| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/05/2004 | US20040023032 Method for producing a conducting doped diamond-like nanocomposite film and a conducting doped diamond-like nanocomposite film |
| 02/05/2004 | US20040023020 Thermal barrier coating utilizing a dispersion strengthened metallic bond coat |
| 02/05/2004 | US20040022960 Depositing a reactant gas containing a precursor of the dielectric film using plasma; stopping the gas supply and continuing the plasma treatment to form a dielectric layer; repeating the steps until a desired thickness is obtained. |
| 02/05/2004 | US20040022945 Using an atmospheric pressure plasma discharge; plasma polymerization |
| 02/05/2004 | US20040022528 For isothermally distributing a temperature across a semiconductor device |
| 02/05/2004 | US20040020761 Sputter coating apparatus including ion beam source(s), and corresponding method |
| 02/05/2004 | US20040020601 Process and an integrated tool for low k dielectric deposition including a pecvd capping module |
| 02/05/2004 | US20040020599 Treating device |
| 02/05/2004 | US20040020439 Process chamber window assembly |
| 02/05/2004 | US20040020437 Vaporizer for MOCVD and method of vaporizing raw material solutions for MOCVD |
| 02/05/2004 | US20040020436 CVD reactor with graphite-foam insulated, tubular susceptor |
| 02/05/2004 | US20040020434 Focused ion beam deposition |
| 02/05/2004 | US20040020432 Plasma cvd apparatus and method |
| 02/05/2004 | US20040020431 Plasma treatment apparatus |
| 02/05/2004 | US20040020430 Method and apparatus for forming a thin film on a tape substrate |
| 02/05/2004 | US20040020429 Pressure regulating system of plasma processing equipment |
| 02/05/2004 | DE10234374A1 Process for handling workpieces comprises transporting the workpieces on a rotating coupling wheel and transferring the workpieces between a retaining element and a reference station at different times |
| 02/05/2004 | DE10232731A1 Be- und Entladevorrichtung für eine Beschichtungseinrichtung Loading and unloading of a coating device |
| 02/05/2004 | DE10228898A1 Device for Chemical Vapor Deposition treatment of workpieces comprises a transport unit and a reactor fixed to the transport unit |
| 02/04/2004 | EP1386981A1 A thin film-forming apparatus |
| 02/04/2004 | EP1386980A2 Process for coating the interior of gas turbine blades |
| 02/04/2004 | EP1386360A2 Composite material, methods for the production thereof and its use |
| 02/04/2004 | EP0857095B1 Anchored oxide coatings on hard metal cutting tools |
| 02/04/2004 | CN1473452A Ceramic heater and ceramic joined article |
| 02/04/2004 | CN1473353A Purging method of semiconductor-manufacturing apparatus and manufacturing method of semiconductor device |
| 02/04/2004 | CN1473206A Plasma electroplating |
| 02/04/2004 | CN1472359A Heating temperature controller and method for preparing method |
| 02/04/2004 | CN1472135A Carbon nanometer for fuel battery, its preparing method and fuel battery therewith |
| 02/03/2004 | US6687050 Amplifier gain error |
| 02/03/2004 | US6686281 Method for fabricating a semiconductor device and a substrate processing apparatus |
| 02/03/2004 | US6686271 Protective layers prior to alternating layer deposition |
| 02/03/2004 | US6686264 Methods of forming binary noncrystalline oxide analogs of silicon dioxide |
| 02/03/2004 | US6686232 Ultra low deposition rate PECVD silicon nitride |
| 02/03/2004 | US6686230 Semiconducting devices and method of making thereof |
| 02/03/2004 | US6686212 Method to deposit a stacked high-κ gate dielectric for CMOS applications |
| 02/03/2004 | US6686210 Methods for controlling the crystallographic texture of thin films with anisotropic ferroelectric polarization or permittivity |
| 02/03/2004 | US6686205 Parallel synthesis and analysis |
| 02/03/2004 | US6686043 Method for making long-life electroluminescent phosphor |
| 02/03/2004 | US6685994 Coating workpiece method using beam of plasma |
| 02/03/2004 | US6685847 Method for observing cross-sectional structure of sample |
| 02/03/2004 | US6685804 Depositing thin film of active material capable of alloying with lithium on current collector of metal incapable of such alloying, by supplying material from gas phase, forming mixed layer at interface via diffusion of current collector material |
| 02/03/2004 | US6685774 Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition |
| 02/03/2004 | US6684759 Temperature regulator for a substrate in vapor deposition processes |
| 01/29/2004 | WO2004010480A1 Apparatus and method for thermally isolating a heat chamber |
| 01/29/2004 | WO2004010475A2 Method of reducing internal stress in materials |
| 01/29/2004 | WO2004010473A2 Bubbler for substrate processing |
| 01/29/2004 | WO2004010471A2 In-situ formation of metal insulator metal capacitors |
| 01/29/2004 | WO2004010469A2 Atomic layer deposition of multi-metallic precursors |
| 01/29/2004 | WO2004010467A2 Low temperature dielectric deposition using aminosilane and ozone |
| 01/29/2004 | WO2004010466A2 Metal organic chemical vapor deposition and atomic layer deposition of metal oxynitride and metal silicon oxynitride |
| 01/29/2004 | WO2004010463A2 Vaporizer delivery ampoule |
| 01/29/2004 | WO2004010462A2 Infrared thermopile detector system for semiconductor process monitoring and control |
| 01/29/2004 | WO2004009868A1 Vaporizer for thin film deposition apparatus |
| 01/29/2004 | WO2004009867A2 Zirconium complex used for the cvd method and preparation method of a thin film using thereof |
| 01/29/2004 | WO2004009861A2 Method to form ultra high quality silicon-containing compound layers |
| 01/29/2004 | WO2004009515A1 Carbon composite material |
| 01/29/2004 | WO2004009299A2 Loading and unloading device for a coating unit |
| 01/29/2004 | WO2004008827A2 Atomic layer deposition of high k dielectric films |
| 01/29/2004 | WO2003043073A3 A method of depositing low k barrier layers |
| 01/29/2004 | WO2002060509A9 Methods for surface modification |
| 01/29/2004 | US20040018750 Method for deposition of nitrogen doped silicon carbide films |
| 01/29/2004 | US20040018746 Infrared thermopile detector system for semiconductor process monitoring and control |
| 01/29/2004 | US20040018735 Method of depositing an oxide film by chemical vapor deposition |
| 01/29/2004 | US20040018723 Formation of boride barrier layers using chemisorption techniques |
| 01/29/2004 | US20040018716 Semiconductor device and production method therefor |
| 01/29/2004 | US20040018694 Methods for forming silicon dioxide layers on substrates using atomic layer deposition |
| 01/29/2004 | US20040018650 Substrate processing apparatus |
| 01/29/2004 | US20040018416 Carbon nanotubes for fuel cells, method for manufacturing the same, and fuel cell using the same |
| 01/29/2004 | US20040018362 Silica layers and antireflection film using same |
| 01/29/2004 | US20040018319 Improving modulus and material hardness of a dielectric material by curing; use in integrated circuit dielectrics, semiconductor chips |
| 01/29/2004 | US20040018307 Methods of forming atomic layers of a material on a substrate by sequentially introducing precursors of the material |
| 01/29/2004 | US20040018304 Method of film deposition using activated precursor gases |
| 01/29/2004 | US20040018008 Heating configuration for use in thermal processing chambers |
| 01/29/2004 | US20040016965 Field-effect transistor and method of producing the same |
| 01/29/2004 | US20040016441 Plasma cleaning gas and plasma cleaning method |
| 01/29/2004 | US20040016406 Plasma processing comprising three rotational motions of an article being processed |
| 01/29/2004 | US20040016404 Vaporizer delivery ampoule |
| 01/29/2004 | US20040016403 Apparatus and a method for forming an alloy layer over a substrate |
| 01/29/2004 | US20040016401 Method and apparatus for forming superconductor material on a tape substrate |
| 01/29/2004 | US20040016394 Atomic layer deposition methods |
| 01/29/2004 | US20040016329 TiBN coating |
| 01/29/2004 | DE10229642A1 Verfahren zum lokalen Erhitzen eines in einem Halbleitersubstrat angeordneten Bereichs A method for locally heating an object arranged in a semiconductor substrate region |
| 01/29/2004 | DE10229040A1 Neue Erdalkalimetallkomplexe und ihre Verwendung New alkaline earth metal complexes and their use |
| 01/29/2004 | DE10219108A1 Hocheffizienter Fernreinigungsprozess für Prozesskammern in Abscheideanlagen Highly efficient cleaning process for remote process chambers in separation systems |
| 01/29/2004 | CA2491886A1 Zirconium complex used for the cvd method and preparation method of a thin film using thereof |
| 01/28/2004 | EP1384571A1 Laminated body |
| 01/28/2004 | EP1384277A2 Abraded fluid diffusion layer for an electrochemical fuel cell |
| 01/28/2004 | EP1383939A1 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| 01/28/2004 | EP1383938A1 Method for production of a metallic or metal-containing layer |
| 01/28/2004 | EP1361293A9 Method of forming silicon thin film and silicon thin film solar cell |
| 01/28/2004 | CN1471800A Atmospheric plasma method for treating electricity conducting materials and device therefor |
| 01/28/2004 | CN1471439A Coating formation by reactive deposition |
| 01/28/2004 | CN1471143A Method for manufacturing semiconductor device |
| 01/28/2004 | CN1136607C Apparatus and method for manufacturing semiconductor device |
| 01/28/2004 | CN1136395C Member having sliding contact surface, compressor and rotary compressor |
| 01/28/2004 | CN1136335C Apparatus for use with CVE/CVD processes |
| 01/28/2004 | CN1136334C Improved chemical vapour deposition apparatus |
| 01/27/2004 | US6684172 Sensor to predict void free films using various grating structures and characterize fill performance |
| 01/27/2004 | US6683274 Heater mounted within ceramic body and spaced apart from radio frequency electrode; plasma enhanced chemical vapor deposition (pecvd) |
| 01/27/2004 | US6683198 Group(III)-metal-hydrides with a guanidino-type ligand |