| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/17/2004 | US6691910 Method of joining different metal materials by friction welding |
| 02/17/2004 | CA2175045C Vapor phase chemical infiltration process of a material into a porous substrate at controlled surface temperature |
| 02/12/2004 | WO2004013903A2 Wafer batch processing system and method |
| 02/12/2004 | WO2004013901A2 Batch furnace |
| 02/12/2004 | WO2004013377A1 Method for preparation of aluminum oxide thin film |
| 02/12/2004 | WO2004013376A2 Titania coatings by plasma cvd at atmospheric pressure |
| 02/12/2004 | WO2004013150A1 Method for preparing bis(cyclopentadienyl)ruthenium and bis(cyclopentadienyl)ruthenium prepared by the method |
| 02/12/2004 | WO2004012996A1 Automatic refill system for ultra pure or contamination sensitive chemicals |
| 02/12/2004 | WO2003029515A3 Formation of composite tungsten films |
| 02/12/2004 | WO2002059333A3 Gene promoters isolated from potato and use thereof |
| 02/12/2004 | US20040029400 Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition |
| 02/12/2004 | US20040029384 Method and apparatus for production of metal film or the like |
| 02/12/2004 | US20040029379 Thin film forming method and thin film forming device |
| 02/12/2004 | US20040029367 Br2SbCH3 a solid source ion implant and CVD precursor |
| 02/12/2004 | US20040029339 Plasma processing apparatus and plasma processing method |
| 02/12/2004 | US20040029334 Method for passivating a semiconductor substrate |
| 02/12/2004 | US20040028952 Hafnium oxide mixture; crystal structure |
| 02/12/2004 | US20040028951 Cutting tool insert; alternating nucleation, aluminizing; gradients in aluminum concentration |
| 02/12/2004 | US20040028923 Coated cutting tool and method for producing the same |
| 02/12/2004 | US20040028916 Fluorine-free plasma curing process for porous low-k materials |
| 02/12/2004 | US20040028906 Diamond-like carbon coating on glass and plastic for added hardness and abrasion resistance |
| 02/12/2004 | US20040028892 Diamond coated cutting tool and method for making the same |
| 02/12/2004 | US20040028835 Method for depositing thin film using plasma chemical vapor deposition |
| 02/12/2004 | US20040028813 Method for producing a continuous coating at the surface of a component |
| 02/12/2004 | US20040028811 Bismuth titanium silicon oxide, bismuth titanium silicon oxide thin film, and method for forming the thin film |
| 02/12/2004 | US20040028810 Chemical vapor deposition reactor and method for utilizing vapor vortex |
| 02/12/2004 | US20040028569 Multiple contents container assembly for ultrapure solvent purging |
| 02/12/2004 | US20040027302 Radial antenna and plasma processing apparatus comprising the same |
| 02/12/2004 | US20040027060 Plastic substrate, fabrication method thereof and device using the same |
| 02/12/2004 | US20040026419 Plastic overcoated with metal; vacuum, vapor deposition |
| 02/12/2004 | US20040026400 LED heat lamp arrays for CVD heating |
| 02/12/2004 | US20040026385 Process for treating with an atmospheric plasma electrically conductive materials and a device therefor |
| 02/12/2004 | US20040026372 Plasma treatment method and apparatus |
| 02/12/2004 | US20040026371 Two-compartment chamber for sequential processing method |
| 02/12/2004 | US20040026368 Monitoring substrate processing by detecting reflectively diffracted light |
| 02/12/2004 | US20040026041 Semiconductor-processing reaction chamber |
| 02/12/2004 | US20040026039 Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus |
| 02/12/2004 | US20040026038 Plasma treatment apparatus |
| 02/12/2004 | US20040026037 Device and method for processing substrate |
| 02/12/2004 | US20040026036 Substrate processing apparatus and substrate processing method |
| 02/12/2004 | US20040025903 Method of in-situ chamber cleaning |
| 02/12/2004 | US20040025789 CVD process capable of reducing incubation time |
| 02/12/2004 | US20040025788 Plasma processing device and exhaust ring |
| 02/12/2004 | US20040025787 System for depositing a film onto a substrate using a low pressure gas precursor |
| 02/12/2004 | US20040025786 Substrate processing apparatus and reaction container |
| 02/12/2004 | US20040025785 Machine for coating hollow bodies |
| 02/12/2004 | US20040025370 Method and apparatus for generating gas to a processing chamber |
| 02/12/2004 | DE19826681B4 Verfahren zur Herstellung von neuartigen Getter-Werkstoffen in Form dünner metallischer und kohlenstoffhaltiger nanostrukturierter Schichten und Verwendung derselben zur Hochvakuumerzeugung und Gasspeicherung Process for the preparation of novel getter materials in the form of thin metal and carbonaceous nanostructured layers, and use thereof for producing a high vacuum and gas storage, |
| 02/12/2004 | DE10234735A1 Structurization of process area inclined or perpendicular to substrate surface, used in trench in semiconductor, especially in capacitor production, involves depositing liner of uniform thickness from precursors only in upper part |
| 02/11/2004 | EP1388891A1 System and method for heat treating semiconductor |
| 02/11/2004 | EP1388594A2 Composite material with smooth barrier layer and process for its production |
| 02/11/2004 | EP1388593A2 Rapid process for producing multilayer barrier coatings |
| 02/11/2004 | EP1388159A1 Magnetic mirror plasma source |
| 02/11/2004 | EP1387898A1 Substituted cycloalkene new copper precursors for chemical vapor deposition of copper metal thin films |
| 02/11/2004 | EP1190122B1 Method and apparatus for epitaxially growing a material on a substrate |
| 02/11/2004 | CN1474882A Method and device for atmospheric plasma processing |
| 02/11/2004 | CN1474447A Method for preparing capacitor in semiconductor assembly |
| 02/11/2004 | CN1473958A High molecular neutralizing membrane producing device using plasma technology and its producing method |
| 02/11/2004 | CN1473957A Gas blocking preventing oif plasma continuous coating device |
| 02/11/2004 | CN1473956A Continuous evaporation coating device of plasma with magnet |
| 02/11/2004 | CN1473955A Process for depositing composite anti-corrosion layer and hydrophilic layer using plasma technology |
| 02/11/2004 | CN1473954A Cleaning plasma method for continuous high molecular membrane evaporation coating device |
| 02/11/2004 | CN1473953A Waste gas filter oif plasma depositing coating system |
| 02/11/2004 | CN1473680A TiBN coating |
| 02/11/2004 | CN1473655A Cleanable manifold for low steam pressure chemical article container |
| 02/11/2004 | CN1138024C Compound gas injection system and methods |
| 02/10/2004 | US6690055 Devices containing platinum-rhodium layers and methods |
| 02/10/2004 | US6690052 Semiconductor device having a capacitor with a multi-layer dielectric |
| 02/10/2004 | US6689930 Method and apparatus for cleaning an exhaust line in a semiconductor processing system |
| 02/10/2004 | US6689699 Wherein gas is introduced into a vacuum chamber for treating a substrate to be processed |
| 02/10/2004 | US6689646 Plasma method for fabricating oxide thin films |
| 02/10/2004 | US6689450 Enhanced Al2O3-Ti(C,N) multi-coating deposited at low temperature |
| 02/10/2004 | US6689427 Group IV metal precursors and a method of chemical vapor deposition using the same |
| 02/10/2004 | US6689422 Silicon aluminide; flowing hydrogen chloride in a hydrogen carrier gas in contact with al particulates heated to a reaction temperature to form aluminum trichloride; hf, zr, y are gettering agents to form thechlorides |
| 02/10/2004 | US6689222 Sealable surface method and device |
| 02/10/2004 | US6689221 Cooling gas delivery system for a rotatable semiconductor substrate support assembly |
| 02/10/2004 | US6689220 Plasma enhanced pulsed layer deposition |
| 02/10/2004 | US6689210 Apparatus for growing thin films |
| 02/10/2004 | US6689203 Liquid coating composition for production of fluorine doped tin oxide thin layers suitable for chemical vapor deposition process |
| 02/10/2004 | US6688375 Wall thermally isolates sections; vacuum deposition of t films; vacuum sealable passages |
| 02/05/2004 | WO2004012278A2 Method and apparatus for superconductor material on a tape substrate |
| 02/05/2004 | WO2004012277A2 Method and apparatus for forming a thin film on a tape substrate |
| 02/05/2004 | WO2004012229A2 Reduced volume, high conductance process chamber |
| 02/05/2004 | WO2004011695A2 Sublimation system employing carrier gas |
| 02/05/2004 | WO2004011694A2 Method and apparatus for generating gas to a processing chamber |
| 02/05/2004 | WO2004011693A1 Atomic deposition layer methods |
| 02/05/2004 | WO2004011688A2 Method and apparatus for dispersion strengthened bond coats for thermal barrier coatings |
| 02/05/2004 | WO2003083160A3 Evaluation of chamber components having textured coatings chamber components |
| 02/05/2004 | WO2003076678A3 Ald method and apparatus |
| 02/05/2004 | US20040023517 Wafer batch processing system having processing tube |
| 02/05/2004 | US20040023516 Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition |
| 02/05/2004 | US20040023515 Adhesion of carbon doped oxides by silanization |
| 02/05/2004 | US20040023513 Method for manufacturing semiconductor device, substrate treater, and substrate treatment system |
| 02/05/2004 | US20040023468 Method for manufacturing a free-standing substrate made of monocrystalline semi-conductor material |
| 02/05/2004 | US20040023461 Atomic layer deposited nanolaminates of HfO2/ZrO2 films as gate dielectrics |
| 02/05/2004 | US20040023456 Method for fabricating capacitor in semiconductor device |
| 02/05/2004 | US20040023453 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 02/05/2004 | US20040023432 Semiconductor polysilicon component and method of manufacture thereof |
| 02/05/2004 | US20040023416 Method for forming a paraelectric semiconductor device |
| 02/05/2004 | US20040023047 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof |