| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/06/2004 | US6673701 Atomic layer deposition methods |
| 01/06/2004 | US6673673 Method for manufacturing a semiconductor device having hemispherical grains |
| 01/06/2004 | US6673393 Oxide coated cutting tool |
| 01/06/2004 | US6673392 Method of vertically aligning carbon nanotubes on substrates at low pressure using thermal chemical vapor deposition with DC bias |
| 01/06/2004 | US6673323 Treatment of hazardous gases in effluent |
| 01/06/2004 | US6673255 By which a predetermined number of flat workpieces may be parallel processed, whereby the number of operating cycles for such treatment is minimalized so as to reach optimal short throughput times with optimal low handling |
| 01/06/2004 | US6673197 Chemical plasma cathode |
| 01/06/2004 | US6673196 Plasma processing apparatus |
| 01/06/2004 | US6673156 Semiconductor processing device |
| 01/02/2004 | EP1377138A1 Device and control method for micro wave plasma processing |
| 01/02/2004 | EP1376672A1 Deposition method, deposition apparatus, insulating film and semiconductor integrated circuit |
| 01/02/2004 | EP1376670A1 Plasma processing device |
| 01/02/2004 | EP1376668A1 Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 01/02/2004 | EP1376667A1 Heat treating device |
| 01/02/2004 | EP1376665A1 Gaseous phase growing device |
| 01/02/2004 | EP1375431A2 Method of manufacturing inorganic nanotube |
| 01/02/2004 | EP1374984A1 Titanium alloy vacuum container and vacuum part |
| 01/02/2004 | EP1374294A2 Fabrication of high resistivity structures using focused ion beams |
| 01/02/2004 | EP1374291A2 Deposition method over mixed substrates using trisilane |
| 01/02/2004 | EP1374290A2 Improved process for deposition of semiconductor films |
| 01/02/2004 | EP1374286A2 Diffuser and rapid cycle chamber |
| 01/02/2004 | EP1374282A1 Hybrid deposition system & methods |
| 01/02/2004 | EP1374004A2 Flow controller |
| 01/02/2004 | EP1373595A1 Method for producing hydrogenated silicon oxycarbide films |
| 01/02/2004 | EP1373278A1 Metalloamide and aminosilane precursors for cvd formation of dielectric thin films |
| 01/02/2004 | EP1373130A1 Process and apparatus for the production of carbon nanotubes |
| 01/02/2004 | EP1372864A2 Manifolded fluid delivery system |
| 01/02/2004 | EP1252362B1 Method and device for depositing a precursor on a substrate, said precursor being present in the liquid form |
| 01/01/2004 | US20040002221 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 01/01/2004 | US20040002220 Method of purging semiconductor manufacturing apparatus and method of manufacturing semiconductor device |
| 01/01/2004 | US20040002170 Apparatus for and method of manufacturing a semiconductor device, and cleaning method for use in the apparatus for manufacturing a semiconductor device |
| 01/01/2004 | US20040000875 Plasma processor with electrode simultaneously responsive to plural frequencies |
| 01/01/2004 | US20040000534 Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable etch resistivity |
| 01/01/2004 | US20040000378 Isolation chamber arrangement for serial processing of semiconductor wafers for the electronic industry |
| 01/01/2004 | US20040000327 Insertion semiconductor into hermetic sealed enclosure; etching uisng hot water jets |
| 01/01/2004 | US20040000321 Chamber clean method using remote and in situ plasma cleaning systems |
| 01/01/2004 | US20040000270 Methods and apparatus for vapor processing of micro-device workpieces |
| 12/31/2003 | WO2004001833A1 Method for manufacturing semiconductor device |
| 12/31/2003 | WO2004001831A1 Magnetron plasma processing apparatus |
| 12/31/2003 | WO2004001822A1 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method |
| 12/31/2003 | WO2004001817A1 Transfer chamber for vacuum processing system |
| 12/31/2003 | WO2004001815A1 An ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device |
| 12/31/2003 | WO2004001809A2 Method for energy-assisted atomic layer deposition and removal |
| 12/31/2003 | WO2004001808A2 Method and system for atomic layer removal and atomic layer exchange |
| 12/31/2003 | WO2004001095A1 Rotary type mass-producing cvd film forming device and metod of forming cvd film on surface in plastic conteiner |
| 12/31/2003 | WO2004000850A1 Dicopper(i)oxalate complexes for use as precursor substances in metallic copper deposition |
| 12/31/2003 | WO2004000460A1 Method and apparatus for manufacturing a catalyst |
| 12/31/2003 | WO2004000003A2 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process |
| 12/31/2003 | WO2003026796A3 A nano-supported sponge catalyst for nanotube growth |
| 12/31/2003 | CN1465094A Reactor having a movable shutter |
| 12/31/2003 | CN1465093A Method of producing semiconductor thin film, method of producing semiconductor device, semiconductor device, integrated circuit, electrooptical device and electronic apparatus |
| 12/31/2003 | CN1464862A Ceramic and method for preparation thereof, and dielectric capacitor, semiconductor and element |
| 12/31/2003 | CN1464861A Ceramics film and production method therefor, and ferroelectric capacitor, semiconductor device, other elements |
| 12/31/2003 | CN1133203C Method of forming selective metal layer and method of forming capacitor and filling contact hole using the same |
| 12/31/2003 | CN1132962C Deposited film forming system and method thereof |
| 12/31/2003 | CA2490773A1 Dicopper(i)oxalate complexes as precursor substances for the deposition of metallic copper |
| 12/30/2003 | US6670741 Plasma processing apparatus with annular waveguide |
| 12/30/2003 | US6670693 Laser synthesized wide-bandgap semiconductor electronic devices and circuits |
| 12/30/2003 | US6670543 Thin-film solar cells and method of making |
| 12/30/2003 | US6670270 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method |
| 12/30/2003 | US6670025 Pyrolytic boron nitride crucible and method |
| 12/30/2003 | US6669996 Wear resistance protective coatings form decomposition of organometallic compound; electron cyclotron resonance |
| 12/30/2003 | US6669988 Chemical vapor infiltration/deposition (CVI/CVD) by flowing a reactant gas through the center opening of a porous stack and around the exterior; densification of carbon-fiber disc brakes using a hydrocarbon gas; uniformity; microstructure quality |
| 12/30/2003 | US6669987 Depressurization of mechanical cells containing optical recording media, using pumps, then coating the disks |
| 12/30/2003 | US6669870 Substituted phenylethylene precursor synthesis method |
| 12/30/2003 | US6669858 Integrated low k dielectrics and etch stops |
| 12/30/2003 | US6669812 Apparatus and method for fabricating semiconductor device |
| 12/30/2003 | US6669811 Linear drive system for use in a plasma processing system |
| 12/30/2003 | US6669784 Gas processing apparatus for object to be processed |
| 12/30/2003 | US6669782 Method and apparatus to control the formation of layers useful in integrated circuits |
| 12/30/2003 | US6669253 Wafer boat and boat holder |
| 12/30/2003 | CA2091647C Method for the surface treatment of a metal by atmospheric pressure plasma |
| 12/25/2003 | WO2003107409A1 Oxide film forming method and oxide film forming apparatus |
| 12/25/2003 | US20030236001 Fabrication process of a semiconductor device |
| 12/25/2003 | US20030235961 Cyclical sequential deposition of multicomponent films |
| 12/25/2003 | US20030235720 Depositing coating material comprising zirconium oxide over substrate; depositing coating material comprising titanium oxide; wherein one of coating materials is deposited by pyrolytic deposition |
| 12/25/2003 | US20030235695 Glass substrates, including glass sheet and continuous float glass ribbon |
| 12/25/2003 | US20030235652 Precoat film forming method |
| 12/25/2003 | US20030235389 Raw material providing device for chemical vapor deposition process |
| 12/25/2003 | US20030234450 Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device |
| 12/25/2003 | US20030234176 Vapor deposition of films using electric arcs having graphite electrodes |
| 12/25/2003 | US20030233981 Film deposition apparatus and film deposition method |
| 12/25/2003 | US20030233768 Method and device for the temperature control of surface temperatures of substrates in a CVD reactor |
| 12/25/2003 | US20030233746 Collar removing clamp for HDP chamber |
| 12/24/2003 | WO2003107428A1 Semiconductor device and method for fabricating the same |
| 12/24/2003 | WO2003107404A1 Vapor phase epitaxial apparatus and vapor phase epitaxial method |
| 12/24/2003 | WO2003107403A1 Vapor phase epitaxy device |
| 12/24/2003 | WO2003106730A1 Thin film-forming apparatus |
| 12/24/2003 | WO2003106729A2 Method of making automotive trim with chromium inclusive coating thereon, and corresponding automotive trim product |
| 12/24/2003 | WO2003106011A2 A method for producing organometallic compounds |
| 12/24/2003 | WO2003096765A3 Apparatus and methods for minimizing arcing in a plasma processing chamber |
| 12/24/2003 | WO2003079404A3 An improved substrate holder for plasma processing |
| 12/24/2003 | WO2003066931A8 A method of producing a tin oxide coating |
| 12/24/2003 | WO2003035928A3 Mechanically and thermodynamically stable amorphous carbon layers for temperature-sensitive surfaces |
| 12/24/2003 | WO2002018670A3 Cvd reactor with a gas outlet ring made of solid graphite |
| 12/24/2003 | CN1463303A Composite material and method for prodn. thereof |
| 12/24/2003 | CN1462818A Method and device for preparing crystalized carbon film azotized |
| 12/24/2003 | CN1132233C Plasma processing method and appts. |
| 12/24/2003 | CN1131892C 静电屏蔽的射频室冷却系统和方法 RF chamber cooling system and method for electrostatic shielding |
| 12/24/2003 | CN1131891C Chemical vapor phase deposition appts. its purification and appts. for mfg. semiconductors |