Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2003
11/18/2003US6649218 Single substrate processing film forming method
11/18/2003US6649211 Selective deposition of hydrous ruthenium oxide thin films
11/18/2003US6649076 Method for performing plasma process on particles
11/18/2003US6649020 Plasma processing apparatus
11/18/2003US6649019 Apparatus for conditioning the atmosphere in a vacuum chamber
11/18/2003US6648982 Steam cleaning system and method for semiconductor process equipment
11/18/2003US6648977 Method of producing near-net shape free standing articles by chemical vapor deposition
11/18/2003US6648034 Purgeable manifold for low vapor pressure chemicals containers
11/18/2003US6647993 Surface-treated shower head for use in a substrate processing chamber
11/18/2003CA2546411A1 Method and device for continuous treatment of the surface of an elongate object
11/18/2003CA2314375C Thin film resonator apparatus and method of making same
11/18/2003CA2102781C Method and apparatus for plasma deposition
11/18/2003CA2096872C Apparatus for the production of hermetically coated optical fiber
11/16/2003CA2427188A1 Low-contact-resistance interface structure between separator and carbon material for fuel cell, separator and carbon material used therein, and production method for stainless steel separator for fuel cell
11/13/2003WO2003093531A1 Gas preheater
11/13/2003WO2003093530A1 A method for modifying a metallic surface
11/13/2003WO2003093173A2 Diamond synthesis
11/13/2003WO2003081216A3 Process monitoring using infrared optical diagnostics
11/13/2003WO2003068699A8 Group iii nitride semiconductor crystal, production method thereof and group iii nitride semiconductor epitaxial wafer
11/13/2003WO2003031677B1 Method and device for depositing a plurality of layers on a substrate
11/13/2003WO2003030222A3 Tool for handling wafers and epitaxial growth station
11/13/2003WO2003023880A3 Thin-film electrochemical devices on fibrous or ribbon-like substrates and method for their manufacture and design
11/13/2003WO2003009061A3 Photoactive coating, coated article, and method of making same
11/13/2003WO2002065516A3 Improved process for deposition of semiconductor films
11/13/2003US20030212507 Real time mass flow control system with interlock
11/13/2003US20030212285 Methods for preparing ruthenium and osmium compounds and films
11/13/2003US20030211757 Cleaning with an oil which is not a plasticizer
11/13/2003US20030211755 Adjustment of N and K values in a darc film
11/13/2003US20030211741 Dielectric thin film, method for making the same and electric components thereof
11/13/2003US20030211736 Method for depositing tantalum silicide films by thermal chemical vapor deposition
11/13/2003US20030211735 Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput
11/13/2003US20030211728 Very low dielectric constant plasma-enhanced CVD films
11/13/2003US20030211367 Coated cutting tool insert
11/13/2003US20030211366 Coated cutting tool for turning of steel
11/13/2003US20030211356 Nickel alloy; overcoating substrate using electric arcs
11/13/2003US20030211325 Method of forming a carbon doped oxide layer on a substrate
11/13/2003US20030211306 Filled diamond foam material and method for forming same
11/13/2003US20030211244 Integrated circuits; reacting organosilicon compound, hydrocarbon and oxidizer
11/13/2003US20030210880 Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides
11/13/2003US20030209805 Flourine doped SiO2 film and method of fabrication
11/13/2003US20030209327 Temperature control for single substrate semiconductor processing reactor
11/13/2003US20030209326 Process and system for heating semiconductor substrates in a processing chamber containing a susceptor
11/13/2003US20030209323 Production apparatus for manufacturing semiconductor device
11/13/2003US20030209201 Slightly foamed solid rubber portion with a core bar embedded therein; used in an automobile
11/13/2003US20030209200 Temperature control for single substrate semiconductor processing reactor
11/13/2003US20030209197 Method of producing high aspect ratio domes by vapor deposition
11/13/2003US20030209193 Atomic layer CVD
11/13/2003CA2483780A1 Diamond synthesis
11/12/2003EP1361610A1 Carburetor, various types of devices using the carburetor, and method of vaporization
11/12/2003EP1361606A1 Method of producing electronic device material
11/12/2003EP1361605A1 Method for producing material of electronic device
11/12/2003EP1361604A1 Device and method for treatment
11/12/2003EP1361294A1 Plasma CVD apparatus
11/12/2003EP1361293A1 Method of forming silicon thin film and silicon thin film solar cell
11/12/2003EP1361292A1 Method for measuring coating thickness in-situ
11/12/2003EP1361291A2 Oxidation and fatigue resistant metallic coating
11/12/2003EP1360880A1 Plasma unit and method for generation of a functional coating
11/12/2003EP1360343A1 Device for ceramic-type coating of a substrate
11/12/2003EP1017877B1 Cvd chamber inner lining
11/12/2003CN1455961A System for conversion of water into non-oxidizing gases and electronic devices containing said system
11/12/2003CN1455827A Apparatus for conducting at least one operation on a substrate
11/12/2003CN1455441A Method for making non-crystal metal oxide film, and method for making capacity element and semiconductor device with non-crystal metal oxide film
11/12/2003CN1455434A Substrate board treatment device and reaction container
11/12/2003CN1455017A Method of coating diamond on gradient hard alloy with cobalt-lean surface layer
11/12/2003CN1455016A Raw-material compound for CVD and chemical gas-phase steam-plating method for iridium and iridium compound film
11/12/2003CN1127776C Multicontact for antenna window
11/12/2003CN1127755C Integrated circuit having mixed layered superlattice materials and precruser solutions for use in process of making same
11/12/2003CN1127581C Free floating barrier and semiconductor technological system
11/11/2003US6646327 Semiconductor device and semiconductor device manufacturing method
11/11/2003US6646235 High temperature uniformity; chemical resistance
11/11/2003US6645884 Method of forming a silicon nitride layer on a substrate
11/11/2003US6645883 Vapor deposition using diluent gas
11/11/2003US6645877 Method of operating a processing chamber having multiple stations
11/11/2003US6645858 Method of catalyzing copper deposition in a damascene structure by plasma treating the barrier layer and then applying a catalyst such as iodine or iodine compounds to the barrier layer
11/11/2003US6645853 Interconnects with improved barrier layer adhesion
11/11/2003US6645835 Semiconductor film forming method and manufacturing method for semiconductor devices thereof
11/11/2003US6645805 Method for forming dielectric film of capacitor
11/11/2003US6645575 Method for making a multi-layer plastic container having a carbon-treated internal surface
11/11/2003US6645574 Method of forming a thin film
11/11/2003US6645573 Process for forming a microcrystalline silicon series thin film and apparatus suitable for practicing said process
11/11/2003US6645302 Vapor phase deposition system
11/06/2003WO2003092060A1 Processing device using shower head structure and processing method
11/06/2003WO2003092059A1 Window type probe, plasma monitoring device, and plasma processing device
11/06/2003WO2003092033A1 Polynuclear metal molecular beam apparatus
11/06/2003WO2003091822A2 Method for producing nitrides and uses thereof as fluorescent markers and light-emitting diodes
11/06/2003WO2003091586A1 Slide element and method for production of said slide element
11/06/2003WO2003091475A1 Thick films of yba2cu3o 7-y and preparation method thereof
11/06/2003WO2003091473A1 Apparatus and method for high rate uniform coating, including non-line of sight
11/06/2003WO2003091469A2 Method for joining a diamond layer to a substrate, and diamond-coated substrate
11/06/2003WO2003091121A1 Plastic containers coated on the inner surface and process for production thereof
11/06/2003WO2003090939A1 Method and apparatus for plasma deposition of chemically reactive groups on substrates chemically reactive substrates obtainable by the method and use thereof
11/06/2003WO2003050853A3 A method of forming a silicon nitride layer on a substrate
11/06/2003WO2003021690A3 Method of depositing an oxide layer on a substrate and a photovoltaic cell using said substrate
11/06/2003WO2003007339A3 Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides
11/06/2003WO2002061819A3 Method for ultra thin film formation
11/06/2003US20030207750 Forming a low k fluorine and carbon- containing silicon oxide dielectric material by reacting with an oxidizing agent one or more silanes including one or more organofluoro silanes characterized by the absence of aliphatic C-H bonds
11/06/2003US20030207593 Atomic layer deposition and conversion
11/06/2003US20030207583 Method for processing wafer using single frequency RF power in plasma processing chamber
11/06/2003US20030207580 HDP-CVD dep/etch/dep process for improved deposition into high aspect ratio features
11/06/2003US20030207552 Raw material compounds for use in cvd, and chemical vapor deposition for producing iridium or iridium compound thin films
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