Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2003
10/15/2003EP0968154B1 Method for densifying a porous structure using an aromatic precursor
10/15/2003EP0713538B2 Method of rapidly densifying a porous structure
10/15/2003CN2579910Y Diamond composite diamond product by chemical gas phase deposition diamond polycrystal
10/15/2003CN1449575A Method of forming a premetal dielectric film on a semiconductor substrate
10/15/2003CN1449572A 转换的均匀性控制 Conversion of uniformity control
10/15/2003CN1449334A Method for providing a semitransparent metallic aspect to cosmetic case or compact components and resulting components
10/15/2003CN1449303A Excimer uv photo reactor
10/15/2003CN1449001A Method for manufacturing semiconductor device
10/15/2003CN1448997A Method and apparatus for manufacturing semiconductor device
10/15/2003CN1448990A Adapter and method for preventing back flow of gas
10/15/2003CN1448536A Chemical raw material dispensing system
10/15/2003CN1448535A Prep. of corundum---mullite multiple phase ceramic coating
10/15/2003CN1448534A Prep. of alumina---monox composite oxides film
10/15/2003CN1448533A Chemical vapor deposition method using alcohol for forming metal oxide thin film
10/15/2003CN1448369A Prep. of preparing fiber reinforced silica-base composite material
10/15/2003CN1448335A Metal catalyst for low-temp. thermochemical gas-phase precipitation synthesis of carbon nanotubes and synthetic method of carbon nanotubes using the same
10/15/2003CN1448334A Process for direct low-temperature synthesis of carbon nanotube on substrate material
10/15/2003CN1124365C Deposited-film forming process and deposited-film forming apparatus
10/15/2003CN1124364C Process for preparing ultra-thin silicon nitride film by electron cyclone, resonance, microwave and plasma
10/15/2003CN1124238C Apparatus and method for manufacturing optical fiber preform by MCVD
10/14/2003US6633623 Apparatus and methods for protecting a jet pump nozzle assembly and inlet-mixer
10/14/2003US6633076 Methods and apparatus for producing stable low k FSG film for HDP-CVD
10/14/2003US6632750 Depositing a silicon nitride film to give a uniform thickness over the main surface of a semiconductor wafer having a high pattern density region and a low pattern density region.
10/14/2003US6632749 Method for manufacturing silicon oxide film, method for manufacturing semiconductor device, semiconductor device, display device and infrared light irradiating device
10/14/2003US6632737 Method for enhancing the adhesion of a barrier layer to a dielectric
10/14/2003US6632736 Method of forming low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer
10/14/2003US6632735 Method of depositing low dielectric constant carbon doped silicon oxide
10/14/2003US6632726 Film formation method and film formation apparatus
10/14/2003US6632689 Method for processing semiconductor wafers in an enclosure with a treated interior surface
10/14/2003US6632549 Alkaline earth fluoride protective layer on aluminium nitride base
10/14/2003US6632514 Coated cutting insert for milling and turning applications
10/14/2003US6632478 Forming dielectrics; annealing with ozone
10/14/2003US6632470 Catheters; propylene, propane, and tetramethyldisiloxane reactive gas and plasma energy
10/14/2003US6632324 System for the plasma treatment of large area substrates
10/14/2003US6632323 Method and apparatus having pin electrode for surface treatment using capillary discharge plasma
10/14/2003US6632322 Switched uniformity control
10/14/2003US6632284 Apparatus and method for forming deposited film
10/14/2003US6632279 Method for growing thin oxide films
10/14/2003US6632277 Optimized silicon wafer gettering for advanced semiconductor devices
10/14/2003US6632127 Chemical mechanical polishing pads comprising silicon substrates bonded to microstructure thin films, used for smoothening dielectrics and semiconductor wafers
10/14/2003US6631692 Plasma CVD film-forming device
10/14/2003CA2162529C Arc assisted cvd coating and sintering method and apparatus
10/09/2003WO2003083953A1 Solar cell and method of manufacturing the same
10/09/2003WO2003083923A1 Plasma processing device and baffle plate thereof
10/09/2003WO2003083915A1 Method for forming thin film
10/09/2003WO2003083893A1 Device for confinement of a plasma within a volume
10/09/2003WO2003083170A1 Cvd method using pulsed gas flow
10/09/2003WO2003083169A1 Apparatus and method for depositing organic matter of vapor phase
10/09/2003WO2003083168A1 Surface treatment system and method
10/09/2003WO2003083167A1 Vapor deposition of silicon dioxide nanolaminates
10/09/2003WO2003083165A1 Surface treatment system and method
10/09/2003WO2003083164A1 Surface treatment system, surface treatment method and product produced by surface treatment method
10/09/2003WO2003083163A1 Surface treatment system and method thereof
10/09/2003WO2003083160A2 Evaluation of chamber components having textured coatings chamber components
10/09/2003WO2003082759A1 Glass substrate having thin film formed thereon and method for preparation thereof
10/09/2003WO2003082533A1 Self-sharpening cutting tool with hard coating
10/09/2003WO2003003118A3 Mask repair with electron beam-induced chemical etching
10/09/2003WO2002063677A3 Formation of a tantalum-nitride layer
10/09/2003US20030190823 Method of loading a wafer onto a wafer holder to reduce thermal shock
10/09/2003US20030190804 Simultaneous cyclical deposition in different processing regions
10/09/2003US20030190801 Method for forming a metal extrusion free via
10/09/2003US20030190783 Capacitor for semiconductor memory device and method of manufacturing the same
10/09/2003US20030190761 System, method and medium for modeling, monitoring and/or controlling plasma based semiconductor manufacturing processes
10/09/2003US20030190497 Cyclical deposition of a variable content titanium silicon nitride layer
10/09/2003US20030190424 Process for tungsten silicide atomic layer deposition
10/09/2003US20030190423 Multiple precursor cyclical deposition system
10/09/2003US20030190422 Source gas delivery
10/09/2003US20030189208 Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications
10/09/2003US20030188830 Substrate support having barrier capable of detecting fluid leakage
10/09/2003US20030188687 Gas driven planetary rotation apparatus and methods for forming silicon carbide layers
10/09/2003US20030188685 Laser drilled surfaces for substrate processing chambers
10/09/2003US20030188682 Method of growing oxide films
10/08/2003EP1351315A2 Electronic microcomponent integrating a capacitor structure and corresponding fabrication method
10/08/2003EP1351314A2 Electronic microcomponent comprising a capacitor structure and its method of fabrication
10/08/2003EP1351282A2 Method for preventing contamination during the fabrication of a semiconductor device
10/08/2003EP1351273A1 Band gap plasma mass filter
10/08/2003EP1350860A1 Process of masking cooling holes of a gas turbine component
10/08/2003EP1349968A1 Liquid distribution unit for dividing a liquid current into a plurality of partial currents
10/08/2003EP1144720B1 Method for producing a thermal barrier coating
10/08/2003CN2578339Y Observer structure of conversion reactor
10/08/2003CN1447463A Nitride thin film of transition metal capable of being as anode material of batteries its preparation method
10/08/2003CN1447416A Mfg. method of semiconductor device
10/08/2003CN1447389A Method for fabricating polysilicon thin films
10/08/2003CN1446656A Coated turning tool for steel
10/08/2003CN1123651C Method and appts. for producing silicon carbide by chemical vapour-deposition
10/08/2003CN1123648C Improved chemical vapor-phase deposition method by using graphite heating furnace as hot source
10/07/2003US6630413 CVD syntheses of silicon nitride materials
10/07/2003US6630412 Multilayer structure containing dielectric; overcoating copper wires
10/07/2003US6630401 Radical-assisted sequential CVD
10/07/2003US6630396 Use of a silicon carbide adhesion promoter layer to enhance the adhesion of silicon nitride to low-k fluorinated amorphous carbon
10/07/2003US6630393 Semiconductor device manufacturing method and semiconductor device manufacturing by the same method
10/07/2003US6630364 System for automatic control of the wall bombardment to control wall deposition
10/07/2003US6630207 Minimizes local heating; higher coating rates; applicable to very thin and/or low melting point substrates
10/07/2003US6630202 CVD treatment of hard friction coated steam line plug grips
10/07/2003US6630201 Providing gas in chamber for reacting with a surface of a substrate; retaining substrate on an electrostatic chuck (ESC) assembly by electrostatic attraction, supplying a DC bias voltage to electrodes to couple a DC bias voltage
10/07/2003US6630030 Method and apparatus for growing thin films
10/07/2003US6630029 Flow of reactant is disrupted from a path substantially parallel to a fiber path to create a mixing flow adjacent the fiber
10/07/2003US6630023 Surface treatment process used in growing a carbon film
10/07/2003US6629763 Object which has optical layers
10/07/2003US6629627 Level control systems for high purity chemical delivery systems
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