| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/16/2004 | US6706627 Method of manufacturing capacitor with a diffusion barrier containing ruthenium, titanium and nitrogen |
| 03/16/2004 | US6706620 Method for fabricating a nitride film |
| 03/16/2004 | US6706585 Chemical vapor deposition process for fabricating layered superlattice materials |
| 03/16/2004 | US6706541 Method and apparatus for controlling wafer uniformity using spatially resolved sensors |
| 03/16/2004 | US6706336 Silicon-based film, formation method therefor and photovoltaic element |
| 03/16/2004 | US6706335 Effecting high frequency plasma chemical vapor deposition using a source gas comprising a silicon halide (silicon chloride or fluoride) and hydrogen forming a silicon thin film |
| 03/16/2004 | US6706327 Method of making cemented carbide body |
| 03/16/2004 | US6706205 Semiconductor processing article |
| 03/16/2004 | US6706201 Method for producing metallized substrate materials |
| 03/16/2004 | US6706142 Systems and methods for enhancing plasma processing of a semiconductor substrate |
| 03/16/2004 | US6706115 Atomic Layer Deposition; alternate surface reactions of metal and nitrogen source materials, the nitrogen compound having a hydrocarbon, amino or silyl group bound to nitrogen, which group dissociates to form a reducing agentas a reducing agent |
| 03/16/2004 | US6706113 Heating then quickly quenching calcium sulfate (gypsum); dehydration; cement binder |
| 03/16/2004 | US6705806 Cutting tool coated with diamond |
| 03/16/2004 | US6705394 Rapid cycle chuck for low-pressure processing |
| 03/16/2004 | US6705246 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 03/16/2004 | US6705245 Apparatus for forming polymer continuously on the surface of metal by DC plasma polymerization |
| 03/11/2004 | WO2004021423A1 Method of forming nanocrystals |
| 03/11/2004 | WO2004021422A1 Processing device, mounting table, processing method |
| 03/11/2004 | WO2004021421A1 Method for manufacturing silicon epitaxial wafer |
| 03/11/2004 | WO2004021415A1 Treating apparatus and method of treating |
| 03/11/2004 | WO2004021392A1 Gas tube end cap for a microwave plasma generator |
| 03/11/2004 | WO2004020695A1 Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing |
| 03/11/2004 | WO2004020694A1 Substrate processor and method of cleaning the same |
| 03/11/2004 | WO2004020693A1 Cleaning method for substrate-processing device and the device |
| 03/11/2004 | WO2004020692A1 Substrate treating apparatus |
| 03/11/2004 | WO2004020691A2 Systems and methods for forming zirconium and/or hafnium-containing layers |
| 03/11/2004 | WO2004020690A1 Systems and methods for forming metal oxides using alcohols |
| 03/11/2004 | WO2004020689A2 Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides |
| 03/11/2004 | WO2004020688A1 Metal sulfide thin film and method for production thereof |
| 03/11/2004 | WO2004020687A1 High throughput deposition apparatus |
| 03/11/2004 | WO2003089680A3 Process modules for transport polymerization of low dieletric constant thin films |
| 03/11/2004 | WO2003069655A3 Electronic micro component including a capacitive structure |
| 03/11/2004 | WO2003065424A3 Apparatus for cyclical deposition of thin films |
| 03/11/2004 | WO2003054911A8 Plasma process apparatus |
| 03/11/2004 | US20040048493 Method and device for heat treatment |
| 03/11/2004 | US20040048492 Apparatus for reducing plasma charge damage for plasma processes |
| 03/11/2004 | US20040048490 Interlayer insulation film used for multilayer interconnect of semiconductor integrated circuit and method of manufacturing the same |
| 03/11/2004 | US20040048485 In-situ sequential high density plasma deposition and etch processing for gap fill |
| 03/11/2004 | US20040048467 Devices containing platinum-iridium films and methods of preparing such films and devices |
| 03/11/2004 | US20040048461 Methods and apparatus for forming barrier layers in high aspect ratio vias |
| 03/11/2004 | US20040048452 Method of producing electronic device material |
| 03/11/2004 | US20040048451 Rhodium film and method of formation |
| 03/11/2004 | US20040048449 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 03/11/2004 | US20040048398 Mask repair with electron beam-induced chemical etching |
| 03/11/2004 | US20040048220 Thermal process station with heated lid |
| 03/11/2004 | US20040048134 Low-contact-resistance interface structure between separator and carbon material for fuel cell, separator and carbon material used therein, and production method for stainless steel separator for fuel cell |
| 03/11/2004 | US20040047990 Introducing a first portion of a reactant gas to center opening region; introducing a second portion of reactant gas to outer region; wherein first and second portions are controlled proportions |
| 03/11/2004 | US20040047059 Object which has optical layers |
| 03/11/2004 | US20040046497 Diffusion barrier coatings having graded compositions and devices incorporating the same |
| 03/11/2004 | US20040046260 Plasma treatment for copper oxide reduction |
| 03/11/2004 | US20040046165 Plasma encapsulation for electronic and microelectronic components such as oleds |
| 03/11/2004 | US20040046130 Apparatus and method for synthesizing films and coatings by focused particle beam deposition |
| 03/11/2004 | US20040045889 High conductivity particle filter |
| 03/11/2004 | US20040045577 Cleaning of processing chambers with dilute NF3 plasmas |
| 03/11/2004 | US20040045576 Plasma cleaning gas with lower global warming potential than SF6 |
| 03/11/2004 | US20040045574 Semiconductor fabrication equipment parts includes determining a definition for a clean part including multiple maximum acceptable impurity levels; determining an initial multiple impurity levels of a part prior to its cleaning process and |
| 03/11/2004 | US20040045509 Reduced friction lift pin |
| 03/11/2004 | US20040045508 Plasma cvd system |
| 03/11/2004 | US20040045505 Process for forming a microcrystalline silicon series thin film and apparatus suitable for practicing said process |
| 03/11/2004 | US20040045504 One of the layers is formed from a material produced by a redox reaction occurring in a deposited solution. |
| 03/11/2004 | US20040045503 Method for treating a surface of a reaction chamber |
| 03/11/2004 | DE4126216B4 Vorrichtung für Dünnschichtverfahren zur Behandlung großflächiger Substrate Apparatus for thin-film processes for the treatment of large area substrates |
| 03/11/2004 | DE10240221A1 Verfahren zum Herstellen dünner Präzisionsrohre A method for producing thin precision tubes |
| 03/11/2004 | DE10239083A1 Device for supplying a process chamber with fluid media comprises a supply line having a supply opening, seals assigned to the supply opening, and tensioning units for tensioning the supply line on a receiver of the process chamber |
| 03/10/2004 | EP1396884A2 Interlayer insulation film used for multilayer interconnect of semiconductor integrated circuit and method of manufacturing the same |
| 03/10/2004 | EP1396878A1 Production method for semiconductor substrate and semiconductor element |
| 03/10/2004 | EP1396877A2 Substrate for electronic devices, manufacturing method therefor, and electronic device |
| 03/10/2004 | EP1396554A1 Plasma cvd apparatus |
| 03/10/2004 | CN1481582A Processing method and processing appts |
| 03/10/2004 | CN1481449A Injector and method for prolonged introduction of reagents into plasma |
| 03/10/2004 | CN1481448A Plating method of metal film on surface of polymer |
| 03/10/2004 | CN1480998A Method for forming silica layer on substrate by adopting atomic layer deposition technique |
| 03/10/2004 | CN1141416C Indium source reagent compsns. |
| 03/09/2004 | US6704913 In situ wafer heat for reduced backside contamination |
| 03/09/2004 | US6704667 Real time mass flow control system with interlock |
| 03/09/2004 | US6704188 Ultra thin TCS (SiCL4) cell nitride for dram capacitor with DCS (SiH2Cl2) interface seeding layer |
| 03/09/2004 | US6703708 Graded thin films |
| 03/09/2004 | US6703592 System of controlling the temperature of a processing chamber |
| 03/09/2004 | US6703289 Method for forming crystalline silicon layer and crystalline silicon semiconductor device |
| 03/09/2004 | US6703288 Compound crystal and method of manufacturing same |
| 03/09/2004 | US6703081 Installation and method for vacuum treatment or powder production |
| 03/09/2004 | US6702901 Chamber for chemical vapor deposition |
| 03/09/2004 | US6702899 Vacuum processing apparatus |
| 03/09/2004 | US6702898 Deposited film forming apparatus |
| 03/04/2004 | WO2004019399A1 Gas supply system and treatment system |
| 03/04/2004 | WO2004019381A2 Barrier coatings produced by atmospheric glow discharge |
| 03/04/2004 | WO2004019368A2 Reduced volume plasma reactor |
| 03/04/2004 | WO2004018573A2 Method of coating a surface with an organic film |
| 03/04/2004 | WO2003100121A3 Multistation coating device and method for plasma coating |
| 03/04/2004 | WO2003040440A3 Apparatus and method for diamond production |
| 03/04/2004 | US20040044419 Semiconductor manufacturing apparatus and semiconductor device manufacturing method |
| 03/04/2004 | US20040044163 Single source mixtures of metal siloxides |
| 03/04/2004 | US20040043639 Method and apparatus for transferring heat from a substrate to a chuck |
| 03/04/2004 | US20040043637 Method of forming silicon nitride deposited film |
| 03/04/2004 | US20040043636 Systems and methods for forming tantalum oxide layers and tantalum precursor compounds |
| 03/04/2004 | US20040043635 Systems and methods for forming metal oxides using metal diketonates and/or ketoimines |
| 03/04/2004 | US20040043634 Systems and methods for forming metal-doped alumina |
| 03/04/2004 | US20040043633 Systems and methods for forming refractory metal oxide layers |
| 03/04/2004 | US20040043632 Systems and methods for forming metal oxides using alcohols |
| 03/04/2004 | US20040043631 Method and apparatus for treating a semi-conductor substrate |