| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/26/2004 | US20040037958 CVD condeposition of A1 and one or more reactive (gettering) elements to form protective aluminide coating |
| 02/26/2004 | US20040037946 Methods for surface modification |
| 02/26/2004 | US20040037768 One embodiment of the system comprising a process gas generation cabinet, wherein the process gas generation cabinet comprises a housing, encompassing a process gas generator, and an exhaust and abatement system. The cabinet |
| 02/26/2004 | US20040036403 Fabrication method of carbon nanotubes |
| 02/26/2004 | US20040035531 Apparatus for controlling the temperature of a gas distribution plate in a process reactor |
| 02/26/2004 | US20040035530 Sheet-fed treating device |
| 02/26/2004 | US20040035365 Plasma processing apparatus |
| 02/26/2004 | US20040035364 Plasma processing apparatus and method for asssembling the plasma processing apparatus |
| 02/26/2004 | US20040035362 Atomic layer deposition method and semiconductor device fabricating apparatus having rotatable gas injectors |
| 02/26/2004 | US20040035361 Apparatus and method for forming deposited film |
| 02/26/2004 | US20040035359 Heat-treating apparatus and heat-treating method |
| 02/26/2004 | US20040035358 Reactors having gas distributors and methods for depositing materials onto micro-device workpieces |
| 02/26/2004 | US20040035202 Method and device for the metered delivery of low volumetric flows of liquid |
| 02/26/2004 | DE10328872A1 Paraelektrisches Material für ein Halbleiterbauelement und Herstellungsverfahren desselben Thereof paraelectric material for a semiconductor device and manufacturing method |
| 02/26/2004 | DE10328578A1 Hartmaske aus amorphen Kohlenstoff-Wasserstoff-Schichten Hard mask of amorphous carbon-hydrogen layers |
| 02/26/2004 | DE10326136A1 Entladungsplasma-Bearbeitungsanlage mit magnetischer neutraler Linie Discharge plasma processing system with magnetic neutral line |
| 02/26/2004 | DE10258681A1 Process for applying alternating layers e.g. barrier layers onto a plastic bottle by chemical gas phase deposition comprises depositing an organic adhesion promoting layer on a substrate and applying an inorganic barrier layer |
| 02/25/2004 | EP1391941A1 Production method for light emitting element absract: |
| 02/25/2004 | EP1391919A1 Ceramic heater for semiconductor manufactring/inspecting apparatus |
| 02/25/2004 | EP1391911A1 Microwave plasma generator |
| 02/25/2004 | EP1391535A1 Device for receiving and vacuum sealing of a container having an opening |
| 02/25/2004 | EP1391531A2 Thermal barrier coating with nitride particles |
| 02/25/2004 | EP1391429A1 Bismuth titanium silicon oxide, bismuth titanium silicon oxide thin film, and method for forming the thin film |
| 02/25/2004 | EP1390968A1 Smooth multipart substrate support member for cvd |
| 02/25/2004 | EP1390964A1 Dipole ion source |
| 02/25/2004 | EP1390566A2 Composite material and method for production thereof |
| 02/25/2004 | EP1390561A1 Method and device for depositing layers |
| 02/25/2004 | EP1390559A1 Method for producing a layer with a predefined layer thickness profile |
| 02/25/2004 | EP1390558A1 Penning discharge plasma source |
| 02/25/2004 | EP1390174A1 Apparatus and method for controlling temperature uniformity of substrates |
| 02/25/2004 | EP1390157A1 Method and apparatus for temperature controlled vapor deposition on a substrate |
| 02/25/2004 | CN1478292A Mobile plating system and method |
| 02/25/2004 | CN1477682A Plasma processing device and method thereof |
| 02/25/2004 | CN1477240A Deposition method of seed-crystal-free and bias-less diamond quasi-monocrystal film |
| 02/25/2004 | CN1139672C Liquid conveying system |
| 02/25/2004 | CN1139671C Method of depositing electrocatalyst and electrodes formed by such method |
| 02/25/2004 | CN1139448C Direct quick precision metal type forming method based on liquid thermochemical reaction |
| 02/24/2004 | US6696700 Higher conductivity and deposition area thin film |
| 02/24/2004 | US6696663 Inductively coupled plasma apparatus |
| 02/24/2004 | US6696362 Method for using an in situ particle sensor for monitoring particle performance in plasma deposition processes |
| 02/24/2004 | US6696157 Diamond-like glass thin films |
| 02/24/2004 | US6696109 Chemical vapor deposition process for depositing titanium silicide films from an organometallic compound |
| 02/24/2004 | US6696108 Placing article to be processed in reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to the same high frequency electrode to generate plasma in reaction container |
| 02/24/2004 | US6695955 Method of forming polycrystalline silicon for liquid crystal display device |
| 02/24/2004 | US6695925 Immersion in aqueous solution containing 12% hydrogen peroxide (h2o2), sodium and potassium ions; immersing in water tank; immersing in isopropyl alcohol; drying with heated nitrogen gas |
| 02/24/2004 | US6694809 Flow controller |
| 02/24/2004 | US6694792 Substrate treatment process |
| 02/24/2004 | CA2072160C Alumina coated sintered body |
| 02/19/2004 | WO2004015750A1 Heat treatment method and heat treatment apparatus |
| 02/19/2004 | WO2004015742A2 High rate deposition in a batch reactor |
| 02/19/2004 | WO2004015348A1 Led heat lamp arrays for cvd heating |
| 02/19/2004 | WO2004015166A2 Method of forming a coating on a plastic glazing |
| 02/19/2004 | WO2004015165A1 Improvements to showerheads |
| 02/19/2004 | WO2004015164A1 Pyrrolyl complexes of copper for copper metal deposition |
| 02/19/2004 | WO2004014811A1 Apparatus and method for measuring the weight of an optical fiber preform during a chemical deposition process for forming the preform |
| 02/19/2004 | WO2004014644A1 Laminate having adherent layer and laminate having protective film |
| 02/19/2004 | WO2004001809A3 Method for energy-assisted atomic layer deposition and removal |
| 02/19/2004 | WO2003100123B1 Ceramic thin film on various substrates, and process for producing same |
| 02/19/2004 | WO2003091822A3 Method for producing nitrides and uses thereof as fluorescent markers and light-emitting diodes |
| 02/19/2004 | WO2003048406A3 Coating method and coating |
| 02/19/2004 | WO2003030224A3 Barrier formation using novel sputter-deposition method |
| 02/19/2004 | WO2003017341A3 Methods of forming metal-comprising materials and capacitor electrodes; and capacitor constructions |
| 02/19/2004 | WO2002094458A3 Method for producing a coated synthetic body |
| 02/19/2004 | US20040033703 Method for forming amino-free low k material |
| 02/19/2004 | US20040033699 Method of making an integrated circuit using an EUV mask formed by atomic layer deposition |
| 02/19/2004 | US20040033698 Method of forming oxide layer using atomic layer deposition method and method of forming capacitor of semiconductor device using the same |
| 02/19/2004 | US20040033688 Atomic layer deposition methods |
| 02/19/2004 | US20040033679 Patterning of nanostructures |
| 02/19/2004 | US20040033650 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 02/19/2004 | US20040033393 WC-Co cemented carbide with a low content of cubic carbides and a highly W-alloyed binder phase; coating of a titanium carbonitride with columnar grains followed by a layer of kappa -Al2O3 and a top layer of TiN |
| 02/19/2004 | US20040033373 Low kappa dielectric inorganic/organic hybrid films and methods of making |
| 02/19/2004 | US20040033371 Deposition of organosilsesquioxane films |
| 02/19/2004 | US20040033361 Component of glass-like carbon for CVD apparatus and process for production thereof |
| 02/19/2004 | US20040033318 Apparatus and method for forming thin-film |
| 02/19/2004 | US20040033310 Deposition methods |
| 02/19/2004 | US20040033180 Method and apparatus for producing silicon oxide-based ceramic membrane by gas phase synthesis |
| 02/19/2004 | US20040031564 Alumina, zirconium silicate, feldspar, pottery stone, siliceous limestone, kaolin, gairome clay (Japan), and black soil; compressed into blocks, dehydrated; storing thermal energy after being roasted for a short time, releasing the energy to produce progressive temperature rise; skin rehabilitation |
| 02/19/2004 | US20040031438 Cast diamond products and formation thereof by chemical vapor deposition |
| 02/19/2004 | DE10258680A1 Process for applying alternating layers e.g. barrier layers onto a plastic bottle by chemical gas phase deposition comprises depositing an organic adhesion promoting layer on a substrate and applying an inorganic barrier layer |
| 02/19/2004 | CA2494631A1 Method of forming a coating on a plastic glazing |
| 02/18/2004 | CN2603811Y Heat treatment facilities |
| 02/18/2004 | CN1476057A Plasma processor and variable impedance apparatus correcting method |
| 02/18/2004 | CN1475599A Laser CVD apparatus and laser CVD method |
| 02/18/2004 | CN1475598A Deivce for preventing condensation of plasma eraporating and plating equipment |
| 02/18/2004 | CN1139105C Laser annealing method for semiconductor layer |
| 02/18/2004 | CN1138872C Deposition of silicon dioxide and silicon oxynitride using bis(tertiarybutylamino) |
| 02/17/2004 | US6693302 Semiconductor light-emitting element |
| 02/17/2004 | US6693030 Reactive preclean prior to metallization for sub-quarter micron application |
| 02/17/2004 | US6693022 CVD method of producing in situ-doped polysilicon layers and polysilicon layered structures |
| 02/17/2004 | US6692834 Depositing, preferably by plasma glow discharge, a reactant monomer on at least one surface of an implantable device, preferably at ambient temperature |
| 02/17/2004 | US6692833 By chemical vapor deposition on a non-conductive substrate using as precursor a metal halide and/or organometallic compound and a reducing agent; allows another metal conducting layer to be deposited by electrolysis |
| 02/17/2004 | US6692822 Wear resistance, high toughness properties and good resistance to plastic deformation; performance |
| 02/17/2004 | US6692795 Method for fabricating semiconductor device having ruthenium layer and equipment for fabricating the same |
| 02/17/2004 | US6692794 Composite and manufacturing method therefor |
| 02/17/2004 | US6692648 Method of plasma heating and etching a substrate |
| 02/17/2004 | US6692622 Plasma processing apparatus with an electrically conductive wall |
| 02/17/2004 | US6692576 Wafer support system |
| 02/17/2004 | US6692575 Apparatus for supporting a substrate in a reaction chamber |
| 02/17/2004 | US6692574 Gas dispersion apparatus for use in a hot filament chemical vapor deposition chamber |
| 02/17/2004 | US6692569 A-site-and/or b-site-modified pbzrtio3 materials and (pb, sr, ca, ba, mg) (zr, ti,nb, ta)o3 films having utility in ferroelectric random access memories and high performance thin film microactuators |