| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/13/2004 | US6719848 Chemical vapor deposition system |
| 04/13/2004 | US6719842 Ammonia for use in manufacture of GaN-type compound semiconductor and method for manufacturing GaN-type compound semiconductor |
| 04/08/2004 | WO2004030071A1 Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition |
| 04/08/2004 | WO2004030067A1 Ozone processing apparatus |
| 04/08/2004 | WO2004030066A1 Substrate processing apparatus |
| 04/08/2004 | WO2004030065A1 Substrate processing apparatus |
| 04/08/2004 | WO2004030064A1 Substrate processing apparatus |
| 04/08/2004 | WO2004030063A1 Substrate processing apparatus |
| 04/08/2004 | WO2004030059A1 Method for depositing nitride film using chemical vapor deposition apparatus of single chamber type |
| 04/08/2004 | WO2004030037A2 System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (xfn) compounds for use in cleaning semiconductor processing chambers |
| 04/08/2004 | WO2004030020A2 Upper electrode plate with deposition shield in a plasma processing system |
| 04/08/2004 | WO2004030019A1 Method and arrangement for generating an atmospheric pressure glow discharge plasma (apg) |
| 04/08/2004 | WO2004030013A2 Baffle plate in a plasma processing system |
| 04/08/2004 | WO2004029325A1 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and a plasma reactor for carrying out said method |
| 04/08/2004 | WO2004018573A3 Method of coating a surface with an organic film |
| 04/08/2004 | WO2004015166A3 Method of forming a coating on a plastic glazing |
| 04/08/2004 | WO2004013903A3 Wafer batch processing system and method |
| 04/08/2004 | WO2004012229A3 Reduced volume, high conductance process chamber |
| 04/08/2004 | WO2004009299A3 Loading and unloading device for a coating unit |
| 04/08/2004 | WO2004006977A3 Coatings |
| 04/08/2004 | WO2003102264A3 Method for depositing silicon nitride or silicon oxynitride, and corresponding product |
| 04/08/2004 | WO2003087431A3 Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| 04/08/2004 | US20040067661 Method for locally heating a region in a semiconductor substrate |
| 04/08/2004 | US20040067642 Devices containing zirconium-platinum-containing materials and methods for preparing such materials and devices |
| 04/08/2004 | US20040067641 Gas distribution system for cyclical layer deposition |
| 04/08/2004 | US20040067363 Hydrophilic DLC on substrate with oxygen and/or hot water treatment |
| 04/08/2004 | US20040067354 Tray for vapor phase step |
| 04/08/2004 | US20040067308 Two-layer film for next generation damascene barrier application with good oxidation resistance |
| 04/08/2004 | US20040065656 Heated substrate support |
| 04/08/2004 | US20040065344 Processing apparatus and cleaning method |
| 04/08/2004 | US20040065261 Truncated dummy plate for process furnace |
| 04/08/2004 | US20040065260 Heating element CVD system and connection structure between heating element and electric power supply mechanism in the heating element CVD system |
| 04/08/2004 | US20040065258 Atomic layer deposition methods and atomic layer deposition tools |
| 04/08/2004 | US20040065256 Systems and methods for improved gas delivery |
| 04/08/2004 | US20040065255 Cyclical layer deposition system |
| 04/08/2004 | US20040065253 Method of growing oxide thin films |
| 04/08/2004 | DE20319104U1 Anordnung zur Wärmebehandlung von Siliziumscheiben in einer Prozesskammer Arrangement for heat treatment of silicon wafers in a process chamber |
| 04/08/2004 | DE10245553A1 Process for the gas phase deposition of components contained in a process gas flowing along a main flow direction used in the manufacture of transistors or capacitors comprises changing the main flow direction once during the process |
| 04/08/2004 | DE10245537A1 Verfahren und Prozessreaktor zur sequentiellen Gasphasenabscheidung mittels einer Prozess- und einer Hilfskammer Method and process for sequential vapor deposition reactor by means of a process and an auxiliary chamber |
| 04/08/2004 | DE10245459A1 Internally coated hollow member, has a coating supplied using a gas plasma by pulling the component to be coated through a ring electrode connected to an HF source and direct current source |
| 04/07/2004 | EP1406472A1 Ceramic heater and ceramic joined article |
| 04/07/2004 | EP1405333A1 Apparatus and method of making a slip free wafer boat |
| 04/07/2004 | EP1405330A2 Process chamber components having textured internal surfaces and method of manufacture |
| 04/07/2004 | EP1404903A1 Process chamber with a base with sectionally different rotational drive and layer deposition method in such a process chamber |
| 04/07/2004 | EP1404892A1 Manufacture of silica waveguides with minimal absorption |
| 04/07/2004 | EP1404891A1 Cvd system comprising a thermally differentiated substrate support |
| 04/07/2004 | EP1404890A1 Source chemical container assembly |
| 04/07/2004 | EP1404722A1 Continuous processing apparatus by plasma polymerization with vertical chamber |
| 04/07/2004 | EP1252364B1 Apparatus and method for epitaxially processing a substrate |
| 04/07/2004 | EP1198610A4 Low-temperature compatible wide-pressure-range plasma flow device |
| 04/07/2004 | EP0991337B1 Ornamental stones |
| 04/07/2004 | EP0771469B1 Method of and apparatus for microwave-plasma production |
| 04/07/2004 | CN1488166A Ferro electric thin film, metal thin film or oxide thin film, and method and apparatus for preparation thereof, and electric or electronic device using said thin film |
| 04/07/2004 | CN1488165A Method and device for heat treatment |
| 04/07/2004 | CN1488164A 等离子体装置及等离子体生成方法 Plasma device and method for generating a plasma |
| 04/07/2004 | CN1488162A Heat treatment device and heat treatment method |
| 04/07/2004 | CN1488009A Diamond coatings on reactor wall and method of manufacturing thereof |
| 04/07/2004 | CN1488008A Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
| 04/07/2004 | CN1487564A Substrate for electronic apparatus, method for producing substrate of electronic apparatus, and electronic apparatus |
| 04/07/2004 | CN1487118A Plasma decomposition method and apparatus for preparing diamond-like film |
| 04/07/2004 | CN1144958C Method for high-speed gas-phase carbon deposition for carbon braking disc for aircraft and equipment thereof |
| 04/07/2004 | CN1144898C PECVD of TaN films from tantalum halide precursors |
| 04/07/2004 | CN1144896C Plasma treating apparatus |
| 04/06/2004 | US6718126 Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition |
| 04/06/2004 | US6717368 Plasma generator using microwave |
| 04/06/2004 | US6717113 Method for substrate thermal management |
| 04/06/2004 | US6716772 Semiconductor device manufacturing method and semiconductor manufacturing apparatus |
| 04/06/2004 | US6716770 Vapor deposition using organosilicon compound and fluorohydrocarbon plasma; dielectric |
| 04/06/2004 | US6716765 Plasma clean for a semiconductor thin film deposition chamber |
| 04/06/2004 | US6716752 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 04/06/2004 | US6716751 Dopant precursors and processes |
| 04/06/2004 | US6716748 Reaction chamber for processing a substrate wafer, and method for processing a substrate using the chamber |
| 04/06/2004 | US6716725 Plasma processing method and semiconductor device |
| 04/06/2004 | US6716717 Method for fabricating capacitor of semiconductor device |
| 04/06/2004 | US6716713 Dopant precursors and ion implantation processes |
| 04/06/2004 | US6716663 Method for removing foreign matter, method for forming film, semiconductor device and film forming apparatus |
| 04/06/2004 | US6716658 Method of preventing generation of particles in chamber |
| 04/06/2004 | US6716647 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions runs |
| 04/06/2004 | US6716551 Abraded fluid diffusion layer for an electrochemical fuel cell |
| 04/06/2004 | US6716479 Forming flexibible thin films via chemical vapor deposition, pulse-laser deposition, molecular beam epitaxy, and sputtering; acoustics; telecommunications |
| 04/06/2004 | US6716477 Method and apparatus for monitoring process exhaust gas, semiconductor-manufacturing device and method and system for managing semiconductor-manufacturing device |
| 04/06/2004 | US6716476 Method of depositing an optical quality silica film by PECVD |
| 04/06/2004 | US6716289 Rigid gas collector for providing an even flow of gasses |
| 04/06/2004 | US6716287 Processing chamber with flow-restricting ring |
| 04/06/2004 | US6716284 Apparatus and process of improving atomic layer deposition chamber performance |
| 04/06/2004 | US6715496 Turbomolecular pump coupled to a process chamber, using a fluorinated gas |
| 04/06/2004 | US6715441 PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 04/01/2004 | WO2004027846A1 Substrate processing apparatus and method of manufacturing semiconductor device |
| 04/01/2004 | WO2004027838A2 Fast gas exchange for thermal conductivity modulation |
| 04/01/2004 | WO2004027816A2 A method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 04/01/2004 | WO2004027815A1 Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition |
| 04/01/2004 | WO2004027813A1 System for and method of gas cluster ion beam processing |
| 04/01/2004 | WO2004027127A1 Acicular silicon crystal and process for producing the same |
| 04/01/2004 | WO2004027112A2 An apparatus for the deposition of high dielectric constant films |
| 04/01/2004 | WO2004027111A1 Electrode, solid element and device using the same |
| 04/01/2004 | WO2004027110A2 Additives to prevent degradation of alkyl-hydrogen siloxanes |
| 04/01/2004 | WO2004026471A1 Photocatalyst material and process for producing the same |
| 04/01/2004 | WO2004026096A2 Viewing window cleaning apparatus |
| 04/01/2004 | WO2004011688A3 Method and apparatus for dispersion strengthened bond coats for thermal barrier coatings |
| 04/01/2004 | WO2004006293A3 Method of annealing electrically conductive zinc oxide films |