Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2004
03/25/2004CA2497786A1 Diffusion barrier coatings having graded compositions and devices incorporating the same
03/25/2004CA2441680A1 Titanium article having improved corrosion resistance
03/24/2004EP1401014A1 Plasma processing device, and method of cleaning the same
03/24/2004EP1401013A1 Plasma processing device
03/24/2004EP1401008A1 Element for coupling electrical energy into a processing chamber and processing system comprising such an element
03/24/2004EP1400490A1 Deposition of a solid by thermal decomposition of a gaseous substance in a bowl reactor
03/24/2004EP1400456A1 MANUFACTURING DEVICE FOR DLC FILM COATED PLASTIC CONTAINER; DLC FILM COATED PLASTIC CONTAINER, AND METHOD OF MANUFACTURING THE DLC FILM COATED PLASTIC CONTAINER
03/24/2004EP1400345A1 Process for preparation of a plastic product
03/24/2004EP1399967A1 Method of making full color display panels
03/24/2004EP1399955A1 Method for preparing low dielectric films
03/24/2004EP1399384A2 Method for the selective production of ordered carbon nanotubes in a fluidised bed
03/24/2004EP1133582B1 Method for preparing titanium coatings
03/24/2004EP1125003B1 Excess cvd reactant control
03/24/2004EP0966553B1 Process for low temperature cvd using bi-amides
03/24/2004CN1484778A Thin film transistor substrate using low dielectric constant and method for manufacturing the same
03/24/2004CN1484712A Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
03/24/2004CN1483855A High temp. -resisting plasma cavity resonator
03/24/2004CN1483853A Method for forming metal film
03/24/2004CN1483769A Metallic coating with oxidation resistance and fatigue resistance
03/24/2004CN1483687A Method for mfg outside diameter variation reduced optical fibre prefabricated bar
03/24/2004CN1483668A Carbon nano pipe array growth method
03/23/2004US6709916 Method for forming capacitor of semiconductor device
03/23/2004US6709721 Purge heater design and process development for the improvement of low k film properties
03/23/2004US6709703 Method for fabricating a III-V nitride film and an apparatus for fabricating the same
03/23/2004US6709610 Isotropic dry cleaning process for noble metal integrated circuit structures
03/23/2004US6709525 Low pressure chemical vapor deposition apparatus of vertical type for fabricating semiconductor devices
03/23/2004US6709522 Material handling system and methods for a multichamber plasma treatment system
03/23/2004US6709520 Reactor and method for chemical vapor deposition
03/23/2004US6709519 Method and apparatus for non-contact, in-situ temperature measurement of a substrate film during chemical vapor deposition of the substrate film
03/23/2004US6709512 Method of growing a polycrystalline silicon layer, method of growing a single crystal silicon layer and catalytic CVD apparatus
03/23/2004US6709267 Semiconductors
03/23/2004US6708700 Cleaning of semiconductor processing chambers
03/23/2004US6708645 Arc resistant high voltage feedthru fitting for a vacuum deposition chamber
03/18/2004WO2004023525A2 Low temperature deposition of silicon based thin films by single-wafer hot-wall rapid thermal chemical vapor deposition
03/18/2004WO2004023508A2 Accessory member for dispensers of alkali metals
03/18/2004WO2004009867A3 Zirconium complex used for the cvd method and preparation method of a thin film using thereof
03/18/2004WO2003091469A3 Method for joining a diamond layer to a substrate, and diamond-coated substrate
03/18/2004WO2003025249A9 Method of forming nitride films
03/18/2004WO2002080244A3 Improved process for deposition of semiconductor films
03/18/2004US20040054114 Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane
03/18/2004US20040053946 Cancer treatment method
03/18/2004US20040053496 Method for forming metal films
03/18/2004US20040053494 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer
03/18/2004US20040053493 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer
03/18/2004US20040053492 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer
03/18/2004US20040053486 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer
03/18/2004US20040053479 Method and device for plasma cvd
03/18/2004US20040053472 Method for film formation of gate insulator, apparatus for film formation of gate insulator, and cluster tool
03/18/2004US20040053460 Substrate for electronic devices, manufacturing method therefor, and electronic device
03/18/2004US20040053459 Dielectric layer for a semiconductor device and method of producing the same
03/18/2004US20040053428 Method and apparatus for the compensation of edge ring wear in a plasma processing chamber
03/18/2004US20040053053 Carbon nanotube array and method for forming same
03/18/2004US20040053024 Method and coating system for reducing carbonaceous deposits on surfaces exposed to hydrocarbon fuels at elevated temperatures
03/18/2004US20040052972 Atomic layer deposition (ALD)/epitaxy
03/18/2004US20040052971 Obtaining adamantine amorphous carbon films by using plasma consisting of a mixture of acetylene and argon maintained by power of a microwave source
03/18/2004US20040052969 Comprises high temperature heat exchanger
03/18/2004US20040052942 Method for coating substrates and mask holder
03/18/2004US20040052618 Semiconductor device producing apparatus and producing method of semiconductor device
03/18/2004US20040052004 Thin-film magnetic head, method for producing the same and magnetic disk device using the same
03/18/2004US20040051464 Plasma device and plasma generating method
03/18/2004US20040051463 Plasma generator using microwave
03/18/2004US20040051175 Forming metal barrier for overcoating substrate; then nitriding; multilayer coating
03/18/2004US20040050744 Plastic container for liquid medicine
03/18/2004US20040050685 Having gas atmosphere control mechanism whereby used gas is exhausted from vicinity of treatment section and vicinity of treatment section is maintained under specified gas atmosphere; forming silicon, silicon nitride films
03/18/2004US20040050495 Plasma processing apparatus and plasma processing method
03/18/2004US20040050494 Plasma processing device
03/18/2004US20040050492 Heated gas distribution plate for a processing chamber
03/18/2004US20040050490 Anodization-adapted aluminum alloy and plasma-treating apparatus made thereof
03/18/2004US20040050328 Film-forming system and film-forming method
03/18/2004US20040050326 Apparatus and method for automatically controlling gas flow in a substrate processing system
03/18/2004US20040050325 Apparatus and method for delivering process gas to a substrate processing system
03/18/2004US20040050102 Silica glass jig for semiconductor industry and method for producing the same
03/18/2004DE10240160A1 Corrosion-protected component used as a connecting element, such as a rivet, bolt or screw, comprises a base body made from a steel or light metal and a corrosion-inhibiting surface layer made from aluminum, alloy or compound
03/18/2004DE10239875A1 Verfahren und Vorrichtung zur großflächigen Beschichtung von Substraten bei Atmosphärendruckbedingungen Method and device for large-area coating of substrates under atmospheric pressure conditions
03/17/2004EP1398826A1 Microwave plasma processing device, plasma processing method, and microwave radiating member
03/17/2004EP1398820A2 Plasma treatment apparatus
03/17/2004EP1398819A2 Matching box, vacuum apparatus using the same, and vacuum processing method
03/17/2004EP1398274A1 MOISTURE AND GAS BARRIER PLASTIC CONTAINER WITH PARTITION PLATES, AND DEVICE AND METHOD FOR MANUFACTURING THE PLASTIC CONTAINER
03/17/2004EP1398079A2 Method and coating system for reducing carbonaceous deposits on surfaces exposed to hydrocarbon fuels at elevated temperatures
03/17/2004EP1397833A2 System and method to form a composite film stack utilizing sequential deposition techniques
03/17/2004EP1397830A2 Copper vias in low-k technology
03/17/2004EP1397529A1 Application of dense plasmas generated at atmospheric pressure for treating gas effluents
03/17/2004EP1397528A2 Device for depositing especially, crystalline layers on one or more substrates, especially substrates which are also crystalline
03/17/2004EP1397527A1 Grain oriented electric sheet of metal with an electrically insulating coating
03/17/2004EP1397526A2 Modified diamond-like carbon (dlc) layer structure
03/17/2004EP1047807B1 A DEPOSITION METHOD FOR USING A Cu(hfac) PRECURSOR WITH A SUBSTITUTED PHENYLETHYLENE LIGAND
03/17/2004EP0931176A4 Improved plasma jet system
03/17/2004CN1482655A Metal film semiconductor device and a method for forming the same
03/17/2004CN1482653A Precursor containing a nitrogen compound bound to hfcl4 for hafnium oxide layer and method for forming hafnium oxide film using the precursor
03/17/2004CN1482275A Method for preparing diamond/carbon or nitride nano mix phase gradient composite material
03/17/2004CN1482083A Raw material providing device for chemical vapor deposition process
03/17/2004CN1142577C Dual-face shower head electrode for magnetron plasma generating apparatus
03/17/2004CN1142318C Diamond-cobalt boron compound wear-resistant composite coating of carbide tool and preparation process thereof
03/17/2004CN1142059C Low dielectric constant inorganic/organic hybrid films and method of making it
03/16/2004US6707086 Method for forming crystalline silicon nitride
03/16/2004US6707076 Semiconductor element
03/16/2004US6707017 High-power microwave window
03/16/2004US6706648 APCVD method of forming silicon oxide using an organic silane, oxidizing agent, and catalyst-formed hydrogen radical
03/16/2004US6706647 Method of and apparatus for manufacturing semiconductors
03/16/2004US6706645 Method of manufacturing a semiconductor device