2003US20030162410 Method of depositing low K films
08/28/2003US20030162408 Insulation film on semiconductor substrate and method for forming same
08/28/2003US20030162394 Method of fabricating semiconductor device
08/28/2003US20030162373 Semiconductor thin film, semiconductor device employing the same, methods for manufacturing the same and device for manufacturing a semiconductor thin film
08/28/2003US20030162365 Epitaxial thin film forming method
08/28/2003US20030162346 Silicon oxide co-deposition/etching process
08/28/2003US20030162042 Titanium alloy vacuum container and vacuum part
08/28/2003US20030162034 Organofluorosilicate glass films containing both organic species and inorganic fluorines, exclusive of significant amounts of fluorocarbon species; insulating layers for integrated circuits and associated electronic devices
08/28/2003US20030161970 Method and apparatus for manufacturing ultra fine three-dimensional structure
08/28/2003US20030161954 Selecting precursor of deposit material and solvent, wherein precursor dissociates under conditions at which solvent is supercritical fluid, dissolving precursor, exposing substrate to solution under conditions at which precursor dissociates
08/28/2003US20030161952 Alternately adsorbing a tungsten-containing compound and a nitrogen-containing compound on a substrate; reduced resistivity, lower concentration of fluorine
08/28/2003US20030161951 Cyclic introduction of a silicon-containing precursor gas and an oxidizing gas separated by an intervening purge step
08/28/2003US20030161950 Direct synthesis of long single-walled carbon nanotube strands
08/28/2003US20030161948 Selective deposition of hydrous ruthenium oxide thin films
08/28/2003US20030161695 Chromium-containing cemented carbide body having a surface zone of binder enrichment
08/28/2003US20030161081 Electronic microcomponent including a capacitive structure, and process for producing it