| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/25/2003 | WO2002065508A3 Dopant precursors and processes |
| 09/25/2003 | US20030181746 Preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organolithium reagent or Group IIIA alkylmetal halide; vapor deposited films for semiconductors |
| 09/25/2003 | US20030181745 Organoindium compounds |
| 09/25/2003 | US20030181328 Supported metal catalyst for synthesizing carbon nanotubes by low-temperature thermal chemical vapor deposition and method of synthesizing carbon nanotubes using the same |
| 09/25/2003 | US20030181069 Method of forming interlayer insulation film |
| 09/25/2003 | US20030181068 Methods for forming thin film layers by simultaneous doping and sintering |
| 09/25/2003 | US20030181065 Low contamination components for semiconductor processing apparatus and methods for making components |
| 09/25/2003 | US20030181060 Manufacturing method of semiconductor device and substrate processing apparatus |
| 09/25/2003 | US20030181039 Improved reliability of outer lead bonding (OLB) parts of the semiconductor device; low-elasticity resin layer has a lower elasticity modulus than the resin mold |
| 09/25/2003 | US20030181035 Selective deposition of abarrier layer on a metal film |
| 09/25/2003 | US20030181027 Method of forming a polysilicon layer |
| 09/25/2003 | US20030181024 Method for obtaining high quality InGaAsN semiconductor devices |
| 09/25/2003 | US20030180581 Vapor deposition, vacuum deposition |
| 09/25/2003 | US20030180556 Applying chemical resistant protective coatings comprising dielectric layers and thin films selected gold, chromium, platinum, silver or rhenium on interiors of gas apparatus |
| 09/25/2003 | US20030180550 Insulating film material containing an organic silane compound, its production method and semiconductor device |
| 09/25/2003 | US20030180463 Extraction raw materials; reforming; forming thin films |
| 09/25/2003 | US20030180461 Process of direct growth of carbon nanotubes on a substrate at low temperature |
| 09/25/2003 | US20030180460 Applying aqueous mixture of sodium hypochlorite, hydrogen peroxide, sodium hydrosulfite, calcium hypochlorite, or potassium permanganate on debris deposits; drying, washing off residues |
| 09/25/2003 | US20030180459 Plasma vapor deposition; precoating with dielectric after cleaning |
| 09/25/2003 | US20030180458 Atomic layer deposition; thin film semiconductor; vapor deposition |
| 09/25/2003 | US20030180445 Method for forming a catalytic bead sensor |
| 09/25/2003 | US20030179521 Electronic microcomponent incorporating a capacitive structure and fabrication process |
| 09/25/2003 | US20030178735 Method and apparatus for producing free-standing silicon carbide articles |
| 09/25/2003 | US20030178300 Method of manufacturing an object in a vacuum recipient |
| 09/25/2003 | US20030178145 Closed hole edge lift pin and susceptor for wafer process chambers |
| 09/25/2003 | US20030178141 Semiconductor chamber process apparatus and method |
| 09/25/2003 | US20030177977 Gas-admission element for CVD processes, and device |
| 09/24/2003 | EP1347510A1 Wiring-inclusive structure and forming method thereof |
| 09/24/2003 | EP1347503A2 Semiconductor device and method for manufacturing the same |
| 09/24/2003 | EP1347077A1 Apparatus and method for the production of flexible semiconductor devices |
| 09/24/2003 | EP1346607A2 Resistive heaters and uses thereof |
| 09/24/2003 | EP1346082A1 Coated cemented carbide cutting tool insert |
| 09/24/2003 | EP1346080A1 Injector and method for prolonged introduction of reagents into plasma |
| 09/24/2003 | EP1346078A1 Fullerene coated component of semiconductor processing equipment |
| 09/24/2003 | EP1346074A1 Coated cutting tool insert with iron-nickel based binder phase |
| 09/24/2003 | EP1152993B1 Method for producing an anhydrite iii or alpha based hydraulic bonding agent |
| 09/24/2003 | EP0912460B1 Densification of a porous structure (iii) |
| 09/24/2003 | CN1444605A Continuous processing apparatus by plasma polymerization with vertical chamber |
| 09/24/2003 | CN1444257A Method and system for processing radio-frequency plasma |
| 09/24/2003 | CN1122299C Method of forming microcrystalline silicon film, photoelectric element and method of producing same |
| 09/24/2003 | CN1122117C Plasma reactor with a deposition shield plate |
| 09/24/2003 | CN1122116C Single body injector and deposition chamber |
| 09/24/2003 | CN1122115C Method for forming tin oxide coating on glass |
| 09/24/2003 | CN1121891C Semiconductor mfg. system with getter safety device |
| 09/23/2003 | US6624517 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 09/23/2003 | US6624428 Process and device for treatment by dielectric barrier discharge lamps |
| 09/23/2003 | US6624094 Method of manufacturing an interlayer dielectric film using vacuum ultraviolet CVD with Xe2 excimer lamp and silicon atoms |
| 09/23/2003 | US6624088 Method of forming low dielectric silicon oxynitride spacer films highly selective to etchants |
| 09/23/2003 | US6624072 Organometallic compound mixtures in chemical vapor deposition |
| 09/23/2003 | US6624064 Chamber seasoning method to improve adhesion of F-containing dielectric film to metal for VLSI application |
| 09/23/2003 | US6623802 Process and installation for forming a layer on a substrate |
| 09/23/2003 | US6623801 Method of producing high-purity polycrystalline silicon |
| 09/23/2003 | US6623799 Iodine or bromine containing catalyst |
| 09/23/2003 | US6623798 Chemical vapor deposition method for depositing silicide and apparatus for performing the same |
| 09/23/2003 | US6623790 Method of adjusting the size of cooling holes of a gas turbine component |
| 09/23/2003 | US6623656 Enables zirconium- and/or hafnium-containing films to be readily formed, exhibiting good electrical properties and low current leakages |
| 09/23/2003 | US6623654 Thin interface layer to improve copper etch stop |
| 09/23/2003 | US6623597 Focus ring and apparatus for processing a semiconductor wafer comprising the same |
| 09/23/2003 | US6623595 Wavy and roughened dome in plasma processing reactor |
| 09/23/2003 | US6623563 Susceptor with bi-metal effect |
| 09/23/2003 | US6623241 Low-pressure steam turbine |
| 09/23/2003 | CA2267492C Formation of thin film resistors |
| 09/23/2003 | CA2138282C Process for the preparation of trialkyl compounds of group 3a metals |
| 09/20/2003 | CA2421110A1 Electronic micro-component integrating a capacitive structure and manufacturing process |
| 09/18/2003 | WO2003077304A1 Plasma processing system and method for interrupting plasma processing |
| 09/18/2003 | WO2003077294A1 Plasma processor |
| 09/18/2003 | WO2003077293A1 High-frequency power supply structure and plasma cvd device using the same |
| 09/18/2003 | WO2003076684A1 System for vacuum metallization of objects treated in batches |
| 09/18/2003 | WO2003076678A2 Ald method and apparatus |
| 09/18/2003 | WO2003076184A1 Method of making window unit including diamond-like carbon (dlc) coating |
| 09/18/2003 | WO2003046244A3 Generation, distribution, and use of molecular fluorine within a fabrication facility |
| 09/18/2003 | WO2003044242A3 Atomic layer deposition of copper using a reducing gas and non-fluorinated copper precursors |
| 09/18/2003 | US20030176080 Hermetic silicon carbide |
| 09/18/2003 | US20030176065 Aluminum-containing material and atomic layer deposition methods |
| 09/18/2003 | US20030176062 Methods For Treating Pluralities of Discrete Semiconductor Substrates |
| 09/18/2003 | US20030176061 Apparatuses For Treating Pluralities of Discrete Semiconductor Substrates |
| 09/18/2003 | US20030176060 Methods For Treating Pluralities Of Discrete Semiconductor Substrates |
| 09/18/2003 | US20030176057 Methods for treating pluralities of discrete semiconductor substrates |
| 09/18/2003 | US20030176047 Methods for treating pluralities of discrete semiconductor substrates |
| 09/18/2003 | US20030176030 Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength |
| 09/18/2003 | US20030176012 Integrated circuit structure including electrodes with PGO ferroelectric thin film thereon |
| 09/18/2003 | US20030176011 Cat-PECVD method, film forming apparatus for implementing the method, film formed by use of the method and device manufactured using the film |
| 09/18/2003 | US20030175558 MoSi2-Si3N4 composite coating and manufacturing method thereof |
| 09/18/2003 | US20030175485 Magnetic recording medium, method for manufacturing the same, and resistance roller used for the method |
| 09/18/2003 | US20030175442 Method and apparatus for low-pressure pulsed coating |
| 09/18/2003 | US20030175426 Heat treatment apparatus and method for processing substrates |
| 09/18/2003 | US20030175425 Vapor phase deposition method for metal oxide dielectric film |
| 09/18/2003 | US20030175424 Method and system for coating a glass contacting surface with a thermal barrier and lubricous coating |
| 09/18/2003 | US20030175423 Method and device for depositing thin layers via ALD/CVD processes in combination with rapid thermal processes |
| 09/18/2003 | US20030175176 Method and device for preventing solid products from adhering to inner surface of exhaust gas pipe and exhaust gas treatment device with the device |
| 09/18/2003 | US20030173526 Method of surface texturizing |
| 09/18/2003 | US20030173206 Process for making at least one nanotube between two electrically conducting elements and device for implementing such a process |
| 09/18/2003 | US20030173031 Wafer holder with peripheral lift ring |
| 09/18/2003 | US20030173030 Plasma processing apparatus |
| 09/18/2003 | US20030173029 Plasma processing apparatus |
| 09/18/2003 | US20030172952 Method of cleaning a plasma processing apparatus |
| 09/18/2003 | US20030172874 Mechanism and method for supporting substrate to be coated with film |
| 09/18/2003 | US20030172873 Apparatus and method for the production of flexible semiconductor devices |
| 09/18/2003 | US20030172872 Apparatus for cyclical deposition of thin films |
| 09/18/2003 | US20030172869 Method for preparing low-resistant p-type srtio3 |