| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/15/2004 | WO2004006285A1 Method and apparatus for non-invasive measurement and analysis of plasma parameters |
| 01/15/2004 | WO2004005576A1 Plant for vacuum coating of objects treated in batches |
| 01/15/2004 | WO2004005186A1 sp3 BOND BORON NITRIDE EMITTING LIGHT IN ULTRAVIOLET REGION, ITS PRODUCING METHOD, AND FUNCTIONAL MATERIAL USING SAME |
| 01/15/2004 | WO2003065766A3 Heating in a vacuum atmosphere in the presence of a plasma |
| 01/15/2004 | WO2003062507A3 Method for manufacturing a free-standing substrate made of monocrystalline semi-conductor material |
| 01/15/2004 | WO2002092728A3 Coal tar and hydrocarbon mixture pitch and the preparation and use thereof |
| 01/15/2004 | US20040010158 One pot method to produce an organometallic compound, e.g., a cyclopentadienytrimethylplatinum, from a metal source, an alkylating agent and a hydrocarbon or hetero compound; chemical vapor deposition to form electrical thin film |
| 01/15/2004 | US20040009679 Method of forming material using atomic layer deposition and method of forming capacitor of semiconductor device using the same |
| 01/15/2004 | US20040009678 Method for manufacturing semiconductor device |
| 01/15/2004 | US20040009676 Nitrogen-free dielectric anti-reflective coating and hardmask |
| 01/15/2004 | US20040009665 Deposition of copper films |
| 01/15/2004 | US20040009336 Titanium silicon nitride (TISIN) barrier layer for copper diffusion |
| 01/15/2004 | US20040009308 Method of producing a branched carbon nanotube for use with an atomic force microscope |
| 01/15/2004 | US20040009307 Vapor depositing a metal oxide layer on a substrate, by oxidation with a generated plasma of metal compounds and oxygen; plasma enhanced chemical vapor deposition |
| 01/15/2004 | US20040009306 Plasma enhanced chemical deposition for high and/or low index of refraction polymers |
| 01/15/2004 | US20040008336 Method and system of determining chamber seasoning condition by optical emission |
| 01/15/2004 | US20040007581 Removable lid and floating pivot |
| 01/15/2004 | US20040007560 Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor |
| 01/15/2004 | US20040007248 Preparing an etching and a deposition apparatus each using chlorine series gas, generating a plasma containing hydrogen and nitrogen to remove by-products |
| 01/15/2004 | US20040007247 Plasma film-forming apparatus and cleaning method for the same |
| 01/15/2004 | US20040007187 CVD reactor with substrate holder which is rotatably driven and mounted by a gas stream |
| 01/15/2004 | US20040007185 Method of manufacturing a semiconductor device and a semiconductor manufacture system |
| 01/15/2004 | US20040007182 Plasma processing apparatus |
| 01/15/2004 | US20040007181 Deposited-film formation process and formation system |
| 01/15/2004 | US20040007180 Film-formation apparatus and source supplying apparatus therefor, gas concentration measuring method |
| 01/15/2004 | US20040007179 Reaction apparatus for atomic layer deposition |
| 01/15/2004 | US20040007178 Low pressure vapor phase deposition of organic thin films |
| 01/15/2004 | US20040007176 Gas flow control in a wafer processing system having multiple chambers for performing same process |
| 01/15/2004 | US20040007171 Method for growing thin oxide films |
| 01/15/2004 | DE10230395A1 Leitfähiges Bauteil für elektrochemische Zellen sowie Verfahren zur Herstellung eines solchen Bauteils Conductive component for electrochemical cells and methods for producing such a component |
| 01/15/2004 | DE10228050A1 Dikupfer(I)oxolat-Komplexe als Precursor-Substanzen zur metallischen Kupferabscheidung Dicopper (I) oxolat complexes as precursor substances for metallic copper deposition |
| 01/15/2004 | DE10227637A1 Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken Method and apparatus for plasma treatment of workpieces |
| 01/14/2004 | EP1381079A1 Heat treating method and heat treating device |
| 01/14/2004 | EP1381078A1 Ultraviolet ray assisted processing device for semiconductor processing |
| 01/14/2004 | EP1380050A2 Method for producing a chalcogenide-semiconductor layer of the abc2 type with optical process monitoring |
| 01/14/2004 | EP1379476A1 Chemical vapor deposition of antimony-doped metal oxide |
| 01/14/2004 | EP1222196B1 Deposition of films using organosilsesquioxane-precursors |
| 01/14/2004 | EP1141443B1 A method of metallizing the surface of a solid polymer substrate and the product obtained |
| 01/14/2004 | CN1468444A 真空处理装置 Vacuum processing apparatus |
| 01/14/2004 | CN1468440A System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber |
| 01/14/2004 | CN1468322A Electrostatically clamped edge ring for plasma processing |
| 01/14/2004 | CN1468154A Method and apparatus for forming a coating |
| 01/14/2004 | CN1467802A Laser anneal equipment and laser film forming method |
| 01/14/2004 | CN1467311A Method of manufacturing inorganic nanotube |
| 01/14/2004 | CN1467303A Method for depositing film using plasma chemical gas phase deposition method |
| 01/14/2004 | CN1467302A Layer formation method, and substrate with a layer formed by the method |
| 01/14/2004 | CN1134525C Method for making long-life electroluminescent matter |
| 01/13/2004 | US6677711 Plasma processor method and apparatus |
| 01/13/2004 | US6677253 Carbon doped oxide deposition |
| 01/13/2004 | US6677250 CVD apparatuses and methods of forming a layer over a semiconductor substrate |
| 01/13/2004 | US6677214 Semiconductor device and method of fabricating the same |
| 01/13/2004 | US6677167 Wafer processing apparatus and a wafer stage and a wafer processing method |
| 01/13/2004 | US6677001 Electron cyclotron resonance chemical vapor deposition (ecr cvd) has attracted the interests of researchers as a new method of manufacturing thin films, particularly amorphous thin films |
| 01/13/2004 | US6676916 Method for inducing controlled cleavage of polycrystalline silicon rod |
| 01/13/2004 | US6676804 Method and apparatus for plasma processing |
| 01/13/2004 | US6676803 Semiconductor device fabricating equipment using radio frequency energy |
| 01/13/2004 | US6676802 Remote exposure of workpieces using a plasma |
| 01/13/2004 | US6676764 Method for cleaning a substrate in selective epitaxial growth process |
| 01/13/2004 | US6676760 Process chamber having multiple gas distributors and method |
| 01/13/2004 | US6676758 Gas collector for epitaxial reactor |
| 01/13/2004 | US6676756 Technique for high efficiency metalorganic chemical vapor deposition |
| 01/13/2004 | US6676751 Epitaxial film produced by sequential hydride vapor phase epitaxy |
| 01/13/2004 | US6676704 Prosthetic joint component having at least one sintered polycrystalline diamond compact articulation surface and substrate surface topographical features in said polycrystalline diamond compact |
| 01/13/2004 | US6676487 Polishing liquid of silicon dioxide powder; x-ray mask deposited on a semiconductor surface |
| 01/13/2004 | US6675816 Parallel flat plate |
| 01/13/2004 | US6675737 Plasma processing apparatus |
| 01/08/2004 | WO2004003995A1 Substrate treating apparatus and method for manufacturing semiconductor device |
| 01/08/2004 | WO2004003983A1 Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gas |
| 01/08/2004 | WO2004003963A2 Plasma processor with electrode simultaneously responsive to plural frequencies |
| 01/08/2004 | WO2004003962A2 Thermal sprayed yttria-containing coating for plasma reactor |
| 01/08/2004 | WO2004003410A1 Sealable surface method and device |
| 01/08/2004 | WO2004003266A1 POROUS SUBSTRATE AND ITS MANUFACTURING METHOD, AND GaN SEMICONDUCTOR MULTILAYER SUBSTRATE AND ITS MANUFACTURING METHOD |
| 01/08/2004 | WO2004002946A1 Novel alkaline earth metal complexes and use thereof |
| 01/08/2004 | WO2002056342A3 Copper vias in low-k technology |
| 01/08/2004 | WO2002048423A3 Method for coating substrates and mask holder |
| 01/08/2004 | US20040005789 Method for fabricating semiconductor device |
| 01/08/2004 | US20040005731 Device and method for the depostion of, in particular, crystalline layers on, in particular, crystalline substrates |
| 01/08/2004 | US20040005502 In particular for use as a bipolar plate in a fuel cell. The conductive component consists of a metal part provided with a doped diamond coating and/or with a doped diamond-like carbon coating. This coating enables the component to be produced at |
| 01/08/2004 | US20040005414 Producing fine or ultra fine powder particles comprising mixing a metal alkoxide with a non-metallic hydride in an organic solvent, agitating the mixed solution, and then burning the mixed solution. The burning process comprises |
| 01/08/2004 | US20040005410 Process for internally coating gas turbine blades or vanes and internally coated gas turbine blade or vane produced thereby |
| 01/08/2004 | US20040005408 Method of forming a dielectric film |
| 01/08/2004 | US20040005258 Having intersecting channel-like voids parallel to the major axis of said template; used to produce micro- and nano-scale filaments and particles, e.g., polymerizing acetylene and decomposing polyacetylene to form carbon nanotubes |
| 01/08/2004 | US20040005147 Heat treatment apparatus, calibration method for temperature measuring system of the apparatus, and heat treatment system |
| 01/08/2004 | US20040004870 Method for manufacturing semiconductor device |
| 01/08/2004 | US20040003897 Plasma stabilization method and plasma apparatus |
| 01/08/2004 | US20040003896 Controller for plasma processing apparatus performing good etching process |
| 01/08/2004 | US20040003828 Selective cleaning, drying, and modifying substrate surfaces and depositing thin films thereon using a dense phase gas solvent and admixtures within a first created supercritical fluid antisolvent. |
| 01/08/2004 | US20040003780 Self aligning non contact shadow ring process kit |
| 01/08/2004 | US20040003779 Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates |
| 01/08/2004 | US20040003777 Apparatus and method for depositing materials onto microelectronic workpieces |
| 01/08/2004 | DE10212923A1 Verfahren zum Beschichten eines Substrates und Vorrichtung zur Durchführung des Verfahrens A method for coating a substrate and apparatus for carrying out the method |
| 01/07/2004 | EP1377999A1 Inductively coupled plasma source with controllable power distribution |
| 01/07/2004 | EP1326718B1 Method and apparatus for forming a coating |
| 01/07/2004 | EP1115900B1 Methods for preparing ruthenium metal films |
| 01/07/2004 | CN1466670A System and method for controlling movement of a workpiece in a thermal processing system |
| 01/07/2004 | CN1465741A Liquid material gasifying and supply device |
| 01/07/2004 | CN1465740A Method for preparing vacuum film-coating zinc sulfide |
| 01/06/2004 | US6674169 Semiconductor device with titanium silicon oxide layer |
| 01/06/2004 | US6673725 Film forming by plasma enhanced vapor deposition using gas of nitrous oxide, water, carbon dioxide, ammonia, an alkylsiloxane and a methylsilane; coating a copper wiring |
| 01/06/2004 | US6673718 Methods for forming aluminum metal wirings |